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11.发明公开公开(公告)号：US20240337926A1
公开(公告)日：2024-10-10
申请号：US18745066
申请日：2024-06-17
Applicant: Inpria Corporation
Inventor： Stephen T. Meyers , Jeremy T. Anderson , Joseph B. Edson , Kai Jiang , Douglas A. Keszler , Michael K. Kocsis , Alan J. Telecky , Brian J. Cardineau
CPC classification number: G03F7/0042 , G03F7/0043 , G03F7/2004 , G03F7/32 , G03F7/322 , G03F7/325
Abstract: Organometallic radiation resist compositions are described based on tin ions with alkyl ligands. Some of the compositions have branched alkyl ligands to provide for improved patterning contrast while maintaining a high degree of solution stability. Blends of compounds with distinct alkyl ligands can provide further improvement in the patterning. High resolution patterning with a half-pitch of no more than 25 nm can be achieved with a line width roughness of no more than about 4.5 nm. Synthesis techniques have been developed that allow for the formation of alkyl tin oxide hydroxide compositions with very low metal contamination.
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公开(公告)号：US12032291B2
公开(公告)日：2024-07-09
申请号：US17682639
申请日：2022-02-28
Applicant: Inpria Corporation
Inventor： Robert E. Jilek , Kai Jiang , Amrit K. Narasimhan
Abstract: As described herein, photosensitive composition comprises RSnL3, where R is a hydrocarbyl ligand with 1-20 carbon atoms and one or more silicon and/or germanium heteroatoms and L is an acetylide ligand (—C≡CA, where A is a silyl group with 0 to 6 carbon atoms or an organo group with 1 to 10 carbon atoms). Methods are described wherein photosensitive compositions are synthesized by reacting RX, where X is a halide, and MSnL3, where M is an alkali metal, alkali earth metal or a pseudo-alkali earth metal, L is an acetylide or a dialkylamide. The radiation sensitive compositions are effective for radiation based patterning, such as with EUV light.
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公开(公告)号：US11988958B2
公开(公告)日：2024-05-21
申请号：US16536768
申请日：2019-08-09
Applicant: Inpria Corporation
Inventor： Stephen T. Meyers , Douglas A. Keszler , Kai Jiang , Jeremy T. Anderson , Andrew Grenville
CPC classification number: G03F7/0042 , G03F7/0043 , G03F7/09 , G03F7/20 , G03F7/2002 , G03F7/2037 , G03F7/30 , G03F7/32 , G03F7/322 , G03F7/325
Abstract: Organometallic solutions have been found to provide high resolution radiation based patterning using thin coatings. The patterning can involve irradiation of the coated surface with a selected pattern and developing the pattern with a developing agent to form the developed image. The patternable coatings may be susceptible to positive-tone patterning or negative-tone patterning based on the use of an organic developing agent or an aqueous acid or base developing agent. The radiation sensitive coatings can comprise a metal oxo/hydroxo network with organic ligands. A precursor solution can comprise an organic liquid and metal polynuclear oxo-hydroxo cations with organic ligands having metal carbon bonds and/or metal carboxylate bonds.
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公开(公告)号：US10732505B1
公开(公告)日：2020-08-04
申请号：US16861333
申请日：2020-04-29
Applicant: Inpria Corporation
Inventor： Stephen T. Meyers , Jeremy T. Anderson , Brian J. Cardineau , Joseph B. Edson , Kai Jiang , Douglas A. Keszler , Alan J. Telecky
Abstract: Organometallic precursors are described for the formation of high resolution lithography patterning coatings based on metal oxide hydroxide chemistry. The precursor compositions generally comprise ligands readily hydrolysable by water vapor or other OH source composition under modest conditions. The organometallic precursors generally comprise a radiation sensitive organo ligand to tin that can result in a coating that can be effective for high resolution patterning at relatively low radiation doses and is particularly useful for EUV patterning. The precursors compositions are readily processable under commercially suitable conditions. Solution phase processing with in situ hydrolysis or vapor based deposition can be used to form the coatings.
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15.发明申请公开(公告)号：US20190153001A1
公开(公告)日：2019-05-23
申请号：US16194491
申请日：2018-11-19
Applicant: Inpria Corporation
Inventor： Brian J. Cardineau , Stephen T. Meyers , Kai Jiang , William Earley
Abstract: Organotin clusters are described with the formula R3Sn3(O2CR′)5-x(OH)2+x(μ3-O) with 0≤x
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Patent Agency Ranking
公开(公告)号：US20180307137A1
公开(公告)日：2018-10-25
申请号：US16007242
申请日：2018-06-13
Applicant: Inpria Corporation
Inventor： Stephen T. Meyers , Douglas A. Keszler , Kai Jiang , Jeremy T. Anderson , Andrew Grenville
CPC classification number: G03F7/0042 , G03F7/0043 , G03F7/09 , G03F7/20 , G03F7/2002 , G03F7/2037 , G03F7/30 , G03F7/32 , G03F7/322 , G03F7/325
Abstract: Organometallic solutions have been found to provide high resolution radiation based patterning using thin coatings. The patterning can involve irradiation of the coated surface with a selected pattern and developing the pattern with a developing agent to form the developed image. The patternable coatings may be susceptible to positive-tone patterning or negative-tone patterning based on the use of an organic developing agent or an aqueous acid or base developing agent. The radiation sensitive coatings can comprise a metal oxo/hydroxo network with organic ligands. A precursor solution can comprise an organic liquid and metal polynuclear oxo-hydroxo cations with organic ligands having metal carbon bonds and/or metal carboxylate bonds.
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公开(公告)号：US20250093773A1
公开(公告)日：2025-03-20
申请号：US18970543
申请日：2024-12-05
Applicant: Inpria Corporation
Inventor： Stephen T. Meyers , Douglas A. Keszler , Kai Jiang , Jeremy T. Anderson , Andrew Grenville
Abstract: Organometallic solutions have been found to provide high resolution radiation based patterning using thin coatings. The patterning can involve irradiation of the coated surface with a selected pattern and developing the pattern with a developing agent to form the developed image. The patternable coatings may be susceptible to positive-tone patterning or negative-tone patterning based on the use of an organic developing agent or an aqueous acid or base developing agent. The radiation sensitive coatings can comprise a metal oxo/hydroxo network with organic ligands. A precursor solution can comprise an organic liquid and metal polynuclear oxo-hydroxo cations with organic ligands having metal carbon bonds and/or metal carboxylate bonds.
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18.发明公开公开(公告)号：US20240337941A1
公开(公告)日：2024-10-10
申请号：US18654160
申请日：2024-05-03
Applicant: Inpria Corporation
Inventor： Robert E. Jilek , Kai Jiang , Amrit K. Narasimhan
Abstract: As described herein, photosensitive composition comprises RSnL3, where R is a hydrocarbyl ligand with 1-20 carbon atoms and one or more silicon and/or germanium heteroatoms and L is an acetylide ligand (—C≡CA, where A is a silyl group with 0 to 6 carbon atoms or an organo group with 1 to 10 carbon atoms). Methods are described wherein photosensitive compositions are synthesized by reacting RX, where X is a halide, and MSnL3, where M is an alkali metal, alkali earth metal or a pseudo-alkali earth metal, L is an acetylide or a dialkylamide. The radiation sensitive compositions are effective for radiation based patterning, such as with EUV light.
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19.发明公开公开(公告)号：US20240280897A1
公开(公告)日：2024-08-22
申请号：US18634119
申请日：2024-04-12
Applicant: Inpria Corporation
Inventor： Stephen T. Meyers , Jeremy T. Anderson , Joseph B. Edson , Kai Jiang , Douglas A. Keszler , Michael K. Kocsis , Alan J. Telecky , Brian J. Cardineau
CPC classification number: G03F7/0042 , G03F7/0043 , G03F7/2004 , G03F7/32 , G03F7/322 , G03F7/325
Abstract: Organometallic radiation resist compositions are described based on tin ions with alkyl ligands. Some of the compositions have branched alkyl ligands to provide for improved patterning contrast while maintaining a high degree of solution stability. Blends of compounds with distinct alkyl ligands can provide further improvement in the patterning. High resolution patterning with a half-pitch of no more than 25 nm can be achieved with a line width roughness of no more than about 4.5 nm. Synthesis techniques have been developed that allow for the formation of alkyl tin oxide hydroxide compositions with very low metal contamination.
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20.发明授权公开(公告)号：US11988959B2
公开(公告)日：2024-05-21
申请号：US17705795
申请日：2022-03-28
Applicant: Inpria Corporation
Inventor： Stephen T. Meyers , Jeremy T. Anderson , Joseph B. Edson , Kai Jiang , Douglas A. Keszler , Michael K Kocsis , Alan J. Telecky , Brian J. Cardineau
CPC classification number: G03F7/0042 , G03F7/0043 , G03F7/2004 , G03F7/32 , G03F7/322 , G03F7/325
Abstract: Organometallic radiation resist compositions are described based on tin ions with alkyl ligands. Some of the compositions have branched alkyl ligands to provide for improved patterning contrast while maintaining a high degree of solution stability. Blends of compounds with distinct alkyl ligands can provide further improvement in the patterning. High resolution patterning with a half-pitch of no more than 25 nm can be achieved with a line width roughness of no more than about 4.5 nm. Synthesis techniques have been developed that allow for the formation of alkyl tin oxide hydroxide compositions with very low metal contamination.
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