公开(公告)号：US08637353B2

公开(公告)日：2014-01-28

申请号：US13013378

申请日：2011-01-25

申请人： Michel J. Abou-Khalil ,  Robert J. Gauthier, Jr. ,  Tom C. Lee ,  Junjun Li ,  Souvick Mitra ,  Christopher S. Putnam

发明人： Michel J. Abou-Khalil ,  Robert J. Gauthier, Jr. ,  Tom C. Lee ,  Junjun Li ,  Souvick Mitra ,  Christopher S. Putnam

IPC分类号： H01L21/82

CPC分类号： H01L22/30 ,  H01L21/76886 ,  H01L21/76898 ,  H01L22/14 ,  H01L22/20 ,  H01L25/0657 ,  H01L25/50 ,  H01L2225/06541 ,  H01L2225/06596 ,  H01L2924/0002 ,  Y10T29/5313 ,  Y10T29/532 ,  H01L2924/00

摘要： Methods and systems for altering the electrical resistance of a wiring path. The electrical resistance of the wiring path is compared with a target electrical resistance value. If the electrical resistance of the wiring path exceeds the target electrical resistance value, an electrical current is selectively applied to the wiring path to physically alter a portion of the wiring path. The current may be selected to alter the wiring path such that the electrical resistance drops to a value less than or equal to the target electrical resistance value.

摘要翻译： 用于改变布线路径的电阻的方法和系统。 将布线路径的电阻与目标电阻值进行比较。 如果布线路径的电阻超过目标电阻值，则选择性地向布线路径施加电流，以物理地改变布线路径的一部分。 可以选择电流来改变布线路径，使得电阻下降到小于或等于目标电阻值的值。

公开(公告)号：US08503140B2

公开(公告)日：2013-08-06

申请号：US12898013

申请日：2010-10-05

申请人： Michel J. Abou-Khalil ,  Robert J. Gauthier, Jr. ,  Tom C. Lee ,  Junjun Li ,  Souvick Mitra ,  Christopher S. Putnam

发明人： Michel J. Abou-Khalil ,  Robert J. Gauthier, Jr. ,  Tom C. Lee ,  Junjun Li ,  Souvick Mitra ,  Christopher S. Putnam

IPC分类号： H02H9/00

CPC分类号： H01L27/0262 ,  H01L29/747 ,  H01L29/87 ,  H02H9/04

摘要： Bi-directional back-to-back stacked SCRs for high-voltage pin ESD protection, methods of manufacture and design structures are provided. The device includes a symmetrical bi-directional back-to-back stacked silicon controlled rectifier (SCR). An anode of a first of the back-to-back stacked SCR is connected to an input. An anode of a second of the back-to-back stacked SCR is connected to ground. Cathodes of the first and second of the back-to-back stacked SCR are connected together. Each of the symmetrical bi-directional back-to-back SCRs include a pair of diodes directing current towards the cathodes which, upon application of a voltage, become reverse biased effectively and deactivating elements from one of the symmetrical bi-directional back-to-back SCRs while the diodes of another of the symmetrical bi-directional back-to-back SCRs direct current in the same direction as the reverse biased diodes.

摘要翻译： 提供用于高压针ESD保护的双向背对背堆叠SCR，制造方法和设计结构。 该器件包括对称双向背对背层叠可控硅整流器（SCR）。 背对背堆叠的SCR中的第一个的阳极连接到输入。 背对背堆叠的SCR的第二个的阳极连接到地面。 第一个和第二个背靠背堆叠的SCR的阴极连接在一起。 对称双向背靠背SCR中的每一个包括一对二极管，其引导电流朝向阴极，其在施加电压时有效地变得有效地反向偏置，并且从对称的双向后向SCR中的一个去激活元件， 另一个对称双向背对背SCR的二极管在与反向偏置二极管相同的方向上直流电流，反向SCR。

公开(公告)号：US20120187525A1

公开(公告)日：2012-07-26

申请号：US13012137

申请日：2011-01-24

申请人： Michel J. Abou-Khalil ,  Robert J. Gauthier, JR. ,  Tom C. Lee ,  Junjun Li ,  Souvick Mitra ,  Christopher S. Putnam

发明人： Michel J. Abou-Khalil ,  Robert J. Gauthier, JR. ,  Tom C. Lee ,  Junjun Li ,  Souvick Mitra ,  Christopher S. Putnam

IPC分类号： H01L29/12 ,  G06F17/50 ,  H01L21/36

CPC分类号： H01L27/0255 ,  G06F17/5022 ,  G06F17/5045 ,  H01L27/0262 ,  H01L27/1203 ,  H01L29/6609 ,  H01L29/66393 ,  H01L29/7436 ,  H01L29/861

摘要： Device structures with a reduced junction area in an SOI process, methods of making the device structures, and design structures for a lateral diode. The device structure includes one or more dielectric regions, such as STI regions, positioned in the device region and intersecting the p-n junction between an anode and cathode. The dielectric regions, which may be formed using shallow trench isolation techniques, function to reduce the width of a p-n junction with respect to the width area of the cathode at a location spaced laterally from the p-n junction and the anode. The width difference and presence of the dielectric regions creates an asymmetrical diode structure. The volume of the device region occupied by the dielectric regions is minimized to preserve the volume of the cathode and anode.

摘要翻译： 在SOI工艺中具有减小的结面积的器件结构，制造器件结构的方法以及横向二极管的设计结构。 器件结构包括位于器件区域中并与阳极和阴极之间的p-n结相交的一个或多个电介质区域，例如STI区域。 可以使用浅沟槽隔离技术形成的电介质区域用于在p-n结和阳极侧向间隔的位置处减小p-n结相对于阴极宽度区域的宽度。 介质区域的宽度差和存在产生不对称二极管结构。 由电介质区域占据的器件区域的体积被最小化以保持阴极和阳极的体积。

公开(公告)号：US08217455B2

公开(公告)日：2012-07-10

申请号：US12102032

申请日：2008-04-14

申请人： Michel J. Abou-Khalil ,  Robert J. Gauthier, Jr. ,  Tom C. Lee ,  Junjun Li ,  Christopher S. Putnam ,  Souvick Mitra

发明人： Michel J. Abou-Khalil ,  Robert J. Gauthier, Jr. ,  Tom C. Lee ,  Junjun Li ,  Christopher S. Putnam ,  Souvick Mitra

IPC分类号： H01L27/12

CPC分类号： H01L27/1203 ,  H01L27/0248

摘要： Semiconductor-on-insulator device structures with enhanced electrostatic discharge protection, and design structures for an integrated circuit with device structures exhibiting enhanced electrostatic discharge protection. A device is formed in a body region of a device layer of a semiconductor-on-insulator substrate, which is bounded by an inner peripheral sidewall of an annular dielectric-filled isolation structure that extends from a top surface of the device layer to the insulating layer of the semiconductor-on-insulator substrate. An annular conductive interconnect extends through the body region and the insulating layer to connect the body region with the bulk wafer of the semiconductor-on-insulator substrate. The annular conductive interconnect is disposed inside the inner peripheral sidewall of the isolation structure, which annularly encircles the body region.

摘要翻译： 具有增强的静电放电保护的绝缘体上半导体器件结构以及具有增强的静电放电保护的器件结构的集成电路的设计结构。 一种器件形成在绝缘体上半导体衬底的器件层的体区中，该衬底由环形电介质填充的隔离结构的内周侧壁限定，该隔离结构从器件层的顶表面延伸到绝缘体 绝缘体上半导体衬底的层。 环形导电互连延伸穿过主体区域和绝缘层，以将体区域与绝缘体上半导体衬底的体晶片连接。 环形导电互连件设置在隔离结构的内周侧壁的内侧，环形环绕主体区域。

公开(公告)号：US07956671B2

公开(公告)日：2011-06-07

申请号：US12496002

申请日：2009-07-01

申请人： Michel J. Abou-Khalil ,  Tom C. Lee ,  Junjun Li ,  Robert J. Gauthier, Jr. ,  Christopher S. Putnam ,  Souvick Mitra

发明人： Michel J. Abou-Khalil ,  Tom C. Lee ,  Junjun Li ,  Robert J. Gauthier, Jr. ,  Christopher S. Putnam ,  Souvick Mitra

IPC分类号： H01L23/52

CPC分类号： G11C17/16 ,  G11C11/5692 ,  H01L23/5252 ,  H01L23/5256 ,  H01L27/101 ,  H01L27/112 ,  H01L27/11206 ,  H01L45/085 ,  H01L45/1206 ,  H01L45/14 ,  H01L2924/0002 ,  H01L2924/00

摘要： In one embodiment of an e-fuse programming/re-programming circuit, the e-fuse has two short high atomic diffusion resistance conductor layers positioned on opposite sides and at a same end of a long low atomic diffusion resistance conductor layer. A voltage source is used to vary the polarity and, optionally, the magnitude of voltage applied to the terminals in order to control bi-directional flow of electrons within the long conductor layer and, thereby formation of opens and/or shorts at the long conductor layer-short conductor layer interfaces. The formation of such opens and/or shorts can be used to achieve different programming states. Other circuit structure embodiments incorporate e-fuses with additional conductor layers and additional terminals so as to allow for even more programming states. Also disclosed are embodiments of associated e-fuse programming and re-programming methods.

摘要翻译： 在电熔丝编程/重新编程电路的一个实施例中，电熔丝具有位于长低的原子扩散电阻较长的导体层的相对侧和同一端的两个短的高原子扩散电阻的导体层。 电压源用于改变施加到端子的电压的极性和可选的电压大小，以便控制长导体层内电子的双向流动，从而在长导体上形成开路和/或短路 层 - 短导体层接口。 可以使用这种打开和/或短路的形成来实现不同的编程状态。 其他电路结构实施例包括具有附加导体层和附加端子的电子保险丝，以便允许甚至更多的编程状态。 还公开了相关联的电熔丝编程和重新编程方法的实施例。

公开(公告)号：US20090256202A1

公开(公告)日：2009-10-15

申请号：US12102032

申请日：2008-04-14

申请人： Michel J. Abou-Khalil ,  Robert J. Gauthier, JR. ,  Tom C. Lee ,  Junjun Li ,  Christopher S. Putnam ,  Souvick Mitra

发明人： Michel J. Abou-Khalil ,  Robert J. Gauthier, JR. ,  Tom C. Lee ,  Junjun Li ,  Christopher S. Putnam ,  Souvick Mitra

IPC分类号： H01L29/786

CPC分类号： H01L27/1203 ,  H01L27/0248

摘要： Semiconductor-on-insulator device structures with enhanced electrostatic discharge protection, and design structures for an integrated circuit with device structures exhibiting enhanced electrostatic discharge protection. A device is formed in a body region of a device layer of a semiconductor-on-insulator substrate, which is bounded by an inner peripheral sidewall of an annular dielectric-filled isolation structure that extends from a top surface of the device layer to the insulating layer of the semiconductor-on-insulator substrate. An annular conductive interconnect extends through the body region and the insulating layer to connect the body region with the bulk wafer of the semiconductor-on-insulator substrate. The annular conductive interconnect is disposed inside the inner peripheral sidewall of the isolation structure, which annularly encircles the body region.

摘要翻译： 具有增强的静电放电保护的绝缘体上半导体器件结构以及具有增强的静电放电保护的器件结构的集成电路的设计结构。 一种器件形成在绝缘体上半导体衬底的器件层的体区中，该衬底由环形电介质填充的隔离结构的内周侧壁限定，该隔离结构从器件层的顶表面延伸到绝缘体 绝缘体上半导体衬底的层。 环形导电互连延伸穿过主体区域和绝缘层，以将体区域与绝缘体上半导体衬底的体晶片连接。 环形导电互连件设置在隔离结构的内周侧壁的内侧，环形环绕主体区域。

公开(公告)号：US20090160013A1

公开(公告)日：2009-06-25

申请号：US11960030

申请日：2007-12-19

申请人： Michel J. Abou-Khalil ,  Robert J. Gauthier, JR. ,  Tom C. Lee ,  Junjun Li ,  Souvick Mitra ,  Christopher S. Putnam

发明人： Michel J. Abou-Khalil ,  Robert J. Gauthier, JR. ,  Tom C. Lee ,  Junjun Li ,  Souvick Mitra ,  Christopher S. Putnam

IPC分类号： H01L29/00 ,  H01L21/4763

CPC分类号： H01L23/34 ,  H01L21/743 ,  H01L21/76877 ,  H01L21/84 ,  H01L23/3677 ,  H01L27/0255 ,  H01L27/1203 ,  H01L2924/0002 ,  H01L2924/12044 ,  H01L2924/00

摘要： A heat generating component of a semiconductor device is located between two heavily doped semiconductor regions in a semiconductor substrate. The heat generating component may be a middle portion of a diode having a light doping, a lightly doped p-n junction between a cathode and anode of a silicon controlled rectifier, or a resistive portion of a doped semiconductor resistor. At least one thermally conductive via comprising a metal or a non-metallic conductive material is place directly on the heat generating component. Alternatively, a thin dielectric layer may be formed between the heat generating component and the at least one thermally conductive via. The at least one thermally conductive via may, or may not, be connected to a back-end-of-line metal wire, which may be connected to higher level of metal wiring or to a handle substrate through a buried insulator layer.

摘要翻译： 半导体器件的发热元件位于半导体衬底中的两个重掺杂半导体区之间。 发热部件可以是具有轻掺杂的二极管的中间部分，可控硅整流器的阴极和阳极之间的轻掺杂p-n结或掺杂半导体电阻器的电阻部分。 至少一个包含金属或非金属导电材料的导热通孔直接放置在发热部件上。 或者，可以在发热部件和至少一个导热通孔之间形成薄介电层。 至少一个导热通孔可以连接到或可以不连接到后端金属线，其可以通过掩埋绝缘体层连接到较高级别的金属布线或者与手柄基板连接。

公开(公告)号：US08642452B2

公开(公告)日：2014-02-04

申请号：US13012137

申请日：2011-01-24

申请人： Michel J. Abou-Khalil ,  Robert J. Gauthier, Jr. ,  Tom C. Lee ,  Junjun Li ,  Souvick Mitra ,  Christopher S. Putnam

发明人： Michel J. Abou-Khalil ,  Robert J. Gauthier, Jr. ,  Tom C. Lee ,  Junjun Li ,  Souvick Mitra ,  Christopher S. Putnam

IPC分类号： H01L21/36

CPC分类号： H01L27/0255 ,  G06F17/5022 ,  G06F17/5045 ,  H01L27/0262 ,  H01L27/1203 ,  H01L29/6609 ,  H01L29/66393 ,  H01L29/7436 ,  H01L29/861

摘要： Device structures with a reduced junction area in an SOI process, methods of making the device structures, and design structures for a lateral diode. The device structure includes one or more dielectric regions, such as STI regions, positioned in the device region and intersecting the p-n junction between an anode and cathode. The dielectric regions, which may be formed using shallow trench isolation techniques, function to reduce the width of a p-n junction with respect to the width area of the cathode at a location spaced laterally from the p-n junction and the anode. The width difference and presence of the dielectric regions creates an asymmetrical diode structure. The volume of the device region occupied by the dielectric regions is minimized to preserve the volume of the cathode and anode.

公开(公告)号：US08445355B2

公开(公告)日：2013-05-21

申请号：US12969004

申请日：2010-12-15

申请人： Michel J. Abou-Khalil ,  Robert J. Gauthier, Jr. ,  Tom C. Lee ,  Junjun Li ,  Souvick Mitra ,  Christopher S. Putnam ,  Anthony K. Stamper

发明人： Michel J. Abou-Khalil ,  Robert J. Gauthier, Jr. ,  Tom C. Lee ,  Junjun Li ,  Souvick Mitra ,  Christopher S. Putnam ,  Anthony K. Stamper

IPC分类号： H01L21/20

CPC分类号： H01L28/82 ,  H01L23/5223 ,  H01L27/0207 ,  H01L28/90 ,  H01L2924/0002 ,  H01L2924/00

摘要： Metal-insulator-metal (MIM) capacitors and methods for fabricating MIM capacitors. The MIM capacitor includes an interlayer dielectric (ILD) layer with apertures each bounded by a plurality of sidewalls and each extending from the top surface of the ILD layer into the first interlayer dielectric layer. A layer stack, which is disposed on the sidewalls of the apertures and the top surface of the ILD layer, includes a bottom conductive electrode, a top conductive electrode, and a capacitor dielectric between the bottom and top conductive electrodes.

摘要翻译： 金属绝缘体金属（MIM）电容器和制造MIM电容器的方法。 MIM电容器包括层间绝缘层（ILD）层，其中各孔由多个侧壁限定，并且各自从ILD层的顶表面延伸到第一层间电介质层。 布置在孔的侧壁和ILD层的顶表面上的层叠层包括底部导电电极，顶部导电电极和位于底部和顶部导电电极之间的电容器电介质。

公开(公告)号：US08421128B2

公开(公告)日：2013-04-16

申请号：US11960030

申请日：2007-12-19

申请人： Michel J. Abou-Khalil ,  Robert J. Gauthier, Jr. ,  Tom C. Lee ,  Junjun Li ,  Souvick Mitra ,  Christopher S. Putnam

发明人： Michel J. Abou-Khalil ,  Robert J. Gauthier, Jr. ,  Tom C. Lee ,  Junjun Li ,  Souvick Mitra ,  Christopher S. Putnam

IPC分类号： H01L23/62

CPC分类号： H01L23/34 ,  H01L21/743 ,  H01L21/76877 ,  H01L21/84 ,  H01L23/3677 ,  H01L27/0255 ,  H01L27/1203 ,  H01L2924/0002 ,  H01L2924/12044 ,  H01L2924/00

摘要： A heat generating component of a semiconductor device is located between two heavily doped semiconductor regions in a semiconductor substrate. The heat generating component may be a middle portion of a diode having a light doping, a lightly doped p-n junction between a cathode and anode of a silicon controlled rectifier, or a resistive portion of a doped semiconductor resistor. At least one thermally conductive via comprising a metal or a non-metallic conductive material is place directly on the heat generating component. Alternatively, a thin dielectric layer may be formed between the heat generating component and the at least one thermally conductive via. The at least one thermally conductive via may, or may not, be connected to a back-end-of-line metal wire, which may be connected to higher level of metal wiring or to a handle substrate through a buried insulator layer.

摘要翻译： 半导体器件的发热元件位于半导体衬底中的两个重掺杂半导体区之间。 发热部件可以是具有轻掺杂的二极管的中间部分，可控硅整流器的阴极和阳极之间的轻掺杂p-n结或掺杂半导体电阻器的电阻部分。 至少一个包含金属或非金属导电材料的导热通孔直接放置在发热部件上。 或者，可以在发热部件和至少一个导热通孔之间形成薄介电层。 至少一个导热通孔可以连接到或可以不连接到后端金属线，其可以通过掩埋绝缘体层连接到较高级别的金属布线或者与手柄基板连接。