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    Optical system, method of manufacturing an optical system and method of manufacturing an optical element
    1.
    发明授权
    Optical system, method of manufacturing an optical system and method of manufacturing an optical element 有权
    光学系统，制造光学系统的方法和制造光学元件的方法

    公开(公告)号：US07605926B1

    公开(公告)日：2009-10-20

    申请号：US12197035

    申请日：2008-08-22

    申请人： Jochen Hetzler ,  Ralf Arnold ,  Frank Schillke ,  Bernd Doerband

    发明人： Jochen Hetzler ,  Ralf Arnold ,  Frank Schillke ,  Bernd Doerband

    IPC分类号： G01B9/02 ,  G01B11/02

    CPC分类号： G01B9/02039 ,  G01B9/02057 ,  G01M11/0221 ,  G01M11/025 ,  G01M11/0271

    摘要： A method of positioning optical elements relative to each other uses an interferometer apparatus comprising a plurality of holograms generating beams of adjustment measuring light which are incident on optical surfaces of the optical elements. Interference patterns generated by superimposing adjustment measuring light of the beams reflected from the surfaces are indicative of positioning errors of the optical elements. The beams of adjustment measuring light may comprise focused beams forming a point focus on the optical surface and beams of light which is orthogonally incident on extended portions on the optical surface.

    摘要翻译： 相对于彼此定位光学元件的方法使用包括多个全息图的干涉仪装置，其产生入射在光学元件的光学表面上的测量光的光束。 通过叠加来自表面反射的光束的调整测量光产生的干涉图案表示光学元件的定位误差。 调节光束测量光可以包括在光学表面上形成点聚焦的聚焦光束和正交入射在光学表面上的延伸部分上的光束。

    Method for measuring and manufacturing an optical element and optical apparatus
    4.
    发明申请
    Method for measuring and manufacturing an optical element and optical apparatus 审中-公开
    光学元件和光学装置的测量和制造方法

    公开(公告)号：US20050225774A1

    公开(公告)日：2005-10-13

    申请号：US11098546

    申请日：2005-04-05

    申请人： Rolf Freimann ,  Susanne Beder ,  Guenther Seitz ,  Frank Schillke ,  Bernd Doerband ,  Heinz Martin ,  Franz Krug

    发明人： Rolf Freimann ,  Susanne Beder ,  Guenther Seitz ,  Frank Schillke ,  Bernd Doerband ,  Heinz Martin ,  Franz Krug

    IPC分类号： G01B9/02 ,  G01M11/02 ,  G02B13/18 ,  G02B27/62

    CPC分类号： G01M11/0214 ,  G01M11/025 ,  G01M11/0271 ,  G02B13/18 ,  G02B27/62

    摘要： A method of processing an optical element comprises testing the optical surface of the optical element using an interferometer optics for generating a beam of measuring light; wherein the interferometer optics has a plurality of optical elements which are configured and arranged such that the measuring light is substantially orthogonally incident on a reflecting surface, at each location thereof; and wherein the method further comprises: measuring at least one property of the interferometer optics, disposing the optical surface of the optical element at a measuring position relative to the interferometer optics within the beam of measuring light, and performing at least one interferometric measurement; determining deviations of the optical surface of the first optical element from a target shape thereof, based on the interferometric measurement and the at least one measured property of the interferometer optics.

    摘要翻译： 一种处理光学元件的方法包括使用用于产生测量光束的干涉仪光学器件来测试光学元件的光学表面; 其中所述干涉仪光学元件具有多个光学元件，所述多个光学元件被配置和布置成使得所述测量光在其每个位置处基本正交入射在反射表面上; 并且其中所述方法还包括：测量所述干涉仪光学器件的至少一个属性，将所述光学元件的光学表面相对于所述测量光束内的所述干涉仪光学器件设置在测量位置处，并且执行至少一个干涉测量; 基于干涉测量和干涉仪光学器件的至少一个测量特性，确定第一光学元件的光学表面与其目标形状的偏差。

    Method of manufacturing an optical system
    5.
    发明授权
    Method of manufacturing an optical system 有权
    制造光学系统的方法

    公开(公告)号：US07133225B1

    公开(公告)日：2006-11-07

    申请号：US10965909

    申请日：2004-10-18

    申请人： Rolf Freimann ,  Bernhard Fellner ,  Hans-Guenther Sachs ,  Hartmut Brandenburg ,  Bernd Doerband ,  Frank Schillke

    发明人： Rolf Freimann ,  Bernhard Fellner ,  Hans-Guenther Sachs ,  Hartmut Brandenburg ,  Bernd Doerband ,  Frank Schillke

    IPC分类号： G02B7/02 ,  G01B11/00 ,  G01N23/207

    CPC分类号： G02B7/023 ,  G02B7/1821 ,  G03F7/70258 ,  G03F7/70825

    摘要： A method of manufacturing an optical system comprises assembling an optical element on a mounting frame thereof. The mounting frame is disposed on a rotary table having an axis of rotation, and the mounting frame is adjusted such that a predefined axis of symmetry thereof is parallel to the axis of rotation. The optical element is placed on the mounting frame, and an interferometric measurement of a surface of the optical element is performed. The interferometric measurement is analyzed to arrange the optical element relative to the mounting frame such that a predefined axis of the optical element is parallel to the axis of rotation.

    摘要翻译： 制造光学系统的方法包括在其安装框架上组装光学元件。 安装框架设置在具有旋转轴线的旋转工作台上，并且调整安装框架使其预定的对称轴线平行于旋转轴线。 将光学元件放置在安装框架上，并执行光学元件的表面的干涉测量。 分析干涉测量以使光学元件相对于安装框架布置，使得光学元件的预定轴线平行于旋转轴线。

    Method of measuring a deviation of an optical surface from a target shape using interferometric measurement results
    7.
    发明授权
    Method of measuring a deviation of an optical surface from a target shape using interferometric measurement results 有权
    使用干涉测量结果测量光学表面与目标形状的偏差的方法

    公开(公告)号：US08508749B2

    公开(公告)日：2013-08-13

    申请号：US13609084

    申请日：2012-09-10

    申请人： Ralf Arnold ,  Stefan Schulte ,  Bernd Doerband

    发明人： Ralf Arnold ,  Stefan Schulte ,  Bernd Doerband

    IPC分类号： G01B11/02

    CPC分类号： G01B9/021 ,  G01B9/02039 ,  G01B11/2441 ,  G01M11/025 ,  G01M11/0271 ,  Y10T29/49771

    摘要： A method of measuring a deviation of an optical surface from a target shape and a method of manufacturing an optical element. This method of measuring the deviation includes: performing a first interferometric measurement using a first diffractive measurement structure, which is arranged to cover a first area of the optical surface, to provide a first interferometric measurement result, performing a second interferometric measurement using a second diffractive measurement structure, which is arranged to cover a second area of the optical surface different from the first area, to provide a second interferometric measurement result, and determining a deviation of the optical surface from the target shape.

    摘要翻译： 测量光学表面与目标形状的偏差的方法和制造光学元件的方法。 这种测量偏差的方法包括：使用被布置成覆盖光学表面的第一区域的第一衍射测量结构来执行第一干涉测量，以提供第一干涉测量结果，使用第二衍射进行第二干涉测量 测量结构被布置成覆盖与第一区域不同的光学表面的第二区域，以提供第二干涉测量结果，以及确定光学表面与目标形状的偏差。

    METHOD OF MEASURING A DEVIATION OF AN OPTICAL SURFACE FROM A TARGET SHAPE
    8.
    发明申请
    METHOD OF MEASURING A DEVIATION OF AN OPTICAL SURFACE FROM A TARGET SHAPE 有权
    测量目标形状的光学表面偏差的方法

    公开(公告)号：US20100177320A1

    公开(公告)日：2010-07-15

    申请号：US12684600

    申请日：2010-01-08

    申请人： Ralf Arnold ,  Stefan Schulte ,  Bernd Doerband

    发明人： Ralf Arnold ,  Stefan Schulte ,  Bernd Doerband

    IPC分类号： G01B11/02 ,  G02B13/18

    CPC分类号： G01B9/021 ,  G01B9/02039 ,  G01B11/2441 ,  G01M11/025 ,  G01M11/0271 ,  Y10T29/49771

    摘要： A method of aligning at least two wave shaping elements, a method of measuring a deviation of an optical surface from a target shape and a measuring apparatus for interferometrically measuring a deviation of an optical surface from a target shape. The method of aligning at least two wave shaping elements, each of which wave shaping elements has a diffractive measurement structure for adapting part of a wave front of incoming light to a respective portion of the target shape, includes: providing a first one of the wave shaping elements with a diffractive alignment structure, arranging the wave shaping elements relative to each other such that each of the diffractive measurement structures is traversed by a separate subset of rays of the incoming light during operation of the measuring apparatus, and aligning the first wave shaping element and a second one of the wave shaping elements relative to each other by evaluating alignment light having consecutively interacted with the diffractive alignment structure and with the second wave shaping element.

    摘要翻译： 对准至少两个波形整形元件的方法，测量光学表面与目标形状的偏差的方法和用于干涉测量光学表面与目标形状的偏差的测量装置。 对准至少两个波形整形元件的方法，其中每个波形整形元件具有衍射测量结构，用于将入射光的一部分波前适应到目标形状的相应部分，包括：提供第一波 具有衍射对准结构的成形元件，将波形整形元件相对于彼此布置，使得每个衍射测量结构在测量设备的操作期间被入射光的单独的子集子穿过，并且对准第一波形整形 元件和第二波形成形元件相对于彼此，通过评估与衍射对准结构和第二波形整形元件连续相互作用的对准光。

    Method of measuring a deviation of an optical surface from a target shape
    9.
    发明授权
    Method of measuring a deviation of an optical surface from a target shape 有权

    公开(公告)号：US08159678B2

    公开(公告)日：2012-04-17

    申请号：US13030748

    申请日：2011-02-18

    申请人： Ralf Arnold ,  Stefan Schulte ,  Bernd Doerband

    发明人： Ralf Arnold ,  Stefan Schulte ,  Bernd Doerband

    IPC分类号： G01B11/02

    摘要： A method of aligning at least two wave shaping elements, a method of measuring a deviation of an optical surface from a target shape and a measuring apparatus for interferometrically measuring a deviation of an optical surface from a target shape. The method of aligning at least two wave shaping elements, each of which wave shaping elements has a diffractive measurement structure for adapting part of a wave front of incoming light to a respective portion of the target shape, includes: providing a first one of the wave shaping elements with a diffractive alignment structure, arranging the wave shaping elements relative to each other such that each of the diffractive measurement structures is traversed by a separate subset of rays of the incoming light during operation of the measuring apparatus, and aligning the first wave shaping element and a second one of the wave shaping elements relative to each other by evaluating alignment light having consecutively interacted with the diffractive alignment structure and with the second wave shaping element.

    METHOD OF MEASURING A DEVIATION OF AN OPTICAL SURFACE FROM A TARGET SHAPE
    10.
    发明申请
    METHOD OF MEASURING A DEVIATION OF AN OPTICAL SURFACE FROM A TARGET SHAPE 有权
    测量目标形状的光学表面偏差的方法

    公开(公告)号：US20110141484A1

    公开(公告)日：2011-06-16

    申请号：US13030748

    申请日：2011-02-18

    申请人： Ralf ARNOLD ,  Stefan Schulte ,  Bernd Doerband

    发明人： Ralf ARNOLD ,  Stefan Schulte ,  Bernd Doerband

    IPC分类号： G01B11/02

    CPC分类号： G01B9/021 ,  G01B9/02039 ,  G01B11/2441 ,  G01M11/025 ,  G01M11/0271 ,  Y10T29/49771

    摘要： A method of aligning at least two wave shaping elements, a method of measuring a deviation of an optical surface from a target shape and a measuring apparatus for interferometrically measuring a deviation of an optical surface from a target shape. The method of aligning at least two wave shaping elements, each of which wave shaping elements has a diffractive measurement structure for adapting part of a wave front of incoming light to a respective portion of the target shape, includes: providing a first one of the wave shaping elements with a diffractive alignment structure, arranging the wave shaping elements relative to each other such that each of the diffractive measurement structures is traversed by a separate subset of rays of the incoming light during operation of the measuring apparatus, and aligning the first wave shaping element and a second one of the wave shaping elements relative to each other by evaluating alignment light having consecutively interacted with the diffractive alignment structure and with the second wave shaping element.

    摘要翻译： 对准至少两个波形整形元件的方法，测量光学表面与目标形状的偏差的方法和用于干涉测量光学表面与目标形状的偏差的测量装置。 对准至少两个波形整形元件的方法，其中每个波形整形元件具有衍射测量结构，用于将入射光的一部分波前适应到目标形状的相应部分，包括：提供第一波 具有衍射对准结构的成形元件，将波形整形元件相对于彼此布置，使得每个衍射测量结构在测量设备的操作期间被入射光的单独的子集子穿过，并且对准第一波形整形 元件和第二波形成形元件相对于彼此，通过评估与衍射对准结构和第二波形整形元件连续相互作用的对准光。