Two Layer Ag Process For Low Emissivity Coatings
    11.
    发明申请
    Two Layer Ag Process For Low Emissivity Coatings 审中-公开
    用于低发射率涂层的两层Ag工艺

    公开(公告)号:US20140170434A1

    公开(公告)日:2014-06-19

    申请号:US13715709

    申请日:2012-12-14

    CPC classification number: G02B1/10 Y10T428/12056 Y10T428/12611

    Abstract: Two layer silver process comprising a silver layer deposited on a doped silver layer can improve the adhesion of the silver layer on a substrate, minimizing agglomeration to provide a high quality silver layer. The doped silver layer can comprise silver and a doping element that has lower enthalpy of formation with oxide than that of silver, leading to better bonding with oxygen in the substrate.

    Abstract translation: 包含沉积在掺杂银层上的银层的双层银方法可以改善银层在基片上的附着力,最小化附聚以提供高质量的银层。 掺杂的银层可以包含银和掺杂元素,其掺杂元素具有比银更低的氧化物形成焓,导致与衬底中的氧更好的结合。

    METHOD OF GENERATING HIGH PURITY BISMUTH OXIDE
    12.
    发明申请
    METHOD OF GENERATING HIGH PURITY BISMUTH OXIDE 审中-公开
    生成高纯度氧化铝的方法

    公开(公告)号:US20130136921A1

    公开(公告)日:2013-05-30

    申请号:US13738563

    申请日:2013-01-10

    Abstract: A method for forming and protecting high quality bismuth oxide films comprises depositing a transparent thin film on a substrate comprising one of Si, alkali metals, or alkaline earth metals. The transparent thin film is stable at room temperature and at higher temperatures and serves as a diffusion barrier for the diffusion of impurities from the substrate into the bismuth oxide. Reactive sputtering, sputtering from a compound target, or reactive evaporation are used to deposit a bismuth oxide film above the diffusion barrier.

    Abstract translation: 用于形成和保护高质量氧化铋膜的方法包括在包含Si,碱金属或碱土金属之一的衬底上沉积透明薄膜。 透明薄膜在室温和较高温度下是稳定的,并且用作扩散阻挡层,用于将杂质从基底扩散到氧化铋中。 使用反应溅射,来自化合物靶的溅射或反应性蒸发来在扩散阻挡层上沉积氧化铋膜。

    Heat stable SnAl and SnMg based dielectrics
    13.
    发明授权
    Heat stable SnAl and SnMg based dielectrics 有权
    耐热SnAl和SnMg基电介质

    公开(公告)号:US09296651B2

    公开(公告)日:2016-03-29

    申请号:US14299341

    申请日:2014-06-09

    Abstract: A transparent dielectric composition comprising tin, oxygen and one of aluminum or magnesium with preferably higher than 15% by weight of aluminum or magnesium offers improved thermal stability over tin oxide with respect to appearance and optical properties under high temperature processes. For example, upon a heat treatment at temperatures higher than 500 C, changes in color and index of refraction of the present transparent dielectric composition are noticeably less than those of tin oxide films of comparable thickness. The transparent dielectric composition can be used in high transmittance, low emissivity coated panels, providing thermal stability so that there are no significant changes in the coating optical and structural properties, such as visible transmission, IR reflectance, microscopic morphological properties, color appearance, and haze characteristics, of the as-coated and heated treated products.

    Abstract translation: 包含锡,氧和铝或镁中的一种优选高于15重量%的铝或镁的透明电介质组合物相对于在高温过程下的外观和光学性质提供了比氧化锡更好的热稳定性。 例如,当在高于500℃的温度下进行热处理时,本发明透明电介质组合物的颜色变化和折射率显着小于具有相当厚度的氧化锡膜的变化。 透明电介质组合物可用于高透光率,低发射率涂层面板,提供热稳定性,使得涂层的光学和结构性能如可见透射率,IR反射率,微观形态特性,颜色外观和 涂层和加热处理产品的雾度特性。

    Novel silver barrier materials for low-emissivity applications
    16.
    发明申请
    Novel silver barrier materials for low-emissivity applications 有权
    用于低发射率应用的新型银阻挡材料

    公开(公告)号:US20140177042A1

    公开(公告)日:2014-06-26

    申请号:US13725126

    申请日:2012-12-21

    Abstract: A method for making low emissivity panels, including control the composition of a barrier layer formed on a thin conductive silver layer. The barrier structure can include an alloy of a first element having high oxygen affinity with a second element having low oxygen affinity. The first element can include Ta, Nb, Zr, Hf, Mn, Y, Si, and Ti, and the second element can include Ru, Ni, Co, Mo, and W, which can have low oxygen affinity property. The alloy barrier layer can reduce optical absorption in the visible range, can provide color-neutral product, and can improve adhesion to the silver layer.

    Abstract translation: 一种制造低发射率面板的方法,包括控制形成在薄导电银层上的阻挡层的组成。 阻挡结构可以包括具有高氧亲和力的第一元素与具有低氧亲合力的第二元素的合金。 第一元素可以包括Ta,Nb,Zr,Hf,Mn,Y,Si和Ti,第二元素可以包括可以具有低氧亲和性的Ru,Ni,Co,Mo和W。 合金阻挡层可以减少可见光范围内的光吸收,可以提供颜色中性的产品,并可以提高对银层的粘附性。

    Low emissivity coating with optimal base layer material and layer stack
    17.
    发明申请
    Low emissivity coating with optimal base layer material and layer stack 审中-公开
    低发射率涂层,具有最佳的基层材料和层叠

    公开(公告)号:US20140170422A1

    公开(公告)日:2014-06-19

    申请号:US13715588

    申请日:2012-12-14

    Abstract: A method for making low emissivity panels, including forming a base layer to promote a seed layer for a conductive silver layer. The base layer can be an amorphous layer or a nanocrystalline layer, which can facilitate zinc oxide seed layer growth, together with smoother surface and improved thermal stability. The base layer can include doped tin oxide, for example, tin oxide doped with Al, Ga, In, Mg, Ca, Sr, Sb, Bi, Ti, V, Y, Zr, Nb, Hf, Ta, or any combination thereof. The doped tin oxide base layer can influence the growth of (002) crystallographic orientation in zinc oxide, which in turn serves as a seed layer template for silver (111).

    Abstract translation: 一种制造低发射率面板的方法,包括形成基底层以促进导电银层的种子层。 基层可以是非晶层或纳米晶层,其可以促进氧化锌种子层生长,以及更平滑的表面和改善的热稳定性。 基底层可以包括掺杂的氧化锡,例如掺杂有Al,Ga,In,Mg,Ca,Sr,Sb,Bi,Ti,V,Y,Zr,Nb,Hf,Ta或其任何组合的氧化锡 。 掺杂的氧化锡基层可以影响氧化锌中(002)晶体取向的生长,其又用作银(111)的种子层模板。

    pvd chamber and process for over-coating layer to improve emissivity for low emissivity coating
    19.
    发明申请
    pvd chamber and process for over-coating layer to improve emissivity for low emissivity coating 审中-公开
    pvd室和过涂层的过程,以提高低辐射率涂层的发射率

    公开(公告)号:US20140170338A1

    公开(公告)日:2014-06-19

    申请号:US13714797

    申请日:2012-12-14

    CPC classification number: C23C14/3492 C23C14/024 C23C14/185

    Abstract: A method for making low emissivity panels, including control the ion characteristics, such as ion energy, ion density and ion to neutral ratio, in a sputter deposition process of a layer deposited on a thin conductive silver layer. The ion control can prevent or minimize degrading the quality of the conductive silver layer, which can lead to better transmittance in visible regime, block more heat transfer from the low emissivity panels, and potentially can reduce the requirements for other layers, so that the overall performance, such as durability, could be improved.

    Abstract translation: 在沉积在薄导电银层上的层的溅射沉积工艺中,制备低辐射率面板的方法,包括控制离子特性,例如离子能量,离子密度和离子与中性比。 离子控制可以防止或最小化降低导电银层的质量,这可以导致在可见状态下更好的透射率,阻止来自低辐射面板的更多的热传递,并且潜在地可以减少对其它层的要求,使得整体 可以提高性能,如耐久性。

    Silver barrier materials for low-emissivity applications
    20.
    发明授权
    Silver barrier materials for low-emissivity applications 有权
    用于低发射率应用的银屏障材料

    公开(公告)号:US09448345B2

    公开(公告)日:2016-09-20

    申请号:US13725126

    申请日:2012-12-21

    Abstract: A method for making low emissivity panels, including control the composition of a barrier layer formed on a thin conductive silver layer. The barrier structure can include an alloy of a first element having high oxygen affinity with a second element having low oxygen affinity. The first element can include Ta, Nb, Zr, Hf, Mn, Y, Si, and Ti, and the second element can include Ru, Ni, Co, Mo, and W, which can have low oxygen affinity property. The alloy barrier layer can reduce optical absorption in the visible range, can provide color-neutral product, and can improve adhesion to the silver layer.

    Abstract translation: 一种制造低发射率面板的方法,包括控制形成在薄导电银层上的阻挡层的组成。 阻挡结构可以包括具有高氧亲和力的第一元素与具有低氧亲合力的第二元素的合金。 第一元素可以包括Ta,Nb,Zr,Hf,Mn,Y,Si和Ti,第二元素可以包括可以具有低氧亲和性的Ru,Ni,Co,Mo和W。 合金阻挡层可以减少可见光范围内的光吸收,可以提供颜色中性的产品,并可以提高对银层的粘附性。

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