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公开(公告)号：US20180347961A1
公开(公告)日：2018-12-06
申请号：US16100843
申请日：2018-08-10
Applicant: KLA-Tencor Corporation
Inventor： Jiyou Fu , Noam Sapiens , Kevin A. Peterlinz , Stilian Ivanov Pandev
IPC: G01B11/00 , G03F7/00 , G01B11/24 , G01N21/21 , G01N21/956
CPC classification number: G01B11/002 , G01B11/24 , G01B2210/56 , G01N21/956 , G01N2021/213 , G03F7/00
Abstract: A spectroscopic beam profile metrology system simultaneously detects measurement signals over a large wavelength range and a large range of angles of incidence (AOI). In one aspect, a multiple wavelength illumination beam is reshaped to a narrow line shaped beam of light before projection onto a specimen by a high numerical aperture objective. After interaction with the specimen, the collected light is passes through a wavelength dispersive element that projects the range of AOIs along one direction and wavelength components along another direction of a two-dimensional detector. Thus, the measurement signals detected at each pixel of the detector each represent a scatterometry signal for a particular AOI and a particular wavelength. In another aspect, a hyperspectral detector is employed to simultaneously detect measurement signals over a large wavelength range, range of AOIs, and range of azimuth angles.
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Patent Agency Ranking
公开(公告)号：US10101676B2
公开(公告)日：2018-10-16
申请号：US15271179
申请日：2016-09-20
Applicant: KLA-Tencor Corporation
Inventor： Jiyou Fu , Noam Sapiens , Kevin A. Peterlinz , Stilian Ivanov Pandev
Abstract: A spectroscopic beam profile metrology system simultaneously detects measurement signals over a large wavelength range and a large range of angles of incidence (AOI). In one aspect, a multiple wavelength illumination beam is reshaped to a narrow line shaped beam of light that is projected onto an overlay metrology target such that the direction of the line shaped beam is aligned with the direction of extent of a grating structure of the overlay metrology target. Collected light is dispersed across a detector according to AOI in one direction and according to wavelength in another direction. The measured signal at each detector pixel is associated with a particular AOI and wavelength. The collected light includes first order diffracted light, zero order diffracted light, or a combination thereof. In some embodiments, first order diffracted light and zero order diffracted light are detected over separate areas of the detector.
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公开(公告)号：US09915524B2
公开(公告)日：2018-03-13
申请号：US14708454
申请日：2015-05-11
Applicant: KLA-Tencor Corporation
Inventor： Noam Sapiens , Kevin A. Peterlinz , Alexander Buettner , Kerstin Purrucker , Andrei V. Shchegrov
IPC: G01N21/21 , G01B11/24 , G03F7/20 , G01N21/956
CPC classification number: G01B11/24 , G01B2210/56 , G01N21/956 , G01N2021/213 , G03F7/70625
Abstract: Methods and systems are presented to reduce the illumination spot size projected onto a measurement target and associated spillover onto area surrounding a measurement target. In one aspect, a spatial light modulator (SLM) is located in the illumination path between the illumination light source and the measurement sample. The SLM is configured to modulate amplitude, phase, or both, across the path of the illumination light to reduce wavefront errors. In some embodiments, the desired state of the SLM is based on wavefront measurements performed in an optical path of the metrology system. In another aspect, an illumination aperture having an image plane tilted at an oblique angle with respect to a beam of illumination light is employed to overcome defocusing effects in metrology systems that employ oblique illumination of the measurement sample. In some embodiments, the illumination aperture, objective lens, and specimen are aligned to satisfy the Scheimpflug condition.
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公开(公告)号：US20170082932A1
公开(公告)日：2017-03-23
申请号：US15271179
申请日：2016-09-20
Applicant: KLA-Tencor Corporation
Inventor： Jiyou Fu , Noam Sapiens , Kevin A. Peterlinz , Stilian Ivanov Pandev
IPC: G03F9/00
CPC classification number: G03F9/7065 , G03F7/70633 , G03F9/7046
Abstract: A spectroscopic beam profile metrology system simultaneously detects measurement signals over a large wavelength range and a large range of angles of incidence (AOI). In one aspect, a multiple wavelength illumination beam is reshaped to a narrow line shaped beam of light that is projected onto an overlay metrology target such that the direction of the line shaped beam is aligned with the direction of extent of a grating structure of the overlay metrology target. Collected light is dispersed across a detector according to AOI in one direction and according to wavelength in another direction. The measured signal at each detector pixel is associated with a particular AOI and wavelength. The collected light includes first order diffracted light, zero order diffracted light, or a combination thereof. In some embodiments, first order diffracted light and zero order diffracted light are detected over separate areas of the detector.
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公开(公告)号：US20160334326A1
公开(公告)日：2016-11-17
申请号：US14708454
申请日：2015-05-11
Applicant: KLA-Tencor Corporation
Inventor： Noam Sapiens , Kevin A. Peterlinz , Alexander Buettner , Kerstin Purrucker , Andrei V. Shchegrov
IPC: G01N21/21
CPC classification number: G01B11/24 , G01B2210/56 , G01N21/956 , G01N2021/213 , G03F7/70625
Abstract: Methods and systems are presented to reduce the illumination spot size projected onto a measurement target and associated spillover onto area surrounding a measurement target. In one aspect, a spatial light modulator (SLM) is located in the illumination path between the illumination light source and the measurement sample. The SLM is configured to modulate amplitude, phase, or both, across the path of the illumination light to reduce wavefront errors. In some embodiments, the desired state of the SLM is based on wavefront measurements performed in an optical path of the metrology system. In another aspect, an illumination aperture having an image plane tilted at an oblique angle with respect to a beam of illumination light is employed to overcome defocusing effects in metrology systems that employ oblique illumination of the measurement sample. In some embodiments, the illumination aperture, objective lens, and specimen are aligned to satisfy the Scheimpflug condition.
Abstract translation: 呈现方法和系统以减少投影到测量目标上的照明光点尺寸和相关联的外溢到测量目标周围的区域。 在一个方面，空间光调制器（SLM）位于照明光源和测量样本之间的照明路径中。 SLM被配置为在照明光的路径上调制幅度，相位或两者以减少波前误差。 在一些实施例中，SLM的期望状态基于在计量系统的光路中执行的波前测量。 在另一方面，采用具有相对于照明光束倾斜倾斜角的图像平面的照明孔，以克服采用测量样品的倾斜照明的度量系统中的散焦效应。 在一些实施例中，照明孔径，物镜和样本被对准以满足Scheimpflug条件。
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公开(公告)号：US20150032398A1
公开(公告)日：2015-01-29
申请号：US14074689
申请日：2013-11-07
Applicant: KLA-Tencor Corporation
IPC: G01N23/203 , G01B15/00
CPC classification number: G01N23/203 , G01B15/00 , G01B2210/56 , G01N23/2206 , H01L22/12 , H01L22/20
Abstract: Structural parameters of a specimen are determined by fitting models of the response of the specimen to measurements collected by different measurement techniques in a combined analysis. X-ray measurement data of a specimen is analyzed to determine at least one specimen parameter value that is treated as a constant in a combined analysis of both optical measurements and x-ray measurements of the specimen. For example, a particular structural property or a particular material property, such as an elemental composition of the specimen, is determined based on x-ray measurement data. The parameter(s) determined from the x-ray measurement data are treated as constants in a subsequent, combined analysis of both optical measurements and x-ray measurements of the specimen. In a further aspect, the structure of the response models is altered based on the quality of the fit between the models and the corresponding measurement data.
Abstract translation: 样本的结构参数是通过将样本的响应拟合到通过不同测量技术在综合分析中收集的测量结果来确定的。 分析样本的X射线测量数据，以确定在样本的光学测量和x射线测量的组合分析中被视为常数的至少一个样本参数值。 例如，基于x射线测量数据确定特定结构性质或特定材料性质，例如样品的元素组成。 从x射线测量数据确定的参数在随后的样本的光学测量和x射线测量的组合分析中被视为常数。 在另一方面，响应模型的结构基于模型与相应测量数据之间的拟合质量而改变。
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