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    Method for accurate exposure of small dots on a heat-sensitive positive-working lithographic printing plate material
    2.
    发明授权
    Method for accurate exposure of small dots on a heat-sensitive positive-working lithographic printing plate material 有权
    在热敏正性平版印刷版材料上精确曝光小点的方法

    公开(公告)号：US07467587B2

    公开(公告)日：2008-12-23

    申请号：US11114210

    申请日：2005-04-21

    申请人： Joan Vermeersch ,  Wim Sap ,  Marc Van Damme

    发明人： Joan Vermeersch ,  Wim Sap ,  Marc Van Damme

    IPC分类号： B41C1/10 ,  B41M1/06 ,  G03F7/00

    CPC分类号： B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262

    摘要： A method is disclosed for accurate reproduction of high-quality halftone images comprising microdots by means of lithographic plate materials which comprise a heat-sensitive positive-working coating that requires wet processing. Such microdots have a dot size ≦25 μm and may be obtained by stochastic screening or by amplitude-modulated screening at a ruling of not less than 150 lpi. It has been established that the “physical right exposure energy density” (physical REED) lies in the range from CP to 1.5*CP, wherein the physical REED is defined as the energy density at which the physical area on the plate, occupied by a microdot corresponding to a 50% halftone in the image data, coincides with the 50% target value; and wherein CP is the clearing point of the plate which is defined as the minimum energy density that is required to obtain, after processing, a dissolution of 95% of the coating. An accurate reproduction of microdots can therefore be achieved by exposing the material with light having an energy density in the range from CP to 1.5*CP. Loss of microdots by overexposure is thereby avoided.

    摘要翻译： 公开了一种用于通过平版印刷材料精确再现包含微点的高质量半色调图像的方法，该平版印刷材料包括需要湿法处理的热敏正性涂层。 这样的微点具有<25μm的点大小，并且可以通过随机筛选或通过幅度调制筛选获得，尺寸不小于150lpi。 已经确定的是，“身体右曝光能量密度”（物理REED）在CP到1.5 * CP的范围内，其中物理REED被定义为板上的物理区域的能量密度，由 在图像数据中对应于50％半色调的微点符合50％的目标值; 并且其中CP是板的清除点，其被定义为在加工后95％的涂层的溶解所需的最小能量密度。 因此，通过用能量密度在CP至1.5×CP范围内的光使材料曝光，可以实现微点的精确再现。 从而避免由于过度曝光导致的微点损失。

    Method for making positive working printing plates from a heat mode sensitive imaging element
    3.
    发明授权
    Method for making positive working printing plates from a heat mode sensitive imaging element 有权
    从热模式敏感成像元件制造正性印刷版的方法

    公开(公告)号：US06248503B1

    公开(公告)日：2001-06-19

    申请号：US09186613

    申请日：1998-11-06

    申请人： Joan Vermeersch ,  Marc Van Damme ,  Andreas Elsässer ,  Inge Claes

    发明人： Joan Vermeersch ,  Marc Van Damme ,  Andreas Elsässer ,  Inge Claes

    IPC分类号： G03F7004

    CPC分类号： B41C1/10 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262

    摘要： According to the present invention there is provided a method for making a lithographic printing plate comprising the steps of a) exposing imagewise to IR-radiation a heat mode imaging element having on a lithographic base with a hydrophilic surface a first layer including a polymer, soluble in an aqueous alkaline solution and a top layer on the same side of the lithographic base as the first layer which top layer is unpenetrable by an alkaline developer and contains a compound capable of converting light into heat, wherein said first layer and said top layer may be one and the same layer; and b) developing said imagewise exposed heat mode imaging element with said alkaline developer whereby the exposed areas of the first and the top layer, which may be the same, are dissolved and the unexposed areas of the first layer remain undissolved characterized in that said alkaline developer has a pH of at least 12 and a surface tension of at least 30 mN/m.

    摘要翻译： 根据本发明，提供了一种制备平版印刷版的方法，包括以下步骤：a）将具有亲水表面的光学成像元件的热模式成像元件成像曝光于包含聚合物的第一层，所述第一层可溶于 碱性水溶液和位于与第一层相同的一侧的顶层，该顶层不能被碱性显影剂穿透，并且含有能够将光转化成热的化合物，其中所述第一层和所述顶层可以是 同一层; 和b）用所述碱性显影剂显影所述成像曝光的热模式成像元件，由此第一层和顶层的可能相同的暴露区域被溶解，并且第一层的未曝光区域保持未溶解，其特征在于所述碱性显影剂 具有至少12的pH和至少30mN / m的表面张力。

    Imaging element for producing a lithographic plate therewith
    7.
    发明授权
    Imaging element for producing a lithographic plate therewith 失效
    用于制造平版印刷版的成像元件

    公开(公告)号：US6080523A

    公开(公告)日：2000-06-27

    申请号：US235318

    申请日：1999-01-22

    申请人： Joan Vermeersch ,  Marc Van Damme ,  Dirk Kokkelenberg ,  Inge Claes

    发明人： Joan Vermeersch ,  Marc Van Damme ,  Dirk Kokkelenberg ,  Inge Claes

    IPC分类号： G03F1/00 ,  G03F7/11

    CPC分类号： G03F7/202

    摘要： According to the present invention there is provided an imaging element comprising on a support having a hydrophilic surface in the order given a photosensitive layer insoluble in an aqueous alkaline solution and capable of becoming soluble in said aqueous alkaline solution upon exposure with actinic light and a thermosensitive layer comprising a masking dye rendering said thermosensitive layer opaque to light for which said photosensitive layer has spectral sensitivity and said imaging element further comprising a compound A capable of converting light into heat comprised in said thermosensitive layer or a layer adjacent thereto, characterized in that said thermosensitive layer further comprises thermoplastic particles of a hydrophobic polymer.

    摘要翻译： 根据本发明，提供了一种成像元件，其包含在具有亲水表面的支持体上，其顺序为给定不溶于碱性水溶液的感光层，并且当用光化学曝光并且能够变得易溶于碱性水溶液时， 所述掩模染料使所述热敏层不透光，所述光敏层对于所述感光层具有光谱灵敏度的光，并且所述成像元件还包含能够将光转换成包含在所述热敏层中的热或与其相邻的层的化合物A，其特征在于所述 热敏层还包括疏水性聚合物的热塑性颗粒。

    Imaging element comprising a hydrophobic photopolymerizable composition and method for producing lithographic plates therewith
    8.
    发明授权
    Imaging element comprising a hydrophobic photopolymerizable composition and method for producing lithographic plates therewith 失效
    包含疏水性光聚合组合物的成像元件及其制造平版印刷版的方法

    公开(公告)号：US5922506A

    公开(公告)日：1999-07-13

    申请号：US539960

    申请日：1995-10-06

    申请人： Yvan Hoogmartens ,  Marc Van Damme ,  Joan Vermeersch ,  Yves Verburgh

    发明人： Yvan Hoogmartens ,  Marc Van Damme ,  Joan Vermeersch ,  Yves Verburgh

    IPC分类号： G03F7/004 ,  G03F7/00 ,  G03F7/027 ,  G03F7/028 ,  G03F7/033 ,  G03F7/038 ,  G03F7/039 ,  G03F7/09 ,  G03F7/095 ,  G03F7/34 ,  G03C1/76 ,  G03F7/26

    CPC分类号： G03F7/0955 ,  G03F7/34

    摘要： The present invention provides a negative-working photosensitive imaging element comprising on a hydrophilic surface of a support in the order given (i) a hydrophobic photopolymerizable composition capable of being irradiated with actinic light through the support and/or through the front and containing at least one unsaturated compound with at least one polymerizable ethylenically unsaturated group, at least one hydrophobic thermoplastic polymer and at least one photoinitiator, and (ii) optionally a receptor layer, characterized in that said hydrophobic photopolymerizable composition comprises in the order given (i) a polymerizable layer contiguous to said hydrophilic surface and comprising at least part of said at least one unsaturated compound and (ii) a hydrophobic photosensitive layer contiguous to said polymerizable layer comprising at least part of said at least one hydrophobic thermoplastic polymer and of said at least one photoinitiator.The present invention also provides a method for obtaining a lithographic plate of high quality with said imaging element.

    摘要翻译： 本发明提供一种负性光敏成像元件，其按照以下顺序包含在载体的亲水性表面上：（i）疏水性光聚合性组合物，其能够通过载体和/或通过前面并通过前部照射光化学光，并且至少含有 一种具有至少一个可聚合烯键式不饱和基团的不饱和化合物，至少一种疏水性热塑性聚合物和至少一种光引发剂，和（ii）任选的受体层，其特征在于所述疏水性可光聚合组合物按照下列顺序包含：（i） 所述至少一部分所述至少一种不饱和化合物和（ii）与所述可聚合层邻接的疏水光敏层，其包含至少部分所述至少一种疏水性热塑性聚合物和所述至少一种光引发剂 。 本发明还提供了一种利用所述成像元件获得高质量的平版印刷版的方法。

    Aqueous silicate treatment method for preparing a hydrophilic surface of an lithographic printing plate aluminum base
    10.
    发明授权
    Aqueous silicate treatment method for preparing a hydrophilic surface of an lithographic printing plate aluminum base 失效
    用于制备平版印刷版铝基底的亲水表面的硅酸水溶液处理方法

    公开(公告)号：US5811215A

    公开(公告)日：1998-09-22

    申请号：US826230

    申请日：1997-03-27

    申请人： Marc Van Damme ,  Joan Vermeersch

    发明人： Marc Van Damme ,  Joan Vermeersch

    IPC分类号： G03F7/09 ,  B41C1/055 ,  B41N3/03 ,  B41N3/08 ,  C25D11/18 ,  G03F7/00 ,  G03F7/34 ,  G03F7/07 ,  G03F7/039

    CPC分类号： B41N3/034 ,  Y10S430/165

    摘要： According to the present invention there is provided a method for preparing a hydrophilic surface of an aluminum lithographic base comprising the steps of roughening and anodizing a side of an aluminum foil and sealing said side of the aluminum foil with hot water within a temperature range from 70.degree. C. to 100.degree. C. for at least 5 seconds and rinsing said side of the aluminum foil with water characterized in that between said hot water treatment and said rinsing said side of the aluminum foil is treated with an aqueous silicate solution within a temperature range from 70.degree. C. to 100.degree. C. for at least 5 seconds.

    摘要翻译： 根据本发明，提供一种制备铝版印刷版基材的亲水表面的方法，包括以下步骤：使铝箔的一面粗糙化并阳极化，并用热水密封铝箔的一侧，温度范围为70℃ 在100℃下进行至少5秒钟，并用水冲洗所述铝箔的一侧，其特征在于，在所述热水处理和所述漂洗之间，铝箔的所述侧面用硅酸盐水溶液在温度 范围从70℃至100℃至少5秒。