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    Process for self-aligned flare point and shield throat definition prior to main pole patterning
    5.
    发明授权
    Process for self-aligned flare point and shield throat definition prior to main pole patterning 有权
    在主极图案化之前，自对准耀斑和屏蔽喉定义的过程

    公开(公告)号：US07881010B2

    公开(公告)日：2011-02-01

    申请号：US11956277

    申请日：2007-12-13

    申请人： Hung-Chin Guthrie ,  Ming Jiang ,  Edward Hin Pong Lee ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

    发明人： Hung-Chin Guthrie ,  Ming Jiang ,  Edward Hin Pong Lee ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

    IPC分类号： G11B5/187

    CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/3146 ,  G11B5/315

    摘要： A method for manufacturing a magnetic write head having a write pole with a flared step feature that defines a secondary flare point. The method involves depositing a magnetic write pole material on a substrate and then depositing a magnetic material over the write pole material followed by a non-magnetic material. A first mask is formed having a front edge to define the location of the secondary flare point, and one or more material removal processes are used to remove portions of the magnetic layer and non-magnetic layer that are not protected by this first mask. The first mask is replaced by a second mask that is configured to define a write pole, and an ion milling is performed to define the write pole. Shadowing from the magnetic layer and non-magnetic layer form a flared secondary flare point.

    摘要翻译： 一种用于制造具有定义二次闪光点的具有扩口步骤特征的写极的磁写头的方法。 该方法包括将磁性写入极材料沉积在衬底上，然后将磁性材料沉积在写入极材料上，随后是非磁性材料。 形成第一掩模，其具有前边缘以限定次级火炬点的位置，并且使用一个或多个材料去除过程来去除未被该第一掩模保护的磁性层和非磁性层的部分。 第一个掩模由配置为定义写入极的第二个掩模代替，并且执行离子铣削来定义写入极点。 从磁性层和非磁性层的阴影形成扩张的次级耀斑点。

    PROCESS FOR SELF-ALIGNED FLARE POINT AND SHIELD THROAT DEFINITION PRIOR TO MAIN POLE PATTERNING
    6.
    发明申请
    PROCESS FOR SELF-ALIGNED FLARE POINT AND SHIELD THROAT DEFINITION PRIOR TO MAIN POLE PATTERNING 有权
    自动对准点的过程和主要绘图前的屏蔽定义

    公开(公告)号：US20090152234A1

    公开(公告)日：2009-06-18

    申请号：US11956277

    申请日：2007-12-13

    申请人： Hung-Chin Guthrie ,  Ming Jiang ,  Edward Hin Pong Lee ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

    发明人： Hung-Chin Guthrie ,  Ming Jiang ,  Edward Hin Pong Lee ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

    IPC分类号： B44C1/22

    CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/3146 ,  G11B5/315

    摘要： A method for manufacturing a magnetic write head having a write pole with a flared step feature that defines a secondary flare point. The method involves depositing a magnetic write pole material on a substrate and then depositing a magnetic material over the write pole material followed by a non-magnetic material. A first mask is formed having a front edge to define the location of the secondary flare point, and one or more material removal processes are used to remove portions of the magnetic layer and non-magnetic layer that are not protected by this first mask. The first mask is replaced by a second mask that is configured to define a write pole, and an ion milling is performed to define the write pole. Shadowing from the magnetic layer and non-magnetic layer form a flared secondary flare point.

    摘要翻译： 一种用于制造具有定义二次闪光点的具有扩口步骤特征的写极的磁写头的方法。 该方法包括将磁性写入极材料沉积在衬底上，然后将磁性材料沉积在写入极材料上，随后是非磁性材料。 形成第一掩模，其具有前边缘以限定次级火炬点的位置，并且使用一个或多个材料去除过程来去除未被该第一掩模保护的磁性层和非磁性层的部分。 第一个掩模由配置为定义写入极的第二个掩模代替，并且执行离子铣削来定义写入极点。 从磁性层和非磁性层的阴影形成扩张的次级耀斑点。

    Method of multi-angled bump processing for magnetic pole fabrication and systems thereof
    7.
    发明授权
    Method of multi-angled bump processing for magnetic pole fabrication and systems thereof 有权
    用于磁极制造的多角度凸块加工方法及其系统

    公开(公告)号：US08085497B2

    公开(公告)日：2011-12-27

    申请号：US12341834

    申请日：2008-12-22

    申请人： Wen-Chien David Hsiao ,  Vladimir Nikitin ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

    发明人： Wen-Chien David Hsiao ,  Vladimir Nikitin ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

    IPC分类号： G11B5/127

    CPC分类号： G11B5/3116 ,  G11B5/3163

    摘要： A system according to one embodiment includes a magnetic pole; a bump structure above the pole, the bump structure having a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the pole, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the pole, wherein the second angle is greater than the first angle; and a shield above the bump structure. A method according to one embodiment includes forming a bump layer above a magnetic pole; removing a portion of the bump layer for forming a step therein; and milling the bump layer for defining thereon a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the bump layer, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the bump layer, wherein the second angle is greater than the first angle.

    摘要翻译： 根据一个实施例的系统包括磁极; 所述凸起结构具有从所述极的沉积平面以1°至89°之间的第一角度定向的第一表面，并且所述第一表面以与所述极的沉积的平面成1°至89°之间的第二角度定向 所述极的沉积平面，其中所述第二角度大于所述第一角度; 和凸块结构之上的屏蔽。 根据一个实施例的方法包括在磁极上形成凸起层; 去除所述凸起层的一部分以在其中形成台阶; 并且研磨所述凸起层，以在其上限定从凸起层的沉积平面以1°至89°之间的第一角度定向的第一表面，以及从该平面以1°至89°之间的第二角度定向的第二表面 所述凸起层的沉积，其中所述第二角度大于所述第一角度。

    METHOD OF MULTI-ANGLED BUMP PROCESSING FOR MAGNETIC POLE FABRICATION AND SYSTEMS THEREOF
    8.
    发明申请
    METHOD OF MULTI-ANGLED BUMP PROCESSING FOR MAGNETIC POLE FABRICATION AND SYSTEMS THEREOF 有权
    用于磁极制造及其系统的多重保护加工方法

    公开(公告)号：US20100157474A1

    公开(公告)日：2010-06-24

    申请号：US12341834

    申请日：2008-12-22

    申请人： Wen-Chien David Hsiao ,  Vladimir Nikitin ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

    发明人： Wen-Chien David Hsiao ,  Vladimir Nikitin ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

    IPC分类号： G11B5/127

    CPC分类号： G11B5/3116 ,  G11B5/3163

    摘要： A system according to one embodiment includes a magnetic pole; a bump structure above the pole, the bump structure having a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the pole, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the pole, wherein the second angle is greater than the first angle; and a shield above the bump structure. A method according to one embodiment includes forming a bump layer above a magnetic pole; removing a portion of the bump layer for forming a step therein; and milling the bump layer for defining thereon a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the bump layer, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the bump layer, wherein the second angle is greater than the first angle.

    摘要翻译： 根据一个实施例的系统包括磁极; 所述凸起结构具有从所述极的沉积平面以1°至89°之间的第一角度定向的第一表面，并且所述第一表面以与所述极的沉积的平面成1°至89°之间的第二角度定向 所述极的沉积平面，其中所述第二角度大于所述第一角度; 和凸块结构之上的屏蔽。 根据一个实施例的方法包括在磁极上形成凸起层; 去除所述凸起层的一部分以在其中形成台阶; 并且研磨所述凸起层，以在其上限定从凸起层的沉积平面以1°至89°之间的第一角度定向的第一表面，以及从该平面以1°至89°之间的第二角度定向的第二表面 所述凸起层的沉积，其中所述第二角度大于所述第一角度。

    Fabricating perpendicular write elements in perpendicular magnetic recording heads
    9.
    发明授权
    Fabricating perpendicular write elements in perpendicular magnetic recording heads 失效
    在垂直磁记录头中制造垂直写入元件

    公开(公告)号：US07648731B2

    公开(公告)日：2010-01-19

    申请号：US11380154

    申请日：2006-04-25

    申请人： Hung-Chin Guthrie ,  Ming Jiang ,  Yinshi Liu ,  Aron Pentek ,  John J. Yang ,  Sue Siyang Zhang

    发明人： Hung-Chin Guthrie ,  Ming Jiang ,  Yinshi Liu ,  Aron Pentek ,  John J. Yang ,  Sue Siyang Zhang

    IPC分类号： B05D5/12

    CPC分类号： G11B5/1278 ,  G11B5/3163

    摘要： Methods of fabricating perpendicular write elements for perpendicular magnetic recording heads are discussed. In write element fabrication, write poles are fabricated according to one of many desired methods. The write poles during fabrication are typically covered by a hard mask and a photolithographic soft mask. According to the methods described herein, the soft mask is removed such as by chemical etching. The hard mask is then removed, such as by CMP and ion etching, to expose the write poles. Shield gap material may then be deposited on the write poles to define the shield gap between the write poles and the trailing shields. Trailing shield material may then be deposited on the shield gap material to form the trailing shields corresponding with the write poles.

    摘要翻译： 讨论了制造垂直磁记录头垂直写入元件的方法。 在写入元件制造中，根据许多期望的方法之一制造写入极。 制造期间的写入极通常被硬掩模和光刻软掩模覆盖。 根据本文描述的方法，例如通过化学蚀刻去除软掩模。 然后去除硬掩模，例如通过CMP和离子蚀刻，以暴露写入极。 然后可以将屏蔽间隙材料沉积在写入极上以限定写入极和后部屏蔽之间的屏蔽间隙。 然后可以将后挡板材料沉积在屏蔽间隙材料上以形成对应于写入极的后挡板。

    FABRICATING PERPENDICULAR WRITE ELEMENTS IN PERPENDICULAR MAGNETIC RECORDING HEADS
    10.
    发明申请
    FABRICATING PERPENDICULAR WRITE ELEMENTS IN PERPENDICULAR MAGNETIC RECORDING HEADS 失效
    在完整的磁记录头中制作完整的写入元素

    公开(公告)号：US20080145524A1

    公开(公告)日：2008-06-19

    申请号：US11380154

    申请日：2006-04-25

    申请人： Hung-Chin Guthrie ,  Ming Jiang ,  Yinshi Liu ,  Aron Pentek ,  John J. Yang ,  Sue Siyang Zhang

    发明人： Hung-Chin Guthrie ,  Ming Jiang ,  Yinshi Liu ,  Aron Pentek ,  John J. Yang ,  Sue Siyang Zhang

    IPC分类号： B05D5/12

    CPC分类号： G11B5/1278 ,  G11B5/3163

    摘要： Methods of fabricating perpendicular write elements for perpendicular magnetic recording heads are discussed. In write element fabrication, write poles are fabricated according to one of many desired methods. The write poles during fabrication are typically covered by a hard mask and a photolithographic soft mask. According to the methods described herein, the soft mask is removed such as by chemical etching. The hard mask is then removed, such as by CMP and ion etching, to expose the write poles. Shield gap material may then be deposited on the write poles to define the shield gap between the write poles and the trailing shields. Trailing shield material may then be deposited on the shield gap material to form the trailing shields corresponding with the write poles.

    摘要翻译： 讨论了制造垂直磁记录头垂直写入元件的方法。 在写入元件制造中，根据许多期望的方法之一制造写入极。 制造期间的写入极通常被硬掩模和光刻软掩模覆盖。 根据本文描述的方法，例如通过化学蚀刻去除软掩模。 然后去除硬掩模，例如通过CMP和离子蚀刻，以暴露写入极。 然后可以将屏蔽间隙材料沉积在写入极上以限定写入极和后部屏蔽之间的屏蔽间隙。 然后可以将后挡板材料沉积在屏蔽间隙材料上以形成对应于写入极的后挡板。