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42 条记录 (耗时 0.018 秒)

    Optical system for transforming numerical aperture
    11.
    发明授权
    Optical system for transforming numerical aperture 有权
    用于转换数值孔径的光学系统

    公开(公告)号：US07859756B2

    公开(公告)日：2010-12-28

    申请号：US12413963

    申请日：2009-03-30

    申请人： Lev Ryzhikov ,  Yuli Vladimirsky

    发明人： Lev Ryzhikov ,  Yuli Vladimirsky

    IPC分类号： G02B27/10

    CPC分类号： G03F7/70291 ,  G03F7/70075 ,  G03F7/70208 ,  G03F7/70275

    摘要： A system is provided to form illumination light beams having desirable divergence and directivity. For instance, the system can include an optical element and a relay. The optical element can include a pupil defining element. Further, the relay can have a first and second lens array arranged in series and configured to receive the plurality of beams and to re-image the plurality of beams into a corresponding plurality of beams in an image plane. Each of the plurality of corresponding beams can have a numerical aperture less than a numerical aperture of each of the plurality of beams.

    摘要翻译： 提供一种系统以形成具有期望的发散和方向性的照明光束。 例如，该系统可以包括光学元件和继电器。 光学元件可以包括瞳孔限定元件。 此外，继电器可以具有串联布置的第一和第二透镜阵列，并且被配置为接收多个光束并将多个光束重新成像到图像平面中的对应的多个光束。 多个相应光束中的每一个可以具有小于多个光束中的每一个的数值孔径的数值孔径。

    System and Method for Reducing Disturbances Caused by Movement in an Immersion Lithography System
    12.
    发明申请
    System and Method for Reducing Disturbances Caused by Movement in an Immersion Lithography System 审中-公开

    公开(公告)号：US20070165201A1

    公开(公告)日：2007-07-19

    申请号：US11693525

    申请日：2007-03-29

    申请人： Lev Ryzhikov ,  Yuli Vladimirsky

    发明人： Lev Ryzhikov ,  Yuli Vladimirsky

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70275 ,  G03F7/70258 ,  G03F7/70341 ,  G03F7/709

    摘要： In an immersion lithography system, a moveable substrate unit is formed from a substrate and at least one optical element, with immersion liquid between them. The immersion liquid and the optical element move in unison with the substrate. Movement of the substrate unit reduces refractive index disturbance produced by turbulence during exposure scans. The projection optical system is enhanced with a dynamic axial compensation group. Elements in the dynamic axial compensation group can move to compensate aberrations caused by deviation of axial symmetry due to movement of the optical element in the substrate unit. The space in the substrate unit filled with immersion liquid may be dynamically controlled to provide proper working distance. If the optical element in the substrate unit has optical power, both resolution and depth of focus may be enhanced. Even if the optical element has no optical power, depth of focus may still be enhanced.

    Lithographic apparatus having double telecentric illumination
    13.
    发明授权
    Lithographic apparatus having double telecentric illumination 有权
    具有双重远心照明的平版印刷设备

    公开(公告)号：US07227613B2

    公开(公告)日：2007-06-05

    申请号：US10898290

    申请日：2004-07-26

    申请人： Lev Ryzhikov ,  Yuli Vladimirsky

    发明人： Lev Ryzhikov ,  Yuli Vladimirsky

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70225 ,  G03F7/70283 ,  G03F7/70291

    摘要： A system and method are used to pattern illumination to form one or more devices on a substrate using a reflecting system, a pattern generator that defines an objection plane, a projection system, and the substrate that defines an image plane. A reflecting portion of the reflecting system is substantially parallel to a reflecting portion of the pattern generator. The reflecting portion of the pattern generator patterns the illumination beam and directs the patterned illumination beam towards the substrate via the projection system. Based on the relationship of the reflecting system and the pattern generator, the illumination beam is telecentric proximate the object plane and the patterned illumination beam is telecentric proximate the image plane. Through use of a reflecting optic and not a transmissive optic to direct light between the illuminator and the projection system, illumination efficiency is increased and errors imparted on the illumination are decreased.

    摘要翻译： 系统和方法用于使用反射系统，限定反射平面的图案发生器，限定图像平面的投影系统和基板来图案照明以在基板上形成一个或多个设备。 反射系统的反射部分基本上平行于图案发生器的反射部分。 图案发生器的反射部分图案化照明光束，并且经由投影系统将图案化的照明光束引向衬底。 基于反射系统和图案发生器的关系，照明光束在物平面附近是远心的，并且图案化的照明光束在图像平面附近是远心的。 通过使用反射光学器件而不是透射光学器件来在照明器和投影系统之间引导光，照明效率增加，并且照射上产生的误差降低。

    Ultra high resolution lithographic imaging and printing and defect reduction by exposure near the critical condition utilizing fresnel diffraction
    16.
    发明授权
    Ultra high resolution lithographic imaging and printing and defect reduction by exposure near the critical condition utilizing fresnel diffraction 失效
    通过利用菲涅尔衍射在临界条件附近通过曝光进行超高分辨率光刻成像和印刷和缺陷减少

    公开(公告)号：US06383697B1

    公开(公告)日：2002-05-07

    申请号：US09514304

    申请日：2000-02-28

    申请人： Yuli Vladimirsky ,  Antony Bourdillon

    发明人： Yuli Vladimirsky ,  Antony Bourdillon

    IPC分类号： G03C500

    CPC分类号： G03F7/70216 ,  G03F7/70325 ,  G03F7/7035 ,  Y10S430/143 ,  Y10S430/168

    摘要： Ultra-high resolution lithographic imaging and printing refers to the reduction in printed feature size, or “demagnification” obtained by the use of “bias”. A new meaning is given to Next Generation Lithography (NGL) in terms of fidelity in the reproduction of masks. Applying the classical manifestation of Fresnel diffraction, the mask pattern features are “demagnified” by “bias”. Classically, bias is minimized but the invention uses it to advantage so that: (i) mask-wafer gaps are thus enlarged; (ii) mask features are enlarged 3×-6× for a given printed feature size (cf. classically 1:1 in proximity lithography); (iii) the technique is extensible to beyond 25 nm feature sizes and (iv) exposure times are reduced. The invention is specifically demonstrated in proximity X-ray lithography but has a generic extension to all lithographies that can use out of focus imaging to produce ultra-high resolution. In consequence of the diffraction, printing defects due to mask faults are reduced including edge roughness, writing errors, diffraction effects at shielded areas and absorber thickness variations. Moreover the exposure doses from mask features of various sizes are controlled by various techniques.

    摘要翻译： 超高分辨率平版印刷成像和印刷是指通过使用“偏压”获得的印刷特征尺寸减小或“缩小”。 新一代平版印刷术（NGL）在面具复制方面的保真度有新意义。 应用菲涅耳衍射的经典表现，掩模图案特征通过“偏差”“缩小”。 通常，偏压被最小化，但是本发明使用它有利于：（i）掩模 - 晶片间隙因此被扩大; （ii）对于给定的印刷特征尺寸，掩模特征被放大3×6x（参见邻近光刻中的经典1：1）; （iii）该技术可扩展到超过25nm的特征尺寸，并且（iv）降低曝光时间。 本发明在接近X射线光刻技术中被具体证明，但是具有可以使用离焦成像以产生超高分辨率的所有平版印刷术的通用扩展。 由于衍射，由于掩模故障引起的印刷缺陷减少，包括边缘粗糙度，写入误差，屏蔽区域的衍射效应和吸收体厚度变化。 此外，各种尺寸的掩模特征的曝光剂量由各种技术控制。

    Diffraction elements for alignment targets
    17.
    发明授权
    Diffraction elements for alignment targets 失效
    对准目标的衍射元件

    公开(公告)号：US08681313B2

    公开(公告)日：2014-03-25

    申请号：US12921559

    申请日：2009-04-03

    申请人： Yuli Vladimirsky ,  Muhammad Arif ,  Robert Albert Tharaldsen

    发明人： Yuli Vladimirsky ,  Muhammad Arif ,  Robert Albert Tharaldsen

    IPC分类号： G01B11/00 ,  G01B11/14 ,  G02B5/18 ,  G03B27/32 ,  G03B27/42 ,  G03B27/54 ,  G03B27/74

    CPC分类号： G03F9/7011 ,  G03F9/7076

    摘要： A patterning device, including alignment targets having alignment features formed from a plurality of diffractive elements, each diffractive element including an absorber stack and a multi-layered reflector stack is provided. The diffractive elements are configured to enhance a pre-determined diffraction order used for pre-alignment and to diffract light in a pre-determined direction of a pre-alignment system when illuminated with light of a wavelength used for the pre-alignment. The diffractive elements may occupy at least half of an area of each alignment feature. The diffractive elements may be configured to enhance first or higher order diffractions, while substantially reducing zeroth diffraction orders and specular reflection when illuminated with a wavelength used for reticle prealignment. The dimensions of each diffractive element may be a function of a diffraction grating period of each alignment feature.

    摘要翻译： 一种图案形成装置，包括具有由多个衍射元件形成的对准特征的对准目标，每个衍射元件包括吸收体堆叠和多层反射器叠层。 衍射元件被配置为当用用于预对准的波长的光照射时，增强用于预对准的预定衍射级并且在预对准系统的预定方向上衍射光。 衍射元件可以占据每个对准特征的面积的至少一半。 衍射元件可以被配置为增强第一或更高阶衍射，同时当用用于掩模版预对准的波长照射时，基本上减少了零级衍射级和镜面反射。 每个衍射元件的尺寸可以是每个对准特征的衍射光栅周期的函数。

    Diffraction Elements for Alignment Targets
    18.
    发明申请
    Diffraction Elements for Alignment Targets 失效
    对准目标的衍射元件

    公开(公告)号：US20110019173A1

    公开(公告)日：2011-01-27

    申请号：US12921559

    申请日：2009-04-03

    申请人： Yuli Vladimirsky ,  Muhammah Arif ,  Robert Albert Tharaldsen

    发明人： Yuli Vladimirsky ,  Muhammah Arif ,  Robert Albert Tharaldsen

    IPC分类号： G03B27/54 ,  G03B27/32 ,  G02B5/18

    CPC分类号： G03F9/7011 ,  G03F9/7076

    摘要： A patterning device, including alignment targets having alignment features formed from a plurality of diffractive elements, each diffractive element including an absorber stack and a multi-layered reflector stack is provided. The diffractive elements are configured to enhance a pre-determined diffraction order used for pre-alignment and to diffract light in a pre-determined direction of a pre-alignment system when illuminated with light of a wavelength used for the pre-alignment. The diffractive elements may occupy at least half of an area of each alignment feature. The diffractive elements may be configured to enhance first or higher order diffractions, while substantially reducing zeroth diffraction orders and specular reflection when illuminated with a wavelength used for reticle prealignment. The dimensions of each diffractive element may be a function of a diffraction grating period of each alignment feature.

    摘要翻译： 一种图案形成装置，包括具有由多个衍射元件形成的对准特征的对准目标，每个衍射元件包括吸收体堆叠和多层反射器叠层。 衍射元件被配置为当用用于预对准的波长的光照射时，增强用于预对准的预定衍射级并且在预对准系统的预定方向上衍射光。 衍射元件可以占据每个对准特征的面积的至少一半。 衍射元件可以被配置为增强第一或更高阶衍射，同时当用用于掩模版预对准的波长照射时，基本上减少了零级衍射级和镜面反射。 每个衍射元件的尺寸可以是每个对准特征的衍射光栅周期的函数。

    Method and system for wavefront measurements of an optical system
    19.
    发明申请
    Method and system for wavefront measurements of an optical system 有权
    光学系统的波前测量方法和系统

    公开(公告)号：US20090021748A1

    公开(公告)日：2009-01-22

    申请号：US12178524

    申请日：2008-07-23

    申请人： Azat M. Latypov ,  Sherman K. Poultney ,  Yuli Vladimirsky

    发明人： Azat M. Latypov ,  Sherman K. Poultney ,  Yuli Vladimirsky

    IPC分类号： G01B9/02

    CPC分类号： G03F7/706 ,  G01J9/0215

    摘要： A wavefront measurement system includes a source of electromagnetic radiation. An illumination system delivers the electromagnetic radiation to an object plane. A source of a diffraction pattern is in the object plane. A projection optical system projects the diffraction pattern onto an image plane, which includes a mechanism (e.g., a shearing grating) to introduce the lateral shear. A detector is located optically conjugate with the pupil of the projection optical system, and receives an instant fringe pattern, resulting from the interference between sheared wavefronts, from the image plane. The diffraction pattern is dynamically scanned across a pupil of the projection optical system, and the resulting time-integrated interferogram obtained from the detector is used to measure the wavefront aberration across the entire pupil.

    摘要翻译： 波前测量系统包括电磁辐射源。 照明系统将电磁辐射传送到物体平面。 衍射图案的来源在物体平面中。 投影光学系统将衍射图案投影到图像平面上，该图像平面包括用于引入横向剪切的机构（例如，剪切光栅）。 检测器与投影光学系统的光瞳光学共轭，并且从图像平面接收由剪切波前的干涉导致的即时条纹图案。 衍射图案被动态地扫描投影光学系统的光瞳，并且由检测器获得的所得到的时间积分干涉图用于测量整个瞳孔上的波前像差。