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公开(公告)号:US11107201B2
公开(公告)日:2021-08-31
申请号:US16794583
申请日:2020-02-19
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Sanguk Park , Bongsoo Jung , Changho Kim , Jungwon Lee , Donghyun Yeom
IPC: G06T5/00
Abstract: Disclosed is an electronic device including a memory and a processor electrically connected with the memory. The memory stores instructions that, when executed, cause the processor to control the electronic device to: obtain information about a maximum value of brightness of image content based on metadata of the image content, to perform tone mapping on at least one or more frames corresponding to a preview image of the image content based on the information about the maximum value of the brightness, and to output the preview image based on the at least one or more frames on which the tone mapping is performed, on a display device.
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公开(公告)号:US10103791B2
公开(公告)日:2018-10-16
申请号:US14076083
申请日:2013-11-08
Inventor: Jonghyung Kwun , Seungri Jin , Sanguk Park , Dongjo Park , Junghyun Park , Yeonjea Cho
IPC: H04B7/02 , H04B7/0413 , H04B7/06
Abstract: A data transmission and reception method and apparatus in a Multiple-Input Multiple-Output (MIMO) system. The transmission method includes selecting at least one antenna for use in transmission among a plurality of antennas based on transmission data and transmitting the transmission data through the selected antenna. The data transmission and reception method and apparatus are advantageous in increasing the throughput of the MIMO communication system. Also, the data transmission and reception method and apparatus are capable of making it possible to design a superior transceiver in complexity and performance. Also, the data transmission and reception method and apparatus are capable of acquiring extra Degree of Freedom (DOF) and thus increasing the number of symbols that can be transmitted at a time. Furthermore, the data transmission and reception method and apparatus are applicable to conventional MIMO communication systems to obtain extra performance gain without being restricted to certain conditions.
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公开(公告)号:US12189481B2
公开(公告)日:2025-01-07
申请号:US18452181
申请日:2023-08-18
Applicant: Samsung Electronics Co., Ltd.
Inventor: Daeman Ko , Sanguk Park , Sunghyun Na , Wooseok Oh
IPC: G06F11/14 , G06F9/4401
Abstract: In a method of recovering a bootloader in a mobile electronic device, a bootloader recovery signal is transmitted from a bridge board to the mobile electronic device. The bridge board includes a first internal path and a second internal path. The mobile electronic device includes a third internal path and a fourth internal path. The bootloader recovery request signal is transmitted based on the first internal path and the third internal path. a boot mode of the mobile electronic device is changed based on the first internal path and the fourth internal path in response to receiving the bootloader recovery request signal. Bootloader recovery data is transmitted from a host device to the bridge board based on the changed boot mode. The bootloader recovery data is transmitted from the bridge board to the mobile electronic device based on the second internal path and the third internal path.
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公开(公告)号:US20230073206A1
公开(公告)日:2023-03-09
申请号:US18048949
申请日:2022-10-24
Applicant: Samsung Electronics Co., Ltd.
Inventor: Hakseung Han , Sanguk Park , Jongju Park , Raewon Yi
Abstract: A laser annealing method performed on a reflective photomask may include preparing a reflective photomask including a pattern area and a border area surrounding the pattern area and irradiating a laser beam onto the border area of the reflective photomask. The irradiating of the laser beam may include split-irradiating a plurality of laser beam spots onto the border area. Each of the plurality of laser beam spots may be shaped using a beam shaper. The beam shaper may include a blind area, a transparent area at a center of the blind area, and a semitransparent area between the blind area and the transparent area. Each of the plurality of laser beam spots may include a center portion passing through the transparent area and having a uniform energy profile and an edge portion passing through the semitransparent area and having an inclined energy profile.
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公开(公告)号:US20210223680A1
公开(公告)日:2021-07-22
申请号:US16911601
申请日:2020-06-25
Applicant: Samsung Electronics Co., Ltd.
Inventor: Hakseung Han , Sanguk Park , Jongju Park , Raewon Yi
Abstract: A laser annealing method performed on a reflective photomask may include preparing a reflective photomask including a pattern area and a border area surrounding the pattern area and irradiating a laser beam onto the border area of the reflective photomask. The irradiating of the laser beam may include split-irradiating a plurality of laser beam spots onto the border area. Each of the plurality of laser beam spots may be shaped using a beam shaper. The beam shaper may include a blind area, a transparent area at a center of the blind area, and a semitransparent area between the blind area and the transparent area. Each of the plurality of laser beam spots may include a center portion passing through the transparent area and having a uniform energy profile and an edge portion passing through the semitransparent area and having an inclined energy profile.
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公开(公告)号:US11012117B2
公开(公告)日:2021-05-18
申请号:US16593196
申请日:2019-10-04
Applicant: Samsung Electronics Co., Ltd.
Inventor: Yangwoon Roh , Sanguk Park , Jinyoung Park , Myunggyun Yoon , Heonsoon Jang , Seyeong Cheon , Hyunpil Kim , Hwanjin Kim
Abstract: A continuous communication apparatus includes a communication interface configured for contactless communication with a different electronic device; and a processor configured to detect a trigger to initiate contactless communication with the different electronic device; determine a communication type associated with communication to be performed with the different electronic device upon detecting the trigger; set at least one parameter associated with continuous communication when the communication type is the continuous communication; and perform the continuous communication with the different electronic device on the basis of the configured parameter.
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公开(公告)号:US20210033959A1
公开(公告)日:2021-02-04
申请号:US15931709
申请日:2020-05-14
Applicant: Samsung Electronics Co., Ltd.
Inventor: Hakseung Han , Sanguk Park , Jongju Park , Raewon Yi
Abstract: Disclosed are photomask manufacturing methods and semiconductor device fabrication methods. The photomask manufacturing method includes forming a reflective layer on a mask substrate having an image region and an edge region surrounding the image region, forming an absorption pattern on the reflective layer, forming a black border by irradiating a first laser beam to the reflective layer and the absorption pattern on the edge region, using a photomask having the black border to provide a test substrate with an extreme ultraviolet (EUV) beam to form a test pattern, obtaining a critical dimension correction map of the test pattern, and using the critical dimension correction map to irradiate a second laser beam to the reflective layer on a portion of the image region to form an annealed region that is thicker than the black border.
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