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公开(公告)号：US06861197B2
公开(公告)日：2005-03-01
申请号：US10084828
申请日：2002-02-28
申请人： Yuji Harada , Jun Watanabe , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
发明人： Yuji Harada , Jun Watanabe , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
IPC分类号： C08F220/22 , G03F7/004 , G03F7/039
CPC分类号： C08F220/22 , G03F7/0046 , G03F7/0397 , Y10S430/108 , Y10S430/126 , Y10S430/168
摘要： A base polymer having incorporated an ester group having a fluorinated alicyclic unit is provided. A resist composition comprising the polymer is sensitive to high-energy radiation, and has excellent sensitivity at a wavelength of less than 200 nm, significantly improved transparency by virtue of the fluorinated alicyclic units incorporated as well as satisfactory plasma etching resistance. The resist composition has a low absorption at the exposure wavelength of a F2 laser and is ideal as a micropatterning material in VLSI fabrication.
摘要翻译： 提供了具有含有氟化脂环族单元的酯基的基础聚合物。 包含聚合物的抗蚀剂组合物对高能量辐射敏感，并且在小于200nm的波长下具有优异的灵敏度，由于所掺入的氟化脂环族单元以及令人满意的等离子体耐蚀刻性而显着提高了透明度。 抗蚀剂组合物在F2激光的曝光波长处具有低吸收，并且在VLSI制造中是理想的微图案材料。
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公开(公告)号：US06582880B2
公开(公告)日：2003-06-24
申请号：US09947765
申请日：2001-09-07
申请人： Yuji Harada , Jun Watanabe , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
发明人： Yuji Harada , Jun Watanabe , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
IPC分类号： G03F7004
CPC分类号： G03F7/0392 , C08F220/22 , G03F7/0045 , G03F7/0046 , G03F7/0397 , Y10S430/108 , Y10S430/111
摘要： An acrylate resin containing fluorinated alkyl groups in ester side chains has high transmittance to VUV radiation. A resist composition using the resin as a base polymer is sensitive to high-energy radiation, has excellent sensitivity and resolution, and is suited for lithographic microprocessing.
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公开(公告)号：US06333436B1
公开(公告)日：2001-12-25
申请号：US09688365
申请日：2000-10-12
申请人： Matsuo Nakashima , Jun Hatakeyama , Jun Watanabe , Yuji Harada
发明人： Matsuo Nakashima , Jun Hatakeyama , Jun Watanabe , Yuji Harada
IPC分类号： C07C4122
CPC分类号： C07C43/313 , C07C43/225 , C07C69/017 , C07C69/712 , C07C69/96 , C07F7/1804 , Y02P20/55
摘要： Styrene derivatives of formula (1) are novel wherein R1 is H, F, C1-20 alkyl or fluorinated C1-20 alkyl, R2 in cis or trans conformation is F, C1-20 alkyl or fluorinated C1-20 alkyl, R3 is a phenol protecting group, p, q and r are integers in the range of 0≦p
摘要翻译： 式（1）的苯乙烯衍生物是新的，其中R 1是H，F，C 1-20烷基或氟化C 1-20烷基，R 2在顺式或反式构象中是F，C 1-20烷基或氟化C 1-20烷基，R 3是 苯酚保护基，p，q和r为0 <= p <5,0 <= q <5,0
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14.发明授权公开(公告)号：US06835524B2
公开(公告)日：2004-12-28
申请号：US09783321
申请日：2001-02-15
申请人： Jun Hatakeyama , Jun Watanabe , Yuji Harada
发明人： Jun Hatakeyama , Jun Watanabe , Yuji Harada
IPC分类号： G03C173
CPC分类号： C08F20/22 , C08F220/22 , G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/143
摘要： Polymers comprising recurring units of an acrylic derivative of fluorinated backbone represented by formula (1) are novel. R1, R2 and R3 are independently H, F, C1-20 alkyl or fluorinated C1-20 alkyl, at least one of R1, R2 and R3 contains fluorine, and R4 is a hydrophilic group. Using the polymers, chemical amplification positive resist compositions featuring low absorption of F2 excimer laser light are obtained.
摘要翻译： 包含由式（1）表示的氟化主链的丙烯酸衍生物的重复单元的聚合物是新颖的.R 1，R 2和R 3独立地是H，F，C 1-20烷基或氟化C 1-20烷基 ，R 1，R 2和R 3中的至少一个含有氟，R 4是亲水基团。 使用聚合物，得到具有F2准分子激光的低吸收性的化学放大阳性抗蚀剂组合物。
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公开(公告)号：US06660447B2
公开(公告)日：2003-12-09
申请号：US09947767
申请日：2001-09-07
申请人： Jun Hatakeyama , Yuji Harada , Jun Watanabe , Masaru Sasago , Masayuki Endo , Shinji Kishimura
发明人： Jun Hatakeyama , Yuji Harada , Jun Watanabe , Masaru Sasago , Masayuki Endo , Shinji Kishimura
IPC分类号： G03F7004
CPC分类号： G03F7/0392 , C08F212/14
摘要： A polymer having fluorinated vinyl phenol units copolymerized with acrylonitrile units has high transmittance to VUV radiation. A resist composition using the polymer as a base resin has high sensitivity and resolution to high-energy radiation and good plasma etching resistance and is suited for lithographic microprocessing.
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公开(公告)号：US06436606B1
公开(公告)日：2002-08-20
申请号：US09650408
申请日：2000-08-29
申请人： Jun Hatakeyama , Jun Watanabe , Yuji Harada
发明人： Jun Hatakeyama , Jun Watanabe , Yuji Harada
IPC分类号： C08F22202
CPC分类号： G03F7/0392 , C08F234/02 , G03F7/0045 , G03F7/0397
摘要： Polymers comprising recurring units of formula (1) and recurring units having acid labile groups are novel. At least one of R1 and R2 is fluorine or a trifluoromethyl group, and the remainder is hydrogen or a C1-20 alkyl, R3 and R4 each are hydrogen or an unsubstituted or fluorine-substituted C1-20 alkyl, or R3 and R4 may form a ring. Using such polymers, resist compositions featuring transparency to excimer laser light and alkali solubility are obtained.
摘要翻译： 包含式（1）的重复单元的聚合物和具有酸不稳定基团的重复单元是新的.R 1和R 2中的至少一个是氟或三氟甲基，其余是氢或C 1-20烷基，R 3和R 4各自是 氢或未取代或氟取代的C 1-20烷基，或者R 3和R 4可以形成环。 使用这种聚合物，获得具有对准分子激光的透明度和碱溶性的抗蚀剂组合物。
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公开(公告)号：US08361703B2
公开(公告)日：2013-01-29
申请号：US12628705
申请日：2009-12-01
申请人： Yuji Harada , Jun Hatakeyama , Koji Hasegawa
发明人： Yuji Harada , Jun Hatakeyama , Koji Hasegawa
CPC分类号： C09D127/12 , C08F220/18 , C08F220/24 , C08F220/26 , C08F220/30 , C08L33/16 , C09D125/18 , C09D133/16 , G03F7/0046 , G03F7/11 , G03F7/2041 , C08L2666/04 , C08F212/14 , C08F232/08 , C08F212/32
摘要： A protective coating composition comprising a polymer of acyl-protected hexafluoroalcohol structure as a base polymer, optionally in admixture with a second polymer containing sulfonic acid amine salt in recurring units is applied onto a resist film. The protective coating is transparent to radiation of wavelength up to 200 nm.
摘要翻译： 包含酰基保护的六氟醇结构的聚合物作为基础聚合物的保护性涂料组合物，任选地与含有重复单元的磺酸胺盐的第二聚合物的混合物施加到抗蚀剂膜上。 保护涂层对波长高达200nm的辐射是透明的。
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公开(公告)号：US08101335B2
公开(公告)日：2012-01-24
申请号：US12463751
申请日：2009-05-11
申请人： Yuji Harada , Jun Hatakeyama , Kazunori Maeda , Koji Hasegawa , Satoshi Shinachi
发明人： Yuji Harada , Jun Hatakeyama , Kazunori Maeda , Koji Hasegawa , Satoshi Shinachi
CPC分类号： G03F7/0395 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041 , Y10S430/106 , Y10S430/111
摘要： A copolymer of an alkali-soluble (α-trifluoromethyl)-acrylate and a norbornene derivative is useful as an additive to a resist composition. When processed by immersion lithography, the resist composition exhibits excellent water repellency and water slip and forms a pattern with few development defects.
摘要翻译： 碱溶性（α-三氟甲基）丙烯酸酯和降冰片烯衍生物的共聚物可用作抗蚀剂组合物的添加剂。 当通过浸渍光刻处理时，抗蚀剂组合物表现出优异的防水性和水滑动性并且形成几乎没有显影缺陷的图案。
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公开(公告)号：US08088537B2
公开(公告)日：2012-01-03
申请号：US12320183
申请日：2009-01-21
申请人： Jun Hatakeyama , Yuji Harada
发明人： Jun Hatakeyama , Yuji Harada
CPC分类号： G03F7/11 , G03F7/2041
摘要： The present invention relates to a resist top coat composition and a patterning process adopting such a material, which resist top coat composition is provided for forming a top coat on a photoresist film so as to protect the photoresist film, in liguid immersion photolithography. The present invention provides a resist top coat composition for forming a top coat on a photoresist film, wherein the resist top coat composition comprises, at least: a polymer I including a repeating unit a represented by the following general formula (1); and a polymer II including repeating unit having a sulfonic acid or an amine salt of a sulfonic acid:
摘要翻译： 本发明涉及一种抗蚀剂面漆组合物和采用这种材料的图案化方法，其抗蚀面漆组合物用于在光致抗蚀剂膜上形成顶涂层以保护光致抗蚀剂膜，在液体浸渍光刻中。 本发明提供了一种用于在光致抗蚀剂膜上形成顶涂层的抗蚀剂面漆组合物，其中抗蚀剂面漆组合物至少包含：包含由以下通式（1）表示的重复单元的聚合物I; 和包含具有磺酸或磺酸胺盐的重复单元的聚合物II：
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公开(公告)号：US20100136482A1
公开(公告)日：2010-06-03
申请号：US12628794
申请日：2009-12-01
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/2041
摘要： A resist composition is provided comprising (A) an additive polymer of acyl-protected hexafluoroalcohol structure, (B) a base polymer having a structure derived from lactone ring, hydroxyl group and/or maleic anhydride, the base polymer becoming soluble in alkaline developer under the action of acid, (C) a photoacid generator, and (D) an organic solvent. The additive polymer is transparent to radiation of wavelength up to 200 nm, and its properties can be tailored by a choice of the polymer structure.
摘要翻译： 提供了抗蚀剂组合物，其包含（A）酰基保护的六氟醇结构的添加剂聚合物，（B）具有衍生自内酯环，羟基和/或马来酸酐的结构的基础聚合物，所述基础聚合物在碱性显影剂中变得可溶 酸的作用，（C）光致酸发生剂，和（D）有机溶剂。 添加剂聚合物对波长高达200nm的辐射是透明的，并且其性质可以通过选择聚合物结构来定制。
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