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公开(公告)号：US07983471B2
公开(公告)日：2011-07-19
申请号：US11987766
申请日：2007-12-04
Applicant: Tadashi Kitamura , Toshiaki Hasebe , Masatoshi Tsuneoka
Inventor： Tadashi Kitamura , Toshiaki Hasebe , Masatoshi Tsuneoka
CPC classification number: G06T7/001 , G06K9/00 , G06K2209/19 , G06T2207/30148
Abstract: A pattern inspection apparatus is used for inspecting a fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines, comprising one of a line segment and a curve, from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.
Abstract translation: 图案检查装置用于检查用于半导体或液晶面板的半导体集成电路（LSI），液晶面板和光掩模（掩模版）等精细图案，其基于用于制造的数据制造 精细图案如设计数据。 图案检查装置包括：参考图案生成装置，被配置为从数据生成包括线段和曲线中的一个或多个线的代表的参考图案，被配置为生成图案的图像的图像生成装置 被检查的检测装置，被配置为检测所述待检查图案的边缘的检测装置;以及检查装置，被配置为通过将所述图案的图像的边缘与所述图案的边缘进行比较来检查所述图案， 用参考图案的一行或多行进行检查。
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公开(公告)号：US07796801B2
公开(公告)日：2010-09-14
申请号：US11434797
申请日：2006-05-17
Applicant: Tadashi Kitamura , Kazufumi Kubota , Shinichi Nakazawa , Neeti Vohra , Masahiro Yamamoto , Toshiaki Hasebe
Inventor： Tadashi Kitamura , Kazufumi Kubota , Shinichi Nakazawa , Neeti Vohra , Masahiro Yamamoto , Toshiaki Hasebe
CPC classification number: G06K9/2054 , G06K9/00 , G06K9/036 , G06K9/48 , G06K2209/19 , G06T7/0004 , G06T7/001 , G06T2207/30148 , H01J37/265 , H01J37/28 , H01J2237/2817
Abstract: A fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data is inspected by a pattern inspection apparatus. The pattern inspection apparatus for inspecting a pattern to-be-inspected uses an image of the pattern to-be-inspected and data for fabricating the pattern to-be-inspected. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.
Abstract translation: 基于用于制造诸如设计数据的精细图案的数据制造的诸如用于半导体或液晶面板的半导体集成电路（LSI），液晶面板和光掩模（掩模版））的精细图案是 由图案检查装置检查。 用于检查待检查图案的图案检查装置使用要检查的图案的图像和用于制造待检查图案的数据。 图案检查装置包括参考图案生成装置，被配置为从数据生成由一行或多行表示的参考图案，被配置为生成待检查图案的图像的图像生成装置，被配置为检测 要检查的图案的边缘，以及检查装置，其被配置为通过将待检查的图案的图像的边缘与所述待检查的图案的边缘进行比较来检查待检查的图案， 参考模式。
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公开(公告)号：US20060245636A1
公开(公告)日：2006-11-02
申请号：US11434797
申请日：2006-05-17
Applicant: Tadashi Kitamura , Kazufumi Kubota , Shinichi Nakazawa , Neeti Vohra , Masahiro Yamamoto , Toshiaki Hasebe
Inventor： Tadashi Kitamura , Kazufumi Kubota , Shinichi Nakazawa , Neeti Vohra , Masahiro Yamamoto , Toshiaki Hasebe
IPC: G06K9/00
CPC classification number: G06K9/2054 , G06K9/00 , G06K9/036 , G06K9/48 , G06K2209/19 , G06T7/0004 , G06T7/001 , G06T2207/30148 , H01J37/265 , H01J37/28 , H01J2237/2817
Abstract: A fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data is inspected by a pattern inspection apparatus. The pattern inspection apparatus for inspecting a pattern to-be-inspected uses an image of the pattern to-be-inspected and data for fabricating the pattern to-be-inspected. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.
Abstract translation: 基于用于制造诸如设计数据的精细图案的数据制造的诸如用于半导体或液晶面板的半导体集成电路（LSI），液晶面板和光掩模（掩模版））的精细图案是 由图案检查装置检查。 用于检查待检查图案的图案检查装置使用要检查的图案的图像和用于制造待检查图案的数据。 图案检查装置包括参考图案生成装置，被配置为从数据生成由一行或多行表示的参考图案，被配置为生成待检查图案的图像的图像生成装置，被配置为检测 要检查的图案的边缘，以及检查装置，其被配置为通过将待检查的图案的图像的边缘与所述待检查的图案的边缘进行比较来检查待检查的图案， 参考模式。
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公开(公告)号：US20050146714A1
公开(公告)日：2005-07-07
申请号：US11058616
申请日：2005-02-16
Applicant: Tadashi Kitamura , Kazufumi Kubota , Shinichi Nakazawa , Neeti Vohra , Masahiro Yamamoto
Inventor： Tadashi Kitamura , Kazufumi Kubota , Shinichi Nakazawa , Neeti Vohra , Masahiro Yamamoto
CPC classification number: G06K9/00 , G06K2209/19 , G06T7/0004 , G06T2207/30148
Abstract: A pattern inspection apparatus is used for inspecting a pattern, such as semiconductor integrated circuit (LSI), liquid crystal panel, and a photomask by using an image of the pattern to-be-inspected and design data for fabricating the pattern to-be-inspected. The pattern inspection apparatus includes a reference pattern generation device for generating a reference pattern represented by one or more lines from design data, an image generation device for generating the image of the pattern to-be-inspected, a detecting device for detecting an edge of the image of the pattern to-be-inspected, and an inspection device for inspecting the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.
Abstract translation: 图案检查装置用于通过使用要检查的图案的图像和用于制造待图案的图案的设计数据来检查诸如半导体集成电路（LSI），液晶面板和光掩模的图案， 检查。 图案检查装置包括：参考图案生成装置，用于从设计数据生成由一条或多条线表示的参考图案;图像生成装置，用于生成被检查图案的图像;检测装置， 要检查的图案的图像;以及检查装置，用于通过将待检查图案的图像的边缘与参考图案的一条或多条线进行比较来检查待检查的图案。
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公开(公告)号：US06555187B1
公开(公告)日：2003-04-29
申请号：US09701603
申请日：2000-11-30
Applicant: Tadashi Kitamura
Inventor： Tadashi Kitamura
IPC: C09K1900
CPC classification number: G02F1/1339 , C08L63/00 , Y10T428/1073 , Y10T428/31511 , Y10T428/31515 , Y10T428/31518 , Y10T428/31525 , C08L2666/02
Abstract: Provided is a liquid crystal sealant composition in which an aqueous solution obtained by admixing the epoxy resin composition with purified water has an ionic conductivity of 1 mS/m or less; the B stage-reduced product has a viscosity of 50 to 10000 Pa·s at 80 to 100° C.; the cured matter of the above composition has a linear expansion coefficient of 10×10−5 mm/mm/° C. or less and a glass transition temperature Tg of 100° C. or higher; and the above cured matter has a moisture permeability of 200 g/m2·24 hours or less at 80° C. and which can meet a liquid crystal display element (cell) produced by a single layer press hot bonding system and exhibits high adhesion reliability and makes it possible to produce a homogeneous liquid crystal display element having a high quality.
Abstract translation: 提供一种液状密封剂组合物，其中通过将环氧树脂组合物与纯化水混合而获得的水溶液的离子电导率为1mS / m以下; B阶还原产物在80〜100℃下的粘度为50〜10000Pa·s。 上述组合物的固化物的线膨胀系数为10×10 -5 mm / mm /℃以下，玻璃化转变温度Tg为100℃以上; 并且上述固化物在80℃下的透湿度为200g / m 2·24小时以下，并且能够满足通过单层压制热粘合体系制造的液晶显示元件（电池），并且表现出高的粘合可靠性 并且可以制造具有高质量的均匀的液晶显示元件。
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Patent Agency Ranking
公开(公告)号：US5477049A
公开(公告)日：1995-12-19
申请号：US184122
申请日：1994-01-21
Applicant: Tadashi Kitamura
Inventor： Tadashi Kitamura
CPC classification number: H01J37/28 , H01J2237/2813
Abstract: Using a scanning type electron microscope, a spot where a particle is detected is determined by acquiring the evaluation of detection of particles on the surface of a wafer, etc., based on the coordinate information of a particle spot, by particle detection equipment, from the image within the view, shifting the view from the most probable spot of particle existence to less probable spots in sequence, and manipulating evaluation of detection as follows; supposing that the variance of histogram of the image is .sigma., and that the value N is equal to or more than 3, which is empirically known, and assuming that the spots where the data out of the range of .+-.N.sigma. exist is that of particles detected, pixels of particles are counted. In this manipulation, weighting corresponding to the spot of histogram and weighting corresponding to the mean of intensity of detection at the neighborhood of particles are executed.
Abstract translation: 使用扫描型电子显微镜，通过基于粒子斑点的坐标信息，通过粒子检测装置获取对晶片表面上的粒子的检测等级的评价来确定检测到粒子的斑点，来自 视图中的图像，将视图从最可能的粒子存在点移动到较少可能的点，并且如下操作检测的评估; 假设图像的直方图的方差是Σ，并且值N等于或大于3，这是经验上已知的，并且假设存在+/- N西格玛范围内的数据的点是 检测到的颗粒的像素被计数。 在该操作中，执行与直方图的点相对应的加权和对应于粒子附近的检测强度的平均值的加权。
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17.发明授权Isocyanate resin compositions and hot melt and pressure sensitive adhesives based thereon 失效异氰酸酯树脂组合物和基于其的热熔和压敏粘合剂
公开(公告)号：US5418288A
公开(公告)日：1995-05-23
申请号：US22870
申请日：1993-01-15
Applicant: Eiichi Kawasaki , Kiyoto Doi , Tadashi Kitamura , Kousuke Suewaka , Kazuya Shinkoda
Inventor： Eiichi Kawasaki , Kiyoto Doi , Tadashi Kitamura , Kousuke Suewaka , Kazuya Shinkoda
CPC classification number: C09J175/00 , C08G18/10 , C08G18/6225 , C08G18/728 , C08L51/003 , C08G2170/20 , C08G2170/40
Abstract: There is disclosed a resin composition containing graft copolymer having at least one isocyanate group and 10,000 to 20,000 of number-average molecular weight or high-molecular-weight polymer having at least one isocyanate group and 10,000 to 200,000 of number-average molecular weight, and low-molecular-weight polymer having or not having an isocyanate group and 500 to 8,000 of number-average molecular weight is disclosed. This resin composition has tackiness at ordinary temperature, and long pot life. It can be used to reactive hot melt type adhesives (which can omit hot press process), reactive hot melt type pressure-sensitive adhesives, or coating material.
Abstract translation: 公开了含有至少一种异氰酸酯基和数均分子量为10,000〜20,000，具有至少一个异氰酸酯基和数均分子量为10,000〜200,000的高分子量聚合物的接枝共聚物的树脂组合物，以及 公开了具有或不具有异氰酸酯基的低分子量聚合物和数均分子量为500-8,000的低分子量聚合物。 该树脂组合物在常温下具有粘性，使用寿命长。 它可用于反应性热熔型粘合剂（可以省略热压工艺），反应性热熔型压敏粘合剂或涂料。
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18.发明授权Oiled-face adherable, hot-melt adhesive composition and a non-slip processing method of metal scaffolding board 失效油性粘合剂，热熔粘合剂组合物和金属螯合板的非滑动加工方法
公开(公告)号：US5095059A
公开(公告)日：1992-03-10
申请号：US675611
申请日：1991-03-27
Applicant: Tadashi Kitamura , Kiyoto Doi , Eiichi Kawasaki , Kenichi Yashiro
Inventor： Tadashi Kitamura , Kiyoto Doi , Eiichi Kawasaki , Kenichi Yashiro
IPC: C09J151/00 , C09J157/06 , C09J201/02
CPC classification number: C09J157/06 , C09J151/003 , C09J201/02
Abstract: The invention provides oiled-face adherable, hot-melt adhesive composition which has constitutive components consisting of thermoplastic resin such as ethylene-acrylate ester resin, tacky resin such as rosin ester derivative and waxes such as paraffin wax and/or plasticizer such as naphthene oil, and also contains modified resin components obtained by introducing into the molecular chains of these components a phosphoric acid group or, if desired, a carboxyl or its anhydride group, for example, by grafting 2-hydroxy-3-(meth)acryloxypropyl phosphate.By providing the composition, adhesion and seal of metals with difficulty adhesive plastics are improved and a non-slip processing method of face-oiled metal scaffolding boards can be accomplished.
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公开(公告)号：US08285031B2
公开(公告)日：2012-10-09
申请号：US13152227
申请日：2011-06-02
Applicant: Tadashi Kitamura , Toshiaki Hasebe , Masotoshi Tsuneoka
Inventor： Tadashi Kitamura , Toshiaki Hasebe , Masotoshi Tsuneoka
CPC classification number: G06T7/001 , G06K9/00 , G06K2209/19 , G06T2207/30148
Abstract: A pattern inspection apparatus is used for inspecting a fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines, comprising one of a line segment and a curve, from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.
Abstract translation: 图案检查装置用于检查用于半导体或液晶面板的半导体集成电路（LSI），液晶面板和光掩模（掩模版）等精细图案，其基于用于制造的数据制造 精细图案如设计数据。 图案检查装置包括：参考图案生成装置，被配置为从数据生成包括线段和曲线中的一个或多个线的代表的参考图案，被配置为生成图案的图像的图像生成装置 被检查的检测装置，被配置为检测所述待检查图案的边缘的检测装置;以及检查装置，被配置为通过将所述图案的图像的边缘与所述图案的边缘进行比较来检查所述图案， 用参考图案的一行或多行进行检查。
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公开(公告)号：US08045785B2
公开(公告)日：2011-10-25
申请号：US12852314
申请日：2010-08-06
Applicant: Tadashi Kitamura , Kazufumi Kubota , Shinichi Nakazawa , Neeti Vohra , Masahiro Yamamoto , Toshiaki Hasebe
Inventor： Tadashi Kitamura , Kazufumi Kubota , Shinichi Nakazawa , Neeti Vohra , Masahiro Yamamoto , Toshiaki Hasebe
CPC classification number: G06K9/2054 , G06K9/00 , G06K9/036 , G06K9/48 , G06K2209/19 , G06T7/0004 , G06T7/001 , G06T2207/30148 , H01J37/265 , H01J37/28 , H01J2237/2817
Abstract: A fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data is inspected by a pattern inspection apparatus. The pattern inspection apparatus for inspecting a pattern to-be-inspected uses an image of the pattern to-be-inspected and data for fabricating the pattern to-be-inspected. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing edges of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.
Abstract translation: 基于用于制造诸如设计数据的精细图案的数据制造的诸如用于半导体或液晶面板的半导体集成电路（LSI），液晶面板和光掩模（掩模版））的精细图案是 由图案检查装置检查。 用于检查待检查图案的图案检查装置使用要检查的图案的图像和用于制造待检查图案的数据。 图案检查装置包括参考图案生成装置，被配置为从数据生成由一行或多行表示的参考图案，被配置为生成待检查图案的图像的图像生成装置，被配置为检测 要检查的图案的边缘;以及检查装置，其被配置为通过将待检查的图案的图像的边缘与所述待检查的图案的边缘进行比较来检查待检查的图案， 参考模式。
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