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公开(公告)号：US07750326B2
公开(公告)日：2010-07-06
申请号：US11150466
申请日：2005-06-13
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Derk Jan Wilfred Klunder
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Derk Jan Wilfred Klunder
IPC分类号： H05G2/00
CPC分类号： G03F7/70925 , B82Y10/00 , G03F7/70166 , G03F7/70916
摘要： A lithographic apparatus is disclosed. The apparatus includes a source for supplying hydrogen radicals, a guide for use in conjunction with the source, for directing hydrogen radicals to an application surface to be targeted by the hydrogen radicals. The guide is provided with a coating having a hydrogen radical recombination constant of less than 0.2. In this way, the radicals can be transported with reduced losses and are able to better interact with remaining contaminants on application surfaces, such as mirror surfaces.
摘要翻译： 公开了一种光刻设备。 该装置包括用于提供氢自由基的源，与源结合使用的引导件，用于将氢自由基引导到由氢自由基靶向的施用表面。 引导件具有氢自由基复合常数小于0.2的涂层。 以这种方式，可以以较少的损失运输自由基，并且能够更好地与应用表面（例如镜面）上的剩余污染物相互作用。
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12.发明授权Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus 失效用于去除光学元件上的沉积的方法，用于保护光学元件的方法，器件制造方法，包括光学元件的设备和光刻设备公开(公告)号：US07561247B2
公开(公告)日：2009-07-14
申请号：US11207996
申请日：2005-08-22
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Carolus Ida Maria Antonius Spee , Derk Jan Wilfred Klunder , Antonius Maria Bernardus De Mol
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Carolus Ida Maria Antonius Spee , Derk Jan Wilfred Klunder , Antonius Maria Bernardus De Mol
CPC分类号： G03F7/70925
摘要： A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas and one or more additional compounds selected from the group of hydrocarbon compounds and silane compounds in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2 containing gas; and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical element includes providing a cap layer to the optical element by a deposition process; and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus.
摘要翻译： 在包括光学元件的装置的光学元件上去除沉积物的方法包括在装置的至少一部分中提供含H2气体和一种或多种选自烃化合物和硅烷化合物的其它化合物，包括生产 来自含H 2气体的H 2的氢原子; 并使具有沉积的光学元件与至少部分氢自由基接触并除去至少部分沉积物。 此外，用于保护包括光学元件的装置的光学元件的方法包括通过沉积工艺向光学元件提供盖层; 并且在使用所述装置期间或之后，如上所述在去除过程中从所述光学元件中去除所述盖层的至少一部分。 该方法可以应用在光刻设备中。
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13.发明授权公开(公告)号：US07504643B2
公开(公告)日：2009-03-17
申请号：US11444535
申请日：2006-06-01
申请人： Johannes Maria Freriks , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen
发明人： Johannes Maria Freriks , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70925
摘要： A cleaning arrangement for a lithographic apparatus module may be provided in a collector. The cleaning arrangement includes a hydrogen radical source configured to provide a hydrogen radical containing gas to at least part of the module and a pump configured to pump gas through the module such that a flow speed of the hydrogen radical containing gas provided through at least part of the module is at least 1 m/s. The cleaning arrangement may also include a gas shutter configured to modulate a flow of the hydrogen radical containing gas to at least part of the module, a buffer volume of at least 1 m3 in communication with the module, and a pump configured to provide a gas pressure in the buffer volume between 0.001 mbar (0.1 Pa) and 1 mbar (100 Pa). The cleaning arrangement may further include a gas return system.
摘要翻译： 用于光刻设备模块的清洁装置可以设置在收集器中。 清洁装置包括被配置为向至少部分模块提供含氢自由基气体的氢根源，以及构造成将气体泵送通过模块的泵，使得通过至少部分的至少一部分提供含氢自由基气体的流速 该模块至少为1米/秒。 清洁装置还可以包括配置成将含氢自由基气体的流动调制到模块的至少一部分的气闸，与模块连通的至少1m 3的缓冲体积以及配置成提供气体的泵 缓冲体积在0.001毫巴（0.1帕）至1毫巴（100帕）之间的压力。 清洁装置还可以包括气体返回系统。
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14.发明申请Device arranged to measure a quantity relating to radiation and lithographic apparatus 失效用于测量与辐射和光刻设备有关的数量的设备公开(公告)号：US20080273188A1
公开(公告)日：2008-11-06
申请号：US11797358
申请日：2007-05-02
申请人： Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen , Niels Machiel Driessen , Vadim Yevgenyevich Banine , Johannes Christiaan Leonardus Franken , Olav Waldemar Vladimir Frijns , Derk Jan Wilfred Klunder
发明人： Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen , Niels Machiel Driessen , Vadim Yevgenyevich Banine , Johannes Christiaan Leonardus Franken , Olav Waldemar Vladimir Frijns , Derk Jan Wilfred Klunder
IPC分类号： G03B27/74
CPC分类号： G03F7/70916 , G03F7/70558 , G03F7/7085
摘要： A device is arranged to measure a quantity relating to radiation. The device includes a sensor configured to measure the quantity, a screen arranged to protect the sensor from incoming particles emitted from a source configured to emit extreme ultraviolet radiation, and a mirror configured to redirect extreme ultraviolet radiation emitted by the source, past the screen, to the sensor.
摘要翻译： 一个装置被安排来测量与辐射有关的数量。 该装置包括被配置为测量该数量的传感器，布置成保护传感器免受从被配置为发射极紫外辐射的源射出的入射颗粒的屏幕，以及被配置为重定向由该源发射的超过紫外线的过滤器， 到传感器。
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公开(公告)号：US20080197292A1
公开(公告)日：2008-08-21
申请号：US11995696
申请日：2006-07-07
CPC分类号： G01N21/76 , G01N21/648 , G01N33/54306 , G01N33/582
摘要： The present invention provides a luminescence sensor (2), such as e.g. a luminescence biosensor, comprising a multi-layer structure. The multi-layer structure comprises at least a first layer (2a) formed of a first material and a second layer (2b) formed of a second material. The first material has a first binding capacity towards luminophores and the second material has a second binding capacity towards luminophores, the first binding capacity being different from the second binding capacity. The luminescence sensor (2) according to the present invention shows a high sensitivity because it provides preferred binding sites for luminophores at locations where the combined excitation and detection efficiency is the highest.
摘要翻译： 本发明提供一种发光传感器（2），例如， 发光生物传感器，包括多层结构。 多层结构至少包括由第一材料形成的第一层（2a）和由第二材料形成的第二层（2b）。 第一材料具有朝向发光体的第一结合能力，第二材料具有朝向发光体的第二结合能力，第一结合能力不同于第二结合能力。 根据本发明的发光传感器（2）显示出高灵敏度，因为它在组合的激发和检测效率最高的位置处为发光体提供优选的结合位点。
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16.发明授权Lithographic apparatus including a cleaning device and method for cleaning an optical element 失效光刻设备包括清洁装置和清洁光学元件的方法公开(公告)号：US07372049B2
公开(公告)日：2008-05-13
申请号：US11292312
申请日：2005-12-02
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/70883 , G03F7/70908 , G03F7/70983
摘要： An EUV lithographic apparatus includes an EUV radiation source, an optical element and a cleaning device. The cleaning device includes a hydrogen radical source and a flow tube in communication with the hydrogen radical source. The cleaning device is configured to provide a flow of hydrogen radicals and the flow tube is arranged to provide a hydrogen radical flow at a predetermined position within the lithographic apparatus, for example for cleaning a collector mirror.
摘要翻译： EUV光刻设备包括EUV辐射源，光学元件和清洁装置。 清洁装置包括氢自由基源和与氢根源连通的流管。 清洁装置被配置为提供氢自由基流，并且流管布置成在光刻设备内的预定位置处提供氢自由基流，例如用于清洁收集镜。
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公开(公告)号：US20100141909A1
公开(公告)日：2010-06-10
申请号：US12519077
申请日：2007-11-27
申请人： Arnoud Cornelis Wassink , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Theodorus Petrus Maria Cadee , Vladimir Mihailòvitch Krivtsun , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen , Paul Peter Anna Antonius Brom , Wouter Anthon Soer , Denis Alexandrovich Glushkov
发明人： Arnoud Cornelis Wassink , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Theodorus Petrus Maria Cadee , Vladimir Mihailòvitch Krivtsun , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen , Paul Peter Anna Antonius Brom , Wouter Anthon Soer , Denis Alexandrovich Glushkov
CPC分类号： G03F7/70933 , G03F7/70858 , G03F7/70883 , G03F7/70916 , G03F7/70925 , G03F7/70983 , H05G2/003 , H05G2/005
摘要： A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.
摘要翻译： 提供了一种用于产生限定光轴的辐射束的辐射系统。 辐射系统包括用于产生EUV辐射的等离子体产生的放电源。 放电源包括一对构造和布置成具有电压差的电极，以及用于在一对电极之间产生等离子体的系统，以便在电极之间的等离子体中提供放电。 辐射系统还包括用于从电极捕获碎屑的碎片捕获屏蔽。 碎片捕捉屏蔽被构造和布置成屏蔽电极与相对于光轴以预定球面角度提供的视线，并为视线中的电极之间的中心区域提供孔。
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公开(公告)号：US07696493B2
公开(公告)日：2010-04-13
申请号：US11637937
申请日：2006-12-13
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Derk Jan Wilfred Klunder
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Derk Jan Wilfred Klunder
IPC分类号： G03F7/20
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , H05G2/005
摘要： The invention relates to a radiation system for generating electromagnetic radiation. The radiation system includes a pair of electrodes constructed and arranged to generate plasma of a first substance and a pinch in the plasma. The radiation system also includes a plasma recombination surface that is arranged proximate to the pinch, and is configured to neutralize a plurality of plasma particles.
摘要翻译： 本发明涉及一种用于产生电磁辐射的辐射系统。 辐射系统包括一对电极，其构造和布置成产生等离子体中的第一物质的等离子体和夹持物。 辐射系统还包括等离子体复合表面，该等离子体复合表面被布置成接近于夹紧，并且被配置为中和多个等离子体颗粒。
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公开(公告)号：US20090072168A1
公开(公告)日：2009-03-19
申请号：US12289884
申请日：2008-11-06
申请人： Vadim Yevgenyevich Banine , Vladimir Vitalevitch IVANOV , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen
发明人： Vadim Yevgenyevich Banine , Vladimir Vitalevitch IVANOV , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen
IPC分类号： G01J3/10
CPC分类号： G03F7/70933 , G03F7/70925
摘要： A cleaning arrangement is configured to clean an EUV optic of an EUV lithographic apparatus. The partial radical pressure ranges between 0.1-10 Pa. The cleaning arrangement can be configured inside a cleaning cocoon of the lithographic apparatus for offline cleaning. It can also be configured at particular positions inside the apparatus to clean nearby optics during production. In the pressure range of 0.1-10 Pa the penetration of atomic hydrogen into the optical devices is high, while the recombination to molecular hydrogen and hydrogen consumption is limited.
摘要翻译： 清洁装置被配置为清洁EUV光刻设备的EUV光学元件。 部分自由基压力范围在0.1-10Pa之间。清洁装置可以被配置在光刻设备的清洁茧内用于离线清洁。 它也可以配置在设备内的特定位置，以便在生产过程中清洁附近的光学元件。 在0.1-10Pa的压力范围内，原子氢进入光学器件的渗透率很高，而分子氢和氢消耗的复合受到限制。
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20.发明授权Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby 有权光谱纯度滤光片，包括这种光谱纯度滤光片的光刻设备，器件制造方法以及由此制造的器件公开(公告)号：US07453645B2
公开(公告)日：2008-11-18
申请号：US11025601
申请日：2004-12-30
CPC分类号： G21K1/06 , G03F7/70575 , G21K2201/067
摘要： A spectral purity filter includes an aperture, the aperture having a diameter, wherein the spectral purity filter is configured to enhance the spectral purity of a radiation beam by reflecting radiation of a first wavelength and allowing at least a portion of radiation of a second wavelength to transmit through the aperture, the first wavelength being larger than the second wavelength. The spectral purity filter may be used to improve the spectral purity of an Extreme Ultra-Violet (EUV) radiation beam.
摘要翻译： 光谱纯度滤光器包括孔，孔具有直径，其中光谱纯度滤光器被配置为通过反射第一波长的辐射并允许第二波长的至少一部分辐射来增强辐射束的光谱纯度 通过孔径传播，第一波长大于第二波长。 光谱纯度滤光片可用于提高极紫外（EUV）辐射束的光谱纯度。
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