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11.发明授权公开(公告)号：US06685853B1
公开(公告)日：2004-02-03
申请号：US09614230
申请日：2000-07-12
申请人： Marie Angelopoulos , Edward D. Babich , Inna V. Babich , Kuang-Jung Chen , Wayne Martin Moreau , David E. Seeger
发明人： Marie Angelopoulos , Edward D. Babich , Inna V. Babich , Kuang-Jung Chen , Wayne Martin Moreau , David E. Seeger
IPC分类号： H01B112
CPC分类号： H01B1/12 , H01L23/5328 , H01L2924/0002 , H01L2924/00
摘要： The present invention is an admixture of an electrically conductive material and an energy sensitive material resulting in a conductive energy sensitive composition. The structures are useful for lithography in microelectronic fabrication to avoid the effects of charging on resists from electron beams. The compositions are also useful in applications of scanning electron metrology and static dissipation.
摘要翻译： 本发明是导电材料和能量敏感材料的混合物，导致导电能量敏感组合物。 该结构可用于微电子制造中的光刻，以避免对来自电子束的抗蚀剂充电的影响。 该组合物也可用于扫描电子测量和静电消散的应用中。
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公开(公告)号：US5457005A
公开(公告)日：1995-10-10
申请号：US85041
申请日：1993-07-02
申请人： Edward D. Babich , Jeffrey D. Gelorme , Ronald W. Nunes , Sharon L. Nunes , Jurij R. Paraszczak , Russell J. Serino
发明人： Edward D. Babich , Jeffrey D. Gelorme , Ronald W. Nunes , Sharon L. Nunes , Jurij R. Paraszczak , Russell J. Serino
CPC分类号： G03F7/0755 , Y10S430/122 , Y10S430/143
摘要： A dry developable photoresist composition that contains in admixture a polymeric epoxide; a di- or polyfunctional organosilicon material; and an onium salt; and use thereof to produce an image.
摘要翻译： 一种干燥可显影光致抗蚀剂组合物，其包含聚合物环氧化物; 二官能或多功能有机硅材料; 和盐盐; 并使用它来产生图像。
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13.发明授权Dielectric structures having embedded gap filling RIE etch stop polymeric materials of high thermal stability 失效具有嵌入式间隙填充RIE蚀刻的介电结构阻止具有高热稳定性的聚合材料
公开(公告)号：US5141817A
公开(公告)日：1992-08-25
申请号：US366089
申请日：1989-06-13
申请人： Edward D. Babich , Michael Hatzakis , Richard P. McGouey , Sharon L. Nunes , Jurij R. Paraszczak , Jane M. Shaw
发明人： Edward D. Babich , Michael Hatzakis , Richard P. McGouey , Sharon L. Nunes , Jurij R. Paraszczak , Jane M. Shaw
IPC分类号： B32B7/02 , C08L83/14 , H01B3/18 , H01L21/302 , H01L21/3065 , H01L21/48 , H01L23/14 , H01L23/498
CPC分类号： H01L21/4807 , C08L83/14 , H01L23/145 , H01L23/49866 , H01L2924/0002 , Y10S428/901 , Y10T428/31663 , Y10T428/31721
摘要： Structures containing a dielectric material having a polymeric reactive ion etch barrier embedded therein. The preferred dielectric materials are polymers, preferably polyimide materials. The RIE etch barrier is a copolymer having an aromatic component having high thermal stability and having a cross-linking component selected from metallacyclobutane, metallabutene and vinyl groups. The etch barrier is deposited as a solvent free liquid which can fill gaps between the dielectric material and electrical conductors embedded therein. The liquid polymer is cured to a solid insoluble state. The structures with electrical conductors embedded therein are useful for electronic applications.
摘要翻译： 包含其中嵌入有聚合物反应离子蚀刻屏障的电介质材料的结构。 优选的介电材料是聚合物，优选聚酰亚胺材料。 RIE蚀刻阻挡层是具有高热稳定性且具有选自金属环丁烷，金属和乙烯基的交联成分的芳香族成分的共聚物。 蚀刻阻挡层被沉积为无溶剂的液体，其可以填充介电材料和嵌入其中的电导体之间的间隙。 液体聚合物固化成固体不溶性状态。 具有嵌入其中的电导体的结构对于电子应用是有用的。
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14.发明授权
公开(公告)号：US4981909A
公开(公告)日：1991-01-01
申请号：US241281
申请日：1988-09-07
申请人： Edward D. Babich , Michael Hatzakis , Scott L. Jacobs , Juri R. Parasczcak , Jane M. Shaw , David F. Witman
发明人： Edward D. Babich , Michael Hatzakis , Scott L. Jacobs , Juri R. Parasczcak , Jane M. Shaw , David F. Witman
摘要： Plasma-resistant polymeric materials are prepared by reacting a polymeric material containing reactive hydrogen functional groups with a multifunctional organometallic material containing at least two functional groups which are reactive with the reactive hydrogen functional groups of the polymeric material, such as hexamethylcyclotrisilazane.
摘要翻译： 通过使含有反应性氢官能团的聚合材料与含有至少两个与聚合物材料的反应性氢官能团（例如六甲基环三硅氮烷）反应的官能团的多官能有机金属材料反应来制备等离子体的聚合材料。
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15.发明授权
公开(公告)号：US4782008A
公开(公告)日：1988-11-01
申请号：US713509
申请日：1985-03-19
申请人： Edward D. Babich , Michael Hatzakis , Scott L. Jacobs , Juri R. Parasczcak , Jane M. Shaw , David F. Witman
发明人： Edward D. Babich , Michael Hatzakis , Scott L. Jacobs , Juri R. Parasczcak , Jane M. Shaw , David F. Witman
IPC分类号： C08L61/00 , C08K5/549 , C08L33/00 , C08L33/02 , C08L61/04 , C08L61/06 , G03C1/00 , G03C1/72 , G03F7/004 , G03F7/038 , G03F7/26 , G03F7/38 , H01L21/027 , G03C5/00 , C08F8/00 , C08L83/00
摘要： Plasma-resistant polymeric materials are prepared by reacting a polymeric material containing reactive hydrogen functional groups with a multifunctional organometallic material containing at least two functional groups which are reactive with the reactive hydrogen functional groups of the polymeric material, such as hexamethylcyclotrisilazane.
摘要翻译： 通过使含有反应性氢官能团的聚合物材料与含有至少两个与聚合物材料的反应性氢官能团（例如六甲基环三硅氮烷）反应的官能团的多官能有机金属材料反应来制备等离子体聚合材料。
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公开(公告)号：US4603195A
公开(公告)日：1986-07-29
申请号：US567305
申请日：1983-12-30
IPC分类号： G03C1/72 , G03F7/004 , G03F7/023 , G03F7/038 , G03F7/075 , H01L21/027 , G03C1/52 , C07C113/00 , C08G77/40
CPC分类号： G03F7/0757 , G03F7/023 , G03F7/0754
摘要： A composition obtained by interracting a quinone diazo compound and an organosilicon compound; and use thereof in lithography.
摘要翻译： 通过包埋醌重氮化合物和有机硅化合物获得的组合物; 并在光刻中使用。
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公开(公告)号：US06617086B2
公开(公告)日：2003-09-09
申请号：US09796445
申请日：2001-03-02
申请人： Marie Angelopoulos , Edward D. Babich , Inna V. Babich , Katherina E. Babich , James J. Bucchignano , Karen E. Petrillo , Steven A. Rishton
发明人： Marie Angelopoulos , Edward D. Babich , Inna V. Babich , Katherina E. Babich , James J. Bucchignano , Karen E. Petrillo , Steven A. Rishton
IPC分类号： G03C300
CPC分类号： G03F7/0758 , G03F7/038 , Y10S430/111
摘要： A new group of non-chemically amplified negative tone water/aqueous base developable (photo) resists based on redistribution of carbon-oxygen bonds in pendant ester groups of the polymers has been found.
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公开(公告)号：US5565529A
公开(公告)日：1996-10-15
申请号：US85465
申请日：1993-06-30
申请人： Edward D. Babich , Michael Hatzakis , Richard P. McGouey , Sharon L. Nunes , Jurij R. Paraszczak , Jane M. Shaw
发明人： Edward D. Babich , Michael Hatzakis , Richard P. McGouey , Sharon L. Nunes , Jurij R. Paraszczak , Jane M. Shaw
IPC分类号： B32B7/02 , C08L83/14 , H01B3/18 , H01L21/302 , H01L21/3065 , H01L21/48 , H01L23/14 , H01L23/498 , C08L83/00
CPC分类号： H01L21/4807 , C08L83/14 , H01L23/145 , H01L23/49866 , H01L2924/0002 , Y10S428/901 , Y10T428/31663 , Y10T428/31721
摘要： Structures containing a dielectric material having a polymeric reactive ion etch barrier embedded therein. The preferred dielectric materials are polymers, preferably polyimide materials. The RIE etch barrier is a copolymer having an aromatic component having high thermal stability and having a cross-linking component selected from metallacyclobutane, metallabutene and vinyl groups. The etch barrier is deposited as a solvent free liquid which can fill gaps between the dielectric material and electrical conductors embedded therein. The liquid polymer is cured to a solid insoluble state. The structures with electrical conductors embedded therein are useful for electronic applications.
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19.发明授权Alkaline developable photoresist composition containing radiation sensitive organosilicon compound with quinone diazide terminal groups 失效含有辐射敏感有机硅化合物与醌二叠氮基末端基团的可显影光致抗蚀剂组合物
公开(公告)号：US5238773A
公开(公告)日：1993-08-24
申请号：US895245
申请日：1992-06-08
申请人： Edward D. Babich , Donis G. Flagello , Michael Hatzakis , Jurij R. Paraszczak , Jane M. Shaw , David F. Witman
发明人： Edward D. Babich , Donis G. Flagello , Michael Hatzakis , Jurij R. Paraszczak , Jane M. Shaw , David F. Witman
IPC分类号： G03F7/075
CPC分类号： G03F7/0757 , G03F7/0755
摘要： A composition containing an organosilicon material having terminal quinone groups, and a phenolic-novolak polymer, and use thereof in photolithography.
摘要翻译： 含有具有末端醌基的有机硅材料和酚醛清漆聚合物的组合物及其在光刻中的用途。
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20.发明授权Dry developable photoresist containing an epoxide, organosilicon and onium salt 失效含有环氧化物，有机硅和鎓盐的可显影光致抗蚀剂
公开(公告)号：US5229251A
公开(公告)日：1993-07-20
申请号：US693999
申请日：1991-04-29
申请人： Edward D. Babich , Jeffrey D. Gelorme , Ronald W. Nunes , Sharon L. Nunes , Jurij R. Paraszczak , Russell J. Serino
发明人： Edward D. Babich , Jeffrey D. Gelorme , Ronald W. Nunes , Sharon L. Nunes , Jurij R. Paraszczak , Russell J. Serino
CPC分类号： G03F7/0755 , Y10S430/122 , Y10S430/143
摘要： A dry developable photoresist composition that contains in admixture a polymeric epoxide; a di- or polyfunctional organosilicon material; and an onium salt; and use thereof to produce an image.
摘要翻译： 一种干燥可显影光致抗蚀剂组合物，其包含聚合物环氧化物; 二官能或多功能有机硅材料; 和盐盐; 并使用它来产生图像。
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