公开(公告)号：US06831794B2

公开(公告)日：2004-12-14

申请号：US10600288

申请日：2003-06-21

申请人： Karl-Heinz Schuster ,  Frank Schillke ,  Franz-Josef Stickel ,  Alexander Epple

发明人： Karl-Heinz Schuster ,  Frank Schillke ,  Franz-Josef Stickel ,  Alexander Epple

IPC分类号： G02B302

CPC分类号： G03F7/70241 ,  G02B13/143 ,  G02B13/22

摘要： A lens has at least one aspheric lens surface, an objective with at least one aspheric lens surface, and a projection exposure device for microlithography and a method for the production of microstructured components with an objective having at least one aspheric lens surface. The object of the invention is to provide a method by which new designs with aspheric lens surfaces can be generated without consultation with manufacturing, with this object attained by the measure of describing the aspheric lens surfaces by Zernike polynomials, which makes it is possible to undertake a classification of aspheric lens surfaces such that the respective aspheric lens surface can be polished and tested at a justifiable cost when at least two of three, or all three, of certain conditions are present.

摘要翻译： 透镜具有至少一个非球面透镜表面，具有至少一个非球面透镜表面的物镜和用于微光刻的投影曝光装置以及用于产生具有至少一个非球面透镜表面的物镜的微结构元件的方法。 本发明的目的是提供一种可以在不咨询制造的情况下产生具有非球面透镜表面的新设计的方法，该目的通过采用Zernike多项式描述非球面透镜表面的措施获得，这使得可以进行 非球面透镜表面的分类，使得当存在三种或全部三种某些条件中的至少两种时，可以以合理的成本对相应的非球面透镜表面进行抛光和测试。

公开(公告)号：US07728987B2

公开(公告)日：2010-06-01

申请号：US11596187

申请日：2004-05-14

申请人： Ralf Arnold ,  Bernd Dörband ,  Frank Schillke ,  Susanne Beder

发明人： Ralf Arnold ,  Bernd Dörband ,  Frank Schillke ,  Susanne Beder

IPC分类号： G01B11/02

CPC分类号： G01B11/2441

摘要： A method of manufacturing an optical element includes testing the optical element by using an interferometer optics generating a beam of measuring light illuminating only a sub-aperture of the tested optical element. The interferometer optics comprises a hologram. Results of the sub-aperture measurement are stitched together to obtain a measuring result with respect to the full surface of the optical element. Further, a method of calibrating the interferometer optics includes performing an interferometric measurement using a calibrating optics having a hologram covering only a sub-aperture of the full cross section of the beam of measuring light generated by the interferometer optics and stitching together the sub-aperture measurements to obtain a result indicative for the full cross section of the interferometer optics.

摘要翻译： 制造光学元件的方法包括通过使用产生仅照射被测光学元件的子孔径的测量光束的干涉仪光学元件来测试光学元件。 干涉仪光学器件包括全息图。 子孔径测量的结果被缝合在一起以获得关于光学元件的整个表面的测量结果。 此外，校准干涉仪光学器件的方法包括使用校准光学器件执行干涉测量，所述校准光学器件具有仅覆盖由干涉仪光学器件产生的测量光束的全部横截面的子孔径并将子孔缝合在一起的全息图 测量以获得指示干涉仪光学器件的完整横截面的结果。

公开(公告)号：US20050225774A1

公开(公告)日：2005-10-13

申请号：US11098546

申请日：2005-04-05

申请人： Rolf Freimann ,  Susanne Beder ,  Guenther Seitz ,  Frank Schillke ,  Bernd Doerband ,  Heinz Martin ,  Franz Krug

发明人： Rolf Freimann ,  Susanne Beder ,  Guenther Seitz ,  Frank Schillke ,  Bernd Doerband ,  Heinz Martin ,  Franz Krug

IPC分类号： G01B9/02 ,  G01M11/02 ,  G02B13/18 ,  G02B27/62

CPC分类号： G01M11/0214 ,  G01M11/025 ,  G01M11/0271 ,  G02B13/18 ,  G02B27/62

摘要： A method of processing an optical element comprises testing the optical surface of the optical element using an interferometer optics for generating a beam of measuring light; wherein the interferometer optics has a plurality of optical elements which are configured and arranged such that the measuring light is substantially orthogonally incident on a reflecting surface, at each location thereof; and wherein the method further comprises: measuring at least one property of the interferometer optics, disposing the optical surface of the optical element at a measuring position relative to the interferometer optics within the beam of measuring light, and performing at least one interferometric measurement; determining deviations of the optical surface of the first optical element from a target shape thereof, based on the interferometric measurement and the at least one measured property of the interferometer optics.

摘要翻译： 一种处理光学元件的方法包括使用用于产生测量光束的干涉仪光学器件来测试光学元件的光学表面; 其中所述干涉仪光学元件具有多个光学元件，所述多个光学元件被配置和布置成使得所述测量光在其每个位置处基本正交入射在反射表面上; 并且其中所述方法还包括：测量所述干涉仪光学器件的至少一个属性，将所述光学元件的光学表面相对于所述测量光束内的所述干涉仪光学器件设置在测量位置处，并且执行至少一个干涉测量; 基于干涉测量和干涉仪光学器件的至少一个测量特性，确定第一光学元件的光学表面与其目标形状的偏差。

公开(公告)号：US08345262B2

公开(公告)日：2013-01-01

申请号：US13361442

申请日：2012-01-30

申请人： Frank Schillke ,  Rolf Freimann ,  Matthias Dreher

发明人： Frank Schillke ,  Rolf Freimann ,  Matthias Dreher

IPC分类号： G01B11/02

CPC分类号： G01B11/2441 ,  G01B9/02039

摘要： An optical element having an optical surface (12; 103), which optical surface has an actual shape, the actual shape deviating from a desired shape by maximum 0.2 nm, wherein the desired shape is either: a free-form surface having a deviation from its best-fitting sphere of at least 5 μm or a substantially rotationally symmetrical surface having a deviation from its best-fitting sphere of at least 0.5 mm.

摘要翻译： 一种具有光学表面（12; 103）的光学元件，该光学表面具有实际形状，实际形状偏离所需形状最大为0.2nm，其中所需形状为：自由曲面与 其最适合的球体至少为5μm，或者具有与其最佳拟合球体至少为0.5mm的偏差的基本上旋转对称的表面。

公开(公告)号：US08104905B2

公开(公告)日：2012-01-31

申请号：US12263564

申请日：2008-11-03

申请人： Frank Schillke ,  Rolf Freimann ,  Matthias Dreher

发明人： Frank Schillke ,  Rolf Freimann ,  Matthias Dreher

IPC分类号： G02B5/08 ,  G01B11/02 ,  G01B9/02 ,  G02B5/18 ,  G02B27/44

CPC分类号： G01B11/2441 ,  G01B9/02039

摘要： An optical element having an optical surface (12; 103), which optical surface has an actual shape, the actual shape deviating from a desired shape by maximum 0.2 nm, wherein the desired shape is either: a free-form surface having a deviation from its best-fitting sphere of at least 5 μm or a substantially rotationally symmetrical surface having a deviation from its best-fitting sphere of at least 0.5 mm.

摘要翻译： 一种具有光学表面（12; 103）的光学元件，该光学表面具有实际形状，实际形状偏离所需形状最大为0.2nm，其中所需形状为：自由曲面与 其最适合的球体至少为5μm，或者具有与其最佳拟合球体至少为0.5mm的偏差的基本上旋转对称的表面。

公开(公告)号：US20100177321A1

公开(公告)日：2010-07-15

申请号：US12684632

申请日：2010-01-08

申请人： Jochen HETZLER ,  Frank Schillke ,  Stefan Schulte ,  Rolf Freimann ,  Bernd Doerband

发明人： Jochen HETZLER ,  Frank Schillke ,  Stefan Schulte ,  Rolf Freimann ,  Bernd Doerband

IPC分类号： G01B11/02

CPC分类号： G01B9/021 ,  G01B9/02039 ,  G01B11/2441 ,  G01M11/025 ,  G01M11/0271 ,  Y10T29/49771

摘要： Optical element having an optical surface, which optical surface is adapted to a non-spherical target shape, such that a long wave variation of the actual shape of the optical surface with respect to the target shape is limited to a maximum value of 0.2 nm, wherein the long wave variation includes only oscillations having a spatial wavelength equal to or larger than a minimum spatial wavelength of 10 mm.

摘要翻译： 具有光学表面的光学元件，该光学表面适于非球形目标形状，使得光学表面的实际形状相对于目标形状的长波变化被限制为最大值为0.2nm， 其中所述长波变化仅包括具有等于或大于10mm的最小空间波长的空间波长的振荡。

公开(公告)号：US08089634B2

公开(公告)日：2012-01-03

申请号：US12684632

申请日：2010-01-08

申请人： Jochen Hetzler ,  Frank Schillke ,  Stefan Schulte ,  Rolf Freimann ,  Bernd Doerband

发明人： Jochen Hetzler ,  Frank Schillke ,  Stefan Schulte ,  Rolf Freimann ,  Bernd Doerband

IPC分类号： G01B9/02 ,  G01B11/02

CPC分类号： G01B9/021 ,  G01B9/02039 ,  G01B11/2441 ,  G01M11/025 ,  G01M11/0271 ,  Y10T29/49771

摘要： Optical element having an optical surface, which optical surface is adapted to a non-spherical target shape, such that a long wave variation of the actual shape of the optical surface with respect to the target shape is limited to a maximum value of 0.2 nm, wherein the long wave variation includes only oscillations having a spatial wavelength equal to or larger than a minimum spatial wavelength of 10 mm.

摘要翻译： 具有光学表面的光学元件，该光学表面适于非球形目标形状，使得光学表面的实际形状相对于目标形状的长波变化被限制为最大值为0.2nm， 其中所述长波变化仅包括具有等于或大于10mm的最小空间波长的空间波长的振荡。

公开(公告)号：US20090128829A1

公开(公告)日：2009-05-21

申请号：US12263564

申请日：2008-11-03

申请人： Frank Schillke ,  Rolf Freimann ,  Matthias Dreher

发明人： Frank Schillke ,  Rolf Freimann ,  Matthias Dreher

IPC分类号： G01B9/02

CPC分类号： G01B11/2441 ,  G01B9/02039

摘要： A method of determining a deviation of an actual shape from a desired shape of an optical surface (12; 103) includes: providing an incoming electromagnetic measuring wave (20; 113), providing two diffractive structures (47, 49; 145, 146, 141, 143) which are respectively designed to reshape the wavefront of an arriving wave, calibrating one of the two diffractive structures (47, 49; 145, 146, 141, 143) by radiating the incoming measuring wave (20; 113) onto the at least one diffractive structure to be calibrated (47, 49; 145, 146, 141, 143) and determining a calibration deviation of the actual wavefront from a desired wavefront of the measuring wave (20; 113) after interaction of the latter with the at least one diffractive structure to be calibrated (47, 49; 145, 146, 141, 143), positioning the two diffractive structures (47; 49; 145, 146, 141, 143) in the optical path of the incoming measuring wave (20; 113) such that individual rays of the measuring wave radiate through both diffractive structures (47; 49; 145, 146, 141, 143), and reshaping the incoming measuring wave (20; 113) by means of the two diffractive structures (47; 49; 145, 146, 141, 143) to form an adapted measuring wave (64; 114), the wavefront of which is adapted to the desired shape of the optical surface (12; 103), positioning the optical surface (12; 103) in the optical path of the adapted measuring wave (64, 114) so that the adapted measuring wave (64; 114) interacts with the optical surface (12; 103) and measuring the wavefront of the adapted measuring wave (64; 114) after interaction of the latter with the optical surface (12; 103).

摘要翻译： 确定实际形状与光学表面（12; 103）的期望形状的偏差的方法包括：提供输入的电磁测量波（20; 113），提供两个衍射结构（47,49; 145,146， 分别被设计成重新形成到达波的波前，通过将进入的测量波（20; 113）辐射到所述两个衍射结构（47,49; 145,146,141,143）中来校准所述两个衍射结构 至少一个待校准的衍射结构（47,49; 145,146,141,143），并且在后者与所述测量波的相互作用之后确定所述实际波前与所述测量波（20; 113）的期望波阵面的校准偏差 至少一个待校准的衍射结构（47,49; 145,146,141,143），将两个衍射结构（47; 49; 145,146,141,143）定位在入射测量波的光路中 20; 113），使得测量波的各个射线通过两个衍射辐射 结构（47; 49; 并且借助于所述两个衍射结构（47; 49; 145,146,141,143）对所述输入测量波（20; 113）重塑，以形成适应的测量波（64; 114 ），其波前适应于光学表面（12; 103）的期望形状，将光学表面（12; 103）定位在适配测量波（64,114）的光路中，使得适配测量 波（64; 114）与光学表面（12; 103）相互作用，并在后者与光学表面（12; 103）相互作用之后测量适应测量波（64; 114）的波前。

公开(公告)号：US07061626B1

公开(公告)日：2006-06-13

申请号：US10845251

申请日：2004-05-14

申请人： Frank Schillke ,  Susanne Beder ,  Jochen Hetzler

发明人： Frank Schillke ,  Susanne Beder ,  Jochen Hetzler

IPC分类号： G01B9/02

CPC分类号： G01B9/021 ,  G02B5/32 ,  G03H1/08 ,  G03H2001/0072

摘要： A method of manufacturing an optical element having an optical surface of a target shape includes performing an interferometric test using an interferometer optics, wherein the interferometer optics includes a hologram that deflects a beam of measuring light by a substantial angle or that displaces an axis of symmetry of measuring light emerging from the hologram with respect to an axis of symmetry of measuring light incident on the hologram.

摘要翻译： 制造具有目标形状的光学表面的光学元件的方法包括使用干涉仪光学器件执行干涉测试，其中所述干涉仪光学器件包括将测量光束偏转相当角度的全息图，或者使对称轴 测量相对于入射在全息图上的测量光的对称轴从全息图出射的光。

公开(公告)号：US07605926B1

公开(公告)日：2009-10-20

申请号：US12197035

申请日：2008-08-22

申请人： Jochen Hetzler ,  Ralf Arnold ,  Frank Schillke ,  Bernd Doerband

发明人： Jochen Hetzler ,  Ralf Arnold ,  Frank Schillke ,  Bernd Doerband

IPC分类号： G01B9/02 ,  G01B11/02

CPC分类号： G01B9/02039 ,  G01B9/02057 ,  G01M11/0221 ,  G01M11/025 ,  G01M11/0271

摘要： A method of positioning optical elements relative to each other uses an interferometer apparatus comprising a plurality of holograms generating beams of adjustment measuring light which are incident on optical surfaces of the optical elements. Interference patterns generated by superimposing adjustment measuring light of the beams reflected from the surfaces are indicative of positioning errors of the optical elements. The beams of adjustment measuring light may comprise focused beams forming a point focus on the optical surface and beams of light which is orthogonally incident on extended portions on the optical surface.

摘要翻译： 相对于彼此定位光学元件的方法使用包括多个全息图的干涉仪装置，其产生入射在光学元件的光学表面上的测量光的光束。 通过叠加来自表面反射的光束的调整测量光产生的干涉图案表示光学元件的定位误差。 调节光束测量光可以包括在光学表面上形成点聚焦的聚焦光束和正交入射在光学表面上的延伸部分上的光束。