MANUFACTURING PROCESS OF ELEMENT CHIP
    11.
    发明申请

    公开(公告)号:US20190221479A1

    公开(公告)日:2019-07-18

    申请号:US16246627

    申请日:2019-01-14

    CPC classification number: H01L21/78 H01L21/3065 H01L21/561 H01L21/6836

    Abstract: A manufacturing process of an element chip comprises steps of preparing a substrate including dicing regions and element regions, attaching a holding sheet held on a frame with a die attach film in between, forming a protective film covering the substrate, forming a plurality of grooves in the protective film along the dicing regions, plasma-etching the substrate to expose the die attach film and then die attach film along the dicing regions, and picking up each of the element chips along with the separated die attach film away from the holding sheet, wherein the die attach film has an area greater than that of the substrate, and wherein the protective film includes a first covering portion covering the substrate and a second covering portion covering at least a portion of the die attach film that extends beyond an outer edge of the substrate.

    LASER PROCESSING APPARATUS
    12.
    发明申请

    公开(公告)号:US20180326537A1

    公开(公告)日:2018-11-15

    申请号:US15962056

    申请日:2018-04-25

    CPC classification number: B23K26/142

    Abstract: Provided is a laser processing apparatus comprises a stage holding a substrate, the stage being movable in a first direction, a laser beam source radiating a laser beam onto the substrate, a dust-suction duct having a first optical path extending in a second direction perpendicular to the first direction, the laser beam travelling along the first optical path thereof, and an air aspirator aspirating an air toward a direction opposite to the first direction, wherein the dust-suction duct includes a pair of air-guiding plates opposed to each other along a third direction perpendicular to the first and second directions, and wherein the pair of the air-guiding plates are configured to have a gap therebetween such that it is narrowest in an optical path region and gets wider as it is far away from the optical path region in upstream and downstream regions thereof.

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