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25 条记录 (耗时 0.022 秒)

    Method for removing a contamination layer from an optical surface and arrangement therefor as well as a method for generating a cleaning gas and arrangement therefor
    11.
    发明授权
    Method for removing a contamination layer from an optical surface and arrangement therefor as well as a method for generating a cleaning gas and arrangement therefor 有权
    用于从光学表面除去污染层的方法及其设置方法以及用于产生清洁气体的方法及其装置

    公开(公告)号：US08419862B2

    公开(公告)日：2013-04-16

    申请号：US12662840

    申请日：2010-05-06

    申请人： Dirk Heinrich Ehm ,  Arnold Storm ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn ,  Thomas Stein ,  Edwin te Sligte

    发明人： Dirk Heinrich Ehm ,  Arnold Storm ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn ,  Thomas Stein ,  Edwin te Sligte

    IPC分类号： B08B5/00 ,  A47L5/05

    CPC分类号： B08B5/02 ,  B08B7/00 ,  G03F7/70925

    摘要： The invention is directed to a method for at least partially removing a contamination layer (15) from an optical surface (14a) of an EUV-reflective optical element (14) by bringing a cleaning gas into contact with the contamination layer. In the method, a jet (20) of cleaning gas is directed to the contamination layer (15) for removing material from the contamination layer (15). The contamination layer (15) is monitored for generating a signal indicative of the thickness of the contamination layer (15) and the jet (20) of cleaning gas is controlled by moving the jet (20) of cleaning gas relative to the optical surface (14a) using this signal as a feedback signal. A cleaning arrangement (19 to 24) for carrying out the method is also disclosed. The invention also relates to a method for generating a jet (20) of cleaning gas and to a corresponding cleaning gas generation arrangement.

    摘要翻译： 本发明涉及通过使清洁气体与污染层接触来至少部分地从EUV反射型光学元件（14）的光学表面（14a）去除污染物层（15）的方法。 在该方法中，将清洁气体的喷嘴（20）引导到污染层（15），以从污染层（15）去除材料。 监测污染层（15）以产生指示污染层（15）的厚度的信号，并且通过相对于光学表面移动清洁气体的喷嘴（20）来控制清洁气体的喷射（20） 14a）使用该信号作为反馈信号。 还公开了一种用于执行该方法的清洁装置（19至24）。 本发明还涉及一种用于产生清洁气体的喷嘴（20）和相应的清洁气体产生装置的方法。

    Lithographic apparatus and method
    12.
    发明申请
    Lithographic apparatus and method 审中-公开
    平版印刷设备和方法

    公开(公告)号：US20080151201A1

    公开(公告)日：2008-06-26

    申请号：US11643776

    申请日：2006-12-22

    申请人： Arnoldus Jan Storm ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn ,  Dirk Heinrich Ehm

    发明人： Arnoldus Jan Storm ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn ,  Dirk Heinrich Ehm

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70925 ,  G03F7/70058 ,  G03F7/70916

    摘要： A lithographic apparatus that includes an illumination system configured to condition a radiation beam. The illumination system includes a plurality of optical components. The apparatus also includes a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus further includes a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The projection system includes a plurality of optical components. The apparatus also includes a contamination measurement unit for measuring contamination of a surface of at least one of the optical components. The contamination measurement unit is provided with a radiation sensor constructed and arranged to measure an optical characteristic of radiation received from the surface.

    摘要翻译： 一种光刻设备，包括配置成调节辐射束的照明系统。 照明系统包括多个光学部件。 该装置还包括构造成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 该装置还包括被构造成保持基板的基板台，以及配置成将图案化的辐射束投影到基板的目标部分上的投影系统。 投影系统包括多个光学部件。 该装置还包括用于测量至少一个光学部件的表面的污染物的污染测量单元。 污染测量单元设置有辐射传感器，其被构造和布置成测量从表面接收的辐射的光学特性。

    Optical apparatus, lithographic apparatus and device manufacturing method
    16.
    发明授权
    Optical apparatus, lithographic apparatus and device manufacturing method 失效
    光学设备，光刻设备和器件制造方法

    公开(公告)号：US07935218B2

    公开(公告)日：2011-05-03

    申请号：US11643955

    申请日：2006-12-22

    申请人： Johannes Hubertus Josephina Moors ,  Vadim Yevgenyevich Banine ,  Bastiaan Theodoor Wolschrijn ,  Carolus Ida Maria Antonius Spee ,  Rik Jansen

    发明人： Johannes Hubertus Josephina Moors ,  Vadim Yevgenyevich Banine ,  Bastiaan Theodoor Wolschrijn ,  Carolus Ida Maria Antonius Spee ,  Rik Jansen

    IPC分类号： C23F1/00

    CPC分类号： G03F7/2043 ,  G03F7/70041 ,  G03F7/70925

    摘要： An optical apparatus includes an illumination system configured to form a pulsed radiation beam, an optical element with a surface on which the radiation beam is incident in operation, and a gas source arranged to supply a mixture of a first type of gas and a second type of gas to a space adjacent the surface. Particles of the first and second types of gas are capable of reacting with the surface, when activated by the radiation beam. The gas source is configured to generate a combination of surface occupation numbers of molecules of the first and second types of gas on the surface under operating conditions, at least prior to pulses of the radiation beam, the combination of surface occupation numbers lying in a range in which reactions of particles with the surface during pulses of the radiation beam are in majority reversed.

    摘要翻译： 光学装置包括被配置为形成脉冲辐射束的照明系统，具有辐射束在其中入射的表面的光学元件，以及设置成供应第一类型气体和第二类型的混合物的气体源 的气体到邻近表面的空间。 当由辐射束激活时，第一和第二类气体的颗粒能够与表面反应。 气源被配置成至少在辐射束的脉冲之前，在工作条件下，在表面上产生第一和第二类气体的分子的表面占有数量的组合，表面占有数的组合在一个范围内 其中在辐射束的脉冲期间颗粒与表面的反应多数反转。