"> METHOD AND APPARATUS FOR ENHANCING GUARDBANDS USING
    13.
    发明申请
    METHOD AND APPARATUS FOR ENHANCING GUARDBANDS USING "IN-SITU" SILICON MEASUREMENTS 审中-公开
    使用“现场”硅测量来增强保护的方法和装置

    公开(公告)号:US20160285434A1

    公开(公告)日:2016-09-29

    申请号:US14667365

    申请日:2015-03-24

    CPC classification number: G01R31/2637 G06F1/3203 H01L22/34 H01L23/58

    Abstract: A method and apparatus (e.g., semiconductor device) for setting voltages (e.g., guardbands) using “in situ,” or on-die, silicon measurements are described. In one embodiment the semiconductor device comprises: a process monitor to measure silicon parameters of the semiconductor device; and a controller coupled to the process monitor to set a voltage for use on at least a portion of the semiconductor device based on silicon process monitor measurements.

    Abstract translation: 描述了使用“原地”或芯片上的硅测量来设置电压(例如,保护带)的方法和装置(例如,半导体器件)。 在一个实施例中,半导体器件包括:测量半导体器件的硅参数的工艺监控器; 以及控制器,其耦合到所述过程监视器,以基于硅过程监视器测量来设置在所述半导体器件的至少一部分上使用的电压。

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