公开(公告)号：US08733592B2

公开(公告)日：2014-05-27

申请号：US13376179

申请日：2010-06-02

申请人： Junichi Kitano ,  Takashi Wada ,  Kenji Kusunoki

发明人： Junichi Kitano ,  Takashi Wada ,  Kenji Kusunoki

IPC分类号： B67D1/00 ,  B67D7/14

CPC分类号： B67D1/1281 ,  B08B9/055 ,  B67D1/0005 ,  B67D1/07 ,  B67D1/0842 ,  B67D1/0888 ,  B67D1/1245 ,  B67D1/1247

摘要： A liquid supply system capable of being serviced and hygienically maintained easily. A beer storage barrel switching device (12) uninterruptedly supplies beer by switching between beer storage barrels (21-1, 21-2). A first connection tube (23-1) is provided with a fluid stopper device (31-1) including a loop section. The fluid stopper device (31-1) switches between a suppliable state in which it is possible to supply the beer to a dispenser (11) through the first connection tube (23-1) and a non-suppliable state in which it is not possible to supply the beer. Using the fluid stopper device (31-1) eliminates the need to provide a conventional valve in the middle of the first connection tube (23-1), the conventional valve having a structural element which comes in direct contact with the beer. Accordingly, the case that a cleaning member, such as a sponge, is caught by the valve does not occur, and this enables the inner wall of the first connection tube (23-1) to be cleaned using the cleaning member. As a result, a beverage, such as beer, can be easily maintained hygienically and served.

摘要翻译： 能够容易地维护和卫生维护的液体供应系统。 啤酒储存桶切换装置（12）通过在啤酒储存桶（21-1,21-2）之间切换来不间断地供应啤酒。 第一连接管（23-1）设置有包括环路部分的流体阻塞装置（31-1）。 流体阻塞装置（31-1）在可以通过第一连接管（23-1）向分配器（11）供应啤酒的可供应状态和不可供应状态之间切换 可能供应啤酒。 使用流体阻塞装置（31-1）消除了在第一连接管（23-1）的中间提供常规阀的需要，常规阀具有与啤酒直接接触的结构元件。 因此，不会发生诸如海绵等清洁部件被阀卡住的情况，这使得能够使用清洁部件清洁第一连接管（23-1）的内壁。 因此，诸如啤酒之类的饮料可以容易地保持卫生和服务。

公开(公告)号：US20120085781A1

公开(公告)日：2012-04-12

申请号：US13376179

申请日：2010-06-02

申请人： Junichi Kitano ,  Takashi Wada ,  Kenji Kusunoki

发明人： Junichi Kitano ,  Takashi Wada ,  Kenji Kusunoki

IPC分类号： B67D1/00

CPC分类号： B67D1/1281 ,  B08B9/055 ,  B67D1/0005 ,  B67D1/07 ,  B67D1/0842 ,  B67D1/0888 ,  B67D1/1245 ,  B67D1/1247

摘要： A liquid supply system capable of being serviced and hygienically maintained easily. A beer storage barrel switching device (12) uninterruptedly supplies beer by switching between beer storage barrels (21-1, 21-2). A first connection tube (23-1) is provided with a fluid stopper device (31-1) including a loop section. The fluid stopper device (31-1) switches between a suppliable state in which it is possible to supply the beer to a dispenser (11) through the first connection tube (23-1) and a non-suppliable state in which it is not possible to supply the beer. Using the fluid stopper device (31-1) eliminates the need to provide a conventional valve in the middle of the first connection tube (23-1), the conventional valve having a structural element which comes in direct contact with the beer. Accordingly, the case that a cleaning member, such as a sponge, is caught by the valve does not occur, and this enables the inner wall of the first connection tube (23-1) to be cleaned using the cleaning member. As a result, a beverage, such as beer, can be easily maintained hygienically and served.

摘要翻译： 能够容易地维护和卫生维护的液体供应系统。 啤酒储存桶切换装置（12）通过在啤酒储存桶（21-1,21-2）之间切换来不间断地供应啤酒。 第一连接管（23-1）设置有包括环路部分的流体阻塞装置（31-1）。 流体阻塞装置（31-1）在可以通过第一连接管（23-1）向分配器（11）供应啤酒的可供应状态和不可供应状态之间切换 可能供应啤酒。 使用流体阻塞装置（31-1）消除了在第一连接管（23-1）的中间提供常规阀的需要，常规阀具有与啤酒直接接触的结构元件。 因此，不会发生诸如海绵等清洁部件被阀卡住的情况，这使得能够使用清洁部件清洁第一连接管（23-1）的内壁。 因此，诸如啤酒之类的饮料可以容易地保持卫生和服务。

公开(公告)号：US09103451B2

公开(公告)日：2015-08-11

申请号：US12450605

申请日：2008-04-04

申请人： Junichi Kitano ,  Takashi Wada ,  Kenji Kusunoki

发明人： Junichi Kitano ,  Takashi Wada ,  Kenji Kusunoki

IPC分类号： F16K7/04 ,  F16K7/06

CPC分类号： F16K7/068

摘要： A device for stopping a flow of fluid in a fixed length of tube with an actuator simple in construction is provided. The stopping device is free of direct touch with the fluid inside the tube, expected not to obstruct the flow in the tube as permitted as possible at normal condition, expected to perform both detection and control with a single device, and further invulnerable to kinds of fluids. The device for stopping a flow of fluid includes a tube holder to keep a tube in looped configuration, a movable part pressing the looped configuration of the tube. Pressing of the looped configuration of the tube make a snapped bent to stop the flow of fluid passed through the tube. Putting the movable part back into place results in the tube's returning from the configuration having the bent, allowing the fluid flowing again through the tube.

摘要翻译： 提供一种用于在构造简单的致动器中停止固定长度的管中的流体流动的装置。 止动装置与管内的流体无直接接触，预期在正常状态下尽可能允许阻止管中的流动，预期用单个装置进行检测和控制，并且进一步不易受到各种 流体。 用于停止流体流动的装置包括管保持器以将管保持为环形构造，可动部分压缩管的环形构造。 按压管的环形构造使得卡扣弯曲以停止通过管的流体的流动。 将可移动部分放回原位导致管从具有弯曲的构造返回，允许流体再次流过管。

公开(公告)号：US20100117011A1

公开(公告)日：2010-05-13

申请号：US12450605

申请日：2008-04-04

申请人： Junichi Kitano ,  Takashi Wada ,  Takeshi Kusunoki

发明人： Junichi Kitano ,  Takashi Wada ,  Takeshi Kusunoki

IPC分类号： F16K7/04

CPC分类号： F16K7/068

摘要： A device for stopping a flow of fluid in a fixed length of tube with an actuator simple in construction is provided. The stopping device is free of direct touch with the fluid inside the tube, expected not to obstruct the flow in the tube as permitted as possible at normal condition, expected to perform both detection and control with a single device, and further invulnerable to kinds of fluids. The device for stopping a flow of fluid includes a tube holder to keep a tube in looped configuration, a movable part pressing the looped configuration of the tube. Pressing of the looped configuration of the tube make a snapped bent to stop the flow of fluid passed through the tube. Putting the movable part back into place results in the tube's returning from the configuration having the bent, allowing the fluid flowing again through the tube.

摘要翻译： 提供一种用于在构造简单的致动器中停止固定长度的管中的流体流动的装置。 止动装置与管内的流体无直接接触，预期在正常状态下尽可能允许阻止管中的流动，预期用单个装置进行检测和控制，并且进一步不易受到各种 流体。 用于停止流体流动的装置包括管保持器以将管保持为环形构造，可动部分压缩管的环形构造。 按压管的环形构造使得卡扣弯曲以停止通过管的流体的流动。 将可移动部分放回原位导致管从具有弯曲的构造返回，允许流体再次流过管。

公开(公告)号：US09209506B2

公开(公告)日：2015-12-08

申请号：US13332709

申请日：2011-12-21

申请人： Junichi Kitano ,  Haruo Ikeda ,  Shunsaku Koga

发明人： Junichi Kitano ,  Haruo Ikeda ,  Shunsaku Koga

IPC分类号： H01P7/04 ,  H01P1/205

CPC分类号： H01P1/2053

摘要： A resonant circuit includes a plurality of cables, each of which including: an outer conductor made of a conductive material in a cylindrical manner; an inner conductor, made of a conductive material in an elongated manner, and disposed inside of the outer conductor; and an insulator disposed between the outer conductor and the inner conductor. The plurality of cables is disposed in series in a circular manner. The inner conductor, provided in one of adjacently disposed cables among the plurality of cables, is conductively connected to the outer conductor of another of the adjacently disposed cable.

摘要翻译： 谐振电路包括多个电缆，每个电缆包括：由导电材料制成的外导体，其为圆柱形; 由导电材料制成的内导体，并且设置在外导体的内部; 以及设置在外导体和内导体之间的绝缘体。 多个电缆以圆形方式串联布置。 设置在多个电缆中的相邻布置的电缆之一中的内部导体导电地连接到相邻布置的电缆的另一个的外部导体。

公开(公告)号：US08366872B2

公开(公告)日：2013-02-05

申请号：US13161185

申请日：2011-06-15

申请人： Kenji Tsutsumi ,  Junichi Kitano ,  Osamu Miyahara ,  Hideharu Kyouda

发明人： Kenji Tsutsumi ,  Junichi Kitano ,  Osamu Miyahara ,  Hideharu Kyouda

IPC分类号： C23F1/02

CPC分类号： C23C26/00 ,  G03F1/80 ,  G03F7/707 ,  G03F7/70916 ,  H01L21/308 ,  H01L21/6708 ,  H01L21/6715 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/68707

摘要： According to the present invention, during the photolithography processing of a substrate, exposure processing is performed immediately after removal of a coating film on the rear surface of the substrate, and a coating film is formed on the rear surface of the substrate immediately after the exposure processing. Thereafter, etching treatment and so on are performed, and a series of these treatment and processing steps are performed a predetermined number of times. The coating film has been formed on the rear surface of the substrate at the time for the etching treatment, so that even if the coating film gets minute scratches, the rear surface of the substrate itself is protected by the coating film and thus never scratched. Further, since the coating film on the rear surface of the substrate is removed immediately before the exposure processing, the rear surface of the substrate can be flat for the exposure processing.

摘要翻译： 根据本发明，在基板的光刻处理中，在除去基板背面的涂膜后立即进行曝光处理，在曝光后立即在基板的背面形成涂膜 处理。 此后，进行蚀刻处理等，并且进行一系列这些处理和处理步骤预定次数。 在蚀刻处理时，已经在基板的背面形成了涂膜，使得即使涂膜受到微小的划痕，基板本身的后表面也被涂膜保护，因此不会被刮伤。 此外，由于在曝光处理之前立即除去基板后表面上的涂膜，所以基板的后表面可以是平坦的，用于曝光处理。

公开(公告)号：US08111372B2

公开(公告)日：2012-02-07

申请号：US12515368

申请日：2007-11-19

申请人： Hideharu Kyouda ,  Junichi Kitano ,  Taro Yamamoto

发明人： Hideharu Kyouda ,  Junichi Kitano ,  Taro Yamamoto

IPC分类号： H01L21/66

CPC分类号： G03F7/70958 ,  G03F7/70341 ,  G03F7/70991 ,  H01L21/6715

摘要： A coating film forming apparatus for immersion light exposure includes one or more coating units configured to apply a resist film or a resist film and an additional film onto a substrate, one or more thermally processing units configured to perform a thermal process, a defect eliciting unit configured to perform a process for eliciting a latent defect of a coating film at an edge portion of the substrate, a checking unit configured to check a state of the coating film after the process by the defect eliciting unit, a control section configured to use a check result obtained by the checking unit to make a judgment of the state of the coating film and permit transfer of the substrate to the light exposure apparatus, and a cleaning unit configured to perform cleaning on the substrate before the process by the defect eliciting unit.

摘要翻译： 用于浸没曝光的涂膜形成装置包括一个或多个涂覆单元，其被配置为将抗蚀剂膜或抗蚀剂膜和附加膜施加到基板上，一个或多个热处理单元，被配置为执行热处理，缺陷引出单元 被配置为执行用于在所述基板的边缘部分处引导涂膜的潜在缺陷的处理，所述检查单元被配置为在所述缺陷引出单元处理之后检查所述涂膜的状态;控制部，被配置为使用 由检查单元获得的检查结果以判断涂膜的状态并允许将基板转移到曝光装置;以及清洁单元，被配置为在由缺陷引出单元进行处理之前在基板上进行清洁。

公开(公告)号：US08054443B2

公开(公告)日：2011-11-08

申请号：US12273165

申请日：2008-11-18

申请人： Junichi Kitano ,  Osamu Miyahara ,  Shinya Wakamizu

发明人： Junichi Kitano ,  Osamu Miyahara ,  Shinya Wakamizu

IPC分类号： G03B27/32 ,  G03B27/54

CPC分类号： G03F7/40

摘要： A developing method is used for subjecting a light-exposed resist film disposed on a wafer W to a developing process by a developing solution and a rinsing process by a rinsing liquid. In a state where the resist film on the wafer W is wet with the developing solution or rinsing liquid before a drying process is performed on the wafer W, a chemical liquid (curing chemical liquid), which contains a resist curing aid contributory to curing of a resist film remaining on the wafer W, is supplied onto a surface of the wafer W. Then, ultraviolet rays are radiated onto a surface of the wafer to cure a resist film remaining on the wafer W by a synergistic effect of the resist curing aid and the ultraviolet rays thus radiated, so as to prevent pattern fall.

摘要翻译： 使用显影方法对设置在晶片W上的曝光抗蚀剂膜进行显影液的显影处理和通过漂洗液的漂洗处理。 在对晶片W进行干燥处理之前，晶片W上的抗蚀剂膜与显影液或漂洗液体湿润的状态下，含有抗蚀剂固化助剂的化学液（固化化学液） 保留在晶片W上的抗蚀剂膜被提供到晶片W的表面上。然后，通过抗蚀剂固化助剂的协同效应将紫外线辐射到晶片的表面上以固化残留在晶片W上的抗蚀剂膜 并且因此辐射紫外线，以防止图案下降。

公开(公告)号：US07857530B2

公开(公告)日：2010-12-28

申请号：US12216751

申请日：2008-07-10

申请人： Yuko Ono ,  Junichi Kitano

发明人： Yuko Ono ,  Junichi Kitano

IPC分类号： G03D5/00 ,  G03C5/00 ,  B08B3/12

CPC分类号： G03D5/00 ,  G03F7/3028 ,  G03F7/322 ,  Y10S134/902

摘要： In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.

公开(公告)号：US20080204675A1

公开(公告)日：2008-08-28

申请号：US11958798

申请日：2007-12-18

申请人： Hisashi Kawano ,  Junichi Kitano ,  Hitoshi Kosugi ,  Koichi Hontake ,  Masashi Enomoto

发明人： Hisashi Kawano ,  Junichi Kitano ,  Hitoshi Kosugi ,  Koichi Hontake ,  Masashi Enomoto

IPC分类号： G03B27/52 ,  G03F7/26

CPC分类号： G03F7/162 ,  G03F7/168 ,  G03F7/3021

摘要： A coating/developing apparatus includes a process section including processing units to perform a series of processes for resist coating and development; an interface section disposed between the process section and immersion light exposure apparatus; and a drying section disposed in the interface section to dry the substrate immediately after the immersion light exposure process. The drying section includes a process container configured to accommodate the substrate, a substrate support member configured to place the substrate thereon, a temperature-adjusted gas supply mechanism configured to supply a temperature-adjusted gas into the process container, and an exhaust mechanism configured to exhaust the process container. The drying section is arranged to dry the substrate by supplying the temperature-adjusted gas into the process container with the substrate placed on the substrate support member, while exhausting the process container.

摘要翻译： 一种涂布/显影装置，包括：处理部，包括进行抗蚀剂涂布和显影的一系列处理的处理单元; 布置在处理部分和浸没曝光装置之间的界面部分; 以及设置在界面部分中的干燥部分，以在浸没曝光处理之后立即干燥基板。 所述干燥部包括被配置为容纳所述基板的处理容器，被配置为将所述基板放置在其上的基板支撑部件，被配置为将经温度调节的气体供应到所述处理容器中的温度调节气体供给机构，以及配置为 排出过程容器。 干燥部被布置成通过将衬底放置在基板支撑构件上的温度调节气体供给到处理容器中，同时排出处理容器来干燥基板。