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    Alkaline developer for radiation sensitive compositions
    11.
    发明申请
    Alkaline developer for radiation sensitive compositions 失效
    用于辐射敏感组合物的碱性显影剂

    公开(公告)号：US20050106510A1

    公开(公告)日：2005-05-19

    申请号：US10956871

    申请日：2004-10-01

    Applicant: Willi-Kurt Gries ,  Marc Van Damme ,  Pascal Meeus ,  Mario Boxhorn

    Inventor： Willi-Kurt Gries ,  Marc Van Damme ,  Pascal Meeus ,  Mario Boxhorn

    IPC: G03C5/16 ,  G03F7/32

    CPC classification number: G03F7/322

    Abstract: The invention relates to an alkaline developer for irradiated radiation sensitive compositions, which developer is based on water and at least one inorganic salt having an alkaline reaction, wherein the developer has a pH of at least 11 and comprises at least three structurally different surfactants of formulae (A), (B) and (C), characterised in that the surfactant of formula (A) has one anionic group, the surfactant of formula (B) has two anionic groups, the surfactant of formula (C) is non-ionic and has at least one non-ionic hydrophilic group, and the concentration of each of the surfactants of formulae (A), (B) and (C) in the developer is at least 0.05 weight-% based on the total weight of the developer. The developer leads to less depositions and has a superior stability when used.

    Abstract translation: 本发明涉及一种用于辐照敏感组合物的碱性显影剂，该显色剂基于水和至少一种具有碱性反应的无机盐，其中显影剂的pH至少为11，并且包含至少三种结构不同的式 （A），（B）和（C），其特征在于式（A）的表面活性剂具有一个阴离子基团，式（B）的表面活性剂具有两个阴离子基团，式（C）的表面活性剂是非离子的 并且具有至少一个非离子亲水基团，并且显影剂中式（A），（B）和（C）的每种表面活性剂的浓度相对于显影剂的总重量为至少0.05重量％ 。 开发人员的沉积少，在使用时具有优异的稳定性。

    Method for postbaking a lithographic printing plate
    12.
    发明申请
    Method for postbaking a lithographic printing plate 审中-公开
    印刷平版印刷版的方法

    公开(公告)号：US20050037287A1

    公开(公告)日：2005-02-17

    申请号：US10914336

    申请日：2004-08-09

    Applicant: Eric Verschueren ,  Marc Van Damme

    Inventor： Eric Verschueren ,  Marc Van Damme

    IPC: G03F7/26

    CPC classification number: B41C1/1008 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  B41N3/08 ,  G03F7/40

    Abstract: A method for making a lithographic printing plate is disclosed wherein the method comprises the steps of: (i) providing a lithographic printing plate precursor comprising a photosensitive coating on a substrate having a hydrophilic surface, (ii) image-wise exposing said photosensitive coating, (iii) developing said exposed coating to form an image on said substrate and optionally gumming the plate and (iv) baking the image on the plate, wherein said baking step is carried out within a dwell-time of less than 1 minute and wherein the chemical resistance of the coating against printing liquids and press chemicals is improved. This baking step is preferably carried out by exposing the printing plate to an infrared radiation source, preferably in a dynamic configuration.

    Abstract translation: 公开了一种制备平版印刷版的方法，其中所述方法包括以下步骤：（i）提供平版印刷版前体，其包含在具有亲水表面的基底上的感光涂层，（ii）成像曝光所述光敏涂层， （iii）显影所述暴露的涂层以在所述基底上形成图像，并且任选地涂覆所述板，和（iv）在所述板上烘烤图像，其中所述烘烤步骤在小于1分钟的停留时间内进行，并且其中 提高了涂料对印刷液和印刷化学品的耐化学性。 该烘烤步骤优选通过将印刷版暴露于红外辐射源，优选以动态构型进行。

    Method for the preparation of a negative working printing plate
    13.
    发明授权
    Method for the preparation of a negative working printing plate 失效
    负工作印版的制备方法

    公开(公告)号：US06739260B2

    公开(公告)日：2004-05-25

    申请号：US10131717

    申请日：2002-04-24

    Applicant: Marc Van Damme ,  Johan Loccufier

    Inventor： Marc Van Damme ,  Johan Loccufier

    IPC: B41C110

    CPC classification number: B41C1/1066

    Abstract: A method for the preparation of a negative working lithographic printing plate by means of ink jet printing is disclosed. This method uses a lithographic printing plate precursor comprising a lithographic support and an image forming layer containing a polymeric binder soluble in an aqueous alkaline developer. The precursor is image-wise printed by an ink jet fluid comprising a compound capable of reducing the solubility of the binder in the aqueous alkaline developer. After development a negative working printing plate is obtained.

    Abstract translation: 公开了一种通过喷墨印刷制备负性平版印刷版的方法。 该方法使用包含平版印刷载体的平版印刷版原版和含有可溶于含水碱性显影剂的聚合物粘合剂的成像层。 该前体由包含能够降低粘合剂在含水碱性显影剂中的溶解度的化合物的喷墨流体成像地印刷。 显影后，得到负性印刷版。

    Method for making positive working printing plates from a heat mode sensitive imaging element
    14.
    发明授权
    Method for making positive working printing plates from a heat mode sensitive imaging element 有权
    从热模式敏感成像元件制造正性印刷版的方法

    公开(公告)号：US06248503B1

    公开(公告)日：2001-06-19

    申请号：US09186613

    申请日：1998-11-06

    Applicant: Joan Vermeersch ,  Marc Van Damme ,  Andreas Elsässer ,  Inge Claes

    Inventor： Joan Vermeersch ,  Marc Van Damme ,  Andreas Elsässer ,  Inge Claes

    IPC: G03F7004

    CPC classification number: B41C1/10 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262

    Abstract: According to the present invention there is provided a method for making a lithographic printing plate comprising the steps of a) exposing imagewise to IR-radiation a heat mode imaging element having on a lithographic base with a hydrophilic surface a first layer including a polymer, soluble in an aqueous alkaline solution and a top layer on the same side of the lithographic base as the first layer which top layer is unpenetrable by an alkaline developer and contains a compound capable of converting light into heat, wherein said first layer and said top layer may be one and the same layer; and b) developing said imagewise exposed heat mode imaging element with said alkaline developer whereby the exposed areas of the first and the top layer, which may be the same, are dissolved and the unexposed areas of the first layer remain undissolved characterized in that said alkaline developer has a pH of at least 12 and a surface tension of at least 30 mN/m.

    Abstract translation: 根据本发明，提供了一种制备平版印刷版的方法，包括以下步骤：a）将具有亲水表面的光学成像元件的热模式成像元件成像曝光于包含聚合物的第一层，所述第一层可溶于 碱性水溶液和位于与第一层相同的一侧的顶层，该顶层不能被碱性显影剂穿透，并且含有能够将光转化成热的化合物，其中所述第一层和所述顶层可以是 同一层; 和b）用所述碱性显影剂显影所述成像曝光的热模式成像元件，由此第一层和顶层的可能相同的暴露区域被溶解，并且第一层的未曝光区域保持未溶解，其特征在于所述碱性显影剂 具有至少12的pH和至少30mN / m的表面张力。

    Imaging element for producing a lithographic plate therewith
    18.
    发明授权
    Imaging element for producing a lithographic plate therewith 失效
    用于制造平版印刷版的成像元件

    公开(公告)号：US6080523A

    公开(公告)日：2000-06-27

    申请号：US235318

    申请日：1999-01-22

    Applicant: Joan Vermeersch ,  Marc Van Damme ,  Dirk Kokkelenberg ,  Inge Claes

    Inventor： Joan Vermeersch ,  Marc Van Damme ,  Dirk Kokkelenberg ,  Inge Claes

    IPC: G03F1/00 ,  G03F7/11

    CPC classification number: G03F7/202

    Abstract: According to the present invention there is provided an imaging element comprising on a support having a hydrophilic surface in the order given a photosensitive layer insoluble in an aqueous alkaline solution and capable of becoming soluble in said aqueous alkaline solution upon exposure with actinic light and a thermosensitive layer comprising a masking dye rendering said thermosensitive layer opaque to light for which said photosensitive layer has spectral sensitivity and said imaging element further comprising a compound A capable of converting light into heat comprised in said thermosensitive layer or a layer adjacent thereto, characterized in that said thermosensitive layer further comprises thermoplastic particles of a hydrophobic polymer.

    Abstract translation: 根据本发明，提供了一种成像元件，其包含在具有亲水表面的支持体上，其顺序为给定不溶于碱性水溶液的感光层，并且当用光化学曝光并且能够变得易溶于碱性水溶液时， 所述掩模染料使所述热敏层不透光，所述光敏层对于所述感光层具有光谱灵敏度的光，并且所述成像元件还包含能够将光转换成包含在所述热敏层中的热或与其相邻的层的化合物A，其特征在于所述 热敏层还包括疏水性聚合物的热塑性颗粒。

    Imaging element comprising a hydrophobic photopolymerizable composition and method for producing lithographic plates therewith
    20.
    发明授权
    Imaging element comprising a hydrophobic photopolymerizable composition and method for producing lithographic plates therewith 失效
    包含疏水性光聚合组合物的成像元件及其制造平版印刷版的方法

    公开(公告)号：US5922506A

    公开(公告)日：1999-07-13

    申请号：US539960

    申请日：1995-10-06

    Applicant: Yvan Hoogmartens ,  Marc Van Damme ,  Joan Vermeersch ,  Yves Verburgh

    Inventor： Yvan Hoogmartens ,  Marc Van Damme ,  Joan Vermeersch ,  Yves Verburgh

    IPC: G03F7/004 ,  G03F7/00 ,  G03F7/027 ,  G03F7/028 ,  G03F7/033 ,  G03F7/038 ,  G03F7/039 ,  G03F7/09 ,  G03F7/095 ,  G03F7/34 ,  G03C1/76 ,  G03F7/26

    CPC classification number: G03F7/0955 ,  G03F7/34

    Abstract: The present invention provides a negative-working photosensitive imaging element comprising on a hydrophilic surface of a support in the order given (i) a hydrophobic photopolymerizable composition capable of being irradiated with actinic light through the support and/or through the front and containing at least one unsaturated compound with at least one polymerizable ethylenically unsaturated group, at least one hydrophobic thermoplastic polymer and at least one photoinitiator, and (ii) optionally a receptor layer, characterized in that said hydrophobic photopolymerizable composition comprises in the order given (i) a polymerizable layer contiguous to said hydrophilic surface and comprising at least part of said at least one unsaturated compound and (ii) a hydrophobic photosensitive layer contiguous to said polymerizable layer comprising at least part of said at least one hydrophobic thermoplastic polymer and of said at least one photoinitiator.The present invention also provides a method for obtaining a lithographic plate of high quality with said imaging element.

    Abstract translation: 本发明提供一种负性光敏成像元件，其按照以下顺序包含在载体的亲水性表面上：（i）疏水性光聚合性组合物，其能够通过载体和/或通过前面并通过前部照射光化学光，并且至少含有 一种具有至少一个可聚合烯键式不饱和基团的不饱和化合物，至少一种疏水性热塑性聚合物和至少一种光引发剂，和（ii）任选的受体层，其特征在于所述疏水性可光聚合组合物按照下列顺序包含：（i） 所述至少一部分所述至少一种不饱和化合物和（ii）与所述可聚合层邻接的疏水光敏层，其包含至少部分所述至少一种疏水性热塑性聚合物和所述至少一种光引发剂 。 本发明还提供了一种利用所述成像元件获得高质量的平版印刷版的方法。

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