公开(公告)号：US20070114206A1

公开(公告)日：2007-05-24

申请号：US11654669

申请日：2007-01-18

Applicant: Andrej Mitrovic ,  Maolin Long ,  Paul Moroz ,  Steven Fink ,  William Jones

Inventor： Andrej Mitrovic ,  Maolin Long ,  Paul Moroz ,  Steven Fink ,  William Jones

IPC: G01L21/30

CPC classification number: H01L21/67248 ,  G05D23/1934 ,  H01J37/32522 ,  H01L21/67069 ,  H01L21/67109

Abstract: A device and method for controlling the temperature of a plasma chamber inside wall or other surfaces exposed to the plasma by a plurality of temperature control systems. A plasma process within the plasma chamber can be controlled by independently controlling the temperature of segments of the wall or other surfaces.

公开(公告)号：US20060162656A1

公开(公告)日：2006-07-27

申请号：US10521444

申请日：2003-07-30

Applicant: Steven Fink

Inventor： Steven Fink

IPC: C23C16/00 ,  C23F1/00 ,  H05H1/24

CPC classification number: H01L21/67017 ,  C23C14/564 ,  C23C16/4412 ,  H01J37/3244 ,  H01J37/32458 ,  H01J37/32834 ,  H01L21/67069 ,  H01L21/6719

Abstract: A vacuum processing apparatus including a process chamber having a plurality of pumping ports, and a plurality of pumping cells each connected to a respective pumping port of the plurality of pumping ports. The plurality of pumping ports is preferably located on a lower wall of the process chamber adjacent to a process chamber volume. A process chamber is also provided that includes a lower wall and a side wall, where the side wall has a height of about four inches. The vacuum processing apparatus further includes a chamber liner configured to displace open volume within the process chamber.

Abstract translation: 一种真空处理设备，包括具有多个泵送端口的处理室和多个泵送单元，每个泵送单元均连接到多个泵送端口的相应的泵送端口。 多个泵送端口优选地位于与处理室容积相邻的处理室的下壁上。 还提供了一种处理室，其包括下壁和侧壁，其中侧壁具有约四英寸的高度。 真空处理设备还包括腔室衬套，该腔室衬套构造成在处理室内移动开放体积。

公开(公告)号：US20060151114A1

公开(公告)日：2006-07-13

申请号：US11032101

申请日：2005-01-11

Applicant: Steven Fink

Inventor： Steven Fink

IPC: H01L21/306 ,  C23F1/00

CPC classification number: H01J37/32633 ,  H01J37/3244 ,  H01L21/67069

Abstract: The present invention presents a baffle assembly located in a plasma processing system, comprising a baffle carrier attached to the plasma processing system, and at least two baffle inserts having a plurality of passages therethrough, the at least two baffle inserts being supported by the baffle carrier.

公开(公告)号：US20060130970A1

公开(公告)日：2006-06-22

申请号：US11018253

申请日：2004-12-22

Applicant: Steven Fink

Inventor： Steven Fink

IPC: H01L21/306 ,  C23C16/00

CPC classification number: H01L21/67288 ,  H01J37/32935

Abstract: A system for monitoring a condition of a consumable component in a substrate processing system that includes a tapered plug having a first axis, a second axis that intersects the first axis, a top portion with first width, a bottom portion with a second width, and sidewalls joining said top and bottom portions respectively. The tapered plug has a cross sectional profile that is substantially parallel to the top and bottom portions and a cross sectional width that varies according to a location where the cross sectional profile intersects the second axis. At least one of the tapered plugs is inserted into at least one consumable component of the substrate processing system such that the top portion of the tapered plug is exposed to a processing environment of a plasma processing system.

Abstract translation: 一种用于监测基板处理系统中的可消耗部件的状况的系统，包括：具有第一轴的锥形塞，与第一轴相交的第二轴，具有第一宽度的顶部，具有第二宽度的底部;以及 分别连接所述顶部和底部的侧壁。 锥形塞具有基本上平行于顶部和底部的横截面轮廓，并且横截面宽度根据截面轮廓与第二轴线相交的位置而变化。 锥形插塞中的至少一个被插入到基板处理系统的至少一个可消耗部件中，使得锥形插头的顶部暴露于等离子体处理系统的处理环境。

公开(公告)号：US20060118045A1

公开(公告)日：2006-06-08

申请号：US11006544

申请日：2004-12-08

Applicant: Steven Fink

Inventor： Steven Fink

IPC: C23C16/00

CPC classification number: H01J37/32633 ,  H01J37/32623 ,  Y10T29/49995

Abstract: An apparatus related to plasma chambers used for processing semiconductor substrates and specifically to improvements in pumping baffle plates used in plasma sources. An apparatus and method for making a baffle plate assembly formed from a modified baffle plate blank wherein a variety of pumping features are formed in the baffle plate blank and opened in a planar material removal operation.

公开(公告)号：US20080252596A1

公开(公告)日：2008-10-16

申请号：US12100737

申请日：2008-04-10

Applicant: Matthew Bell ,  Matthew Vieta ,  Raymond Chin ,  Malik Coates ,  Steven Fink

Inventor： Matthew Bell ,  Matthew Vieta ,  Raymond Chin ,  Malik Coates ,  Steven Fink

IPC: G09G5/00

CPC classification number: G06F3/0346 ,  G06F3/0304

Abstract: An interactive video display system allows a physical object to interact with a virtual object. A light source delivers a pattern of invisible light to a three-dimensional space occupied by the physical object. A camera detects invisible light scattered by the physical object. A computer system analyzes information generated by the camera, maps the position of the physical object in the three-dimensional space, and generates a responsive image that includes the virtual object. A display presents the responsive image.

Abstract translation: 交互式视频显示系统允许物理对象与虚拟对象交互。 光源将物理对象所占据的三维空间传递出不可见光的图案。 相机检测物体散射的不可见光。 计算机系统分析由摄像机产生的信息，映射物体在三维空间中的位置，并生成包括虚拟对象的响应图像。 显示器呈现响应图像。

公开(公告)号：US20070034154A1

公开(公告)日：2007-02-15

申请号：US11583032

申请日：2006-10-19

Applicant: Steven Fink

Inventor： Steven Fink

IPC: C23F1/00 ,  C23C16/00

CPC classification number: H01J37/321

Abstract: A plasma source assembly including an outer shield, a dielectric chamber wall, and a helical coil provided between the outer shield and the dielectric chamber wall. The plasma source assembly also includes a coil support assembly configured to facilitate repeatable performance of the helical coil. Preferably, the assembly includes a plenum cooling plate that is configured to supply cooling fluid to a first cooling rod provided within a resonator cavity defined by the chamber wall and the outer shield, and receive cooling fluid from a second cooling rod provided within the resonator cavity. The assembly preferably also includes a spacer provided between the first cooling rod and the second cooling rod, and coil insulators having holes configured to receive the helical coil.

公开(公告)号：US20060254512A1

公开(公告)日：2006-11-16

申请号：US10546978

申请日：2004-02-26

Applicant: Steven Fink

Inventor： Steven Fink

IPC: C23C16/00

CPC classification number: H01J37/3244 ,  H01J37/32633 ,  H01L21/67069 ,  H01L21/6719

Abstract: A plasma processing method and system including an apparatus and method for securing semiconductor hardware without the use of exposed threaded hardware. Consistent mechanical and electrical contact between parts in the assembled condition can also be achieved.

Abstract translation: 一种等离子体处理方法和系统，包括用于固定半导体硬件的装置和方法，而不使用暴露的螺纹硬件。 也可以实现在组装状态下部件之间的一致的机械和电气接触。

公开(公告)号：US20050225248A1

公开(公告)日：2005-10-13

申请号：US10811912

申请日：2004-03-30

Applicant: Steven Fink ,  Andrej Mitrovic ,  Paula Calabrese

Inventor： Steven Fink ,  Andrej Mitrovic ,  Paula Calabrese

IPC: C23C14/00 ,  H01J7/24 ,  H01J17/26 ,  H01J37/32 ,  H01L21/00

CPC classification number: H01L21/67069 ,  H01J37/32458 ,  H01J37/32972

Abstract: An optical window deposition shield including a backing plate having a through hole, and a honeycomb structure having a plurality of adjacent cells configured to allow optical viewing through the honeycomb structure. Each cell of the honeycomb structure has an aspect ratio of length to diameter sufficient to impede a processing plasma from traveling through the full length of the cell. A coupling device configured to couple the honeycomb core structure to the backing plate such that the honeycomb structure is aligned with at least a portion of the through hole in the backing plate. The optical window deposition shield shields the optical viewing window of a plasma processing apparatus from contact with the plasma.

Abstract translation: 一种光学窗口沉积屏蔽，包括具有通孔的背板，以及具有多个相邻单元的蜂窝结构，所述多个相邻单元被配置为允许通过蜂窝结构进行光学观察。 蜂窝结构体的每个单元具有足以阻碍加工等离子体行进通过电池整个长度的长度与直径的纵横比。 耦合装置，其被配置为将蜂窝芯结构耦合到背板，使得蜂窝结构与背板中的通孔的至少一部分对齐。 光学窗口沉积屏蔽屏蔽了等离子体处理设备的光学观察窗口与等离子体的接触。

公开(公告)号：US20050213079A1

公开(公告)日：2005-09-29

申请号：US10745577

申请日：2003-12-29

Applicant: Steven Fink

Inventor： Steven Fink

IPC: G01J3/30 ,  G01N21/00

CPC classification number: G01N21/73

Abstract: A sensing device for sensing a condition of a plasma processing system component. The sensing device includes a main body configured to contain a material, an emitter contained in the main body and configured to emit light when exposed to a plasma, and a mating feature connected to the main body and configured to be mated with a receiving feature of an object in the plasma processing system such that the emitter material is exposed to a processing environment of the plasma processing system. When the emitter material is exposed to a plasma, the light emitted from the emitter can be monitored to determine at least one of material accumulation on the system component and erosion of the system component.

Abstract translation: 一种感测装置，用于感测等离子体处理系统部件的状态。 感测装置包括被配置为容纳材料的主体，容纳在主体中并被配置为当暴露于等离子体时发光的发射器，以及连接到主体的配合特征，并且被配置为与接收特征 等离子体处理系统中的一个目的，使得发射极材料暴露于等离子体处理系统的处理环境中。 当发射体材料暴露于等离子体时，可以监测从发射器发射的光以确定系统部件上的材料积聚和系统部件的侵蚀中的至少一种。