公开(公告)号：US20060237433A1

公开(公告)日：2006-10-26

申请号：US11174988

申请日：2005-07-05

申请人： David Quach ,  Martin Salinas

发明人： David Quach ,  Martin Salinas

IPC分类号： H05B3/68

CPC分类号： H01L21/67184 ,  H01L21/67109 ,  H01L21/67742 ,  Y10S414/135

摘要： An integrated thermal unit comprising a bake plate configured to heat a substrate supported on a surface of the bake plate; a chill plate configured to cool a substrate supported on a surface of the chill plate; and a substrate transfer shuttle configured to transfer substrates from the bake plate to the cool plate, wherein the substrate transfer shuttle has a temperature controlled substrate holding surface that is capable of cooling a substrate heated by the bake plate.

公开(公告)号：US07431585B2

公开(公告)日：2008-10-07

申请号：US10278615

申请日：2002-10-22

申请人： Jun Zhao ,  David Quach ,  Timothy Weidman ,  Rick J. Roberts ,  Farhad Moghadam ,  Dan Maydan

发明人： Jun Zhao ,  David Quach ,  Timothy Weidman ,  Rick J. Roberts ,  Farhad Moghadam ,  Dan Maydan

IPC分类号： F27D3/00

CPC分类号： H01L21/67109 ,  Y10S414/139

摘要： An apparatus for processing substrates is disclosed. In one embodiment, the apparatus includes a housing and a plurality of stacked cell structures in the housing. An actuator is adapted to move the plurality of stacked cell structures inside of the housing while substrates in the stacked cell structures are being heated.

公开(公告)号：US20050229849A1

公开(公告)日：2005-10-20

申请号：US11057041

申请日：2005-02-11

申请人： Mario Silvetti ,  David Quach ,  Bok Kim ,  Thomas Nowak ,  Thomas Cho ,  Fred Hariz ,  Robert Moore

发明人： Mario Silvetti ,  David Quach ,  Bok Kim ,  Thomas Nowak ,  Thomas Cho ,  Fred Hariz ,  Robert Moore

IPC分类号： C23C16/00 ,  C23C16/44 ,  C23C16/458 ,  H01J37/32

CPC分类号： C23C16/4404 ,  C23C16/4586 ,  H01J37/32522 ,  H01J2237/022

摘要： Embodiments of the present invention are generally directed to apparatus and methods for a plasma-processing chamber requiring less maintenance and downtime and possessing improved reliability over the prior art. In one embodiment, the apparatus includes a substrate support resting on a ceramic shaft, an inner shaft allowing for electrical connections to the substrate support at atmospheric pressure, an aluminum substrate support resting on but not fixed to a ceramic support structure, sapphire rest points swaged into the substrate support, and a heating element inside the substrate support arranged in an Archimedes spiral to reduce warping of the substrate support and to increase its lifetime. Methods include increasing time between in-situ cleans of the chamber by reducing particle generation from chamber surfaces. Reduced particle generation occurs via temperature control of chamber components and pressurization of non-processing regions of the chamber relative to the processing region with a purge gas.

摘要翻译： 本发明的实施例一般涉及等离子体处理室的装置和方法，其需要较少的维护和停机时间，并且比现有技术具有更高的可靠性。 在一个实施例中，该设备包括搁置在陶瓷轴上的基板支撑件，允许在大气压下与基板支撑件电连接的内轴，支撑在陶瓷支撑结构上但不固定到陶瓷支撑结构的铝基板支撑件，模锻的蓝宝石支架 衬底支撑件内部的加热元件和布置在阿基米德螺旋中的衬底支撑件内的加热元件，以减少衬底支撑件的翘曲并增加其寿命。 方法包括通过减少从室表面产生颗粒来增加室内原位清洗之间的时间。 通过腔室部件的温度控制和腔室相对于处理区域的吹扫气体的非处理区域的加压而发生减少的颗粒产生。

公开(公告)号：US20050194548A1

公开(公告)日：2005-09-08

申请号：US10792053

申请日：2004-03-02

申请人： David Quach ,  Jun Zhao

发明人： David Quach ,  Jun Zhao

IPC分类号： H01J37/30

CPC分类号： H01J37/317 ,  H01J37/20 ,  H01J2237/2001 ,  H01J2237/316 ,  H01J2237/3165 ,  H01L21/67115

摘要： One embodiment of the present invention is an electron beam treatment apparatus that includes: (a) an array of lamps that output radiation; (b) a support mechanism adapted to support a substrate at a treatment position above the lamps; and (c) a lamp heat shield, disposed above the array, having a radiation absorption portion adapted to absorb radiation from at least a portion of the array, and a radiation reflection portion adapted to reflect radiation from at least a portion of the array towards the substrate when disposed at the treatment position.

摘要翻译： 本发明的一个实施例是一种电子束处理装置，其包括：（a）输出辐射的灯阵列; （b）适于在灯上方的处理位置处支撑衬底的支撑机构; 和（c）设置在阵列上方的灯泡屏蔽罩，具有适于吸收来自该阵列的至少一部分的辐射的辐射吸收部分，以及适于将来自阵列的至少一部分的辐射反射到 该基板设置在处理位置时。

公开(公告)号：US20080097714A1

公开(公告)日：2008-04-24

申请号：US11689384

申请日：2007-03-21

申请人： Sharathchandra Somayaji ,  Christopher L. Beaudry ,  David Quach

发明人： Sharathchandra Somayaji ,  Christopher L. Beaudry ,  David Quach

IPC分类号： G01K7/16 ,  G01K15/00

CPC分类号： G01K1/024 ,  G01K7/425

摘要： A monitor device includes a substrate and a plurality of temperature sensors disposed in the substrate. The monitor device also includes a processor coupled to the substrate and adapted to receive one or more signals from the plurality of temperature sensors. The processor is further adapted to convert the one or more received signals into one or more converted signals. The monitor device further includes a transceiver coupled to the substrate and adapted to receive the one or more converted signals. The transceiver is further adapted to transmit one or more output signals to an external receiver.

摘要翻译： 监视器装置包括衬底和设置在衬底中的多个温度传感器。 监视器装置还包括耦合到衬底并适于从多个温度传感器接收一个或多个信号的处理器。 处理器还适于将一个或多个接收的信号转换成一个或多个转换的信号。 监视器装置还包括耦合到衬底并适于接收一个或多个转换信号的收发器。 收发器还适于将一个或多个输出信号发送到外部接收器。

公开(公告)号：US20080023656A1

公开(公告)日：2008-01-31

申请号：US11868453

申请日：2007-10-05

申请人： David Quach ,  Martin Salinas

发明人： David Quach ,  Martin Salinas

IPC分类号： G21K5/08

CPC分类号： H01L21/67109 ,  G03F7/7075 ,  H01L21/67748

摘要： An integrated thermal unit comprising a bake plate configured to heat a substrate supported on a surface of the bake plate; a chill plate configured to cool a substrate supported on a surface of the chill plate; and a substrate transfer shuttle configured to transfer substrates from the bake plate to the cool plate, wherein the substrate transfer shuttle has a temperature controlled substrate holding surface that is capable of cooling a substrate heated by the bake plate.

摘要翻译： 一种集成热单元，包括：烘烤板，被配置为加热支撑在所述烘烤板的表面上的基底; 冷却板，被配置为冷却支撑在所述冷却板的表面上的基板; 以及衬底传送梭，其构造成将衬底从烘烤板转移到冷却板，其中衬底传送梭具有能够冷却由烘烤板加热的衬底的温度控制的衬底保持表面。

公开(公告)号：US20060237431A1

公开(公告)日：2006-10-26

申请号：US11174781

申请日：2005-07-05

申请人： David Quach ,  Martin Salinas

发明人： David Quach ,  Martin Salinas

IPC分类号： H05B3/68

CPC分类号： H01L21/67184 ,  H01L21/67109 ,  H01L21/67742 ,  H01L21/67748 ,  H01L21/67751

摘要： An integrated thermal unit comprises a bake station comprising a bake plate configured to hold and heat a substrate; a chill station comprising a chill plate configured to hold and cool a substrate; and a substrate transfer shuttle configured to transfer substrates from the bake plate to the chill plate along a horizontally linear path within the thermal unit and raise and lower substrates along a vertical path within the integrated thermal unit.

摘要翻译： 集成热单元包括烘焙站，烘烤站包括构造成保持和加热基材的烘烤板; 冷却站，包括构造成保持和冷却衬底的冷却板; 以及基板传送梭，其构造成沿着所述热单元内的水平线性路径将基板从所述烘烤板传送到所述冷却板，并且沿着所述集成热单元内的垂直路径升高和降低基板。

公开(公告)号：US20060223233A1

公开(公告)日：2006-10-05

申请号：US11445630

申请日：2006-06-02

申请人： Jun Zhao ,  David Quach ,  Timothy Weidman ,  Rick Roberts ,  Farhad Moghadam ,  Dan Maydan

发明人： Jun Zhao ,  David Quach ,  Timothy Weidman ,  Rick Roberts ,  Farhad Moghadam ,  Dan Maydan

IPC分类号： H01L21/00 ,  F28F7/00

CPC分类号： H01L21/67109 ,  Y10S414/139

摘要： An apparatus for processing substrates is disclosed. In one embodiment, the apparatus includes a housing and a plurality of stacked cell structures in the housing. An actuator is adapted to move the plurality of stacked cell structures inside of the housing while substrates in the stacked cell structures are being heated.