摘要:
A light source device capable of extending the life of a collector mirror and reducing running cost by protecting the collector mirror from debris that is considered harmful to a mirror coating while securing the collection solid angle and collection rate of EUV light. The light source device includes a target supply unit for supplying a material to become the target; a laser unit for generating plasma by applying a laser beam to the target; a collection optical system for collecting the extreme ultra violet light radiating from the plasma and emitting the extreme ultra violet light; and magnetic field generating unit for generating a magnetic field within the collection optical system when supplied with current so as to trap charged particles radiating from the plasma.
摘要:
Panel glass, for a cathode ray tube, which has an SrO/(SrO+BaO) ratio of from 0.35 to 0.70, an X-ray absorption coefficient of 36.0 cm−1 or more at the wavelength of 0.6 angstrom, wherein Na2O/R2O, K2O/R2O and Li2O/R2O (R2O: Na2O+K2O+Li2O) molar ratios fall within a range surrounded by the points A (0, 0.2, 0.8), B (0.2, 0.2, 0.6), C (0.4, 0.6, 0), D (0.2, 0.8, 0) and E (0, 0.4, 0.6) in the ternary phase diagram as shown in FIG. 1.
摘要翻译:用于阴极射线管的面板玻璃,其SrO /(SrO + BaO)比为0.35-0.70,X射线吸收系数为36.0cm -1以上的波长 0.6埃,其中Na 2 O / R 2 O,K 2 O / R 2 O和Li < O 2 R 2 O 2(R 2 O 2 Na 2 O + K 2 O 2) (O,Li,O)O摩尔比落在由点A(0,0.2,0.8),B(0.2,0.2,0.6),C(0.4,0.6,0)所包围的范围内, ,D(0.2,0.8,0)和E(0,0.4,0.6),如图3所示。 1。
摘要:
On producing CRT funnel glass from CRT panel glass or CRT frit, Fe2O3 is added in a range of 0.05 to 1 mass % so that the fluctuation of transmittance of light having a wavelength of 1,050 nm becomes 10% or less, at a thickness of 10 mm of the produced CRT funnel glass.
摘要:
A first object is to stabilize output of laser light. In order to achieve the first object, if it is detected by an output detection means (15) that the output (E) of laser light (La) has departed from a target value, whilst maintaining the voltage of a power source (17) at a fixed value or in a fixed range, the amount of laser gas supplied to a laser chamber (4) is controlled such that the output (E) of laser light becomes the target value. A second object is to reduce the wear of the pre-ionization electrodes and to prevent drop in output of laser light. The second object is achieved as follows. Specifically, the pulse current discharged from primary capacitor (C1) is stepped up in voltage by a pulse transformer and is charged onto a secondary capacitor (C2). At this point a magnetic switch (SR) that is connected to the downstream side of secondary capacitor (C2) becomes saturated and becomes conductive, allowing current to pass through pre-ionization electrodes (6) that are connected in series with the magnetic switch (SR). At the time-point where the movement of charge of secondary capacitor (C2) has finished, a discharge current in the reverse direction tries to flow in secondary capacitor (C2) but magnetic switch (SR) acts to block the reverse current, stopping the pre-ionization discharge. Concurrently with this the core of pulse transformer (20) is saturated, with the result that charge starts to move from secondary capacitor (C2) to peaking capacitor (C4). The voltage of peaking capacitor (C4) therefore rises until it reaches the discharge initiation voltage, and laser oscillation is performed.
摘要:
A device for correcting teeth irregularities includes a bracket to be fixed on a tooth. The bracket has a slit, and a base plate is interposed between the bracket and the surface to be fixed to the tooth. A wire is inserted into the slit and engaged with the bracket. The base plate has a thickness which is in a range of 0.5 to 5 mm, and the base plate is composed of an easily plastically deformable resin on a surface to be fixed to the tooth. The base plate is capable of deforming to allow the bracket to be inclined at an angle relative to the vertical direction.
摘要:
A variable impedance circuit includes a first differential amplifier circuit having an input terminal pair, an output terminal pair and a capacitive element connected between the emitters of a transistor pair. The variable impedance circuit further inclludes a second differential amplifier circuit having an input terminal pair and an output terminal pair. The output terminal pair of the first differential amplifier circuit is connected to the input terminal pair of the second differential amplifier circuit. Furthermore, the output terminal pair of the second differential amplifier circuit is connected to the input terminal pair of the first differential amplifier circuit.
摘要:
In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.
摘要:
Solid tin (Sn) is used as a target, a CO2 laser is used as an excitation source for the target, and after the size of debris emitted from plasma is decreased to a nanometer or smaller size by exciting the solid tin by a laser beam outputted from the CO2 laser, the emitted debris of a nanometer or smaller size is acted upon so as not to reach the optical element. In accordance with the present invention, in the EUV light source apparatus, the debris emitted together with EUV light from plasma generated by exciting a target within a chamber by a laser beam is prevented from adhering to an optical element provided within the chamber and forming a metal film. As a result, the service life of the optical element can be extended.
摘要:
Solid tin (Sn) is used as a target, a CO2 laser is used as an excitation source for the target, and after the size of debris emitted from plasma is decreased to a nanometer or smaller size by exciting the solid tin by a laser beam outputted from the CO2 laser, the emitted debris of a nanometer or smaller size is acted upon so as not to reach the optical element. In accordance with the present invention, in the EUV light source apparatus, the debris emitted together with EUV light from plasma generated by exciting a target within a chamber by a laser beam is prevented from adhering to an optical element provided within the chamber and forming a metal film. As a result, the service life of the optical element can be extended.
摘要:
In an extreme ultra violet light source apparatus that exhausts debris including fast ions and neutral particles by the effect of a magnetic field, neutral particles emitted from plasma are efficiently ionized. The extreme ultraviolet light source apparatus includes: a plasma generating unit that generates plasma, that radiates at least extreme ultra violet light, through pulse operation; collective optics that collects the extreme ultra violet light radiated from the plasma; a microwave generating unit that radiates microwave through pulse operation into a space in which a magnetic field is formed to cause electron cyclotron resonance, and thereby ionizes neutral particles emitted from the plasma; a magnetic field forming unit that forms the magnetic field and a magnetic field for trapping at least ionized particles; and a control unit that synchronously controls at least the plasma generating unit and the microwave generating unit.