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315 条记录 (耗时 0.034 秒)

    Alignment method
    11.
    发明授权
    Alignment method 失效
    对齐方法

    公开(公告)号：US5726757A

    公开(公告)日：1998-03-10

    申请号：US719315

    申请日：1996-09-25

    申请人： Masaki Kato ,  Kinya Kato ,  Kei Nara

    发明人： Masaki Kato ,  Kinya Kato ,  Kei Nara

    IPC分类号： G03F7/20 ,  G03F9/00 ,  G01B11/00

    CPC分类号： G03F7/70275 ,  G03F7/70358 ,  G03F9/70

    摘要： In an exposure apparatus, an alignment-detecting light component of a mask and that of a plate are spatially separated from each other, thereby enabling highly accurate alignment with little influence of the light from the plate on detection of the mask position. An alignment optical system comprises a light source means for supplying a luminous flux; a scan beam forming optical system for forming, based on the luminous flux, a scan beam at a visual field area on a first substrate with respect to a predetermined optical system; a scanning means for optically scanning, in a predetermined direction, the scan beam formed on the first substrate; a first detection means for detecting a diffracted and reflected light component from a first mark generated when optically scanned with the scan beam formed on the first substrate; and a second detection means for detecting, by way of the predetermined optical system and through a path different from the path through which the diffracted and reflected light component from the first mark is detected, a diffracted and reflected light component from a second mark generated when optically scanned with the scan beam which is formed on the second substrate by way of the predetermined optical system.

    摘要翻译： 在曝光装置中，掩模的对准检测光分量和板的对准检测光分量在空间上彼此分离，从而在对掩模位置的检测时几乎不受来自板的光的影响。 对准光学系统包括用于提供光通量的光源装置; 扫描光束形成光学系统，用于基于光通量，相对于预定光学系统在第一基板上的视野区域处形成扫描光束; 扫描装置，用于在预定方向上光扫描形成在第一基板上的扫描光束; 第一检测装置，用于从由形成在第一基板上的扫描光束进行光扫描时产生的第一标记中检测衍射和反射光分量; 以及第二检测装置，用于通过预定的光学系统和通过不同于检测到来自第一标记的衍射和反射光分量的路径的路径来检测来自第二标记的衍射和反射光分量， 通过预定的光学系统用形成在第二基板上的扫描光束进行光学扫描。

    Optical apparatus
    16.
    发明授权
    Optical apparatus 失效
    光学仪器

    公开(公告)号：US5838449A

    公开(公告)日：1998-11-17

    申请号：US912954

    申请日：1997-08-14

    申请人： Kinya Kato ,  Masaki Kato ,  Kei Nara

    发明人： Kinya Kato ,  Masaki Kato ,  Kei Nara

    IPC分类号： G03F7/20 ,  G03F9/00 ,  G01B9/02

    CPC分类号： G03F7/70275 ,  G03F7/70358 ,  G03F7/70791 ,  G03F9/70

    摘要： An exposure apparatus of a large-substrate single scan-exposure type by which a mask mark and a plate mark are two-dimensionally scanned in relatively narrow respective scan areas at the same time to effect highly accurate alignment. In the present invention, a first substrate and a second substrate are relatively moved in a predetermined direction with respect to a projection optical system, while an image of a pattern formed in the first substrate projectively impinges on the second substrate by way of the projection optical system. The projection optical system comprises a plurality of projection optical units arranged in a direction orthogonal to the scanning direction in order to form, on the second substrate, a same-magnification erected image of the pattern formed on the first substrate. The exposure apparatus has an alignment means for detecting a first mark formed on the first substrate and a second mark formed on the second substrate by optical scanning so as to measure a positional deviation between the first substrate and the second substrate.

    摘要翻译： 大面积单扫描曝光型的曝光装置，通过该曝光装置在相对较窄的各个扫描区域中同时二维地扫描掩码标记和印记标记，以实现高精度对准。 在本发明中，第一基板和第二基板相对于投影光学系统相对于预定方向相对移动，而形成在第一基板中的图案的图像通过投影光学投射到第二基板上 系统。 投影光学系统包括沿与扫描方向正交的方向布置的多个投影光学单元，以在第二基板上形成在第一基板上形成的图案的相同放大率的竖立图像。 曝光装置具有用于检测形成在第一基板上的第一标记的对准装置和通过光学扫描形成在第二基板上的第二标记，以便测量第一基板和第二基板之间的位置偏差。

    TEMPERATURE INSENSITIVE DISTRIBUTED STRAIN MONITORING APPARATUS AND METHOD
    18.
    发明申请
    TEMPERATURE INSENSITIVE DISTRIBUTED STRAIN MONITORING APPARATUS AND METHOD 有权

    公开(公告)号：US20220397388A1

    公开(公告)日：2022-12-15

    申请号：US17343077

    申请日：2021-06-09

    申请人： Chunshu Zhang ,  Jie Lin ,  Masaki Kato

    发明人： Chunshu Zhang ,  Jie Lin ,  Masaki Kato

    IPC分类号： G01B11/16 ,  H04B10/079 ,  G02B6/12

    摘要： An apparatus for monitoring strain in an optical chip in silicon photonics platform. The apparatus includes a silicon photonics substrate shared with the optical chip. Additionally, the apparatus includes an optical input configured in the silicon photonics substrate to supply an input signal of a single wavelength. The apparatus further includes a first waveguide arm and a second waveguide arm embedded in the silicon photonics substrate to form an on-chip interferometer. The second waveguide arm forms a delay line being disposed at a region in or adjacent to the optical chip. The on-chip interferometer is configured to generate an interference pattern serving as an indicator of strain distributed at the region in or adjacent to the optical chip. The interference pattern is caused by a temperature-independent phase shift at the single wavelength of the interferometer between the first waveguide arm and the second waveguide arm.

    Liquid discharge head, liquid discharge device, liquid discharge apparatus, and head module
    19.
    发明授权
    Liquid discharge head, liquid discharge device, liquid discharge apparatus, and head module 有权

    公开(公告)号：US10751998B2

    公开(公告)日：2020-08-25

    申请号：US16285428

    申请日：2019-02-26

    申请人： Masaki Kato

    发明人： Masaki Kato

    IPC分类号： B41J2/175 ,  B41J2/145 ,  B41J2/18 ,  B41J2/14

    摘要： A liquid discharge head includes a plurality of nozzles to discharge a liquid; a plurality of pressure chambers communicating with the plurality of nozzles; a plurality of individual supply channels communicating with the plurality of pressure chambers; a plurality of supply ports communicating with the plurality of individual supply channels; a plurality of common-supply branch channels communicating with two or more of the plurality of individual supply channels through the plurality of supply ports; a common-supply main channel communicating with the plurality of common-supply branch channels; and a plurality of supply-side dampers, each of the plurality of supply-side dampers forming a part of a wall of each of the plurality of common-supply branch channels.