Charge storage cell and method of manufacturing a charge storage cell

    公开(公告)号:US10128292B2

    公开(公告)日:2018-11-13

    申请号:US15637616

    申请日:2017-06-29

    发明人: Laurence Stark

    摘要: A method can be used to manufacture a charge storage cell with a first trench and a second trench in a substrate material. The first trench is filled with a doped material. The second trench is filled with a second trench material. The method includes causing the dopant to diffuse from the first trench to thereby provide a doped region adjacent to the first trench. The material from the first and second trenches is removed and at least one of the trenches is filled with a capacitive deep trench isolation material to provide capacitive deep trench isolation.

    Pixel circuit and method of operating the same

    公开(公告)号:US10021334B2

    公开(公告)日:2018-07-10

    申请号:US15250605

    申请日:2016-08-29

    发明人: Laurence Stark

    摘要: An embodiment circuit includes a first source follower configured to be controlled by a voltage at a first node, a photodiode controllably coupled to the first node, and a bias transistor configured to be controlled by a bias voltage. The bias transistor has a first terminal coupled to an output of the first source follower. The circuit additionally includes a storage node controllably coupled to the output of the first source follower, and an amplifier controllably coupled between the storage node and an output line. Also included in the circuit is a controllable switching element configured to couple a second terminal of the bias transistor to a supply voltage in response to a pixel operating in a first mode, and to couple the second terminal of the bias transistor to the output line in response to the pixel operating in a second mode.