Multi-Function Overlay Marks for Reducing Noise and Extracting Focus and Critical Dimension Information

    公开(公告)号:US20210165315A1

    公开(公告)日:2021-06-03

    申请号:US17171119

    申请日:2021-02-09

    Abstract: An overlay mark includes a first, a second, a third, and a fourth component. The first component is located in a first region of the first overlay mark and includes a plurality of gratings that extend in a first direction. The second component is located in a second region of the first overlay mark and includes a plurality of gratings that extend in the first direction. The third component is located in a third region of the first overlay mark and includes a plurality of gratings that extend in a second direction different from the first direction. The fourth component is located in a fourth region of the first overlay mark and includes a plurality of gratings that extend in the second direction. The first region is aligned with the second region. The third region is aligned with the fourth region.

    Method and Structures for Acoustic Wave Overlay Error Determination

    公开(公告)号:US20190163076A1

    公开(公告)日:2019-05-30

    申请号:US15962518

    申请日:2018-04-25

    Abstract: A structure includes a first periodic structure positioned on a chip, the first periodic structure comprising a material of a first layer disposed on the chip. The structure further includes a second periodic structure positioned within the region of the chip adjacent the first periodic structure, the second periodic structure comprising a second material of a second layer disposed on the chip. The structure further includes an acoustic wave transmitter device disposed on the chip and an acoustic wave receiver device disposed on the chip.

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