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公开(公告)号：US5335259A
公开(公告)日：1994-08-02
申请号：US15434
申请日：1993-02-09
IPC分类号： G03F7/20 , G21K1/10 , H01L21/027 , G21K1/00
CPC分类号： G03F7/70808 , G21K1/10
摘要： An X-ray apparatus includes an X-ray pickup window through which synchrotron radiation light is projected, the X-ray pickup window having an X-ray transmission film; and a correcting system for correcting an intensity distribution of the synchrotron radiation light; wherein the X-ray transmission film has at least one of a film thickness distribution and a transmissivity distribution changing substantially in a predetermined direction; and wherein the X-ray transmission film is so disposed that the predetermined direction is substantially aligned with the direction of change of the intensity distribution of the synchrotron radiation light.
摘要翻译： X射线装置包括X射线拾取窗口，X射线拾取窗口通过其投影同步加速器辐射光，X射线拾取窗口具有X射线透射膜; 以及用于校正同步加速器辐射光的强度分布的校正系统; 其中所述X射线透射膜具有基本上沿预定方向改变的膜厚度分布和透射率分布中的至少一个; 并且其中所述X射线透射膜被设置成使得所述预定方向基本上与所述同步加速器辐射光的强度分布的变化方向对准。
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12.发明授权X-ray mask support member, X-ray mask, and X-ray exposure process using the X-ray mask 失效X射线掩模支撑构件，X射线掩模和使用X射线掩模的X射线曝光处理
公开(公告)号：US5012500A
公开(公告)日：1991-04-30
申请号：US290624
申请日：1988-12-27
申请人： Yutaka Watanabe , Yasuaki Fukuda , Shigetaro Ogura
发明人： Yutaka Watanabe , Yasuaki Fukuda , Shigetaro Ogura
IPC分类号： G03F1/22
CPC分类号： G03F1/22
摘要： An X-ray mask support member comprises a support frame, and a support membrane which is held thereon and comprises X-ray-transmissive membranes laminated in multiple layers. The support membrane comprises and holds between the multi-layers at least one layer of a transmissive membrane T having an electrical resistivity of 1.times.10.sup.-4 .OMEGA..multidot.cm or less.
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公开(公告)号：US6167111A
公开(公告)日：2000-12-26
申请号：US108373
申请日：1998-07-01
CPC分类号： G03F7/70058 , G21K1/06
摘要： An apparatus for transferring a pattern of a mask onto a substrate with radiation light from a synchrotron radiation light source, includes a first mirror for collectively reflecting radiation light from the synchrotron radiation light source, and a second mirror for reflecting radiation light from the first mirror and for projecting the same to the mask. When a light ray advancing from a light emission point of the light source toward a center of a predetermined region of the mask, to be transferred to the substrate, is taken as a chief ray, when a normal to each of the first and second mirrors at an incidence position of a corresponding chief ray is taken as a Z axis, when a direction perpendicular to a plane defined by the Z axis of each mirror and a corresponding chief ray is taken as an X axis, and when a Y axis is taken along a direction perpendicular to the Z axis and X axis of each mirror, the first mirror has a reflection surface of a shape which is concave with respect to the X axis direction and concave with respect to the Y axis direction, while the second mirror has a reflection surface of a shape which is convex with respect to the Y axis direction.
摘要翻译： 一种用于利用来自同步加速器辐射光源的辐射光将掩模图案转印到基板上的装置，包括用于共同地反射来自同步加速器辐射光源的辐射光的第一反射镜和用于反射来自第一反射镜的辐射光的第二反射镜 并将其投射到面罩。 当将从光源的发光点向掩模的预定区域的中心传播的光线作为主光线时，当第一和第二反射镜中的每一个的法线 当将相应的主光线的入射位置作为Z轴时，当将与每个反射镜的Z轴和相应的主光线所定义的平面垂直的方向作为X轴，并且当采用Y轴时 沿着与每个反射镜的Z轴和X轴垂直的方向，第一反射镜具有相对于X轴方向为凹形且相对于Y轴方向凹陷的形状的反射面，而第二反射镜具有 相对于Y轴方向凸出的形状的反射面。
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公开(公告)号：US5153898A
公开(公告)日：1992-10-06
申请号：US841298
申请日：1992-02-28
申请人： Masayuki Suzuki , Noritaka Mochizuki , Setsuo Minami , Shigetaro Ogura , Yasuaki Fukuda , Yutaka Watanabe , Yasuo Kawai , Takao Kariya
发明人： Masayuki Suzuki , Noritaka Mochizuki , Setsuo Minami , Shigetaro Ogura , Yasuaki Fukuda , Yutaka Watanabe , Yasuo Kawai , Takao Kariya
CPC分类号： B82Y10/00 , G02B17/0636 , G03F7/2039 , G03F7/70033 , G03F7/70233 , G03F7/7025 , G03F7/70691 , G03F7/70866 , G03F7/70875 , G03F7/70883 , G03F7/70891
摘要： An X-ray exposure apparatus includes a stage for holding a mask having a pattern for circuit manufacturing, a stage for holding a wafer to be exposed to the pattern of the mask with X-rays, and a reflection reduction imaging system, disposed between the mask stage and the wafer stage, including a reflecting mirror arrangement, containing at least three, but not more than five, reflecting mirrors coated with multi-layer films for receiving X-rays from the mask and directing them to the wafer to expose the wafer to the pattern of the mask with the X-ray in a reduced scale.
摘要翻译： X射线曝光装置包括：用于保持具有用于电路制造的图案的掩模的台，用于将要暴露于掩模的图案的晶片用X射线保持的晶片的台，以及设置在该掩模之间的反射减少成像系统 掩模台和晶片台，包括反射镜装置，其包含涂覆有多层膜的至少三个但不多于五个的反射镜，用于从掩模接收X射线并将其引导到晶片以暴露晶片 以减小的X射线的掩模图案。
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公开(公告)号：US06819396B1
公开(公告)日：2004-11-16
申请号：US09712979
申请日：2000-11-16
IPC分类号： G03B2752
CPC分类号： G03F7/70983 , G03F7/70883
摘要： Disclosed is an exposure apparatus which includes an optical element, a gas supplying unit for supplying a predetermined gas around the optical element, and an organic compound decomposition mechanism for decomposing an organic compound in the gas. This structure prevents adhesion of organic compounds to the optical element without a necessity of using many filters in combination.
摘要翻译： 公开了一种曝光装置，其包括光学元件，用于在光学元件周围提供预定气体的气体供给单元和用于分解气体中的有机化合物的有机化合物分解机构。 这种结构防止有机化合物粘附到光学元件上，而不需要组合使用许多过滤器。
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公开(公告)号：US5262257A
公开(公告)日：1993-11-16
申请号：US3867
申请日：1993-01-11
申请人： Yasuaki Fukuda , Noriyuki Nose
发明人： Yasuaki Fukuda , Noriyuki Nose
摘要： A mask structure according to an aspect of the invention includes a base having a first zone for an alignment pattern and a second zone for a circuit pattern; an alignment pattern forming material with which the alignment pattern is formed in the first zone; and a circuit pattern forming material with which the circuit pattern is formed in the second zone; wherein the alignment pattern forming material and the circuit pattern forming material are different from each other.
摘要翻译： 根据本发明的一个方面的掩模结构包括具有用于对准图案的第一区域和用于电路图案的第二区域的底座; 对准图案形成材料，其中在所述第一区域中形成所述对准图案; 以及在所述第二区域中形成所述电路图案的电路图案形成材料; 其中所述对准图案形成材料和所述电路图案形成材料彼此不同。
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公开(公告)号：US5101420A
公开(公告)日：1992-03-31
申请号：US689092
申请日：1991-04-22
申请人： Nobuo Kushibiki , Hideo Kato , Akira Miyake , Yasuaki Fukuda
发明人： Nobuo Kushibiki , Hideo Kato , Akira Miyake , Yasuaki Fukuda
CPC分类号： G03F1/22 , G03F7/707 , G03F7/70858 , G03F7/70891
摘要： An X-ray mask support comprises a support frame and a support film, wherein both of the support frame and the support film have a thermal expansion coefficient of not more than 1.times.10.sup.-5 K.sup.-1 or wherein the thermal expansion coefficient of the support film does not exceed that of the support flame or wherein both the support frame and the support film have a thermal expansion coefficient of not more than 1.times.10.sup.-5 K.sup.-1 and the support film has a surface roughness at least on the mask surface, of not more than 10 nm r.m.s. Basically a process for preparing the X-ray support film comprises the steps of forming a film on a substrate and sintering the film.
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公开(公告)号：US07657219B2
公开(公告)日：2010-02-02
申请号：US11467207
申请日：2006-08-25
IPC分类号： G03G15/00
CPC分类号： G03G15/6573 , G03G2215/00421
摘要： An image forming apparatus including: a paper feed cassette; a paper pickup roller; an image forming portion; a fixing unit; a paper discharge portion for discharging paper P with a developer image fused and fixed thereon; and an inversion roller and a paper discharge drive roller for conveying paper P along a paper conveyance path, and is constructed such that guide ribs are provided for a curved portion in a main conveyance path and the first and second curved portions of a sub conveyance path are provided in shapes that will not cause concentration of stress acting on the paper P in abutment.
摘要翻译： 一种图像形成装置，包括：供纸盒; 拾纸辊; 图像形成部分; 固定单元; 纸张排出部分，用于在其上融合和固定的显影剂图像排出纸张P; 以及用于沿着纸张输送路径传送纸张P的反转辊和排纸驱动辊，并且被构造成使得在主传送路径中的弯曲部分设置有引导肋，并且副传送路径的第一和第二弯曲部分 设置成不会引起作用在纸张P上的应力集中的形状。
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公开(公告)号：US5656398A
公开(公告)日：1997-08-12
申请号：US479358
申请日：1995-06-07
申请人： Takeshi Miyachi , Yasuaki Fukuda , Keiko Chiba
发明人： Takeshi Miyachi , Yasuaki Fukuda , Keiko Chiba
CPC分类号： G03F1/22
摘要： A method of making an X-ray mask structure having an X-ray absorber in a desired pattern on the surface of a support film held by a frame. The method includes a step of patterning the X-ray absorber, including a drawing step that utilizes charged particles, and a step of thereafter providing the frame with a magnetic member. The frame and the support film each include a non-magnetic material.
摘要翻译： 一种在由框架保持的支撑膜的表面上制造具有期望图案的X射线吸收体的X射线掩模结构的方法。 该方法包括图案化X射线吸收体的步骤，包括利用带电粒子的拉伸步骤，以及此后向框架提供磁性部件的步骤。 框架和支撑膜各自包括非磁性材料。
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公开(公告)号：US5528654A
公开(公告)日：1996-06-18
申请号：US258071
申请日：1994-06-10
申请人： Masahito Niibe , Yasuaki Fukuda
发明人： Masahito Niibe , Yasuaki Fukuda
IPC分类号： G21K1/06
CPC分类号： B82Y10/00 , G21K1/062 , G21K2201/061
摘要： A multilayer film for X-rays comprising two kinds of films having different refractive indices, deposited alternately, wherein one of said two kinds of films which has smaller refractive index consists of an alloy containing Co and Cr. The multilayer film is capable of being utilized as an optical element such as a reflection mirror or a reflection-type X-ray mask.
摘要翻译： 用于X射线的多层膜包括交替沉积的具有不同折射率的两种膜，其中折射率较小的所述两种膜中的一种由含有Co和Cr的合金构成。 多层膜能够用作反射镜或反射型X射线掩模等光学元件。
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