Microsphere-Based Coatings for Radioactive Cooling Under Direct Sunlight

    公开(公告)号:US20200263940A1

    公开(公告)日:2020-08-20

    申请号:US16706436

    申请日:2019-12-06

    Applicant: STC.UNM

    Abstract: The present prevention provides a surface coating for cooling a surface by light scattering comprising a plurality of successive layers, each of the layers may be comprised of a plurality of spheres arranged to form a structure comprised of packed spheres. Each layer may have a different arrangement of packed spheres to create to a different light scattering property in each of the layers. The coating of the structures may also be formed by randomly packed spheres and the spheres may have a uniform diameter.

    Methods to introduce sub-micrometer, symmetry-breaking surface corrugation to silicon substrates to increase light trapping
    14.
    发明授权
    Methods to introduce sub-micrometer, symmetry-breaking surface corrugation to silicon substrates to increase light trapping 有权
    将亚微米对称破裂的表面波纹引入硅衬底以增加光捕获的方法

    公开(公告)号:US09530906B2

    公开(公告)日:2016-12-27

    申请号:US15030039

    申请日:2014-10-17

    Applicant: STC.UNM

    Abstract: Provided is a method for fabricating a nanopatterned surface. The method includes forming a mask on a substrate, patterning the substrate to include a plurality of symmetry-breaking surface corrugations, and removing the mask. The mask includes a pattern defined by mask material portions that cover first surface portions of the substrate and a plurality of mask space portions that expose second surface portions of the substrate, wherein the plurality of mask space portions are arranged in a lattice arrangement having a row and column, and the row is not oriented parallel to a [110] direction of the substrate. The patterning the substrate includes anisotropically removing portions of the substrate exposed by the plurality of spaces.

    Abstract translation: 提供了一种制造纳米图案表面的方法。 该方法包括在衬底上形成掩模,图案化衬底以包括多个对称破裂表面波纹,以及去除掩模。 掩模包括由覆盖基板的第一表面部分的掩模材料部分限定的图案和暴露基板的第二表面部分的多个掩模空间部分,其中多个掩模空间部分布置成具有排的格子布置 和列,并且该行不平行于衬底的[110]方向取向。 图案化衬底包括由多个空间暴露的各向异性去除部分的衬底。

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