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    NEAR-INFRARED-ABSORBING COMPOSITION, NEAR-INFRARED CUT-OFF FILTER AND PRODUCTION METHOD USING SAME, AND CAMERA MODULE
    12.
    发明申请
    NEAR-INFRARED-ABSORBING COMPOSITION, NEAR-INFRARED CUT-OFF FILTER AND PRODUCTION METHOD USING SAME, AND CAMERA MODULE 审中-公开
    近红外吸收组合物，近红外线截止滤光片和使用相同的生产方法，以及相机模块

    公开(公告)号：US20160077256A1

    公开(公告)日：2016-03-17

    申请号：US14946105

    申请日：2015-11-19

    Applicant: FUJIFILM Corporation

    Inventor： Takashi KAWASHIMA ,  Takeshi INASAKI ,  Hidenori TAKAHASHI

    IPC: G02B5/20

    CPC classification number: G02B5/208 ,  C08K5/0091 ,  G02B5/22 ,  C08L33/24

    Abstract: Provided are a near-infrared-absorbing composition capable of forming a cured film having excellent heat resistance while maintaining high near-infrared shielding properties, a near-infrared cut-off filter, a production method using the same, and a camera module.Provided are a near-infrared-absorbing composition including a compound obtained from a reaction between a polymer (A1) having an acid group or a salt thereof and a copper component and a near-infrared-absorbing composition including a compound obtained from a reaction between a polymer (A1) having an acid group or a salt thereof and a copper component and a copper complex obtained from a reaction between a low-molecular-weight compound having a coordination site and a copper component.

    Abstract translation: 本发明提供一种能够形成具有优异的耐热性同时保持高近红外屏蔽性的固化膜的近红外吸收组合物，近红外截止滤光片，使用其的制造方法和相机模块。 提供一种近红外吸收组合物，其包含由具有酸基的聚合物（A1）或其盐与铜成分之间的反应获得的化合物和包含由下列化合物获得的近红外线吸收组合物 具有酸基或其盐的聚合物（A1）和铜成分以及由具有配位部位的低分子量化合物与铜成分之间的反应得到的铜络合物。

    PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
    13.
    发明申请
    PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 审中-公开
    图案形成方法，抗紫外线敏感性或辐射敏感性树脂组合物，电阻膜，制造电子器件的方法和电子器件

    公开(公告)号：US20150111154A1

    公开(公告)日：2015-04-23

    申请号：US14582636

    申请日：2014-12-24

    Applicant: FUJIFILM Corporation

    Inventor： Hidenori TAKAHASHI

    IPC: G03F7/004 ,  G03F7/20

    CPC classification number: G03F7/004 ,  C08F220/36 ,  C08F220/38 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/325

    Abstract: There is provided a pattern forming method including: (a) a process of forming a film by resin (P) having a repeating unit (a) having a cyclic structure and a partial structure represented by the following Formula (I), (II-1) or (II-2), and a repeating unit (b) having a group which decomposes by the action of an acid to generates a polar group, and an actinic ray-sensitive or radiation-sensitive resin composition containing compound (B) which generates acid upon irradiation with an actinic ray or radiation; (b) a process of exposing the film; and (c) a process of forming a negative-type pattern by performing development using a developer including an organic solvent, an actinic ray-sensitive or radiation-sensitive resin composition used therefor, a resist film, a method of manufacturing an electronic device, and an electronic device.

    Abstract translation: 提供一种图案形成方法，包括：（a）通过具有由下式（I）表示的具有环状结构和部分结构的重复单元（a）的树脂（P）形成膜的工序，（II- 1）或（II-2）和具有通过酸作用分解以产生极性基团的基团的重复单元（b）和含有化合物（B）的光化射线敏感或辐射敏感性树脂组合物， 其在用光化射线或辐射照射时产生酸; （b）曝光胶片的过程; 和（c）通过使用包括有机溶剂的显影剂，用于其的光化射线敏感性或辐射敏感性树脂组合物进行显影来形成负型图案的工艺，抗蚀剂膜，电子器件的制造方法， 和电子设备。

    PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION USED THEREIN, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE
    14.
    发明申请
    PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION USED THEREIN, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE 有权
    图案形成方法，使用其的抗紫外线敏感性或辐射敏感性组合物，电阻膜，使用其的电子器件的制造方法和电子器件

    公开(公告)号：US20150010858A1

    公开(公告)日：2015-01-08

    申请号：US14497462

    申请日：2014-09-26

    Applicant: FUJIFILM Corporation

    Inventor： Hidenori TAKAHASHI

    IPC: G03F7/038

    CPC classification number: G03F7/038 ,  C07C217/18 ,  G03F7/0392 ,  G03F7/325

    Abstract: There is provided a pattern forming method comprising (i) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive composition containing (A) a non-polymeric acid-decomposable compound having an aromatic ring and a molecular weight of 500 to 5,000 and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film, and (iii) a step of performing development by using an organic solvent-containing developer to form a negative pattern.

    Abstract translation: 提供了一种图案形成方法，其包括（i）通过使用光化射线敏感或辐射敏感性组合物形成膜的步骤，所述组合物含有（A）具有芳环的非聚合酸可分解化合物和分子量为 500至5,000，和（B）能够在用光化射线或辐射照射时能产生酸的化合物; （ii）曝光该薄膜的步骤，和（iii）通过使用含有机溶剂的显影剂进行显影以形成负图形的步骤。

    PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
    15.
    发明申请
    PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 审中-公开
    图案形成方法，抗紫外线敏感性或辐射敏感性树脂组合物，电阻膜，制造电子器件的方法和电子器件

    公开(公告)号：US20140349225A1

    公开(公告)日：2014-11-27

    申请号：US14456309

    申请日：2014-08-11

    Applicant: FUJIFILM Corporation

    Inventor： Kei YAMAMOTO ,  Hidenori TAKAHASHI ,  Shuhei YAMAGUCHI ,  Junichi ITO

    IPC: G03F7/038 ,  G03F7/20

    CPC classification number: G03F7/0388 ,  G03F7/0048 ,  G03F7/038 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/40

    Abstract: There is provided a pattern forming method, including: (a) forming a film by an actinic ray-sensitive or radiation-sensitive resin composition containing: (A) a resin capable of increasing polarity by an action of an acid to decrease solubility in an organic solvent-containing developer, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a solvent, and (D) a resin, which contains substantially no fluorine atom and silicon atom and is other than the resin (A), (b) exposing the film; and (c) performing development using the organic solvent-containing developer to form a negative type pattern, wherein a receding contact angle of water on the film formed by (a) is 70° or more.

    Abstract translation: 提供了一种图案形成方法，其包括：（a）通过光化射线敏感或辐射敏感性树脂组合物形成膜，所述树脂组合物包含：（A）能够通过酸的作用增加极性的树脂，以降低溶解度 含有有机溶剂的显影剂，（B）能够以光化射线或辐射照射后能够产生酸的化合物，（C）溶剂，（D）基本上不含氟原子和硅原子的树脂， 比树脂（A），（b）曝光该膜; 和（c）使用含有机溶剂的显影剂进行显影以形成负型图案，其中由（a）形成的膜上的水的后退接触角为70°以上。

    NEAR-INFRARED-ABSORBING COMPOSITION, NEAR-INFRARED CUT FILTER OBTAINED USING SAME, PROCESS FOR PRODUCING SAID CUT FILTER, CAMERA MODULE AND PROCESS FOR PRODUCING SAME, AND SOLID PHOTOGRAPHING ELEMENT
    18.
    发明申请
    NEAR-INFRARED-ABSORBING COMPOSITION, NEAR-INFRARED CUT FILTER OBTAINED USING SAME, PROCESS FOR PRODUCING SAID CUT FILTER, CAMERA MODULE AND PROCESS FOR PRODUCING SAME, AND SOLID PHOTOGRAPHING ELEMENT 审中-公开
    近红外吸收组合物，使用其获得的近红外切割过滤器，用于生产切割过滤器的过程，相机模块及其生产方法和固体摄影元件

    公开(公告)号：US20160178816A1

    公开(公告)日：2016-06-23

    申请号：US15003208

    申请日：2016-01-21

    Applicant: FUJIFILM Corporation

    Inventor： Hidenori TAKAHASHI ,  Takashi KAWASHIMA ,  Takeshi INASAKI ,  Seiichi HITOMI

    IPC: G02B5/20 ,  G03B11/00 ,  G02B5/22

    CPC classification number: G02B5/208 ,  G02B5/223 ,  G03B11/00

    Abstract: Provided are a near-infrared-absorbing composition capable of forming a cured film having excellent heat resistance while maintaining high near-infrared-shielding properties, a near-infrared cut filter obtained using the same, a process for producing said cut filter, a camera module and a process for producing the same, and a solid photographing element.The near-infrared-absorbing composition includes a near-infrared-absorbing compound (A1) obtained from a reaction between a low-molecular-weight compound which has two or more coordination sites to a metal component or a coordination site to a metal component and a cross-linking group and has a molecular weight of 1800 or lower or a salt thereof and the metal component and a near-infrared-absorbing compound (B) obtained from a reaction between a high-molecular-weight compound having a repeating unit represented by Formula (II) below or a salt thereof and a metal component.In Formula (II), R2 represents an organic group, Y1 represents a single bond or a divalent linking group, and X2 represents the coordination site to the metal component.

    Abstract translation: 提供一种能够形成具有优异的耐热性同时保持高近红外屏蔽性能的固化膜的近红外吸收组合物，使用其的近红外截止滤光片，制备所述截止滤光片的方法，相机 模块及其制造方法，以及固体拍摄元件。 近红外线吸收组合物包括由与金属成分具有两个以上配位部位的低分子化合物或与金属成分配位的低分子量化合物或与金属成分配位的反应而得到的近红外吸收化合物（A1） 交联基团，分子量为1800以下或其盐，金属成分和近红外线吸收性化合物（B）由具有重复单元的高分子量化合物 （II）或其盐和金属组分。 在式（II）中，R 2表示有机基团，Y 1表示单键或二价连接基团，X 2表示与金属成分的配位点。

    PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
    20.
    发明申请
    PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 有权
    图案形成方法，电泳敏感性或辐射敏感性树脂组合物，电阻膜，电子器件的制造方法和电子器件

    公开(公告)号：US20140308605A1

    公开(公告)日：2014-10-16

    申请号：US14315661

    申请日：2014-06-26

    Applicant: FUJIFILM Corporation

    Inventor： Junichi ITO ,  Hidenori TAKAHASHI ,  Shuhei YAMAGUCHI ,  Kei YAMAMOTO

    IPC: G03F7/038

    CPC classification number: G03F7/0388 ,  C08F220/18 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  H01L21/0274

    Abstract: There is provided a pattern forming method comprising (i) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin capable of increasing the polarity by the action of an acid to decrease the solubility for an organic solvent-containing developer, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a solvent, and (D) a resin substantially free from a fluorine atom and a silicon atom and different from the resin (A), (ii) a step of exposing the film, and (iii) a step of performing development by using an organic solvent-containing developer to form a negative pattern.

    Abstract translation: 提供了一种图案形成方法，其包括（i）通过使用光化学射线敏感或辐射敏感性树脂组合物形成膜的步骤，所述树脂组合物含有（A）能够通过酸的作用增加极性的树脂，以减少 对于含有机溶剂的显影剂的溶解度，（B）在用光化学射线或辐射照射时能够产生酸的化合物，（C）溶剂，（D）基本上不含氟原子和硅原子的树脂 并且不同于树脂（A），（ii）曝光膜的步骤，和（iii）通过使用含有机溶剂的显影剂进行显影以形成负图案的步骤。

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