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公开(公告)号:US10962888B2
公开(公告)日:2021-03-30
申请号:US15962518
申请日:2018-04-25
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Yu-Ching Lee , Yu-Piao Fang
Abstract: A structure includes a first periodic structure positioned on a chip, the first periodic structure comprising a material of a first layer disposed on the chip. The structure further includes a second periodic structure positioned within the region of the chip adjacent the first periodic structure, the second periodic structure comprising a second material of a second layer disposed on the chip. The structure further includes an acoustic wave transmitter device disposed on the chip and an acoustic wave receiver device disposed on the chip.
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公开(公告)号:US20200279759A1
公开(公告)日:2020-09-03
申请号:US16876875
申请日:2020-05-18
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Yu-Ching Lee , Yu-Piao Fang
IPC: H01L21/677 , G03F7/20 , G03F1/22 , H01L21/673 , G03F1/66
Abstract: A transportation container is provided with a container body constructed of a top wall, a bottom wall, a rear wall, and two sidewalls forming a front opening for loading or unloading a reticle pod into or out of the container body; a lid for opening and closing the front opening; and a lift plate above the container body configured to connect to a carrier of an overhead hoist transfer (OHT) system.
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公开(公告)号:US10658215B2
公开(公告)日:2020-05-19
申请号:US15797654
申请日:2017-10-30
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Yu-Ching Lee , Yu-Piao Fang
IPC: H01L21/673 , H01L21/677 , G03F7/20 , G03F1/22 , G03F1/66
Abstract: A transportation container is provided with a container body constructed of a top wall, a bottom wall, a rear wall, and two sidewalls forming a front opening for loading or unloading a reticle pod into or out of the container body; a lid for opening and closing the front opening; and a lift plate above the container body configured to connect to a carrier of an overhead hoist transfer (OHT) system.
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14.
公开(公告)号:US20190064654A1
公开(公告)日:2019-02-28
申请号:US16026309
申请日:2018-07-03
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Yu-Ching Lee , Te-Chih Huang , Yu-Piao Fang
Abstract: An overlay mark includes a first, a second, a third, and a fourth component. The first component is located in a first region of the first overlay mark and includes a plurality of gratings that extend in a first direction. The second component is located in a second region of the first overlay mark and includes a plurality of gratings that extend in the first direction. The third component is located in a third region of the first overlay mark and includes a plurality of gratings that extend in a second direction different from the first direction. The fourth component is located in a fourth region of the first overlay mark and includes a plurality of gratings that extend in the second direction. The first region is aligned with the second region. The third region is aligned with the fourth region.
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公开(公告)号:US11955441B2
公开(公告)日:2024-04-09
申请号:US17706039
申请日:2022-03-28
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor: Jian-Hong Lin , Kuo-Yen Liu , Hsin-Chun Chang , Tzu-Li Lee , Yu-Ching Lee , Yih-Ching Wang
IPC: H01L23/00 , H01L23/522 , H01L23/58 , H01L27/02 , H01L21/768
CPC classification number: H01L23/562 , H01L23/522 , H01L23/5226 , H01L23/585 , H01L27/0248 , H01L21/76805 , H01L2224/06519 , H01L2224/09519 , H01L2224/30519 , H01L2224/33519
Abstract: An interconnect structure comprises a first dielectric layer, a first metal layer, a second dielectric layer, a metal via, and a second metal layer. The first dielectric layer is over a substrate. The first metal layer is over the first dielectric layer. The first metal layer comprises a first portion and a second portion spaced apart from the first portion. The second dielectric layer is over the first metal layer. The metal via has an upper portion in the second dielectric layer, a middle portion between the first and second portions of the first metal layer, and a lower portion in the first dielectric layer. The second metal layer is over the metal via. From a top view the second metal layer comprises a metal line having longitudinal sides respectively set back from opposite sides of the first portion of the first metal layer.
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16.
公开(公告)号:US11302654B2
公开(公告)日:2022-04-12
申请号:US17018381
申请日:2020-09-11
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor: Jian-Hong Lin , Kuo-Yen Liu , Hsin-Chun Chang , Tzu-Li Lee , Yu-Ching Lee , Yih-Ching Wang
IPC: H01L21/768 , H01L23/00 , H01L23/58 , H01L27/02 , H01L23/522
Abstract: A method includes depositing a first dielectric layer over a substrate; forming a first dummy metal layer over the first dielectric layer, wherein the first dummy metal layer has first and second portions laterally separated from each other; depositing a second dielectric layer over the first dummy metal layer; etching an opening having an upper portion in the second dielectric layer, a middle portion between the first and second portions of the first dummy metal layer, and a lower portion in the first dielectric layer, wherein a width of the lower portion of the opening is greater than a width of the middle portion of the opening, and a bottom of the opening is higher than a bottom of the first dielectric layer; and forming a dummy via in the opening and a second dummy metal layer over the dummy via and the second dielectric layer.
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17.
公开(公告)号:US20210165315A1
公开(公告)日:2021-06-03
申请号:US17171119
申请日:2021-02-09
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Yu-Ching Lee , Te-Chih Huang , Yu-Piao Fang
Abstract: An overlay mark includes a first, a second, a third, and a fourth component. The first component is located in a first region of the first overlay mark and includes a plurality of gratings that extend in a first direction. The second component is located in a second region of the first overlay mark and includes a plurality of gratings that extend in the first direction. The third component is located in a third region of the first overlay mark and includes a plurality of gratings that extend in a second direction different from the first direction. The fourth component is located in a fourth region of the first overlay mark and includes a plurality of gratings that extend in the second direction. The first region is aligned with the second region. The third region is aligned with the fourth region.
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公开(公告)号:US20190163076A1
公开(公告)日:2019-05-30
申请号:US15962518
申请日:2018-04-25
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Yu-Ching Lee , Yu-Piao Fang
Abstract: A structure includes a first periodic structure positioned on a chip, the first periodic structure comprising a material of a first layer disposed on the chip. The structure further includes a second periodic structure positioned within the region of the chip adjacent the first periodic structure, the second periodic structure comprising a second material of a second layer disposed on the chip. The structure further includes an acoustic wave transmitter device disposed on the chip and an acoustic wave receiver device disposed on the chip.
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公开(公告)号:US11837486B2
公开(公告)日:2023-12-05
申请号:US17232326
申请日:2021-04-16
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Yu-Ching Lee , Yu-Piao Fang
IPC: H01L21/677 , G03F7/00 , G03F1/22 , H01L21/673 , G03F1/66
CPC classification number: H01L21/6773 , G03F1/22 , G03F1/66 , G03F7/7015 , G03F7/70741 , H01L21/67353 , H01L21/67359 , H01L21/67373 , H01L21/67379 , H01L21/67383 , H01L21/67386 , H01L21/67733 , H01L21/67769 , H01L21/67772 , H01L21/67721 , H01L21/67724
Abstract: A transportation container is provided with a container body constructed of a top wall, a bottom wall, a rear wall, and two sidewalls forming a front opening for loading or unloading a reticle pod into or out of the container body; a lid for opening and closing the front opening; and a lift plate above the container body configured to connect to a carrier of an overhead hoist transfer (OHT) system.
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20.
公开(公告)号:US11835864B2
公开(公告)日:2023-12-05
申请号:US17816030
申请日:2022-07-29
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Yu-Ching Lee , Te-Chih Huang , Yu-Piao Fang
IPC: H01L23/544 , G03F7/00 , G03F1/22 , G03F1/24 , G03F1/42
CPC classification number: G03F7/70633 , G03F1/22 , G03F1/24 , G03F1/42 , H01L23/544 , H01L2223/54426
Abstract: An overlay mark includes a first, a second, a third, and a fourth component. The first component is located in a first region of the first overlay mark and includes a plurality of gratings that extend in a first direction. The second component is located in a second region of the first overlay mark and includes a plurality of gratings that extend in the first direction. The third component is located in a third region of the first overlay mark and includes a plurality of gratings that extend in a second direction different from the first direction. The fourth component is located in a fourth region of the first overlay mark and includes a plurality of gratings that extend in the second direction. The first region is aligned with the second region. The third region is aligned with the fourth region.
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