Film Formation Apparatus and Method for Forming a Film
    15.
    发明申请
    Film Formation Apparatus and Method for Forming a Film 审中-公开
    成膜装置及其制作方法

    公开(公告)号:US20150171329A1

    公开(公告)日:2015-06-18

    申请号:US14633750

    申请日:2015-02-27

    Abstract: An apparatus for forming a film having high uniformity in its film thickness distribution is provided. An evaporation source is used in which an evaporation cell, or a plurality of evaporation cells, having a longitudinal direction is formed, and by moving the evaporation source in a direction perpendicular to the longitudinal direction of the evaporation source, a thin film is deposited on a substrate. By making the evaporation source longer, the uniformity of the film thickness distribution in the longitudinal direction is increased. The evaporation source is moved, film formation is performed over the entire substrate, and therefore the uniformity of the film thickness distribution over the entire substrate can be increased.

    Abstract translation: 提供了一种用于形成其膜厚分布均匀性均匀的膜的装置。 使用蒸发源,其中形成有具有纵向方向的蒸发单元或多个蒸发单元,并且通过沿垂直于蒸发源的纵向的方向移动蒸发源,将薄膜沉积在 底物。 通过使蒸镀源变长,膜长度方向的膜厚分布的均匀性提高。 移动蒸发源,在整个基板上进行成膜,因此能够提高整个基板上的膜厚分布的均匀性。

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