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11.发明申请公开(公告)号：US20250126699A1
公开(公告)日：2025-04-17
申请号：US18825486
申请日：2024-09-05
Applicant: Gigaphoton Inc.
Inventor： Atsushi UEDA
Abstract: A chamber to generate extreme ultraviolet light includes a gas supply port through which gas is supplied into the chamber; a light concentrating mirror concentrating the extreme ultraviolet light; a first exhaust pipe arranged in the chamber, surrounding a plasma generation region, and including a first opening through which the gas supplied into the chamber is sucked and through which the extreme ultraviolet light is radiated toward the light concentrating mirror, and a first exhaust port through which the gas sucked through the first opening is exhausted to an outside of the chamber; and a second exhaust pipe arranged in the chamber, and including a second opening which is located in a periphery of the first opening and through which the gas supplied into the chamber is sucked, and a second exhaust port through which the gas sucked through the second opening is exhausted to the outside of the chamber.
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12.发明公开公开(公告)号：US20230269857A1
公开(公告)日：2023-08-24
申请号：US18148808
申请日：2022-12-30
Applicant: Gigaphoton Inc.
Inventor： Atsushi UEDA , Koichiro Koge
CPC classification number: H05G2/003 , H05G2/008 , G21K1/06 , G03F7/70033
Abstract: An extreme ultraviolet light generation apparatus includes a chamber; a housing extending from an internal space of the chamber to outside of the chamber, surrounding a plasma generation region except on a trajectory of a droplet target and on an optical path of laser light, and including a first opening through which extreme ultraviolet light generated from the plasma passes; a light concentrating mirror arranged in a first space outside the housing at the internal space and reflecting the extreme ultraviolet light having passed through the first opening in a direction different from an incident direction of the extreme ultraviolet light; and a gas supply port provided in the chamber; and a gas exhaust port provided at the housing outside the chamber. An optical axis of the laser light when being radiated to the droplet target is along a direction in which the gas flows in the plasma generation region.
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13.发明申请公开(公告)号：US20220082927A1
公开(公告)日：2022-03-17
申请号：US17397554
申请日：2021-08-09
Applicant: Gigaphoton Inc.
Inventor： Yusuke HOSHINO , Yukio WATANABE , Toshihiro NISHISAKA , Atsushi UEDA , Koichiro KOGE , Takayuki OSANAI , Gouta NIIMI
Abstract: An extreme ultraviolet light generation apparatus may include a chamber, a first partition wall covering a plasma generation region in the chamber and having a first opening, an EUV light concentrating mirror located in a first space inside the chamber and outside the first partition wall and configured to concentrate extreme ultraviolet light generated in the plasma generation region and having passed through the first opening, a first gas supply port formed at the chamber and configured to supply gas to the first space, and a gas exhaust port formed in the first partition wall and configured to exhaust gas in a second space inside the first partition wall to outside of both the first partition wall and the chamber.
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14.发明申请公开(公告)号：US20210235571A1
公开(公告)日：2021-07-29
申请号：US17226515
申请日：2021-04-09
Applicant: Gigaphoton Inc.
Inventor： Atsushi UEDA , Shinji NAGAI
Abstract: An extreme ultraviolet light generation apparatus may include a chamber causing a target substance to be turned into plasma with laser light, a light concentrating mirror concentrating extreme ultraviolet light generated by the turning of the target substance into plasma, a gas supply unit supplying gas into the chamber, a magnetic field generation unit generating a magnetic field including a magnetic field axis that crosses a light path of the extreme ultraviolet light, a first exhaust port arranged at a position through which the magnetic field axis passes in the chamber, a second exhaust port arranged at a position opposite to the light concentrating mirror in the chamber, and a gas exhaust amount adjustment unit adjusting a ratio between an exhaust amount of first exhaust gas exhausted from the first exhaust port and an exhaust amount of second exhaust gas exhausted from the second exhaust port.
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公开(公告)号：US20170315446A1
公开(公告)日：2017-11-02
申请号：US15651259
申请日：2017-07-17
Applicant: GIGAPHOTON INC.
Inventor： Atsushi UEDA , Shinji NAGAI
CPC classification number: G03F7/2008 , H05G2/006 , H05G2/008
Abstract: An extreme ultraviolet light generation apparatus may include a chamber, a target supply device configured to successively supply targets into the chamber, and an extreme ultraviolet light collector mirror including a reflective surface having a through-hole at the center thereof. The reflective surface may reflect and collect extreme ultraviolet light generated at a predetermined emission cycle because of irradiation of the successively supplied targets with a laser beam. A gas ejection device may be disposed in the through-hole to jut out from the reflective surface and have a gas ejection opening to eject etching gas for debris onto the reflective surface. The gas ejection device may be configured so that the etching gas takes a longer time than the predetermined emission cycle to reach the through-hole-side end of effective reflective area of the reflective surface after being ejected from the gas ejection opening.
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Patent Agency Ranking
公开(公告)号：US20170094767A1
公开(公告)日：2017-03-30
申请号：US15379230
申请日：2016-12-14
Applicant: Gigaphoton Inc.
Inventor： Atsushi UEDA , Shinji NAGAI , Yoshifumi UENO , Tamotsu ABE
Abstract: An extreme ultraviolet light generation device is to generate extreme ultraviolet light by irradiating a target with a pulse laser beam and thereby turning the target into plasma. The device may include a chamber, a magnet configured to form a magnetic field in the chamber, and an ion catcher including a collision unit disposed so that ions guided by the magnetic field collide with the collision unit.
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公开(公告)号：US20160255707A1
公开(公告)日：2016-09-01
申请号：US15151025
申请日：2016-05-10
Applicant: Gigaphoton Inc.
Inventor： Atsushi UEDA , Takayuki YABU , Osamu WAKABAYASHI , Georg SOUMAGNE , Takashi SAITO
IPC: H05G2/00
Abstract: An extreme ultraviolet light generation apparatus may include: a chamber; a target supply unit configured to output a target toward a predetermined region inside the chamber; a first gas supply unit configured to blow out gas in a first direction toward a trajectory of the target between the target supply unit and the predetermined region; and a focusing optical system configured to concentrate a pulse laser beam to the predetermined region.
Abstract translation: 极紫外光发生装置可以包括：腔室; 目标供给单元，被配置为朝向所述室内的预定区域输出目标; 第一气体供给单元，被配置为沿着朝向目标供给单元和预定区域之间的目标的轨迹的第一方向吹出气体; 以及配置成将脉冲激光束集中到所述预定区域的聚焦光学系统。
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18.发明申请公开(公告)号：US20210307150A1
公开(公告)日：2021-09-30
申请号：US17160486
申请日：2021-01-28
Applicant: Gigaphoton Inc.
Inventor： Koichiro KOGE , Atsushi UEDA , Takayuki OSANAI
Abstract: An extreme ultraviolet light generation apparatus includes a chamber device, a concentrating mirror, an exhaust port, and a central gas supply port. The exhaust port is formed at the chamber device and is formed on the side lateral to a focal line and opposite to the reflection surface with respect to the plasma generation region. The central gas supply port is formed on the side opposite to the exhaust port with respect to the plasma generation region on the supply line passing through the exhaust port, the plasma generation region, and an inner side of a peripheral portion of the reflection surface. The central gas supply port supplies the gas toward the exhaust port along the supply line through the plasma generation region.
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19.发明申请公开(公告)号：US20200241425A1
公开(公告)日：2020-07-30
申请号：US16849421
申请日：2020-04-15
Applicant: Gigaphoton Inc.
Inventor： Atsushi UEDA
Abstract: An extreme ultraviolet light generation apparatus that generates extreme ultraviolet light by irradiating a target with a pulse laser beam includes: a chamber; a magnet that is positioned outside the chamber and forms a magnetic field (70) inside the chamber; a discharge path (37a) that is opened at a position on an inner wall surface of the chamber where the inner wall surface intersects a central axis of the magnetic field (70) and through which gas inside the chamber is discharged; and a gas supply unit (10a) configured to supply gas into the discharge path (37a) through an inner wall surface of the discharge path.
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20.发明申请公开(公告)号：US20200185212A1
公开(公告)日：2020-06-11
申请号：US16786542
申请日：2020-02-10
Applicant: Gigaphoton Inc.
Inventor： Atsushi UEDA , Takashi SAITO
Abstract: An EUV light generation apparatus includes: a chamber; an EUV light condensing mirror positioned inside the chamber and having a reflective surface that determines a first focal point and a second focal point, the reflective surface and the second focal point being positioned on respective sides of a first surface; at least one magnet configured to generate a magnetic field at and around the first focal point; a first gas supply unit configured to supply first gas to the reflective surface in the chamber and opened near an outer peripheral part of the reflective surface; a second gas supply unit configured to supply second gas into the chamber and opened at a position between the first surface and the second focal point; and a discharge device configured to discharge gas inside the chamber and opened at a position between the first focal point and the at least one magnet.
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