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公开(公告)号：US08598550B2
公开(公告)日：2013-12-03
申请号：US13365758
申请日：2012-02-03
申请人： Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Johannes Bernardus Ridder , Harm-Jan Voorma , Carolus Ida Maria Antonius Spee , Klaas Timmer
发明人： Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Johannes Bernardus Ridder , Harm-Jan Voorma , Carolus Ida Maria Antonius Spee , Klaas Timmer
IPC分类号： G03B7/20
CPC分类号： G03B7/20 , B08B7/00 , G01J1/0271 , G03F7/70175 , G03F7/70916 , G03F7/70925 , G03F7/70975
摘要： A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.
摘要翻译： 提供了一种具有辐射收集器，盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁，这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件：设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口，其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。
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2.发明申请PLASMA RADIATION SOURCE, METHOD OF FORMING PLASMA RADIATION, APPARATUS FOR PROJECTING A PATTERN FROM A PATTERNING DEVICE ONTO A SUBSTRATE AND DEVICE MANUFACTURING METHOD 失效等离子体辐射源，形成等离子体辐射的方法，用于将图案从图案化装置投影到基板上的装置和装置制造方法公开(公告)号：US20110031866A1
公开(公告)日：2011-02-10
申请号：US12907135
申请日：2010-10-19
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70916 , H05G2/005
摘要： A patterned beam of radiation is projected onto a substrate. A reflective optical element is used to help form the radiation beam from radiation emitted from a plasma region of a plasma source. In the plasma source, a plasma current is generated in the plasma region. To reduce damage to the reflective optical element, a magnetic field is applied in the plasma region with at least a component directed along a direction of the plasma current. This axial magnetic field helps limit the collapse of the Z-pinch region of the plasma. By limiting the collapse, the number of fast ions emitted may be reduced.
摘要翻译： 将图案化的辐射束投影到基底上。 反射光学元件用于帮助从等离子体源的等离子体区域发射的辐射形成辐射束。 在等离子体源中，在等离子体区域中产生等离子体电流。 为了减少对反射光学元件的损伤，在等离子体区域中施加至少一个沿着等离子体电流的方向指向的分量的磁场。 该轴向磁场有助于限制等离子体的Z夹点区域的塌陷。 通过限制塌陷，可以减少发射的快速离子的数量。
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3.发明授权公开(公告)号：US07504643B2
公开(公告)日：2009-03-17
申请号：US11444535
申请日：2006-06-01
申请人： Johannes Maria Freriks , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen
发明人： Johannes Maria Freriks , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70925
摘要： A cleaning arrangement for a lithographic apparatus module may be provided in a collector. The cleaning arrangement includes a hydrogen radical source configured to provide a hydrogen radical containing gas to at least part of the module and a pump configured to pump gas through the module such that a flow speed of the hydrogen radical containing gas provided through at least part of the module is at least 1 m/s. The cleaning arrangement may also include a gas shutter configured to modulate a flow of the hydrogen radical containing gas to at least part of the module, a buffer volume of at least 1 m3 in communication with the module, and a pump configured to provide a gas pressure in the buffer volume between 0.001 mbar (0.1 Pa) and 1 mbar (100 Pa). The cleaning arrangement may further include a gas return system.
摘要翻译： 用于光刻设备模块的清洁装置可以设置在收集器中。 清洁装置包括被配置为向至少部分模块提供含氢自由基气体的氢根源，以及构造成将气体泵送通过模块的泵，使得通过至少部分的至少一部分提供含氢自由基气体的流速 该模块至少为1米/秒。 清洁装置还可以包括配置成将含氢自由基气体的流动调制到模块的至少一部分的气闸，与模块连通的至少1m 3的缓冲体积以及配置成提供气体的泵 缓冲体积在0.001毫巴（0.1帕）至1毫巴（100帕）之间的压力。 清洁装置还可以包括气体返回系统。
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4.发明授权公开(公告)号：US07462851B2
公开(公告)日：2008-12-09
申请号：US11525224
申请日：2006-09-22
申请人： Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Robert Rafilevitch Gayazov , Vladimir Mihailovitch Krivtsun
发明人： Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Robert Rafilevitch Gayazov , Vladimir Mihailovitch Krivtsun
IPC分类号： H01J65/04
摘要： A device for generating radiation source based on a discharge includes a cathode and an anode. A discharge is created in a material comprising an alloy of two or more substances.
摘要翻译： 基于放电产生辐射源的装置包括阴极和阳极。 在包含两种或更多种物质的合金的材料中产生放电。
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5.发明申请Plasma radiation source, method of forming plasma radiation, apparatus for projecting a pattern from a patterning device onto a substrate and device manufacturing method 有权等离子体辐射源，形成等离子体辐射的方法，用于将图案从图案形成装置投影到衬底上的装置和器件制造方法公开(公告)号：US20080142740A1
公开(公告)日：2008-06-19
申请号：US11638670
申请日：2006-12-14
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70916 , H05G2/005
摘要： A patterned beam of radiation is projected onto a substrate. A reflective optical element is used to help form the radiation beam from radiation emitted from a plasma region of a plasma source. In the plasma source, a plasma current is generated in the plasma region. To reduce damage to the reflective optical element, a magnetic field is applied in the plasma region with at least a component directed along a direction of the plasma current. This axial magnetic field helps limit the collapse of the Z-pinch region of the plasma. By limiting the collapse, the number of fast ions emitted may be reduced.
摘要翻译： 将图案化的辐射束投影到基底上。 反射光学元件用于帮助从等离子体源的等离子体区域发射的辐射形成辐射束。 在等离子体源中，在等离子体区域中产生等离子体电流。 为了减少对反射光学元件的损伤，在等离子体区域中施加至少一个沿着等离子体电流的方向指向的分量的磁场。 该轴向磁场有助于限制等离子体的Z夹点区域的塌陷。 通过限制塌陷，可以减少发射的快速离子的数量。
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6.发明授权Plasma radiation source, method of forming plasma radiation, apparatus for projecting a pattern from a patterning device onto a substrate and device manufacturing method 失效等离子体辐射源，形成等离子体辐射的方法，用于将图案从图案形成装置投影到衬底上的装置和器件制造方法公开(公告)号：US08362444B2
公开(公告)日：2013-01-29
申请号：US12907135
申请日：2010-10-19
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70916 , H05G2/005
摘要： A patterned beam of radiation is projected onto a substrate. A reflective optical element is used to help form the radiation beam from radiation emitted from a plasma region of a plasma source. In the plasma source, a plasma current is generated in the plasma region. To reduce damage to the reflective optical element, a magnetic field is applied in the plasma region with at least a component directed along a direction of the plasma current. This axial magnetic field helps limit the collapse of the Z-pinch region of the plasma. By limiting the collapse, the number of fast ions emitted may be reduced.
摘要翻译： 将图案化的辐射束投影到基底上。 反射光学元件用于帮助从等离子体源的等离子体区域发射的辐射形成辐射束。 在等离子体源中，在等离子体区域中产生等离子体电流。 为了减少对反射光学元件的损伤，在等离子体区域中施加至少一个沿着等离子体电流的方向指向的分量的磁场。 该轴向磁场有助于限制等离子体的Z夹点区域的塌陷。 通过限制塌陷，可以减少发射的快速离子的数量。
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7.发明申请TARGET MATERIAL, A SOURCE, AN EUV LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD USING THE SAME 审中-公开目标材料，源，EUV光刻设备及使用其的器件制造方法公开(公告)号：US20110043777A1
公开(公告)日：2011-02-24
申请号：US12933668
申请日：2009-03-20
申请人： Vladimir Mihailovitc Krivtsun , Vadim Yevgenyevich Banine , Arno Jan Bleeker , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Johannes Hubertus Josephina Moors , Sergey Churilov , Denis Glushkov
发明人： Vladimir Mihailovitc Krivtsun , Vadim Yevgenyevich Banine , Arno Jan Bleeker , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Johannes Hubertus Josephina Moors , Sergey Churilov , Denis Glushkov
摘要： A target material is configured to be used in a source constructed and arranged to generate a radiation beam having a wavelength in an extreme ultraviolet range. The target material includes a Gd-based composition configured to modify a melting temperature of Gd.
摘要翻译： 目标材料被配置为用于构造和布置成产生具有极紫外范围波长的辐射束的源。 目标材料包括配置成改变Gd的熔融温度的Gd基组合物。
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公开(公告)号：US20100290015A1
公开(公告)日：2010-11-18
申请号：US12821033
申请日：2010-06-22
申请人： Vadim Yevgenyevich BANINE , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Harm-Jan Voorma , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Carolus Ida Maria Antonius Spee , Klaas Timmer , Johannes Bernardus Ridder
发明人： Vadim Yevgenyevich BANINE , Vladimir Vitalevitch Ivanov , Josephus Jacobus Smits , Harm-Jan Voorma , Lambertus Adrianus Van Den Wildenberg , Vladimir Mihailovitch Krivtsun , Alexander Matthijs Struycken , Carolus Ida Maria Antonius Spee , Klaas Timmer , Johannes Bernardus Ridder
CPC分类号： G03B7/20 , B08B7/00 , G01J1/0271 , G03F7/70175 , G03F7/70916 , G03F7/70925 , G03F7/70975
摘要： A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.
摘要翻译： 提供了一种具有辐射收集器，盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁，这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件：设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口，其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。
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公开(公告)号：US20080137050A1
公开(公告)日：2008-06-12
申请号：US11634386
申请日：2006-12-06
申请人： Vladimir Vitalevitch Ivanov , Vadim Yevgenyevich Banine , Konstantin Nikolaevitch Koshelev , Vladimir Mihailovitch Krivtsun
发明人： Vladimir Vitalevitch Ivanov , Vadim Yevgenyevich Banine , Konstantin Nikolaevitch Koshelev , Vladimir Mihailovitch Krivtsun
摘要： A radiation source is disclosed that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a discharge space between the anode and the cathode and to form a plasma so as to generate electromagnetic radiation, the anode and the cathode being rotatably mounted around an axis of rotation, the cathode being arranged to hold a liquid metal. The radiation source further includes an activation source arranged to direct an energy beam onto the liquid metal so as to vaporize part of the liquid metal and a liquid metal provider arranged to supply additional liquid metal so as to compensate for the vaporized part of the liquid metal.
摘要翻译： 公开了一种辐射源，其包括阳极和阴极，其构造和布置成在阳极和阴极之间的放电空间中的物质中产生放电并形成等离子体以产生电磁辐射，阳极和 阴极围绕旋转轴线可旋转地安装，阴极被布置成保持液态金属。 辐射源还包括激活源，其被布置成将能量束引导到液态金属上，以便使部分液态金属蒸发，并且液态金属提供器被布置成提供附加的液态金属，以便补偿液态金属的汽化部分 。
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10.发明授权Lithographic apparatus, illumination system and method for providing a projection beam of EUV radiation 有权光刻设备，照明系统和提供EUV辐射投影光束的方法公开(公告)号：US07135692B2
公开(公告)日：2006-11-14
申请号：US10727035
申请日：2003-12-04
IPC分类号： A61N5/00
CPC分类号： G03F7/70858 , G03F7/70916
摘要： A lithographic apparatus is disclosed. The lithographic apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The illumination system includes a radiation-production system that produces extreme ultra-violet radiation, and a radiation-collection system that collects extreme ultra-violet radiation. Particles that are produced as a by-product of extreme ultra-violet radiation production move substantially in a particle-movement direction. The radiation-collection system is arranged to collect extreme ultra-violet radiation which radiates in a collection-direction, which is substantially different from the particle-movement direction.
摘要翻译： 公开了一种光刻设备。 光刻设备包括提供辐射束的照明系统和支撑图形结构的支撑结构。 图案形成结构被配置为在其横截面中赋予辐射束图案。 该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。 照明系统包括产生极紫外辐射的辐射生产系统和收集极紫外辐射的辐射收集系统。 作为极紫外线辐射产物的副产物产生的颗粒基本上沿颗粒移动方向移动。 辐射采集系统被布置成收集与收集方向辐射的极微紫外辐射，其与颗粒运动方向基本上不同。
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