Method of multi-angled bump processing for magnetic pole fabrication and systems thereof
    12.
    发明授权
    Method of multi-angled bump processing for magnetic pole fabrication and systems thereof 有权
    用于磁极制造的多角度凸块加工方法及其系统

    公开(公告)号:US08085497B2

    公开(公告)日:2011-12-27

    申请号:US12341834

    申请日:2008-12-22

    IPC分类号: G11B5/127

    CPC分类号: G11B5/3116 G11B5/3163

    摘要: A system according to one embodiment includes a magnetic pole; a bump structure above the pole, the bump structure having a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the pole, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the pole, wherein the second angle is greater than the first angle; and a shield above the bump structure. A method according to one embodiment includes forming a bump layer above a magnetic pole; removing a portion of the bump layer for forming a step therein; and milling the bump layer for defining thereon a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the bump layer, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the bump layer, wherein the second angle is greater than the first angle.

    摘要翻译: 根据一个实施例的系统包括磁极; 所述凸起结构具有从所述极的沉积平面以1°至89°之间的第一角度定向的第一表面,并且所述第一表面以与所述极的沉积的平面成1°至89°之间的第二角度定向 所述极的沉积平面,其中所述第二角度大于所述第一角度; 和凸块结构之上的屏蔽。 根据一个实施例的方法包括在磁极上形成凸起层; 去除所述凸起层的一部分以在其中形成台阶; 并且研磨所述凸起层,以在其上限定从凸起层的沉积平面以1°至89°之间的第一角度定向的第一表面,以及从该平面以1°至89°之间的第二角度定向的第二表面 所述凸起层的沉积,其中所述第二角度大于所述第一角度。

    Perpendicular magnetic write head having a corner notched conformal, wrap-around, trailing magnetic shield for reduced adjacent track interference
    13.
    发明授权
    Perpendicular magnetic write head having a corner notched conformal, wrap-around, trailing magnetic shield for reduced adjacent track interference 有权
    垂直磁性写头,具有角切口的保形,环绕,后退磁屏蔽,减少相邻的轨道干扰

    公开(公告)号:US07848054B2

    公开(公告)日:2010-12-07

    申请号:US11744054

    申请日:2007-05-03

    IPC分类号: G11B5/127

    摘要: A perpendicular magnetic write head having a conformal wrap around trailing shield. The write head includes a write pole that can be configured with a trapezoidal shape as viewed from the Air Bearing Surface (ABS) and which includes a wrap around trailing magnetic shield. The magnetic shield has a trailing portion that is separated from the leading edge of the write pole by a non-magnetic trailing gap, and has side shield portions that are separated from first and second side portions of the write pole by first and second non-magnetic side gaps. The magnetic shield can be configured with notches at either side of the trailing portion of magnetic shield. These notches can extend in the trailing direction by a distance that is preferably ¼ to 1 times the trailing gap thickness. The width of the straight, trailing portion of the shield is preferable ½ to 1 times of the main pole width.

    摘要翻译: 垂直磁性写头,其具有围绕后屏蔽的保形包裹。 写入头包括写入极,其可以被配置为从空气轴承表面(ABS)观察到的梯形形状,并且包括围绕尾部磁屏蔽的包裹。 磁屏蔽具有通过非磁性拖尾间隔与写入极的前端分离的后部,并且具有通过第一和第二非间隙与写入极的第一和第二侧部分离的侧面屏蔽部分, 磁侧隙。 磁屏蔽可以在磁屏蔽的尾部的任一侧配置有凹口。 这些凹口可以在拖尾方向上延伸一段距离,优选为后缘间隙厚度的1/4至1倍。 屏蔽的直的后部的宽度优选为主极宽度的1/2至1倍。

    Method FPR manufacturing a magnetic write head
    14.
    发明授权
    Method FPR manufacturing a magnetic write head 有权
    磁写头制造方法

    公开(公告)号:US07788796B2

    公开(公告)日:2010-09-07

    申请号:US11611824

    申请日:2006-12-15

    IPC分类号: G11B5/127 H04R31/00

    摘要: A method for constructing a magnetic write head using an electrical lapping guide to carefully control critical dimensions during a lapping operation used to define an air bearing surface. The lapping guide is photolithograhically patterned in a common photolithographic step with another write head structure so that special relation between the lapping guide and critical dimensions of the write head structure can be carefully maintained. The electrical lapping guide can be patterned in a common photolithographic step as the write pole so that the location of the flare point can be carefully controlled with respect to the location of the lapping guide. A stitched flare structure can also be built together with the electrical lapping guide, then a self-aligned shield can be further built over this stitched flare structure so that both flare point and shield throat can be controlled tightly together by this electrical lapping guide during lapping process.

    摘要翻译: 一种用于在用于限定空气轴承表面的研磨操作期间使用电研磨引导件来构造磁性写入头以小心地控制临界尺寸的方法。 研磨导轨在具有另一写头结构的普通光刻步骤中以光刻方式进行图案化,从而可以仔细地保持研磨引导件与写头结构的临界尺寸之间的特殊关系。 电研磨引导件可以以普通光刻步骤图案化为写极,使得可以相对于研磨导轨的位置仔细地控制扩张点的位置。 缝合的火炬结构也可以与电气研磨导轨一起构建,然后可以在该缝合的火炬结构上进一步构建自对准屏蔽,使得在研磨过程中,电气研磨引导件可以将喇叭口和屏蔽喉部两者紧密地一起控制 处理。

    METHOD OF MULTI-ANGLED BUMP PROCESSING FOR MAGNETIC POLE FABRICATION AND SYSTEMS THEREOF
    15.
    发明申请
    METHOD OF MULTI-ANGLED BUMP PROCESSING FOR MAGNETIC POLE FABRICATION AND SYSTEMS THEREOF 有权
    用于磁极制造及其系统的多重保护加工方法

    公开(公告)号:US20100157474A1

    公开(公告)日:2010-06-24

    申请号:US12341834

    申请日:2008-12-22

    IPC分类号: G11B5/127

    CPC分类号: G11B5/3116 G11B5/3163

    摘要: A system according to one embodiment includes a magnetic pole; a bump structure above the pole, the bump structure having a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the pole, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the pole, wherein the second angle is greater than the first angle; and a shield above the bump structure. A method according to one embodiment includes forming a bump layer above a magnetic pole; removing a portion of the bump layer for forming a step therein; and milling the bump layer for defining thereon a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the bump layer, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the bump layer, wherein the second angle is greater than the first angle.

    摘要翻译: 根据一个实施例的系统包括磁极; 所述凸起结构具有从所述极的沉积平面以1°至89°之间的第一角度定向的第一表面,并且所述第一表面以与所述极的沉积的平面成1°至89°之间的第二角度定向 所述极的沉积平面,其中所述第二角度大于所述第一角度; 和凸块结构之上的屏蔽。 根据一个实施例的方法包括在磁极上形成凸起层; 去除所述凸起层的一部分以在其中形成台阶; 并且研磨所述凸起层,以在其上限定从凸起层的沉积平面以1°至89°之间的第一角度定向的第一表面,以及从该平面以1°至89°之间的第二角度定向的第二表面 所述凸起层的沉积,其中所述第二角度大于所述第一角度。

    Perpendicular magnetic write head having a wrap around trailing shield with a flux return path
    18.
    发明申请
    Perpendicular magnetic write head having a wrap around trailing shield with a flux return path 审中-公开
    垂直磁性写头,具有带有通量返回路径的后挡板的包裹物

    公开(公告)号:US20080112088A1

    公开(公告)日:2008-05-15

    申请号:US11598417

    申请日:2006-11-13

    IPC分类号: G11B5/33

    CPC分类号: G11B5/1278 G11B5/11

    摘要: A magnetic write head for perpendicular magnetic recording that has write pole, a return pole and a trailing shield that is magnetically connected with magnetic return pole. The write head includes a magnetic pedestal and first and second magnetic studs that connect the trailing shield with the pedestal. The studs are laterally spaced a distance that is not greater than 5 um from the nearest side of the write pole. In other words, the studs are spaced from each other a distance that is no greater than the width of the leading edge of the write pole plus 10 um. This spacing of the studs prevents saturation of the trailing shield, maximizing field gradient and ensuring optimal magnetic write performance.

    摘要翻译: 用于垂直磁记录的磁头,具有写磁极,与磁返回极磁性连接的返回极和后屏蔽。 写头包括一个磁性基座和将尾部屏蔽与基座相连的第一和第二磁性螺柱。 螺柱横向间隔开距离写柱最近侧不超过5um的距离。 换句话说,螺柱彼此间隔开不大于写入极的前缘的宽度加上10um的距离。 螺栓的这种间距防止后挡板的饱和,使场梯度最大化并确保最佳磁写性能。

    ELECTRICAL LAPPING GUIDE FOR FLARE POINT CONTROL AND TRAILING SHIELD THROAT HEIGHT IN A PERPENDICULAR MAGNETIC WRITE HEAD
    19.
    发明申请
    ELECTRICAL LAPPING GUIDE FOR FLARE POINT CONTROL AND TRAILING SHIELD THROAT HEIGHT IN A PERPENDICULAR MAGNETIC WRITE HEAD 有权
    用于磁头控制和导航屏蔽的电气导线指南在一个完整的磁性写头

    公开(公告)号:US20080144215A1

    公开(公告)日:2008-06-19

    申请号:US11611824

    申请日:2006-12-15

    IPC分类号: G11B5/147 G11B5/23

    摘要: A method for constructing a magnetic write head using an electrical lapping guide to carefully control critical dimensions dining a lapping operation used to define an air bearing surface. The lapping guide is photolithographically patterned in a common photolithographic step with another write head structure so that special relation between the lapping guide and critical dimensions of the write head structure can be carefully maintained. For example, the electrical lapping guide can be patterned in a common photolithographic step as the write pole so that the location of the flare point can he carefully controlled with respect to the location of the lapping guide. A stitched flare structure can also be built together with the electrical lapping guide, then a self-aligned shield can be further built over this stitched flare structure so that both flare point and shield throat can be controlled tightly together by this electrical lapping guide during lapping process. Similarly, the lapping guide can be formed in a common photolithographic step with a trailing shield, so that a critical dimension such as throat height of the trailing shield can be carefully controlled with respect to the electrical lapping guide.

    摘要翻译: 一种使用电研磨导向器构造磁性写入头的方法,以仔细控制关键尺寸,以用于界定空气轴承表面的研磨操作。 研磨导向器在具有另一写头结构的普通光刻步骤中光刻图案化,使得研磨引导件与写入头结构的关键尺寸之间的特殊关系可以被小心地保持。 例如,电研磨引导件可以以普通的光刻步骤图案化为写入极,使得可以相对于研磨导轨的位置仔细地控制闪光点的位置。 缝合的火炬结构也可以与电研磨导轨一起构建,然后可以在该缝合的火炬结构上进一步构建自对准的屏蔽,使得在研磨过程中这种电研磨引导件可以将喇叭口和屏蔽喉两者紧密地一起控制 处理。 类似地,研磨引导件可以在具有后挡板的普通光刻步骤中形成,使得可以相对于电研磨导轨小心地控制关键尺寸,例如后挡板的喉部高度。

    OPTICAL LAPPING GUIDE FOR USE IN THE MANUFACTURE OF PERPENDICULAR MAGNETIC WRITE HEADS
    20.
    发明申请
    OPTICAL LAPPING GUIDE FOR USE IN THE MANUFACTURE OF PERPENDICULAR MAGNETIC WRITE HEADS 失效
    光学写入头制造中使用的光学引导指南

    公开(公告)号:US20080141522A1

    公开(公告)日:2008-06-19

    申请号:US11611829

    申请日:2006-12-15

    IPC分类号: G11B5/127 B05D5/12 H04R31/00

    摘要: An optical lapping guide for determining an amount of lapping performed on a row of sliders in a process for manufacturing sliders for magnetic data recording. The optical lapping guide is constructed with a front edge that is at an angle with respect to an air bearing surface plane ABS plane, such that a portion of the lapping guides is in front of the ABS and portion of the lapping guide is behind the ABS. As lapping progresses, an increasing amount of the lapping guide will be exposed at the ABS and visible for inspection. Therefore, after a lapping process has been performed, the optical lapping guide can be inspected to determine the amount of material removed by lapping. The greater the amount of the lapping guide that is exposed and visible, the greater the amount of material removed by lapping.

    摘要翻译: 光学研磨引导件,用于确定在用于制造用于磁数据记录的滑块的过程中对一排滑块执行的研磨量。 光学研磨引导件的前边缘相对于空气轴承表面平面ABS平面成一定角度,使得研磨导轨的一部分在ABS的前面,研磨导轨的一部分在ABS后面 。 随着研磨的进行,越来越多的研磨导轨将暴露在ABS处并可见以供检查。 因此,在进行研磨处理之后,可以检查光学研磨导向件以确定通过研磨去除的材料的量。 暴露和可见的研磨导轨的量越大,通过研磨去除的材料量就越大。