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62 条记录 (耗时 0.043 秒)

    Resist composition and patterning method
    11.
    发明授权
    Resist composition and patterning method 有权
    抗蚀剂组成和图案化方法

    公开(公告)号：US06818148B1

    公开(公告)日：2004-11-16

    申请号：US09401490

    申请日：1999-09-22

    申请人： Satoshi Watanabe ,  Toyohisa Sakurada ,  Yoshitaka Yanagi ,  Shigehiro Nagura ,  Toshinobu Ishihara

    发明人： Satoshi Watanabe ,  Toyohisa Sakurada ,  Yoshitaka Yanagi ,  Shigehiro Nagura ,  Toshinobu Ishihara

    IPC分类号： C09K1300

    CPC分类号： G03F7/0048

    摘要： A resist composition is provided comprising a fluorochemical surfactant which functions to reduce the contact angle of a coating of the resist composition with water or an aqueous base developer as the amount of the fluorochemical surfactant increases. The resist composition forms a coating having a thickness uniformity, free of defects, and wettable with an aqueous base developer when applied onto a substrate, and has a good storage stability in that particles do not increase during storage in solution form.

    摘要翻译： 提供了一种抗蚀剂组合物，其包括含氟化学表面活性剂，其功能是随着含氟表面活性剂的量的增加，抗蚀剂组合物的涂层与水或碱性显影剂水溶液的接触角降低。 抗蚀剂组合物形成具有厚度均匀性，无缺陷的涂层，并且当涂覆在基材上时可用基础显影剂水溶液润湿，并且具有良好的储存稳定性，因为在溶液形式储存期间颗粒不增加。

    Partially hydrogenated polymers and chemically amplified positive resist compositions
    12.
    发明授权
    Partially hydrogenated polymers and chemically amplified positive resist compositions 失效
    部分氢化聚合物和化学增幅阳性抗蚀剂组合物

    公开(公告)号：US6033828A

    公开(公告)日：2000-03-07

    申请号：US12583

    申请日：1998-01-26

    申请人： Junji Shimada ,  Osamu Watanabe ,  Satoshi Watanabe ,  Shigehiro Nagura ,  Toshinobu Ishihara

    发明人： Junji Shimada ,  Osamu Watanabe ,  Satoshi Watanabe ,  Shigehiro Nagura ,  Toshinobu Ishihara

    IPC分类号： C08F8/04 ,  G03F7/004 ,  G03F7/039 ,  G03C1/492 ,  C08F12/08 ,  C08F12/24

    CPC分类号： G03F7/039 ,  C08F8/04 ,  G03F7/0045

    摘要： A polymer comprising recurring units of formula (1) is provided wherein some of the hydrogen atoms of phenolic hydroxyl groups and/or alcoholic hydroxyl groups are replaced by acid labile groups. The polymer is crosslinked within a molecule and/or between molecules with a crosslinking group having a C--O--C linkage resulting from reaction of some of the remaining phenolic hydroxyl groups and/or alcoholic hydroxyl groups with an alkenyl ether compound or halogenated alkyl ether compound. The amount of the acid labile group and the crosslinking group combined is on the average from more than 0 mol % to 80 mol % of the entirety of the phenolic hydroxyl group and alcoholic hydroxyl group. The polymer has Mw of 1,000-500,000. ##STR1## R.sup.1 is H or methyl, R.sup.2 is C.sub.1 -C.sub.8 alkyl, letter x is 0 or a positive integer, y is a positive integer, x+y.ltoreq.5, letters p and q are positive numbers satisfying p+q=1 and 0

    摘要翻译： 提供了包含式（1）的重复单元的聚合物，其中酚羟基和/或醇羟基的一些氢原子被酸不稳定基团取代。 聚合物在分子内和/或分子之间交联，具有由一些残留的酚羟基和/或醇羟基与链烯基醚化合物或卤代烷基醚化合物的反应产生的具有C-O-C键的交联基团。 酸不稳定基团和交联基团的用量平均为全部酚羟基和醇羟基的0摩尔％至80摩尔％以上。 聚合物的Mw为1,000-500,000。 R1是H或甲基，R2是C1-C8烷基，字母x是0或正整数，y是正整数，x + y <5，字母p和q是满足p + q = 1的正数， 0

    Contact lens comprising trimethylvinylsilane polymer
    14.
    发明授权
    Contact lens comprising trimethylvinylsilane polymer 失效
    隐形眼镜包括三甲基乙烯基硅烷聚合物

    公开(公告)号：US4649185A

    公开(公告)日：1987-03-10

    申请号：US798757

    申请日：1985-11-15

    申请人： Minoru Takamizawa ,  Akira Yamamoto ,  Toshinobu Ishihara ,  Shigehiro Nagura

    发明人： Minoru Takamizawa ,  Akira Yamamoto ,  Toshinobu Ishihara ,  Shigehiro Nagura

    IPC分类号： C08F30/00 ,  C08F30/08 ,  C08G77/00 ,  C08G77/42 ,  G02B1/04 ,  G02C7/04

    CPC分类号： C08F30/08 ,  G02B1/043

    摘要： The contact lens of the invention is shaped of a poly(trimethylvinylsilane) resin having an average molecular weight of at least 200,000 or a copolymer based thereon. The contact lens has a very high oxygen permeability comparable to conventional transparent silicone rubbers so as to ensure a long time of continued wearing of the lens on the cornea with no adverse physiological influences and the material still has much better mechanical workability for precision shaping into a lens form than the transparent silicone rubbers.

    摘要翻译： 本发明的隐形眼镜成型为平均分子量至少为200,000的聚（三甲基乙烯基硅烷）树脂或基于其的共聚物。 隐形眼镜具有与传统的透明硅橡胶相当的非常高的氧透过率，以便确保镜片在角膜上持续磨损的长时间，没有不利的生理影响，并且该材料仍然具有更好的机械加工性，用于精确成形为 透镜形式比透明硅橡胶。

    Chemically amplified positive resist composition
    15.
    发明授权
    Chemically amplified positive resist composition 失效
    化学放大正光刻胶组合物

    公开(公告)号：US5876900A

    公开(公告)日：1999-03-02

    申请号：US831300

    申请日：1997-04-01

    申请人： Satoshi Watanabe ,  Toshinobu Ishihara ,  Shigehiro Nagura ,  Tsuguo Yamaoka

    发明人： Satoshi Watanabe ,  Toshinobu Ishihara ,  Shigehiro Nagura ,  Tsuguo Yamaoka

    IPC分类号： G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03F7/029 ,  G03F7/033

    CPC分类号： G03F7/0392 ,  G03F7/0045 ,  Y10S430/106

    摘要： A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polyhydroxystyrene having phenolic hydroxyl groups some of which are protected with alkoxyalkyl groups and having a weight-average molecular weight of 3,000-300,000 and a dispersity of 1.0 to 1.5, (C) a photoacid generator, and (D) a vinyl ether group-containing compound. The composition is sensitive to actinic radiation, especially KrF excimer laser beam, has high sensitivity and resolution, and forms a resist pattern having improved plasma etching resistance and heat resistance.

    摘要翻译： 化学放大型正性抗蚀剂组合物含有（A）有机溶剂，（B）具有酚羟基的聚羟基苯乙烯形式的基础树脂，其中一些被羟基烷基保护，并且其重均分子量为3,000-300,000 分散度为1.0〜1.5，（C）光致酸产生剂，（D）含乙烯基醚基的化合物。 该组合物对光化辐射敏感，特别是KrF准分子激光束，具有高灵敏度和分辨率，并且形成具有改善的等离子体耐蚀刻性和耐热性的抗蚀剂图案。

    Chemically amplified positive resist composition
    18.
    发明授权
    Chemically amplified positive resist composition 失效
    化学放大正光刻胶组合物

    公开(公告)号：US6106993A

    公开(公告)日：2000-08-22

    申请号：US114067

    申请日：1998-07-13

    申请人： Satoshi Watanabe ,  Osamu Watanabe ,  Shigehiro Nagura ,  Toshinobu Ishihara

    发明人： Satoshi Watanabe ,  Osamu Watanabe ,  Shigehiro Nagura ,  Toshinobu Ishihara

    IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106

    摘要： A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin, (C) a photoacid generator, and optionally, (D) a dissolution rate regulator. The base resin (B) is a hydroxystyrene copolymer having different acid labile groups and Mw of 3,000-300,000. The resist composition is highly sensitive to actinic radiation such as deep-UV, electron beam and X-ray, can be developed with aqueous base to form a pattern, and is thus suitable for use in a fine patterning technique.

    摘要翻译： 化学放大正性抗蚀剂组合物包含（A）有机溶剂，（B）基础树脂，（C）光致酸产生剂，和任选的（D）溶出速率调节剂。 基础树脂（B）是具有不同酸不稳定基团和Mw为3,000-300,000的羟基苯乙烯共聚物。 抗蚀剂组合物对光化辐射如深UV，电子束和X射线高度敏感，可以用碱水溶液显影以形成图案，因此适用于精细图案化技术。

    Polymers and chemically amplified positive resist compositions
    20.
    发明授权
    Polymers and chemically amplified positive resist compositions 失效
    聚合物和化学增幅阳性抗蚀剂组合物

    公开(公告)号：US06156477A

    公开(公告)日：2000-12-05

    申请号：US13270

    申请日：1998-01-26

    申请人： Kiyoshi Motomi ,  Osamu Watanabe ,  Satoshi Watanabe ,  Shigehiro Nagura ,  Toshinobu Ishihara

    发明人： Kiyoshi Motomi ,  Osamu Watanabe ,  Satoshi Watanabe ,  Shigehiro Nagura ,  Toshinobu Ishihara

    IPC分类号： C08F8/00 ,  G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/039 ,  C08F8/14 ,  G03F7/0045 ,  C08F2800/20 ,  C08F2810/20 ,  Y10S430/106 ,  Y10S430/111

    摘要： A polymer comprising recurring units of formula (1) is provided wherein some hydrogen atoms of phenolic hydroxyl groups and/or carboxyl groups are replaced by acid labile groups. The polymer is crosslinked with a crosslinking group having a C--O--C linkage resulting from reaction of some of the remaining phenolic hydroxyl groups and/or carboxyl groups with an alkenyl ether compound or halogenated alkyl ether compound. The amount of the acid labile group and the crosslinking group combined is on the average from more than 0 mol % to 80 mol % of the entirety of the phenolic hydroxyl group and carboxyl group. The polymer has Mw of 1,000-500,000. R.sup.1 is H or methyl, R.sup.2 is C.sub.1 -C.sub.8 alkyl, R.sup.3 is H, R.sup.4 is --COOR.sup.5, C.sub.1 -C.sub.5 alkyl or phenyl, or R.sup.3 and R.sup.4, taken together, may form --COOCO--, R.sup.5 is H or C.sub.1 -C.sub.8 alkyl, x and y are integers satisfying x+y.ltoreq.5, p and q are positive numbers satisfying p+q=1 and 0

    摘要翻译： 提供了包含式（1）的重复单元的聚合物，其中酚羟基和/或羧基的一些氢原子被酸不稳定基团取代。 聚合物与由一些残留的酚羟基和/或羧基与烯基醚化合物或卤代烷基醚化合物反应得到的具有C-O-C键的交联基团交联。 酸不稳定基团和交联基团的用量平均为全部酚羟基和羧基的0摩尔％至80摩尔％以上。 聚合物的Mw为1,000-500,000。 R1是H或甲基，R2是C1-C8烷基，R3是H，R4是-COOR5，C1-C5烷基或苯基，或R3和R4一起可以形成-COOCO-，R5是H或C1-C8 烷基，x和y是满足x + y <5的整数，p和q是满足p + q = 1和0