Semiconductor device
    12.
    发明授权
    Semiconductor device 有权
    半导体器件

    公开(公告)号:US09349727B2

    公开(公告)日:2016-05-24

    申请号:US14598127

    申请日:2015-01-15

    CPC classification number: H01L27/088 H01L21/823425 H01L27/0207 H01L29/7846

    Abstract: In a semiconductor device, an active region includes: a first impurity region to which a predetermined voltage is applied; second and third impurity regions forming a pair of conductive electrodes of an insulated gate field effect transistor; and at least one impurity region disposed between the first and second impurity regions. A voltage that causes electrical conduction between the second and third impurity regions is applied to a gate electrode disposed between the second and third impurity regions. All gate electrodes disposed between the first and second impurity regions are configured to be electrically connected to the first impurity region constantly. All impurity regions disposed between the first and second impurity regions are electrically isolated from the first and second impurity regions and maintained in a floating state.

    Abstract translation: 在半导体器件中,有源区包括:施加预定电压的第一杂质区; 形成绝缘栅场效应晶体管的一对导电电极的第二和第三杂质区; 以及设置在第一和第二杂质区域之间的至少一个杂质区域。 将引起第二和第三杂质区之间导电的电压施加到设置在第二和第三杂质区之间的栅电极。 设置在第一和第二杂质区域之间的所有栅极电极被配置为恒定地电连接到第一杂质区域。 设置在第一和第二杂质区域之间的所有杂质区域与第一和第二杂质区域电隔离并保持在浮置状态。

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