公开(公告)号：US10007030B2

公开(公告)日：2018-06-26

申请号：US14940265

申请日：2015-11-13

Applicant: FUJIFILM Corporation

Inventor： Miho Asahi ,  Takayasu Yamazaki ,  Kenichi Fukuda ,  Shuntaro Ibuki

IPC: B32B27/00 ,  G02B1/118 ,  B32B7/02 ,  G02B5/30 ,  G02B1/111 ,  G02B27/00 ,  G02B5/02 ,  G02B1/14

CPC classification number: G02B1/118 ,  B32B7/02 ,  G02B1/111 ,  G02B1/14 ,  G02B5/0294 ,  G02B5/3025 ,  G02B27/0006

Abstract: The invention is to provide a antireflective film having a moth-eye structure, which has sufficient antireflective performances, which exhibits excellent planar uniformity, and which can be manufactured by a simple method; a polarizing plate, a cover glass, and an image display device that have the antireflective film; a method for producing the antireflective film; a cloth for cleaning the antireflective film; a kit including the antireflective film and the cleaning cloth; and a method for cleaning the antireflective film. The invention provides a antireflective film which includes a plastic substrate; a infiltration layer; a antireflective layer including a binder resin and particles with an average primary particle diameter of 50 nm to 700 nm, in this order in an adjacent manner, in which the antireflective layer has moth-eye structures formed by the particles on the surface opposite to the infiltration layer.

公开(公告)号：US09903982B2

公开(公告)日：2018-02-27

申请号：US15059899

申请日：2016-03-03

Applicant: FUJIFILM Corporation

Inventor： Naoya Shibata ,  Miho Asahi ,  Hajime Nakayama ,  Ayako Matsumoto

IPC: G02B27/00 ,  G02B1/118 ,  G02B1/111 ,  G02B1/14 ,  G02B5/30 ,  C03C17/00

CPC classification number: G02B1/118 ,  C03C17/007 ,  C03C17/008 ,  C03C2217/43 ,  C03C2217/445 ,  C03C2217/465 ,  C03C2217/475 ,  C03C2217/478 ,  C03C2217/732 ,  G02B1/111 ,  G02B1/14 ,  G02B5/3033

Abstract: An antireflection article includes a substrate; and an antireflection layer containing a binder resin and inorganic particles, wherein the inorganic particles are particles having an average primary particle diameter of 150 nm to 250 nm and a CV value of 4% or less, 99.9% or more of the inorganic particles are perfectly spherical particles, the antireflection layer includes a moth eye structure composed of an unevenness shape formed by the inorganic particles on a surface of the antireflection layer, and an area occupancy ratio of the inorganic particles on the surface of the antireflection layer is 25% to 64%.

公开(公告)号：US09500777B2

公开(公告)日：2016-11-22

申请号：US14640503

申请日：2015-03-06

Applicant: FUJIFILM Corporation

Inventor： Shuntaro Ibuki ,  Nobuyuki Akutagawa ,  Miho Asahi

IPC: G02B1/11 ,  G02B1/12 ,  G02B5/30 ,  G02B1/111 ,  G02B1/118

CPC classification number: G02B1/111 ,  C08J2333/12 ,  C08J2427/20 ,  C08J2429/10 ,  C08J2435/02 ,  G02B1/118 ,  G02B1/12 ,  G02B5/3033

Abstract: There is provided an antireflection film having a surface haze of less than 1.0%, including: a light transmitting layer; and an antireflection layer, wherein the antireflection layer includes a specific unevenness structure on a surface at a side opposite to a side at which the light transmitting layer is provided, the specific unevenness structure made from specific raw materials.

Abstract translation: 提供了具有小于1.0％的表面雾度的抗反射膜，包括：透光层; 以及抗反射层，其中，所述防反射层在与设置有透光层的一侧相反的一侧的表面上具有特定的凹凸结构，由特定的原料制成的特定的凹凸结构。

公开(公告)号：US09346961B2

公开(公告)日：2016-05-24

申请号：US13853702

申请日：2013-03-29

Applicant: FUJIFILM Corporation

Inventor： Naozumi Shiraiwa ,  Masataka Yoshizawa ,  Daiki Wakizaka ,  Miho Asahi ,  Hiroyuki Suzuki

IPC: C09D4/00 ,  C09D5/00 ,  G02B1/10 ,  G02B5/30 ,  G02B1/111 ,  G02B1/116

CPC classification number: C09D5/006 ,  C09D4/00 ,  G02B1/10 ,  G02B1/105 ,  G02B1/111 ,  G02B1/116 ,  G02B1/14 ,  G02B1/18 ,  G02B5/30 ,  G02B5/3033

Abstract: The invention is directed to a polymerizable composition containing: a compound containing a repeating unit having a polyether structure having a fluorine atom and four or more polymerizable groups and being represented by the formula (I) as defined herein; a photopolymerization initiator; and an organic solvent, or a polymerizable composition containing: a compound containing a repeating unit having a polyether structure having a fluorine atom and four or more polymerizable groups and being represented by one of the formulae (I-1) to (I-5) as defined herein; a photopolymerization initiator; and an organic solvent.

Abstract translation: 本发明涉及一种可聚合组合物，其包含：含有具有氟原子的聚醚结构和四个或更多个可聚合基团并由如本文所定义的式（I）表示的重复单元的化合物; 光聚合引发剂; 有机溶剂或聚合性组合物，其含有含有具有氟原子的聚醚结构和四个以上聚合性基团的重复单元的化合物，并且由式（I-1）〜（I-5）表示， 如本文所定义; 光聚合引发剂; 和有机溶剂。