Condensation particle counter
    12.
    发明授权
    Condensation particle counter 失效
    冷凝颗粒计数器

    公开(公告)号:US06980284B2

    公开(公告)日:2005-12-27

    申请号:US10381251

    申请日:2001-09-20

    CPC classification number: G01N15/065 G01N15/14 G01N2015/0049 G01N2015/0681

    Abstract: A condensation particle counter measures the number of ultra-fine particles by growing the ultra-fine particles through a condensing process. The counter includes a capillary in which vapor of operating liquid is condensed and the ultra-fine particles grow. An insulating material surrounds the capillary to shut out heat flow between the capillary and the environment. The condensation particle counter can use various operating liquids including alcohol and water, and can be also applied to semiconductor clean rooms.

    Abstract translation: 冷凝颗粒计数器通过冷凝过程生长超细颗粒来测量超细颗粒的数量。 计数器包括毛细管,其中工作液体的蒸气被冷凝并且超细颗粒生长。 绝缘材料围绕毛细管以截断毛细管和环境之间的热流。 冷凝颗粒计数器可以使用各种操作液体,包括酒精和水,也可以应用于半导体洁净室。

    Method of particle analysis on a mirror wafer
    13.
    发明授权
    Method of particle analysis on a mirror wafer 失效
    在镜片上进行粒子分析的方法

    公开(公告)号:US5267017A

    公开(公告)日:1993-11-30

    申请号:US886541

    申请日:1992-05-20

    CPC classification number: G01R31/305 G01R31/307

    Abstract: A method for reducing targeting errors encountered when trying to locate contaminant particles in a high-magnification imaging device, based on estimates of the particle positions obtained from a scanning device. The method of the invention uses three techniques separately and in combination. The first technique includes selecting at least three reference particles, to provide multiple unique pairs of reference particles for computation of an averaged set of coordinate transformation parameters, used to transform particle position coordinates from the coordinate system of the scanning device to the coordinate system of the imaging device. The averaged transformation parameters result in much smaller targeting errors between the estimated and actual positions of the particles. The targeting errors are further reduced by the use of multiple scans of the scanning device. In a third technique, accumulated reference particle targeting errors observed in prior processing of other wafers are used to reduce these targeting errors when processing a new wafer.

    Abstract translation: 基于从扫描装置获得的粒子位置的估计,减少在高倍率成像装置中定位污染物颗粒时遇到的瞄准误差的方法。 本发明的方法分别使用三种技术组合。 第一技术包括选择至少三个参考粒子,以提供用于计算平均坐标变换参数集合的多个独特的参考粒子对,用于将粒子位置坐标从扫描装置的坐标系转换为坐标系的坐标系 成像装置。 平均变换参数导致粒子的估计位置和实际位置之间的目标误差小得多。 通过使用扫描设备的多次扫描,进一步减少了定位错误。 在第三种技术中,在处理新晶片时,使用在其它晶片的先前处理中观察到的累积参考粒子瞄准误差来减少这些瞄准误差。

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