公开(公告)号：US08558202B2

公开(公告)日：2013-10-15

申请号：US13336749

申请日：2011-12-23

申请人： Tatsuya Yanagida ,  Akira Endo ,  Hiroshi Komori ,  Shinji Nagai ,  Kouji Kakizaki ,  Tamotsu Abe ,  Hideo Hoshino

发明人： Tatsuya Yanagida ,  Akira Endo ,  Hiroshi Komori ,  Shinji Nagai ,  Kouji Kakizaki ,  Tamotsu Abe ,  Hideo Hoshino

IPC分类号： A61N5/06 ,  G01J3/10 ,  H05G2/00

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

摘要： In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.

公开(公告)号：US08471226B2

公开(公告)日：2013-06-25

申请号：US12547896

申请日：2009-08-26

申请人： Hiroshi Komori ,  Tatsuya Yanagida ,  Yoshifumi Ueno ,  Akira Sumitani ,  Akira Endo ,  Tsukasa Hori

发明人： Hiroshi Komori ,  Tatsuya Yanagida ,  Yoshifumi Ueno ,  Akira Sumitani ,  Akira Endo ,  Tsukasa Hori

IPC分类号： A61N5/06

CPC分类号： G21K5/00 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation.

摘要翻译： EUV（Extreme Ultra Violet）光源装置将离子发生器中的目标材料离子化，并将电离靶材材料提供到产生等离子体的点。 这减少了碎片的产生。 离子发生器同时将与激发的锡水平相对应的多个波长的激光束照射在目标材料上以电离目标材料。 电离目标材料从离子束提取器施加的高电压从电离器中提取，并被加速并提供给等离子体产生室。 当驱动激光束照射在电离靶材上时，产生等离子体，从而发射EUV辐射。

公开(公告)号：US20100181503A1

公开(公告)日：2010-07-22

申请号：US12638571

申请日：2009-12-15

申请人： Tatsuya Yanagida ,  Akira Endo ,  Hiroshi Komori ,  Shinji Nagai ,  Kouji Kakizaki ,  Tamotsu Abe ,  Hideo Hoshino

发明人： Tatsuya Yanagida ,  Akira Endo ,  Hiroshi Komori ,  Shinji Nagai ,  Kouji Kakizaki ,  Tamotsu Abe ,  Hideo Hoshino

IPC分类号： G21K5/02

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

摘要： In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.

摘要翻译： 在EUV光源装置中，集光镜受到保护，不会损坏镜面涂层。 EUV光源装置包括：产生极紫外光的室; 目标供应单元，用于将目标材料供应到所述室中; 等离子体产生激光器单元，用于用等离子体产生激光束照射室内的目标材料以产生等离子体; 电离激光单元，用于用电离激光束照射在等离子体产生时产生的中性粒子，以将中性粒子转化为离子; 用于收集从等离子体辐射的极紫外光的收集镜; 以及用于在室内形成磁场或电场以捕获离子的磁场或电场形成单元。

公开(公告)号：US06987279B2

公开(公告)日：2006-01-17

申请号：US11014961

申请日：2004-12-20

申请人： Hideo Hoshino ,  Hiroshi Komori ,  Akira Endo

发明人： Hideo Hoshino ,  Hiroshi Komori ,  Akira Endo

IPC分类号： G01J1/00 ,  H01J17/26 ,  H01J35/00 ,  B06B6/00

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/008

摘要： A light source device capable of extending the life of a collector mirror and reducing running cost by protecting the collector mirror from debris that is considered harmful to a mirror coating while securing the collection solid angle and collection rate of EUV light. The light source device includes a target supply unit for supplying a material to become the target; a laser unit for generating plasma by applying a laser beam to the target; a collection optical system for collecting the extreme ultra violet light radiating from the plasma and emitting the extreme ultra violet light; and magnetic field generating unit for generating a magnetic field within the collection optical system when supplied with current so as to trap charged particles radiating from the plasma.

摘要翻译： 光源装置能够延长收集镜的使用寿命，并通过保护收集镜免受被认为对镜面涂层有害的碎片，同时确保采集立体角和EUV光的收集速率，从而降低运行成本。 光源装置包括用于供给成为靶的材料的目标供给单元; 用于通过向目标物施加激光束来产生等离子体的激光单元; 用于收集从等离子体辐射并发射极紫外光的极紫外光的收集光学系统; 以及磁场产生单元，用于当被提供电流时在收集光学系统内产生磁场，以便捕获从等离子体辐射的带电粒子。

公开(公告)号：US20120091893A1

公开(公告)日：2012-04-19

申请号：US13336749

申请日：2011-12-23

申请人： Tatsuya YANAGIDA ,  Akira Endo ,  Hiroshi Komori ,  Shinji Nagai ,  Kouji Kakizaki ,  Tamotsu Abe ,  Hideo Hoshino

发明人： Tatsuya YANAGIDA ,  Akira Endo ,  Hiroshi Komori ,  Shinji Nagai ,  Kouji Kakizaki ,  Tamotsu Abe ,  Hideo Hoshino

IPC分类号： H05H1/46

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

摘要： In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.

摘要翻译： 在EUV光源装置中，集光镜受到保护，不会损坏镜面涂层。 EUV光源装置包括：产生极紫外光的室; 目标供应单元，用于将目标材料供应到所述室中; 等离子体产生激光器单元，用于用等离子体产生激光束照射室内的目标材料以产生等离子体; 电离激光单元，用于用电离激光束照射在等离子体产生时产生的中性粒子，以将中性粒子转化为离子; 用于收集从等离子体辐射的极紫外光的收集镜; 以及用于在室内形成磁场或电场以捕获离子的磁场或电场形成单元。

公开(公告)号：US08436328B2

公开(公告)日：2013-05-07

申请号：US12638571

申请日：2009-12-15

申请人： Tatsuya Yanagida ,  Akira Endo ,  Hiroshi Komori ,  Shinji Nagai ,  Kouji Kakizaki ,  Tamotsu Abe ,  Hideo Hoshino

发明人： Tatsuya Yanagida ,  Akira Endo ,  Hiroshi Komori ,  Shinji Nagai ,  Kouji Kakizaki ,  Tamotsu Abe ,  Hideo Hoshino

IPC分类号： A61N5/06 ,  G01J3/10 ,  H05G2/00

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

摘要： In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.

摘要翻译： 在EUV光源装置中，集光镜受到保护，不会损坏镜面涂层。 EUV光源装置包括：产生极紫外光的室; 目标供应单元，用于将目标材料供应到所述室中; 等离子体产生激光器单元，用于用等离子体产生激光束照射室内的目标材料以产生等离子体; 电离激光单元，用于用电离激光束照射在等离子体产生时产生的中性粒子，以将中性粒子转化为离子; 用于收集从等离子体辐射的极紫外光的收集镜; 以及用于在室内形成磁场或电场以捕获离子的磁场或电场形成单元。

公开(公告)号：US20080083887A1

公开(公告)日：2008-04-10

申请号：US11976276

申请日：2007-10-23

申请人： Hiroshi Komori ,  Akira Endo

发明人： Hiroshi Komori ,  Akira Endo

IPC分类号： H01J35/20

CPC分类号： G21K1/14 ,  H05G2/003 ,  H05G2/008

摘要： In an extreme ultra violet light source apparatus that exhausts debris including fast ions and neutral particles by the effect of a magnetic field, neutral particles emitted from plasma are efficiently ionized. The extreme ultraviolet light source apparatus includes: a plasma generating unit that generates plasma, that radiates at least extreme ultra violet light, through pulse operation; collective optics that collects the extreme ultra violet light radiated from the plasma; a microwave generating unit that radiates microwave through pulse operation into a space in which a magnetic field is formed to cause electron cyclotron resonance, and thereby ionizes neutral particles emitted from the plasma; a magnetic field forming unit that forms the magnetic field and a magnetic field for trapping at least ionized particles; and a control unit that synchronously controls at least the plasma generating unit and the microwave generating unit.

摘要翻译： 在通过磁场的作用下排出包括快离子和中性粒子的碎片的极紫外光源装置中，从等离子体发射的中性粒子被有效地电离。 极紫外光源装置包括：等离子体产生单元，其通过脉冲操作产生至少辐射极紫外光的等离子体; 收集从等离子体辐射的极紫外光的集体光学元件; 微波发生单元，其通过脉冲操作将微波辐射到形成有磁场的空间中，引起电子回旋共振，从而离子化从等离子体发射的中性粒子; 形成磁场的磁场形成单元和用于捕集至少电离粒子的磁场; 以及至少同步地控制等离子体产生单元和微波产生单元的控制单元。

公开(公告)号：US20080035865A1

公开(公告)日：2008-02-14

申请号：US11882253

申请日：2007-07-31

申请人： Hiroshi Komori ,  Akira Endo ,  Hakaru Mizoguchi

发明人： Hiroshi Komori ,  Akira Endo ,  Hakaru Mizoguchi

IPC分类号： H05G2/00

CPC分类号： H05G2/001 ,  H05G2/005

摘要： An extreme ultra violet light source apparatus in which both a mechanism of supplying a droplet target to a laser application position at a high speed and a mechanism of trapping charged particles generated from plasma are managed without disturbing a track of the target. The apparatus includes: a target nozzle that injects a target material toward a plasma generation point; an electric charge supply unit that charges the injected target material; an acceleration unit that accelerates the charged target material; a laser oscillator that applies a laser beam to the target material at the plasma generation point to generate plasma; and electromagnets that form a magnetic field at the plasma generation point such that the magnetic field has substantially straight lines of magnetic flux in substantially parallel with a traveling direction of the target material in the track of the target material.

摘要翻译： 一种极端的超紫外光源装置，其中既管理将液滴靶向高速激光施加位置提供的机构和捕获由等离子体产生的带电粒子的机制，也不会妨碍目标的轨迹。 该装置包括：向等离子体产生点注入目标材料的目标喷嘴; 电荷供给单元，对注入的目标材料进行充电; 加速单元，加速带电目标材料; 激光振荡器，其在等离子体产生点处将激光束施加到目标材料以产生等离子体; 以及在等离子体产生点处形成磁场的电磁体，使得磁场具有与目标材料的轨道中的目标材料的行进方向基本平行的基本上直线的磁通量。

公开(公告)号：US20050167618A1

公开(公告)日：2005-08-04

申请号：US11014961

申请日：2004-12-20

申请人： Hideo Hoshino ,  Hiroshi Komori ,  Akira Endo

发明人： Hideo Hoshino ,  Hiroshi Komori ,  Akira Endo

IPC分类号： G21K5/00 ,  G03F7/20 ,  G21K5/02 ,  G21K5/08 ,  H01L21/027 ,  H05G2/00 ,  H05H1/24 ,  G01J1/00

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/008

摘要： A light source device capable of extending the life of a collector mirror and reducing running cost by protecting the collector mirror from debris that is considered harmful to a mirror coating while securing the collection solid angle and collection rate of EUV light. The light source device includes a target supply unit for supplying a material to become the target; a laser unit for generating plasma by applying a laser beam to the target; a collection optical system for collecting the extreme ultra violet light radiating from the plasma and emitting the extreme ultra violet light; and magnetic field generating unit for generating a magnetic field within the collection optical system when supplied with current so as to trap charged particles radiating from the plasma.

摘要翻译： 光源装置能够延长收集镜的使用寿命，并通过保护收集镜免受被认为对镜面涂层有害的碎片，同时确保采集立体角和EUV光的收集速率，从而降低运行成本。 光源装置包括用于供给成为靶的材料的目标供给单元; 用于通过向目标物施加激光束来产生等离子体的激光单元; 用于收集从等离子体辐射并发射极紫外光的极紫外光的收集光学系统; 以及磁场产生单元，用于当被提供电流时在收集光学系统内产生磁场，以便捕获从等离子体辐射的带电粒子。

公开(公告)号：US20110101863A1

公开(公告)日：2011-05-05

申请号：US12547896

申请日：2009-08-26

申请人： Hiroshi Komori ,  Tatsuya Yanagida ,  Yoshifumi Ueno ,  Akira Sumitani ,  Akira Endo ,  Tsukasa Hori

发明人： Hiroshi Komori ,  Tatsuya Yanagida ,  Yoshifumi Ueno ,  Akira Sumitani ,  Akira Endo ,  Tsukasa Hori

IPC分类号： H01J7/00

CPC分类号： G21K5/00 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation.

摘要翻译： EUV（Extreme Ultra Violet）光源装置将离子发生器中的目标材料离子化，并将电离靶材材料提供到产生等离子体的点。 这减少了碎片的产生。 离子发生器同时将与激发的锡水平相对应的多个波长的激光束照射在目标材料上以电离目标材料。 电离目标材料从离子束提取器施加的高电压从电离器中提取，并被加速并提供给等离子体产生室。 当驱动激光束照射在电离靶材上时，产生等离子体，从而发射EUV辐射。