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1.发明公开公开(公告)号：US20240184211A1
公开(公告)日：2024-06-06
申请号：US18510705
申请日：2023-11-16
Applicant: Gigaphoton Inc.
Inventor： Yuichi NISHIMURA , Yoshifumi UENO , Kotaro MIYASHITA
CPC classification number: G03F7/70033 , G02B5/0891 , G03F1/24 , G03F7/7085
Abstract: An extreme ultraviolet light generation system includes a chamber including a first region; a target supply unit supplying a target to the first region; a laser device outputting pulse laser light; an optical system including an optical element to guide the pulse laser light to the first region; an irradiation position adjustment mechanism adjusting a laser irradiation position with respect to the target; an EUV light concentrating mirror arranged such that the pulse laser light passes outside the EUV light concentrating mirror and is guided to the first region; a plurality of EUV sensors measuring radiation energies of the EUV light radiated from the first region in mutually different radiation directions; and a processor controlling the irradiation position adjustment mechanism as setting a target irradiation position of the pulse laser light to a laser irradiation position away from a reference position in a direction toward the EUV light concentrating mirror.
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公开(公告)号：US20180103534A1
公开(公告)日：2018-04-12
申请号：US15836877
申请日：2017-12-10
Applicant: Gigaphoton Inc.
Inventor： Takashi SAITO , Yoshifumi UENO , Georg SOUMAGNE
IPC: H05G2/00
Abstract: The extreme ultraviolet light generation device includes a chamber having a first through-hole that allows a pulse laser beam to enter the chamber, a target supply unit held by the chamber and configured to output a target toward a predetermined region in the chamber, a shield member surrounding the predetermined region in the chamber and having a target path that allows the target outputted from the target supply unit to pass toward the predetermined region, and a tubular member surrounding at least a part of an upstream portion of the trajectory of the target outputted from the target supply unit toward the predetermined region, the upstream portion being upstream from the target path of the shield member.
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公开(公告)号：US20180077785A1
公开(公告)日：2018-03-15
申请号：US15807067
申请日：2017-11-08
Applicant: Gigaphoton Inc.
Inventor： Toru SUZUKI , Kotaro MIYASHITA , Yoshifumi UENO , Takuya ISHII
IPC: H05G2/00
Abstract: Output timing of laser light is controlled with high accuracy. An extreme ultraviolet light generation device may include a chamber in which plasma is generated to generate extreme ultraviolet light, a window provided in the chamber, an optical path pipe connected to the chamber, a light source disposed in the optical path pipe and configured to output light into the chamber via the window, a gas supply unit configured to supply gas into the optical path pipe, and an exhaust port configured to discharge the gas in the optical path pipe to an outside of the optical path pipe.
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公开(公告)号：US20180007771A1
公开(公告)日：2018-01-04
申请号：US15697915
申请日：2017-09-07
Applicant: Gigaphoton Inc.
Inventor： Kouichi SATOU , Takayuki YABU , Yoshifumi UENO , Hirokazu HOSODA
CPC classification number: H05G2/008 , G21K2201/06 , H01S3/10 , H05G2/005 , H05G2/006
Abstract: The stability of operations of an EUV light generating apparatus is improved. A droplet detector may include: a light source unit configured to emit illuminating light onto a droplet, which is output into a chamber and generate extreme ultraviolet light when irradiated with a laser beam; a light receiving unit configured to receive the illuminating light and to detect changes in light intensities; and a timing determining circuit configured to output a droplet detection signal that indicates that the droplet has been detected at a predetermined position within the chamber, based on a first timing at which the light intensity of the illuminating light decreases due to the droplet being irradiated therewith and a second timing at which the light intensity of the illuminating light increases.
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公开(公告)号：US20170150591A1
公开(公告)日：2017-05-25
申请号：US15422489
申请日：2017-02-02
Applicant: GIGAPHOTON INC.
Inventor： Masahiko ANDO , Yoshifumi UENO , Toru SUZUKI
IPC: H05G2/00
CPC classification number: H05G2/008 , G03F7/70033 , G03F7/70808 , G03F7/70991
Abstract: The transmission system may include: an optical path adjustment device configured to substantially unify optical paths of a first pre-pulse laser beam and a second pre-pulse laser beam; an optical path separation device configured to separate the optical paths of the substantially unified first pre-pulse laser beam and the second pre-pulse laser beam to an optical path for the first pre-pulse laser beam and an optical path for the second pre-pulse laser beam; a first beam adjustment device disposed on the optical path for the first pre-pulse laser beam separated by the optical path separation device and configured to adjust a beam parameter of the first pre-pulse laser beam; and a second beam adjustment device disposed on the optical path for the second pre-pulse laser beam separated by the optical path separation device and configured to adjust a beam parameter of the second pre-pulse laser beam.
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Patent Agency Ranking
公开(公告)号：US20140021376A1
公开(公告)日：2014-01-23
申请号：US13935233
申请日：2013-07-03
Applicant: GIGAPHOTON INC.
Inventor： Hiroshi KOMORI , Yoshifumi UENO , Georg SOUMAGNE
IPC: G21K5/00
Abstract: An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light source device includes: a target nozzle that supplies a target material; a laser oscillator that applies a laser beam to the target material supplied from the target nozzle to generate plasma; collector optics that collects extreme ultra violet light radiated from the plasma; and a magnetic field forming unit that forms an asymmetric magnetic field in a position where the laser beam is applied to the target material.
Abstract translation: 激光产生等离子体的极紫外光源装置，其中可以有效地喷射从等离子体发射的离子等带电粒子。 极紫外光源装置包括：提供目标材料的目标喷嘴; 激光振荡器，其将激光束施加到从所述目标喷嘴供给的目标材料以产生等离子体; 收集从等离子体辐射的极紫外光的收集器光学元件; 以及在将激光束施加到目标材料的位置形成非对称磁场的磁场形成单元。
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公开(公告)号：US20240023223A1
公开(公告)日：2024-01-18
申请号：US18327814
申请日：2023-06-01
Applicant: Gigaphoton Inc.
Inventor： Yuichi NISHIMURA , Yoshifumi UENO
CPC classification number: H05G2/008 , H05G2/003 , G03F7/70033 , G03F7/7065
Abstract: An EUV light generation system includes a prepulse laser device outputting prepulse laser light to be radiated to a target supplied into a chamber; a main pulse laser device outputting main pulse laser light to be radiated to a diffusion target generated by the radiation of the prepulse laser light; a first actuator adjusting an irradiation position of the prepulse laser light; a second actuator adjusting an irradiation position of the main pulse laser light; an EUV sensor detecting EUV energy; a laser energy sensor detecting laser energy of the main pulse laser light; a target sensor imaging the diffusion target; and a controller controlling, after controlling the first actuator based on a characteristic value of the diffusion target calculated from an image of the diffusion target, the second actuator so that a ratio of the EUV energy to the laser energy detected by the laser energy sensor becomes large.
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8.发明申请公开(公告)号：US20230101779A1
公开(公告)日：2023-03-30
申请号：US17812924
申请日：2022-07-15
Applicant: GIGAPHOTON INC.
Inventor： Yuichi NISHIMURA , Yoshifumi UENO
Abstract: An EUV light generation apparatus includes a chamber; a prepulse laser outputting prepulse laser light; a main pulse laser outputting main pulse laser light; a combiner combining optical paths of the prepulse laser light and the main pulse laser light; a light concentrating unit concentrating, on the target, the prepulse laser light and the main pulse laser light having the optical paths combined; a stage changing a position of the light concentrating unit; a first actuator changing a travel direction of the main pulse laser light; an EUV light sensor detecting EUV energy; a laser energy sensor detecting pulse energy of the main pulse laser light; and an EUV light generation control unit controlling the stage so that temporal variation of the EUV energy decreases and controlling the first actuator so that a ratio of the EUV energy to the pulse energy increases.
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公开(公告)号：US20210364928A1
公开(公告)日：2021-11-25
申请号：US17398054
申请日：2021-08-10
Applicant: Gigaphoton Inc.
Inventor： Gota NIIMI , Yoshifumi UENO , Shinji NAGAI
Abstract: A tin trap device for collecting tin in a chamber device which causes tin to be turned into plasma with laser light in an internal space thereof may include a housing provided with a gas inlet port through which exhaust gas in the chamber device flows and a gas exhaust port through which the exhaust gas is exhausted; and a main heater arranged in the housing, configured to have a temperature equal to or higher than the melting point of tin and lower than the boiling point thereof, and having a projection surface projected toward a direction in which the exhaust gas flows in the gas inlet port cover the gas inlet port.
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10.发明申请公开(公告)号：US20200033731A1
公开(公告)日：2020-01-30
申请号：US16593294
申请日：2019-10-04
Applicant: Gigaphoton Inc.
Inventor： Yuta TAKASHIMA , Yoshifumi UENO
IPC: G03F7/20
Abstract: A target supply device according to an aspect of the present disclosure includes a vibration element configured to generate a droplet by vibrating a target substance to be output from a nozzle 80, a droplet detection unit configured to detect the droplet, and a control unit 70. A first detection threshold and a second detection threshold to be compared with a detection signal from the droplet detection unit are set to the control unit 70. The first detection threshold is used to generate a light emission trigger for a laser beam. The second detection threshold has a smaller absolute value from a base line of the detection signal than the first detection threshold. The control unit 70 calculates an evaluation parameter for a satellite based on the detection signal and the second detection threshold, and determines a duty value of an electric signal suitable for operation of the vibration element based on the evaluation parameter.
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