Abstract:
Polysilanesiloxane copolymers or resins and method of making are provided. The present disclosure further provides a method of applying the polysilanesiloxane copolymers onto a substrate to form a polysilanesiloxane film for use in photolithography (193 nm). The polysilanesiloxane films meet the basic performance criteria expected or desired for use in an antireflection coating (ARC) application,
Abstract:
A method for preparing a bis(alkoxysilylorgano)dicarboxylate includes reacting a haloorganoalkoxysilane, a dimetal salt of a dicarboxyl functional compound, and a phase transfer catalyst. A quaternary iminium compound of a polyaza, polycycloalkene is useful as the phase transfer catalyst. The product may be a bis(alkoxysilylalkyl)fumarate, which is useful as a coupling agent in rubber compositions for tire applications.
Abstract:
A method of producing silicon containing thin films by the thermal polymerization of a reactive gas mixture bisaminosilacyclobutane and source gas selected from a nitrogen providing gas, an oxygen providing gas and mixtures thereof. The films deposited may be silicon nitride, silicon carbonitride, silicon dioxide or carbon doped silicon dioxide. These films are useful as dielectrics, passivation coatings, barrier coatings, spacers, liners and/or stressors in semiconductor devices.
Abstract:
A composition comprising at lest 93% (w/w) neopentasilane; and a method of preparing neopentasilane, the method comprising treating a tetrakis-(trihalosilyl)silane with diisobutylaluminum hydride.