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15 条记录 (耗时 0.032 秒)

    System and method for detecting CMP endpoint via direct chemical monitoring of reactions
    11.
    发明授权
    System and method for detecting CMP endpoint via direct chemical monitoring of reactions 失效
    通过反应的直接化学监测来检测CMP端点的系统和方法

    公开(公告)号：US06287171B1

    公开(公告)日：2001-09-11

    申请号：US09504565

    申请日：2000-02-15

    申请人： Mark Meloni

    发明人： Mark Meloni

    IPC分类号： B24B100

    CPC分类号： B24B37/013 ,  B24B49/12

    摘要： A system and method for detecting process endpoint in CMP is presented which monitors the progression of chemical activities that take place from the chemical reaction that occurs at the wafer surface during polishing. In order to monitor the progression of chemical activities taking place from the chemical reaction, a surface plasmon resonance sensor acts as a conducting surface which supports surface plasmon resonance.

    摘要翻译： 提出了一种用于检测CMP中过程终点的系统和方法，该系统和方法用于监测在抛光期间从晶片表面发生的化学反应发生的化学活性的进展情况。 为了监测从化学反应发生的化学活性的进展，表面等离子体共振传感器用作支持表面等离子体共振的导电表面。

    Tunable And Switchable Multilayer Optical Devices
    14.
    发明申请
    Tunable And Switchable Multilayer Optical Devices 有权
    可调和可切换多层光器件

    公开(公告)号：US20120086949A1

    公开(公告)日：2012-04-12

    申请号：US12900254

    申请日：2010-10-07

    申请人： Lu Gao ,  Paulo E.X. Silveira ,  Mark Meloni

    发明人： Lu Gao ,  Paulo E.X. Silveira ,  Mark Meloni

    IPC分类号： G01B9/02 ,  G02B5/18

    CPC分类号： H01L31/02165 ,  G02B26/001 ,  G02B26/005

    摘要： A multilayer optical device includes an arrangement, on a substrate, of a first layer, a second layer, and a space therebetween. The second layer is a thin-film. The arrangement of the first and second layers and the space therebetween produces transmitted, reflected, or dispersed spectrally modified electromagnetic energy from electromagnetic energy incident upon the arrangement. An optical function of the device is dependent at least in part on interference effects. An optical detector system includes a similar multilayer optical device. The space within the device is in fluid communication with structures for receiving a fluid such that the device operates in a first or second mode depending on absence or presence of the fluid within the space. The system includes a detector for receiving the modified electromagnetic energy, and a controller in fluid communication with the space that establishes the absence or presence of the fluid in the space.

    摘要翻译： 多层光学装置包括在基板上的第一层，第二层和它们之间的空间的布置。 第二层是薄膜。 第一层和第二层的布置以及它们之间的空间通过入射在该布置上的电磁能产生透射，反射或分散的光谱改良的电磁能。 该设备的光学功能至少部分依赖于干扰效应。 光学检测器系统包括类似的多层光学器件。 装置内的空间与用于接收流体的结构流体连通，使得装置以第一或第二模式操作，取决于空间内流体的不存在或存在。 该系统包括用于接收修改的电磁能的检测器，以及与空间流体连通的控制器，其建立空间中不存在或不存在流体。

    Method and apparatus for in-situ measurement of workpiece displacement during chemical mechanical polishing
    15.
    发明授权
    Method and apparatus for in-situ measurement of workpiece displacement during chemical mechanical polishing 失效
    化学机械抛光过程中原位测量工件位移的方法和装置

    公开(公告)号：US06273792B1

    公开(公告)日：2001-08-14

    申请号：US09372270

    申请日：1999-08-11

    申请人： Mark Meloni

    发明人： Mark Meloni

    IPC分类号： B24B100

    CPC分类号： B24B37/205 ,  B24B37/0053 ,  B24B37/013 ,  B24B49/04 ,  B24B49/12

    摘要： Method and apparatus for in-situ measurement of workpiece displacement during chemical mechanical polishing are disclosed. The chemical mechanical polishing apparatus includes a platen having a polishing material attached thereto and a distance measurement device attached to the platen. The distance measurement device includes a light source and a light sensor. Distance between the device and the workpiece is measured by transmitting light through apertures formed within the platen and the polishing material toward the workpiece and focusing the light reflected from the workpiece on an element within the sensor.

    摘要翻译： 公开了在化学机械抛光期间原位测量工件位移的方法和装置。 化学机械抛光装置包括具有附着在其上的研磨材料的台板和附着在台板上的测距装置。 距离测量装置包括光源和光传感器。 通过将形成在压板内的孔和抛光材料的光透射到工件并将从工件反射的光聚焦在传感器内的元件上来测量装置与工件之间的距离。