公开(公告)号：US08054443B2

公开(公告)日：2011-11-08

申请号：US12273165

申请日：2008-11-18

申请人： Junichi Kitano ,  Osamu Miyahara ,  Shinya Wakamizu

发明人： Junichi Kitano ,  Osamu Miyahara ,  Shinya Wakamizu

IPC分类号： G03B27/32 ,  G03B27/54

CPC分类号： G03F7/40

摘要： A developing method is used for subjecting a light-exposed resist film disposed on a wafer W to a developing process by a developing solution and a rinsing process by a rinsing liquid. In a state where the resist film on the wafer W is wet with the developing solution or rinsing liquid before a drying process is performed on the wafer W, a chemical liquid (curing chemical liquid), which contains a resist curing aid contributory to curing of a resist film remaining on the wafer W, is supplied onto a surface of the wafer W. Then, ultraviolet rays are radiated onto a surface of the wafer to cure a resist film remaining on the wafer W by a synergistic effect of the resist curing aid and the ultraviolet rays thus radiated, so as to prevent pattern fall.

摘要翻译： 使用显影方法对设置在晶片W上的曝光抗蚀剂膜进行显影液的显影处理和通过漂洗液的漂洗处理。 在对晶片W进行干燥处理之前，晶片W上的抗蚀剂膜与显影液或漂洗液体湿润的状态下，含有抗蚀剂固化助剂的化学液（固化化学液） 保留在晶片W上的抗蚀剂膜被提供到晶片W的表面上。然后，通过抗蚀剂固化助剂的协同效应将紫外线辐射到晶片的表面上以固化残留在晶片W上的抗蚀剂膜 并且因此辐射紫外线，以防止图案下降。

公开(公告)号：US07857530B2

公开(公告)日：2010-12-28

申请号：US12216751

申请日：2008-07-10

申请人： Yuko Ono ,  Junichi Kitano

发明人： Yuko Ono ,  Junichi Kitano

IPC分类号： G03D5/00 ,  G03C5/00 ,  B08B3/12

CPC分类号： G03D5/00 ,  G03F7/3028 ,  G03F7/322 ,  Y10S134/902

摘要： In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.

公开(公告)号：US20080204675A1

公开(公告)日：2008-08-28

申请号：US11958798

申请日：2007-12-18

申请人： Hisashi Kawano ,  Junichi Kitano ,  Hitoshi Kosugi ,  Koichi Hontake ,  Masashi Enomoto

发明人： Hisashi Kawano ,  Junichi Kitano ,  Hitoshi Kosugi ,  Koichi Hontake ,  Masashi Enomoto

IPC分类号： G03B27/52 ,  G03F7/26

CPC分类号： G03F7/162 ,  G03F7/168 ,  G03F7/3021

摘要： A coating/developing apparatus includes a process section including processing units to perform a series of processes for resist coating and development; an interface section disposed between the process section and immersion light exposure apparatus; and a drying section disposed in the interface section to dry the substrate immediately after the immersion light exposure process. The drying section includes a process container configured to accommodate the substrate, a substrate support member configured to place the substrate thereon, a temperature-adjusted gas supply mechanism configured to supply a temperature-adjusted gas into the process container, and an exhaust mechanism configured to exhaust the process container. The drying section is arranged to dry the substrate by supplying the temperature-adjusted gas into the process container with the substrate placed on the substrate support member, while exhausting the process container.

摘要翻译： 一种涂布/显影装置，包括：处理部，包括进行抗蚀剂涂布和显影的一系列处理的处理单元; 布置在处理部分和浸没曝光装置之间的界面部分; 以及设置在界面部分中的干燥部分，以在浸没曝光处理之后立即干燥基板。 所述干燥部包括被配置为容纳所述基板的处理容器，被配置为将所述基板放置在其上的基板支撑部件，被配置为将经温度调节的气体供应到所述处理容器中的温度调节气体供给机构，以及配置为 排出过程容器。 干燥部被布置成通过将衬底放置在基板支撑构件上的温度调节气体供给到处理容器中，同时排出处理容器来干燥基板。

公开(公告)号：US20080079917A1

公开(公告)日：2008-04-03

申请号：US11898694

申请日：2007-09-14

申请人： Yuko Ono ,  Junichi Kitano

发明人： Yuko Ono ,  Junichi Kitano

IPC分类号： G03B27/52 ,  G03F7/30

CPC分类号： G03D5/00 ,  G03F7/3028 ,  G03F7/322 ,  Y10S134/902

摘要： In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.

公开(公告)号：US06515440B2

公开(公告)日：2003-02-04

申请号：US09816057

申请日：2001-03-23

申请人： Syunsaku Koga ,  Junichi Kitano

发明人： Syunsaku Koga ,  Junichi Kitano

IPC分类号： H02P146

CPC分类号： B60L15/005 ,  Y02T10/645

摘要： In the control system, a propulsion force is computed by a propulsion force computing unit based on a current command value outputted from a speed controller, an acceleration is computed by an acceleration computing unit based on the propulsion force and a running resistance outputted from a running resistance computing unit, a speed is computed by a speed computing unit based on the acceleration, and a simulated phase reference value is computed by a phase computing unit. Then, the simulated phase is computed by adding, at a simulated phase computing unit, a predetermined phase delay (e.g. 30 degrees) to the simulated phase reference value. The addition of the phase delay results in generation of synchronizing force in the LSM and thus little deviation between the simulated phase and the actual phase.

公开(公告)号：US08733592B2

公开(公告)日：2014-05-27

申请号：US13376179

申请日：2010-06-02

申请人： Junichi Kitano ,  Takashi Wada ,  Kenji Kusunoki

发明人： Junichi Kitano ,  Takashi Wada ,  Kenji Kusunoki

IPC分类号： B67D1/00 ,  B67D7/14

CPC分类号： B67D1/1281 ,  B08B9/055 ,  B67D1/0005 ,  B67D1/07 ,  B67D1/0842 ,  B67D1/0888 ,  B67D1/1245 ,  B67D1/1247

摘要： A liquid supply system capable of being serviced and hygienically maintained easily. A beer storage barrel switching device (12) uninterruptedly supplies beer by switching between beer storage barrels (21-1, 21-2). A first connection tube (23-1) is provided with a fluid stopper device (31-1) including a loop section. The fluid stopper device (31-1) switches between a suppliable state in which it is possible to supply the beer to a dispenser (11) through the first connection tube (23-1) and a non-suppliable state in which it is not possible to supply the beer. Using the fluid stopper device (31-1) eliminates the need to provide a conventional valve in the middle of the first connection tube (23-1), the conventional valve having a structural element which comes in direct contact with the beer. Accordingly, the case that a cleaning member, such as a sponge, is caught by the valve does not occur, and this enables the inner wall of the first connection tube (23-1) to be cleaned using the cleaning member. As a result, a beverage, such as beer, can be easily maintained hygienically and served.

摘要翻译： 能够容易地维护和卫生维护的液体供应系统。 啤酒储存桶切换装置（12）通过在啤酒储存桶（21-1,21-2）之间切换来不间断地供应啤酒。 第一连接管（23-1）设置有包括环路部分的流体阻塞装置（31-1）。 流体阻塞装置（31-1）在可以通过第一连接管（23-1）向分配器（11）供应啤酒的可供应状态和不可供应状态之间切换 可能供应啤酒。 使用流体阻塞装置（31-1）消除了在第一连接管（23-1）的中间提供常规阀的需要，常规阀具有与啤酒直接接触的结构元件。 因此，不会发生诸如海绵等清洁部件被阀卡住的情况，这使得能够使用清洁部件清洁第一连接管（23-1）的内壁。 因此，诸如啤酒之类的饮料可以容易地保持卫生和服务。

公开(公告)号：US08703400B2

公开(公告)日：2014-04-22

申请号：US13041935

申请日：2011-03-07

申请人： Kenji Tsutsumi ,  Junichi Kitano ,  Osamu Miyahara ,  Hideharu Kyouda

发明人： Kenji Tsutsumi ,  Junichi Kitano ,  Osamu Miyahara ,  Hideharu Kyouda

IPC分类号： G03F7/26

CPC分类号： H01L21/67225 ,  H01L21/67051 ,  H01L21/6715 ,  Y10S414/136 ,  Y10S414/141

摘要： In the coating treatment apparatus, in a first treatment chamber, the front and rear surfaces of the substrate held by a transfer arm are inverted by a turning mechanism, and a coating solution is applied from a coating nozzle to the rear surface of the substrate. The substrate is transferred into a second treatment chamber, in which the coating solution on the rear surface is heated by a heating unit to cure, thereby forming a coating film on the rear surface of the substrate. The formation of the coating film by the coating treatment apparatus is performed before exposure processing, whereby the rear surface of the substrate can be flat for the exposure processing.

摘要翻译： 在涂布处理装置中，在第一处理室中，由转印臂保持的基板的前表面和后表面通过转动机构反转，并且涂布溶液从涂布喷嘴施加到基板的后表面。 将基板转移到第二处理室中，其中通过加热单元将后表面上的涂布溶液加热固化，从而在基板的后表面上形成涂膜。 在曝光处理之前，通过涂布处理装置形成涂膜，由此基板的后表面可以平坦地进行曝光处理。

公开(公告)号：US20120085781A1

公开(公告)日：2012-04-12

申请号：US13376179

申请日：2010-06-02

申请人： Junichi Kitano ,  Takashi Wada ,  Kenji Kusunoki

发明人： Junichi Kitano ,  Takashi Wada ,  Kenji Kusunoki

IPC分类号： B67D1/00

CPC分类号： B67D1/1281 ,  B08B9/055 ,  B67D1/0005 ,  B67D1/07 ,  B67D1/0842 ,  B67D1/0888 ,  B67D1/1245 ,  B67D1/1247

摘要： A liquid supply system capable of being serviced and hygienically maintained easily. A beer storage barrel switching device (12) uninterruptedly supplies beer by switching between beer storage barrels (21-1, 21-2). A first connection tube (23-1) is provided with a fluid stopper device (31-1) including a loop section. The fluid stopper device (31-1) switches between a suppliable state in which it is possible to supply the beer to a dispenser (11) through the first connection tube (23-1) and a non-suppliable state in which it is not possible to supply the beer. Using the fluid stopper device (31-1) eliminates the need to provide a conventional valve in the middle of the first connection tube (23-1), the conventional valve having a structural element which comes in direct contact with the beer. Accordingly, the case that a cleaning member, such as a sponge, is caught by the valve does not occur, and this enables the inner wall of the first connection tube (23-1) to be cleaned using the cleaning member. As a result, a beverage, such as beer, can be easily maintained hygienically and served.

摘要翻译： 能够容易地维护和卫生维护的液体供应系统。 啤酒储存桶切换装置（12）通过在啤酒储存桶（21-1,21-2）之间切换来不间断地供应啤酒。 第一连接管（23-1）设置有包括环路部分的流体阻塞装置（31-1）。 流体阻塞装置（31-1）在可以通过第一连接管（23-1）向分配器（11）供应啤酒的可供应状态和不可供应状态之间切换 可能供应啤酒。 使用流体阻塞装置（31-1）消除了在第一连接管（23-1）的中间提供常规阀的需要，常规阀具有与啤酒直接接触的结构元件。 因此，不会发生诸如海绵等清洁部件被阀卡住的情况，这使得能够使用清洁部件清洁第一连接管（23-1）的内壁。 因此，诸如啤酒之类的饮料可以容易地保持卫生和服务。

公开(公告)号：US08083959B2

公开(公告)日：2011-12-27

申请号：US11958839

申请日：2007-12-18

申请人： Hideharu Kyouda ,  Junichi Kitano ,  Osamu Miyahara ,  Kenji Tsutsumi

发明人： Hideharu Kyouda ,  Junichi Kitano ,  Osamu Miyahara ,  Kenji Tsutsumi

IPC分类号： B44C1/22

CPC分类号： H01L21/31144 ,  H01L21/67207

摘要： In the present invention, a plurality of rounds of patterning are performed on a substrate. In a patterning system, the substrate on which a first round of patterning has been performed is transferred to a planarizing film forming unit, where a planarizing film is formed above the substrate. The substrate is then transferred to the patterning system and subjected to a second round of patterning. The time from the completion of the forming processing of the planarizing film to the start of the second round of patterning is managed to be constant among the substrates. According to the present invention, in the pattern forming processing of performing a plurality of rounds of patterning, a pattern with a desired dimension can be stably formed above the substrate.

摘要翻译： 在本发明中，在基板上进行多次图案化。 在图案形成系统中，已经进行了第一轮图案化的基板被转印到平坦化膜形成单元，其中在基板上形成平坦化膜。 然后将衬底转移到图案化系统并进行第二轮图案化。 从平面化膜的成形处理完成到第二轮图案化开始的时间被控制为在基板之间是恒定的。 根据本发明，在进行多次图案化的图案形成处理中，可以稳定地在基板上方形成具有期望尺寸的图案。

公开(公告)号：US20080284989A1

公开(公告)日：2008-11-20

申请号：US12216751

申请日：2008-07-10

申请人： Yuko Ono ,  Junichi Kitano

发明人： Yuko Ono ,  Junichi Kitano

IPC分类号： G03B27/52

CPC分类号： G03D5/00 ,  G03F7/3028 ,  G03F7/322 ,  Y10S134/902

摘要： In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.