Light source device and exposure equipment using the same
    11.
    发明授权
    Light source device and exposure equipment using the same 有权
    光源设备和曝光设备使用相同

    公开(公告)号:US06987279B2

    公开(公告)日:2006-01-17

    申请号:US11014961

    申请日:2004-12-20

    摘要: A light source device capable of extending the life of a collector mirror and reducing running cost by protecting the collector mirror from debris that is considered harmful to a mirror coating while securing the collection solid angle and collection rate of EUV light. The light source device includes a target supply unit for supplying a material to become the target; a laser unit for generating plasma by applying a laser beam to the target; a collection optical system for collecting the extreme ultra violet light radiating from the plasma and emitting the extreme ultra violet light; and magnetic field generating unit for generating a magnetic field within the collection optical system when supplied with current so as to trap charged particles radiating from the plasma.

    摘要翻译: 光源装置能够延长收集镜的使用寿命,并通过保护收集镜免受被认为对镜面涂层有害的碎片,同时确保采集立体角和EUV光的收集速率,从而降低运行成本。 光源装置包括用于供给成为靶的材料的目标供给单元; 用于通过向目标物施加激光束来产生等离子体的激光单元; 用于收集从等离子体辐射并发射极紫外光的极紫外光的收集光学系统; 以及磁场产生单元,用于当被提供电流时在收集光学系统内产生磁场,以便捕获从等离子体辐射的带电粒子。

    Panel glass for cathode ray tube
    12.
    发明授权
    Panel glass for cathode ray tube 失效
    阴极射线管用面板玻璃

    公开(公告)号:US06956000B2

    公开(公告)日:2005-10-18

    申请号:US10277883

    申请日:2002-10-23

    CPC分类号: C03C3/085

    摘要: Panel glass, for a cathode ray tube, which has an SrO/(SrO+BaO) ratio of from 0.35 to 0.70, an X-ray absorption coefficient of 36.0 cm−1 or more at the wavelength of 0.6 angstrom, wherein Na2O/R2O, K2O/R2O and Li2O/R2O (R2O: Na2O+K2O+Li2O) molar ratios fall within a range surrounded by the points A (0, 0.2, 0.8), B (0.2, 0.2, 0.6), C (0.4, 0.6, 0), D (0.2, 0.8, 0) and E (0, 0.4, 0.6) in the ternary phase diagram as shown in FIG. 1.

    摘要翻译: 用于阴极射线管的面板玻璃,其SrO /(SrO + BaO)比为0.35-0.70,X射线吸收系数为36.0cm -1以上的波长 0.6埃,其中Na 2 O / R 2 O,K 2 O / R 2 O和Li < O 2 R 2 O 2(R 2 O 2 Na 2 O + K 2 O 2) (O,Li,O)O摩尔比落在由点A(0,0.2,0.8),B(0.2,0.2,0.6),C(0.4,0.6,0)所包围的范围内, ,D(0.2,0.8,0)和E(0,0.4,0.6),如图3所示。 1。

    CRT funnel glass
    13.
    发明申请
    CRT funnel glass 审中-公开
    CRT漏斗玻璃

    公开(公告)号:US20050054513A1

    公开(公告)日:2005-03-10

    申请号:US10966214

    申请日:2004-10-15

    CPC分类号: H01J29/863 C03C3/105

    摘要: On producing CRT funnel glass from CRT panel glass or CRT frit, Fe2O3 is added in a range of 0.05 to 1 mass % so that the fluctuation of transmittance of light having a wavelength of 1,050 nm becomes 10% or less, at a thickness of 10 mm of the produced CRT funnel glass.

    摘要翻译: 在从CRT面板玻璃或CRT玻璃料制造CRT漏斗玻璃时,以0.05〜1质量%的范围添加Fe2O3,使得波长为1050nm的光的透射率的变化为10%以下,厚度为10 所制造的CRT漏斗玻璃的mm。

    Laser gas controller and charging/discharging device for
discharge-excited laser
    14.
    发明授权
    Laser gas controller and charging/discharging device for discharge-excited laser 失效
    激光气体控制器和放电激光激光器的充放电装置

    公开(公告)号:US5754579A

    公开(公告)日:1998-05-19

    申请号:US750538

    申请日:1996-12-13

    IPC分类号: H01S3/036 H01S3/134 H01S3/22

    CPC分类号: H01S3/036 H01S3/134

    摘要: A first object is to stabilize output of laser light. In order to achieve the first object, if it is detected by an output detection means (15) that the output (E) of laser light (La) has departed from a target value, whilst maintaining the voltage of a power source (17) at a fixed value or in a fixed range, the amount of laser gas supplied to a laser chamber (4) is controlled such that the output (E) of laser light becomes the target value. A second object is to reduce the wear of the pre-ionization electrodes and to prevent drop in output of laser light. The second object is achieved as follows. Specifically, the pulse current discharged from primary capacitor (C1) is stepped up in voltage by a pulse transformer and is charged onto a secondary capacitor (C2). At this point a magnetic switch (SR) that is connected to the downstream side of secondary capacitor (C2) becomes saturated and becomes conductive, allowing current to pass through pre-ionization electrodes (6) that are connected in series with the magnetic switch (SR). At the time-point where the movement of charge of secondary capacitor (C2) has finished, a discharge current in the reverse direction tries to flow in secondary capacitor (C2) but magnetic switch (SR) acts to block the reverse current, stopping the pre-ionization discharge. Concurrently with this the core of pulse transformer (20) is saturated, with the result that charge starts to move from secondary capacitor (C2) to peaking capacitor (C4). The voltage of peaking capacitor (C4) therefore rises until it reaches the discharge initiation voltage, and laser oscillation is performed.

    摘要翻译: PCT No.PCT / JP95 / 01015 Sec。 371日期1996年12月13日第 102(e)日期1996年12月13日PCT提交1995年5月26日PCT公布。 第WO95 / 34927号公报 日期1995年12月21日第一个目标是稳定激光输出。 为了实现第一目的,如果由输出检测装置(15)检测到激光(La)的输出(E)已经脱离目标值,同时保持电源(17)的电压, 在固定值或固定范围内,供给激光室(4)的激光气体的量被控制成激光的输出(E)成为目标值。 第二个目的是减少预电离电极的磨损并防止激光输出的下降。 第二个目的是如下实现的。 具体地说,从主电容器(C1)放出的脉冲电流通过脉冲变压器升压成电压并充电到次级电容器(C2)上。 此时,与次级电容器(C2)的下游侧连接的磁性开关(SR)饱和并变成导通状态,使电流通过与磁性开关串联连接的预电离电极(6) SR)。 在二次电容器(C2)的充电移动完成的时间点,反向放电电流试图在二次电容器(C2)中流动,但是磁性开关(SR)用于阻止反向电流,停止 预电离放电。 与此同时,脉冲变压器(20)的核心是饱和的,结果是充电开始从次级电容器(C2)移动到峰值电容器(C4)。 峰值电容器(C4)的电压因此上升直到达到放电起始电压,并且执行激光振荡。

    Device for correcting teeth irregularities
    15.
    发明授权
    Device for correcting teeth irregularities 失效
    矫正牙齿不规则的装置

    公开(公告)号:US5474447A

    公开(公告)日:1995-12-12

    申请号:US115055

    申请日:1993-09-02

    IPC分类号: A61C7/12 A61C3/00

    CPC分类号: A61C7/12

    摘要: A device for correcting teeth irregularities includes a bracket to be fixed on a tooth. The bracket has a slit, and a base plate is interposed between the bracket and the surface to be fixed to the tooth. A wire is inserted into the slit and engaged with the bracket. The base plate has a thickness which is in a range of 0.5 to 5 mm, and the base plate is composed of an easily plastically deformable resin on a surface to be fixed to the tooth. The base plate is capable of deforming to allow the bracket to be inclined at an angle relative to the vertical direction.

    摘要翻译: 用于校正牙齿不规则的装置包括固定在牙齿上的托架。 支架具有狭缝,并且基板被插入在支架和要固定到牙齿的表面之间。 电线插入狭缝并与支架接合。 基板的厚度为0.5〜5mm的范围,基板由固定于牙齿的表面上的容易塑性变形的树脂构成。 基板能够变形以允许支架相对于垂直方向成一定角度倾斜。

    Variable impedance circuit
    16.
    发明授权
    Variable impedance circuit 失效
    可变阻抗电路

    公开(公告)号:US5012201A

    公开(公告)日:1991-04-30

    申请号:US426229

    申请日:1989-10-25

    IPC分类号: H03H11/46

    CPC分类号: H03H11/46

    摘要: A variable impedance circuit includes a first differential amplifier circuit having an input terminal pair, an output terminal pair and a capacitive element connected between the emitters of a transistor pair. The variable impedance circuit further inclludes a second differential amplifier circuit having an input terminal pair and an output terminal pair. The output terminal pair of the first differential amplifier circuit is connected to the input terminal pair of the second differential amplifier circuit. Furthermore, the output terminal pair of the second differential amplifier circuit is connected to the input terminal pair of the first differential amplifier circuit.

    摘要翻译: 可变阻抗电路包括具有输入端子对的第一差分放大器电路,连接在晶体管对的发射极之间的输出端子对和电容元件。 可变阻抗电路还包括具有输入端子对和输出端子对的第二差分放大器电路。 第一差分放大器电路的输出端子对连接到第二差分放大器电路的输入端子对。 此外,第二差分放大器电路的输出端子对连接到第一差分放大器电路的输入端子对。

    Extreme ultraviolet light source apparatus
    17.
    发明授权
    Extreme ultraviolet light source apparatus 有权
    极紫外光源设备

    公开(公告)号:US08436328B2

    公开(公告)日:2013-05-07

    申请号:US12638571

    申请日:2009-12-15

    IPC分类号: A61N5/06 G01J3/10 H05G2/00

    摘要: In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.

    摘要翻译: 在EUV光源装置中,集光镜受到保护,不会损坏镜面涂层。 EUV光源装置包括:产生极紫外光的室; 目标供应单元,用于将目标材料供应到所述室中; 等离子体产生激光器单元,用于用等离子体产生激光束照射室内的目标材料以产生等离子体; 电离激光单元,用于用电离激光束照射在等离子体产生时产生的中性粒子,以将中性粒子转化为离子; 用于收集从等离子体辐射的极紫外光的收集镜; 以及用于在室内形成磁场或电场以捕获离子的磁场或电场形成单元。

    Optical element contamination preventing method and optical element contamination preventing device of extreme ultraviolet light source
    18.
    发明授权
    Optical element contamination preventing method and optical element contamination preventing device of extreme ultraviolet light source 有权
    光学元件污染防治方法和极紫外光源的光学元件污染防治装置

    公开(公告)号:US08129700B2

    公开(公告)日:2012-03-06

    申请号:US12150077

    申请日:2008-04-24

    IPC分类号: H05G2/00

    CPC分类号: B08B17/02 H05G2/003 H05G2/008

    摘要: Solid tin (Sn) is used as a target, a CO2 laser is used as an excitation source for the target, and after the size of debris emitted from plasma is decreased to a nanometer or smaller size by exciting the solid tin by a laser beam outputted from the CO2 laser, the emitted debris of a nanometer or smaller size is acted upon so as not to reach the optical element. In accordance with the present invention, in the EUV light source apparatus, the debris emitted together with EUV light from plasma generated by exciting a target within a chamber by a laser beam is prevented from adhering to an optical element provided within the chamber and forming a metal film. As a result, the service life of the optical element can be extended.

    摘要翻译: 使用固体锡(Sn)作为目标,使用CO 2激光作为靶的激发源,并且在通过激光束激发固体锡后,从等离子体发射的碎片的尺寸减小到纳米或更小的尺寸之后 从CO 2激光器输出的纳米尺寸或更小尺寸的发射碎片被作用到不会到达光学元件。 根据本发明,在EUV光源装置中,防止了通过用激光束激发室内的目标物而产生的来自等离子体的EUV光一起发射的碎片附着在设置在室内的光学元件,并形成 金属膜。 结果,可以延长光学元件的使用寿命。

    Optical element contamination preventing method and optical element contamination preventing device of extreme ultraviolet light source
    19.
    发明申请
    Optical element contamination preventing method and optical element contamination preventing device of extreme ultraviolet light source 有权
    光学元件污染防治方法和极紫外光源的光学元件污染防治装置

    公开(公告)号:US20080267816A1

    公开(公告)日:2008-10-30

    申请号:US12150077

    申请日:2008-04-24

    IPC分类号: A61L2/00

    CPC分类号: B08B17/02 H05G2/003 H05G2/008

    摘要: Solid tin (Sn) is used as a target, a CO2 laser is used as an excitation source for the target, and after the size of debris emitted from plasma is decreased to a nanometer or smaller size by exciting the solid tin by a laser beam outputted from the CO2 laser, the emitted debris of a nanometer or smaller size is acted upon so as not to reach the optical element. In accordance with the present invention, in the EUV light source apparatus, the debris emitted together with EUV light from plasma generated by exciting a target within a chamber by a laser beam is prevented from adhering to an optical element provided within the chamber and forming a metal film. As a result, the service life of the optical element can be extended.

    摘要翻译: 使用固体锡(Sn)作为目标,使用CO 2激光作为靶的激发源,并且在从等离子体发射的碎片的尺寸通过以下方式减小到纳米或更小的尺寸之后 通过从CO 2激光器输出的激光束激发固体锡,发射的纳米或更小尺寸的碎片被作用到不会到达光学元件。 根据本发明,在EUV光源装置中,防止了通过用激光束激发室内的目标物而产生的来自等离子体的EUV光一起发射的碎片附着在设置在室内的光学元件,并形成 金属膜。 结果,可以延长光学元件的使用寿命。

    Extreme ultra violet light source apparatus
    20.
    发明申请
    Extreme ultra violet light source apparatus 有权
    极紫外光源装置

    公开(公告)号:US20080083887A1

    公开(公告)日:2008-04-10

    申请号:US11976276

    申请日:2007-10-23

    IPC分类号: H01J35/20

    CPC分类号: G21K1/14 H05G2/003 H05G2/008

    摘要: In an extreme ultra violet light source apparatus that exhausts debris including fast ions and neutral particles by the effect of a magnetic field, neutral particles emitted from plasma are efficiently ionized. The extreme ultraviolet light source apparatus includes: a plasma generating unit that generates plasma, that radiates at least extreme ultra violet light, through pulse operation; collective optics that collects the extreme ultra violet light radiated from the plasma; a microwave generating unit that radiates microwave through pulse operation into a space in which a magnetic field is formed to cause electron cyclotron resonance, and thereby ionizes neutral particles emitted from the plasma; a magnetic field forming unit that forms the magnetic field and a magnetic field for trapping at least ionized particles; and a control unit that synchronously controls at least the plasma generating unit and the microwave generating unit.

    摘要翻译: 在通过磁场的作用下排出包括快离子和中性粒子的碎片的极紫外光源装置中,从等离子体发射的中性粒子被有效地电离。 极紫外光源装置包括:等离子体产生单元,其通过脉冲操作产生至少辐射极紫外光的等离子体; 收集从等离子体辐射的极紫外光的集体光学元件; 微波发生单元,其通过脉冲操作将微波辐射到形成有磁场的空间中,引起电子回旋共振,从而离子化从等离子体发射的中性粒子; 形成磁场的磁场形成单元和用于捕集至少电离粒子的磁场; 以及至少同步地控制等离子体产生单元和微波产生单元的控制单元。