摘要:
Thermally imageable multilayer imageable elements useful as lithographic printing plate precursors that have good solvent resistance are disclosed. The underlayer of the imageable element comprises an acidic copolymer that comprises, in polymerized form, about 10 mol % to about 75 mol % of one or more monomers of the formula: CH2═CH(R1)-Z-X—NH—CO—NH—C6H3—(R2)(CO2H); in which: R1 is H or CH3; R2 is H or OH; Z is —C6H4— or —C(O) —Y—; Y is —O— or —NH—; and X is selected from —C(CH3)2—, —CH(CH3)— and —(CH2)n—, in which n is an integer from 1 to 12.
摘要:
The present invention provides methods for the reduction of endotoxins in a plasmid preparation using a carbohydrate non-ionic detergent with silica chromatography.
摘要:
The present invention provides an imageable element including a lithographic substrate and an imageable layer disposed on the substrate. The imageable layer includes a radically polymerizable component, an initiator system capable of generating radicals sufficient to initiate a polymerization reaction upon exposure to imaging radiation, and a polymeric binder having a hydrophobic backbone and including constitutional units having a pendant group including a hydrophilic poly(alkylene oxide) segment. The imageable element can be developed using an aqueous developer solution. Alternatively, the imageable element can be developed on-press by contact with ink and/or fountain solution.
摘要:
Multilayer, positive working, thermally imageable, bakeable imageable elements are disclosed. The elements have a substrate, an underlayer, and a top layer. The underlayer comprises a resin or resins having activated methylol and/or activated alkylated methylol groups, such as a resole resin, and a polymeric material that comprises, in polymerized form about 5 mol % to about 30 mol % of methacrylic acid; about 20 mol % to about 75 mol % of N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, or a mixture thereof; optionally, about 5 mol % to about 50 mol % of methacrylamide; and about 3 mol % to about 50 mol % of a compound represented by the formula: CH2C(R2)C(O)NHCH2OR1, in which R1 is C1 to C12 alkyl, phenyl, C1 to C12 substituted phenyl, C1 to C12 aralkyl, or Si(CH3)3; and R2 is H or methyl. The elements produce bakeable lithographic printing plates that are resistant to press chemistries.
摘要:
Flexographic printing members amenable to aqueous (or organic) development do not exhibit the deleterious effects on printing performance characteristic of some conventional alternatives. Embodiments of the invention utilize a photopolymerizable layer comprising, consisting of, or consisting essentially of a photopolymerization initiator and a water-dilutable (but not water-soluble) monomer.
摘要:
In ablation-type printing plates involving silicone acrylate top layers, curing at high oxygen levels not only substantially reduces or eliminates toning, but does not adversely affect plate durability or printing performance.
摘要:
Sequentially subjecting an imaged ablation-type printing member having a silicone topmost layer to, first, a cleaning liquid that is not a solvent for silicone, followed by subjecting to a second cleaning liquid that is a silicone solvent, conditions the printing member for subsequent printing with high-solids inks.
摘要:
Low-VOC cleaning compositions effective in removing stubborn UV inks from printing-press components include at least one non-ionic surfactant selected from the group consisting of a sorbitan ester, an ethoxylated sorbitan ester, an ethoxylated castor oil, polyethylene glycol ester and an alcohol ethoxylate; and at least one carrier comprising or consisting essentially of at least one of (i) an organic solvent miscible therewith or (ii) D-limonene. The cleaning composition has a VOC limit less than 100 g/L.
摘要:
Both single-layer and multilayer imageable elements have a substrate and at least one imageable layer. The elements can be used to prepare either negative- or positive-working imaged elements, for example as lithographic printing plates. The imageable elements also include a radiation absorbing compound and a solvent-resistant polymer comprising pendant phosphoric acid groups, pendant adamantyl groups, or both. When this polymer comprises pendant adamantyl groups, they are connected to the polymer backbone through a urea or urethane group. The imageable elements have improved chemical resistance and thermal bakeability from the presence of the unique solvent-resistant polymer.