TFT FABRICATION PROCESS
    12.
    发明申请
    TFT FABRICATION PROCESS 有权
    TFT制造工艺

    公开(公告)号:US20060234430A1

    公开(公告)日:2006-10-19

    申请号:US11276634

    申请日:2006-03-08

    IPC分类号: H01L21/84 H01L21/31

    摘要: A process for fabricating a thin film transistor including: (a) depositing a semiconductor layer; and (b) depositing a multilayer gate dielectric prior to or subsequent to the depositing the semiconductor layer, wherein the multilayer dielectric comprises: (i) a first layer comprising a first material selected from the group consisting of an optionally substituted silsesquioxane, an optionally substituted silsesquioxane-metal oxide hybrid composition, an optionally substituted siloxane-metal oxide hybrid composition, and a mixture thereof, and (ii) a second layer in contact with the first layer, wherein the second layer comprises a second material, wherein the first layer is closer to the semiconductor layer than the second layer.

    摘要翻译: 一种制造薄膜晶体管的方法,包括:(a)沉积半导体层; 以及(b)在沉积半导体层之前或之后沉积多层栅极电介质,其中所述多层电介质包括:(i)第一层,其包含选自任选取代的倍半硅氧烷,任选取代的第一材料 倍半硅氧烷 - 金属氧化物杂化组合物,任选取代的硅氧烷 - 金属氧化物杂化组合物及其混合物,和(ii)与第一层接触的第二层,其中第二层包括第二材料,其中第一层为 比第二层更靠近半导体层。

    Multilayer gate dielectric
    13.
    发明申请
    Multilayer gate dielectric 审中-公开
    多层门电介质

    公开(公告)号:US20060231908A1

    公开(公告)日:2006-10-19

    申请号:US11104728

    申请日:2005-04-13

    IPC分类号: H01L29/94

    摘要: An electronic device composed of: a multilayer dielectric including: (i) a first layer composed of a first material selected from the group consisting of an optionally substituted silsesquioxane, an optionally substituted silsesquioxane-metal oxide hybrid composition, an optionally substituted siloxane-metal oxide hybrid composition, and a mixture thereof, and (ii) a second layer in contact with the first layer, wherein the second layer comprises a second material.

    摘要翻译: 一种电子器件,包括:多层电介质,其包括:(i)由选自任选取代的倍半硅氧烷,任选取代的倍半硅氧烷 - 金属氧化物杂化组合物,任选取代的硅氧烷 - 金属氧化物组成的组中的第一材料构成的第一层 杂化组合物及其混合物,和(ii)与第一层接触的第二层,其中第二层包含第二材料。

    Dielectric materials for electronic devices
    14.
    发明申请
    Dielectric materials for electronic devices 有权
    用于电子设备的电介质材料

    公开(公告)号:US20060097360A1

    公开(公告)日:2006-05-11

    申请号:US10982472

    申请日:2004-11-05

    IPC分类号: H01L23/58

    摘要: A dielectric material prepared from a siloxy/metal oxide hybrid composition, and electronic devices such as thin film transistors comprising such dielectric material are provided herein. The siloxy/metal oxide hybrid composition comprises a siloxy component such as, for example, a siloxane or silsesquioxane. The siloxy/metal oxide hybrid composition is useful for the preparation of dielectric layers for thin film transistors using solution deposition techniques

    摘要翻译: 本文提供由甲硅烷氧基/金属氧化物杂化组合物制备的电介质材料,以及包括这种介电材料的电子器件如薄膜晶体管。 甲硅烷氧基/金属氧化物杂化组合物包含甲硅烷氧基组分,例如硅氧烷或倍半硅氧烷。 甲硅烷氧基/金属氧化物杂化组合物可用于使用溶液沉积技术制备用于薄膜晶体管的电介质层

    Device with small molecular thiophene compound
    15.
    发明申请
    Device with small molecular thiophene compound 有权
    具有小分子噻吩化合物的装置

    公开(公告)号:US20050276981A1

    公开(公告)日:2005-12-15

    申请号:US10865445

    申请日:2004-06-10

    IPC分类号: B32B9/04 H01L51/05 H01L51/30

    摘要: An electronic device comprising a semiconductor layer in contact with a number of electrodes, wherein the semiconductor layer includes a small molecular thiophene compound consisting of a plurality of thiophene units, each thiophene unit being represented by structure (A) wherein each thiophene unit is bonded at either or both of the second ring position and the fifth ring position, wherein there is at least one thiophene unit where R1 is present at the third ring position or the fourth ring position, or at both the third ring position and the fourth ring position, wherein for any two adjacent thiophene units there is excluded the simultaneous presence of the same or different R1 at the 3-position of one thiophene unit and at the 3′-position of the other thiophene unit.

    摘要翻译: 一种电子器件,包括与多个电极接触的半导体层,其中所述半导体层包括由多个噻吩单元组成的小分子噻吩化合物,每个噻吩单元由结构(A)表示,其中每个噻吩单元以 第二环位置和第五环位置中的任一个或两个,其中存在至少一个噻吩单元,其中R 1存在于第三环位置或第四环位置处,或者在第三环位置处 环位置和第四环位置,其中对于任何两个相邻的噻吩单元,排除了在一个噻吩单元的3位和3'位上同时存在相同或不同的R 1' 其他噻吩单元的位置。

    SMALL MOLECULAR THIOPHENE COMPOUND HAVING DIVALENT LINKAGE
    17.
    发明申请
    SMALL MOLECULAR THIOPHENE COMPOUND HAVING DIVALENT LINKAGE 有权
    具有多个连接的小分子噻吩化合物

    公开(公告)号:US20080108834A1

    公开(公告)日:2008-05-08

    申请号:US11930389

    申请日:2007-10-31

    IPC分类号: C07D409/14 C07D409/04

    摘要: A small molecular thiophene compound consisting of: at least one divalent linkage; and a plurality of thiophene units, each thiophene unit being represented by structure (A) wherein each thiophene unit is bonded at either or both of the second ring position and the fifth ring position, wherein m is 0, 1, or 2, wherein each thiophene unit is the same or different from each other in terms of substituent number, substituent identity, and substituent position, wherein each R1 is independently selected from the group consisting of: (a) a hydrocarbon group, (b) a heteroatom containing group, and (c) a halogen, wherein there is at least one thiophene unit where R1 is present at the third ring position or the fourth ring position, or at both the third ring position and the fourth ring position, wherein for any two adjacent thiophene units as represented by structure (A1): there is excluded the simultaneous presence of the same or different R1 at the 3-position of one thiophene unit and at the 3′-position of the other thiophene unit, and wherein the number of the thiophene units is at least 6.

    摘要翻译: 一种由以下组成的小分子噻吩化合物:至少一个二价键; 和多个噻吩单元,每个噻吩单元由结构(A)表示,其中每个噻吩单元在第二环位置和第五环位置的一个或两个上键合,其中m为0,1或2,其中每个 噻吩单元在取代基数,取代基同一性和取代基位置上相同或不同,其中每个R 1独立地选自:(a)烃基, (b)含杂原子的基团,和(c)卤素,其中存在至少一个噻吩单元,其中R 1在第三个环位置或第四个环位置存在,或两个 第三环位置和第四环位置,其中对于由结构(A1)表示的任何两个相邻的噻吩单元:不排除在3位上同时存在相同或不同的R 1 一个噻吩单元和另一个噻吩单元的3'-位,其中 噻吩单元的数目至少为6。

    PROCESS TO FORM TFT GATE DIELECTRIC WITH CROSSLINKED POLYMER
    18.
    发明申请
    PROCESS TO FORM TFT GATE DIELECTRIC WITH CROSSLINKED POLYMER 审中-公开
    用交联聚合物形成TFT栅极电介质的工艺

    公开(公告)号:US20070259473A1

    公开(公告)日:2007-11-08

    申请号:US11611482

    申请日:2006-12-15

    IPC分类号: H01L21/00

    CPC分类号: H01L51/052 H01L51/0036

    摘要: A process for fabricating a thin film transistor including: (a) depositing a gate dielectric precursor composition, wherein the gate dielectric precursor composition includes a polymer comprising polymerized one or more monomers, wherein the one or more monomers includes an optionally substituted vinyl arylalcohol; and (b) irradiating the gate dielectric precursor composition to crosslink the polymer.

    摘要翻译: 一种制造薄膜晶体管的方法,包括:(a)沉积栅极电介质前体组合物,其中所述栅极电介质前体组合物包括包含聚合的一种或多种单体的聚合物,其中所述一种或多种单体包括任选取代的乙烯基芳基醇; 和(b)照射该栅介质前体组合物以交联该聚合物。

    Linked arylamine polymers
    19.
    发明申请
    Linked arylamine polymers 有权
    连接芳基胺聚合物

    公开(公告)号:US20070238858A1

    公开(公告)日:2007-10-11

    申请号:US11399065

    申请日:2006-04-06

    IPC分类号: C08G73/00

    摘要: A polymer of the following formula wherein Ar is aryl or heteroaryl; X represents CH2, sulfur, oxygen, selenium, NR′, or SiR″2 wherein R′ and R″ are each a suitable hydrocarbon; m represents the number of X substituents; and n represents the number of the repeating units.

    摘要翻译: 下式的聚合物,其中Ar是芳基或杂芳基; X表示CH 2,硫,氧,硒,NR'或SiR“2,其中R'和R”各自为合适的烃; m表示X取代基的数目; n表示重复单元的数量。

    Functionalized heteroacenes and electronic devices generated therefrom
    20.
    发明申请
    Functionalized heteroacenes and electronic devices generated therefrom 有权
    由其产生的官能化异氰酸酯和电子装置

    公开(公告)号:US20070235721A1

    公开(公告)日:2007-10-11

    申请号:US11398981

    申请日:2006-04-06

    IPC分类号: H01L29/08

    摘要: An electronic device, such as a thin film transistor containing a semiconductor of, for example, of the Formula (I) wherein R represents alkyl, alkoxy, aryl, heteroaryl or a suitable hydrocarbon; each R1 and R2 is independently hydrogen (H), a suitable hydrocarbon; a heteroatom containing group or a halogen; R3 and R4 are independently a suitable hydrocarbon, a heteroatom containing group, or a halogen; x and y represent the number of groups; Z represents sulfur, oxygen, selenium, or NR′ wherein R′ is hydrogen, alkyl, or aryl; and n and m represent the number of repeating units.

    摘要翻译: 电子器件,例如含有例如式(I)的半导体的薄膜晶体管,其中R表示烷基,烷氧基,芳基,杂芳基或合适的烃; 每个R 1和R 2独立地是氢(H),合适的烃; 含杂原子的基团或卤素; R 3和R 4独立地是合适的烃,含杂原子的基团或卤素; x和y表示组的数量; Z表示硫,氧,硒或NR',其中R'是氢,烷基或芳基; n和m表示重复单元的数目。