公开(公告)号：US07605926B1

公开(公告)日：2009-10-20

申请号：US12197035

申请日：2008-08-22

申请人： Jochen Hetzler ,  Ralf Arnold ,  Frank Schillke ,  Bernd Doerband

发明人： Jochen Hetzler ,  Ralf Arnold ,  Frank Schillke ,  Bernd Doerband

IPC分类号： G01B9/02 ,  G01B11/02

CPC分类号： G01B9/02039 ,  G01B9/02057 ,  G01M11/0221 ,  G01M11/025 ,  G01M11/0271

摘要： A method of positioning optical elements relative to each other uses an interferometer apparatus comprising a plurality of holograms generating beams of adjustment measuring light which are incident on optical surfaces of the optical elements. Interference patterns generated by superimposing adjustment measuring light of the beams reflected from the surfaces are indicative of positioning errors of the optical elements. The beams of adjustment measuring light may comprise focused beams forming a point focus on the optical surface and beams of light which is orthogonally incident on extended portions on the optical surface.

摘要翻译： 相对于彼此定位光学元件的方法使用包括多个全息图的干涉仪装置，其产生入射在光学元件的光学表面上的测量光的光束。 通过叠加来自表面反射的光束的调整测量光产生的干涉图案表示光学元件的定位误差。 调节光束测量光可以包括在光学表面上形成点聚焦的聚焦光束和正交入射在光学表面上的延伸部分上的光束。

公开(公告)号：US20090128829A1

公开(公告)日：2009-05-21

申请号：US12263564

申请日：2008-11-03

申请人： Frank Schillke ,  Rolf Freimann ,  Matthias Dreher

发明人： Frank Schillke ,  Rolf Freimann ,  Matthias Dreher

IPC分类号： G01B9/02

CPC分类号： G01B11/2441 ,  G01B9/02039

摘要： A method of determining a deviation of an actual shape from a desired shape of an optical surface (12; 103) includes: providing an incoming electromagnetic measuring wave (20; 113), providing two diffractive structures (47, 49; 145, 146, 141, 143) which are respectively designed to reshape the wavefront of an arriving wave, calibrating one of the two diffractive structures (47, 49; 145, 146, 141, 143) by radiating the incoming measuring wave (20; 113) onto the at least one diffractive structure to be calibrated (47, 49; 145, 146, 141, 143) and determining a calibration deviation of the actual wavefront from a desired wavefront of the measuring wave (20; 113) after interaction of the latter with the at least one diffractive structure to be calibrated (47, 49; 145, 146, 141, 143), positioning the two diffractive structures (47; 49; 145, 146, 141, 143) in the optical path of the incoming measuring wave (20; 113) such that individual rays of the measuring wave radiate through both diffractive structures (47; 49; 145, 146, 141, 143), and reshaping the incoming measuring wave (20; 113) by means of the two diffractive structures (47; 49; 145, 146, 141, 143) to form an adapted measuring wave (64; 114), the wavefront of which is adapted to the desired shape of the optical surface (12; 103), positioning the optical surface (12; 103) in the optical path of the adapted measuring wave (64, 114) so that the adapted measuring wave (64; 114) interacts with the optical surface (12; 103) and measuring the wavefront of the adapted measuring wave (64; 114) after interaction of the latter with the optical surface (12; 103).

摘要翻译： 确定实际形状与光学表面（12; 103）的期望形状的偏差的方法包括：提供输入的电磁测量波（20; 113），提供两个衍射结构（47,49; 145,146， 分别被设计成重新形成到达波的波前，通过将进入的测量波（20; 113）辐射到所述两个衍射结构（47,49; 145,146,141,143）中来校准所述两个衍射结构 至少一个待校准的衍射结构（47,49; 145,146,141,143），并且在后者与所述测量波的相互作用之后确定所述实际波前与所述测量波（20; 113）的期望波阵面的校准偏差 至少一个待校准的衍射结构（47,49; 145,146,141,143），将两个衍射结构（47; 49; 145,146,141,143）定位在入射测量波的光路中 20; 113），使得测量波的各个射线通过两个衍射辐射 结构（47; 49; 并且借助于所述两个衍射结构（47; 49; 145,146,141,143）对所述输入测量波（20; 113）重塑，以形成适应的测量波（64; 114 ），其波前适应于光学表面（12; 103）的期望形状，将光学表面（12; 103）定位在适配测量波（64,114）的光路中，使得适配测量 波（64; 114）与光学表面（12; 103）相互作用，并在后者与光学表面（12; 103）相互作用之后测量适应测量波（64; 114）的波前。

公开(公告)号：US06831794B2

公开(公告)日：2004-12-14

申请号：US10600288

申请日：2003-06-21

申请人： Karl-Heinz Schuster ,  Frank Schillke ,  Franz-Josef Stickel ,  Alexander Epple

发明人： Karl-Heinz Schuster ,  Frank Schillke ,  Franz-Josef Stickel ,  Alexander Epple

IPC分类号： G02B302

CPC分类号： G03F7/70241 ,  G02B13/143 ,  G02B13/22

摘要： A lens has at least one aspheric lens surface, an objective with at least one aspheric lens surface, and a projection exposure device for microlithography and a method for the production of microstructured components with an objective having at least one aspheric lens surface. The object of the invention is to provide a method by which new designs with aspheric lens surfaces can be generated without consultation with manufacturing, with this object attained by the measure of describing the aspheric lens surfaces by Zernike polynomials, which makes it is possible to undertake a classification of aspheric lens surfaces such that the respective aspheric lens surface can be polished and tested at a justifiable cost when at least two of three, or all three, of certain conditions are present.

摘要翻译： 透镜具有至少一个非球面透镜表面，具有至少一个非球面透镜表面的物镜和用于微光刻的投影曝光装置以及用于产生具有至少一个非球面透镜表面的物镜的微结构元件的方法。 本发明的目的是提供一种可以在不咨询制造的情况下产生具有非球面透镜表面的新设计的方法，该目的通过采用Zernike多项式描述非球面透镜表面的措施获得，这使得可以进行 非球面透镜表面的分类，使得当存在三种或全部三种某些条件中的至少两种时，可以以合理的成本对相应的非球面透镜表面进行抛光和测试。