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公开(公告)号:US20220336723A1
公开(公告)日:2022-10-20
申请号:US17393345
申请日:2021-08-03
发明人: Jen-Yuan Chang
IPC分类号: H01L35/28 , H01L35/10 , H01L23/498 , G01K7/02
摘要: An semiconductor device includes a substrate having a first surface and a second surface opposite the first surface, and a through-silicon via structure extending through the substrate. The through-silicon via structure includes a first through-silicon via containing a first conductivity type material and a second through-silicon via containing a second conductivity type material opposite the first conductivity type material. The semiconductor device also includes a first conductive layer on the first surface of the substrate and electrically coupled to a first end of the first through-silicon via and a first end of the second through-silicon via. The semiconductor device also includes a second conductive on the second surface and having a first portion coupled to a second end of the first through-silicon via and a second portion coupled to a second end of the second through-silicon via.
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公开(公告)号:US20240339348A1
公开(公告)日:2024-10-10
申请号:US18748025
申请日:2024-06-19
发明人: Jen-Yuan Chang
IPC分类号: H01L21/68 , B65G47/90 , B65G47/91 , H01L21/67 , H01L21/683
CPC分类号: H01L21/681 , B65G47/905 , B65G47/91 , H01L21/67121 , H01L21/6838
摘要: A pick-and-place system is provided. The pick-and-place system includes: a wafer holder; a gantry over the wafer holder and comprising a stabilizer extending downwardly; a primary drive mechanism connected to the gantry and configured to drive the gantry; a secondary drive mechanism located at the gantry; and a suction head, wherein the secondary drive mechanism is connected to the suction head and configured to drive the suction head.
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公开(公告)号:US12087709B2
公开(公告)日:2024-09-10
申请号:US17446235
申请日:2021-08-27
发明人: Jen-Yuan Chang
IPC分类号: H01L23/58 , H01L21/768 , H01L23/48
CPC分类号: H01L23/585 , H01L21/76816 , H01L21/76898 , H01L23/481 , H01L2221/1057
摘要: Some implementations described herein provide an electronic device. The electronic device includes a first conductive structure that extends through a dielectric structure of the electronic device and into a substrate of the electronic device. The electronic device includes a guard ring, having multiple layers, that extends along one or more sides of a first vertical portion of the first conductive structure. The electronic device includes a second conductive structure that extends along a second vertical portion of the first conductive structure, where the second conductive structure includes a conductive structure side surface, which is nearest to a side surface of the first conductive structure, that is a distance from the side surface of the first conductive structure, and where the distance is greater than or equal to approximately 5% of a width of the first conductive structure.
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公开(公告)号:US20240087943A1
公开(公告)日:2024-03-14
申请号:US18171315
申请日:2023-02-17
发明人: Jen-Yuan Chang
IPC分类号: H01L21/683 , H01L21/304 , H01L21/67
CPC分类号: H01L21/6838 , H01L21/304 , H01L21/67092 , H01L21/67121 , H01L21/67253 , H01L21/67259
摘要: A suction head of a pick-and-place tool for semiconductor device packaging is provided. The suction head includes: a suction unit configured to apply a suction force on a top die and pick the top die; and a warpage-correction mechanism. The warpage-correction mechanism includes a pushing mechanism, and the pushing mechanism includes a plurality of pushing units, each of the plurality of pushing units disposed in a corner region of the suction head. Each of the plurality of pushing units includes: a tubular chamber extending vertically relative to a bottom surface of the suction head; and a pusher disposed in the tubular chamber and in air-tight contact with a side wall of the tubular chamber. The pusher is movable vertically and capable of protruding out of the bottom surface of the suction head to push a corner region of the top die and apply a downward force thereon.
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公开(公告)号:US20240038686A1
公开(公告)日:2024-02-01
申请号:US18103676
申请日:2023-01-31
发明人: Jen-Yuan Chang
IPC分类号: H01L23/00 , H01L25/065 , H01L23/58 , H01L21/78
CPC分类号: H01L23/562 , H01L25/0657 , H01L24/08 , H01L23/585 , H01L21/78 , H01L2225/06562 , H01L2225/06568 , H01L2224/08145
摘要: A semiconductor device includes a first and second semiconductor chip having a respective first surface and a second surface opposite to each other. The semiconductor device can include a second semiconductor chip having a third surface and a fourth surface opposite to each other. The third surface of the second semiconductor chip can face the second surface of the first semiconductor chip. A first portion of a dielectric filling material can be in contact with a first sidewall of the first semiconductor chip. A second portion of a dielectric filling material can be in contact with a second sidewall of the second semiconductor chip. The first and second portions of the dielectric filling material can have a width that decreases in a corresponding increasing depth toward the first surface of the first semiconductor chip.
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公开(公告)号:US20230307412A1
公开(公告)日:2023-09-28
申请号:US17858387
申请日:2022-07-06
发明人: Jen-Yuan Chang
IPC分类号: H01L23/00
CPC分类号: H01L24/80 , H01L24/05 , H01L24/06 , H01L24/08 , H01L23/585 , H01L2224/06517 , H01L2224/08145 , H01L2224/74 , H01L2224/8013
摘要: A method of manufacturing a semiconductor structure includes following operations: moving a die towards a wafer by a pick-and-place tool, the pick-and-place tool including an infrared (IR) detection device attached to the pick-and-place tool in a fixed relationship; aligning the die with the wafer by using the IR detection device; and bonding the die to the wafer.
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公开(公告)号:US11594497B2
公开(公告)日:2023-02-28
申请号:US17301327
申请日:2021-03-31
发明人: Jen-Yuan Chang
IPC分类号: H01L23/552
摘要: A semiconductor device includes an inductance structure and a shielding structure. The shielding structure is arranged to at least partially shield the inductance structure from external electromagnetic fields. The shielding structure includes a shielding structure portion arranged along a side of the inductance structure such that the shielding structure portion is around at least a portion of a perimeter of the inductance structure.
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公开(公告)号:US20220357538A1
公开(公告)日:2022-11-10
申请号:US17697822
申请日:2022-03-17
发明人: Jen-Yuan Chang
摘要: A semiconductor package includes a base substrate structure having a top surface that includes conductive regions disposed in a dielectric region. The conductive regions are coupled to an interconnect structure. The semiconductor package also includes a first die bonded sideways on the base substrate structure. A side surface at an edge of the first die is bonded to the top surface of the base substrate structure. A front surface of the first die is perpendicular to the top surface of the base substrate structure. The first die includes a photonic device on a substrate of the first die, and the substrate includes an optical interface for coupling a back surface of the first die to an optical fiber.
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公开(公告)号:US12027403B2
公开(公告)日:2024-07-02
申请号:US17700497
申请日:2022-03-22
发明人: Jen-Yuan Chang
IPC分类号: H01L21/68 , B65G47/90 , B65G47/91 , H01L21/67 , H01L21/683
CPC分类号: H01L21/681 , B65G47/905 , B65G47/91 , H01L21/67121 , H01L21/6838
摘要: A pick-and-place system is provided. The pick-and-place system includes: a wafer holder configured to hold a bottom die; a gantry having a stabilizer extending downwardly; a primary drive mechanism connected to the gantry and configured to drive the gantry horizontally and vertically; a suction head configured to hold a top die; and a secondary drive mechanism located at the gantry and connected to the suction head and configured to drive the suction head horizontally and vertically to place the top die on the bottom die at a target position. The primary drive mechanism drives the gantry vertically until the stabilizer is in contact with the bottom die before the secondary drive mechanism drives the suction head.
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公开(公告)号:US11916037B2
公开(公告)日:2024-02-27
申请号:US17586723
申请日:2022-01-27
发明人: Jen-Yuan Chang
CPC分类号: H01L24/80 , H01L2224/80203 , H01L2224/80211 , H01L2224/80895 , H01L2224/80896
摘要: A method for bonding semiconductor devices is provided. The method may include several operations. A wafer and a chip are formed. The wafer and the chip are disposed in a low-pressure environment. A planar surface of the chip is moved toward a planar surface of the wafer. A void is formed between the planar surface of the chip and the planar surface of the wafer. The chip is bonded to the wafer. A bonded structure of the chip and the wafer is disposed under a standard atmosphere and a size of the void is reduced. A system for forming a semiconductor structure is also provided.
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