Abstract:
A defect inspection method includes: acquiring an image of an inspection pattern obtained by an imaging device, detecting an edge of the inspection pattern in the image, dividing the image into an inspection region and a non-inspection region, using the detected edge as a boundary thereof, performing image processing only on the inspection region to determine the intensity value distribution in the image, and detecting a defect in the inspection pattern based on the obtained intensity value distribution.
Abstract:
A pattern shape evaluation method comprising detecting an edge of an evaluation target pattern from an image of the evaluation target pattern to output the edge as a first edge, detecting an edge of a reference pattern from an image of the reference pattern to output the edge as a second edge, performing a relative scan of the first edge and the second edge to superpose the first edge onto the second edge, and outputting a resulting edge as a third edge, calculating a characteristic amount indicating characteristics of the third edge from the third edge, and deriving a characteristic amount function which provides the characteristic amount against relative coordinates in the relative scan and comparing the characteristic amount function with a preset value to judge whether or not the evaluation target pattern is good.
Abstract:
An image processing apparatus which compresses an image, the apparatus includes: a storage unit which stores a code book, the code book being prepared by allocating identification codes to code blocks, the code blocks being formed by executing quantization processing regarding a plurality of first image blocks as multidimensional vectors, the plurality of first image blocks being generated by cutting, in preset sizes, first regions out of a code book preparation image containing a first edge, each of the first regions surrounding and including an edge point of the first edge, the first edge being detected from the code book preparation image; an edge detection unit which detects a second edge from a compression target image containing the second edge; an image block generation unit which cuts, in preset sizes, second regions out of the compression target image to generate a plurality of second image blocks, each of the second regions surrounding and including an edge point of the detected second edge; a search unit which searches the code book stored in the storage unit for code blocks similar to the second image blocks; and an output unit which outputs information on the identification codes of the similar code blocks which have been searched for and information on coordinates of the edge points of the second image blocks.
Abstract:
A pattern shape evaluation method includes acquiring an image of an evaluation target pattern including a plurality of element patterns; detecting edge of the evaluation target pattern from the image; classifying the detected edge of the evaluation target pattern into a plurality of evaluation target pattern edge groups; acquiring edge of a reference pattern serving as an evaluation standard for the element patterns; classifying the edge of the reference pattern into a plurality of reference pattern edge groups; selecting a reference pattern edge group to be aligned with the edge of the evaluation target pattern from the classified reference pattern edge groups; aligning the edge of the selected reference pattern edge group with the edge of the evaluation target pattern; and evaluating the shape of the evaluation target pattern by use of the result of the alignment.
Abstract:
A method is disclosed whereby a functional nanomaterial such as a monolayer carbon nanotube, a monolayer boron nitride nanotube, a monolayer silicon carbide nanotube, a multilayer carbon nanotube with the number of layers controlled, a multilayer boron nitride nanotube with the number of layers controlled, a multilayer silicon carbide nanotube with the number of layers controlled, a metal containing fullerene, and a metal containing fullerene with the number of layers controlled is produced at a high yield. According to the method, when a multilayer carbon nanotube (3) is formed by a chemical vapor deposition or a liquid phase growth process, an endothermic reaction aid (H2S) is introduced in addition to a primary reactant (CH4, H2) in the process to form a monolayer carbon nanotube (4).
Abstract:
In a method for manufacturing an optical fiber probe in which an optical fiber is formed as an optical fiber probe by etching a tip section and sharpening a core region of the optical fiber, the optical fiber is a polarization maintaining optical fiber including the core region, a stress-applying region, and a clad region. The optical fiber probe is formed by mechanical-grinding of the edge of the optical fiber into a sharpened shape so that the core region is located at the tip of a sharpened portion, and by dipping the formed edge of the optical fiber in an etchant for further sharpening the core region. Accordingly, a new optical fiber probe both with a high transmission efficiency and with a large polarization degree is obtained.
Abstract:
A pattern evaluation method includes: acquiring a plurality of examination images obtained in regard to an evaluation target pattern, at least one of the plurality of examination images being different from the other examination images; detecting all edges of the evaluation target pattern in each of the examination images; executing alignment of the evaluation target pattern in the respective examination images with a sub-pixel accuracy based on the detected edges; superimposing the aligned pattern edges to generate a single combined edge; measuring the combined edge; and evaluating the evaluation target pattern based on a result of the measurement.
Abstract:
A measurement system includes a measurement apparatus, a client computer, and a server computer. The server computer includes a setting edition unit configured to prepare/edit set contents of a recipe of the measurement apparatus from the client computer, a notification unit configured to notify the measurement apparatus of at least one execution request included in the recipe prepared/edited by the client computer, a data processing unit configured to process data acquired by the recipe whose execution request has been notified by the measurement apparatus based on setting information input from the client computer, and a result display unit configured to display a processing result of the data processing unit in the client computer.
Abstract:
A method is disclosed whereby a functional nanomaterial such as a monolayer carbon nanotube, a monolayer boron nitride nanotube, a monolayer silicon carbide nanotube, a multilayer carbon nanotube with the number of layers controlled, a multilayer boron nitride nanotube with the number of layers controlled, a multilayer silicon carbide nanotube with the number of layers controlled, a metal containing fullerene, and a metal containing fullerene with the number of layers controlled is produced at a high yield. According to the method, when a multilayer carbon nanotube (3) is formed by a chemical vapor deposition or a liquid phase growth process, an endothermic reaction aid (H2S) is introduced in addition to a primary reactant (CH4, H2) in the process to form a monolayer carbon nanotube (4).
Abstract:
An assembly for measuring a trench depth parameter of a workpiece is disclosed. The assembly has an ultra-violet radiation source; a split fiber bundle having a first branch for propagating the ultra-violet radiation from the radiation source to a lens, and a second branch; a lens for focusing the UV radiation to the workpiece and refocusing an ultra-violet interference signal to the second branch; and a detector responsive to the ultra-violet interference signal received through the second branch. The detector transforms the ultra-violet interference signal to an electrical signal which is a measure of a trench depth of the workpiece. The ultra-violet interference signal is developed when ultra-violet radiation propagates through the workpiece and reflects from its base region to thereby interfere with ultra-violet radiation that is directly reflected by a workpiece surface which is different from the base region.