COATING METHOD
    14.
    发明申请
    COATING METHOD 审中-公开
    涂料方法

    公开(公告)号:US20160017490A1

    公开(公告)日:2016-01-21

    申请号:US14774742

    申请日:2014-03-14

    Abstract: A method for coating a substrate surface such as a syringe part by PECVD is provided, the method comprising generating a plasma from a gaseous reactant comprising an organosilicon precursor and optionally an oxidizing gas by providing plasma-forming energy adjacent to the substrate, thus forming a coating on the substrate surface by plasma enhanced chemical vapor deposition (PECVD). The plasma-forming energy is applied in a first phase as a first pulse at a first energy level followed by further treatment in a second phase at a second energy level lower than the first energy level. The lubricity, hydrophobicity and/or barrier properties of the coating are set by setting the ratio of the O2 to the organosilicon precursor in the gaseous reactant, and/or by setting the electric power used for generating the plasma.

    Abstract translation: 提供了一种通过PECVD涂覆诸如注射器部件的基底表面的方法,该方法包括通过在基底附近提供等离子体形成能量从包含有机硅前体和任选的氧化气体的气态反应器产生等离子体,由此形成 通过等离子体增强化学气相沉积(PECVD)在衬底表面上涂覆。 等离子体形成能量在第一相中作为第一脉冲施加在第一能级,随后在低于第一能级的第二能级在第二相进一步处理。 通过设定气体反应物中的O 2与有机硅前体的比例和/或通过设定用于产生等离子体的电力来设定涂层的润滑性,疏水性和/或阻隔性。

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