公开(公告)号：US07428907B2

公开(公告)日：2008-09-30

申请号：US10838926

申请日：2004-05-05

申请人： Seiichiro Okuda ,  Hiroaki Sugimoto ,  Takuya Kuroda ,  Masanobu Sato ,  Sadao Hirae ,  Shuichi Yasuda ,  Kenya Morinishi ,  Masayoshi Imai

发明人： Seiichiro Okuda ,  Hiroaki Sugimoto ,  Takuya Kuroda ,  Masanobu Sato ,  Sadao Hirae ,  Shuichi Yasuda ,  Kenya Morinishi ,  Masayoshi Imai

IPC分类号： B08B3/02

CPC分类号： H01L21/67046 ,  B08B1/04 ,  B08B3/02 ,  B08B2203/0288 ,  H01L21/67051 ,  Y10S134/902

摘要： The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, intermediate rinse liquid or deionized water. The reaction products which having been generated on the substrate in etching process is removed at high speeds with the flow of the mist, whereby the quality of the process is improved.

摘要翻译： 基板处理装置设置有气液混合喷嘴，用于通过混合液体和加压气体来产生处理液雾，以将处理液雾以高速排放到基板。 液体可以是去除液体，中间漂洗液体或去离子水。 在蚀刻过程中在基板上产生的反应产物随着雾的流动以高速度被去除，从而提高了工艺的质量。

公开(公告)号：US06550988B2

公开(公告)日：2003-04-22

申请号：US09984533

申请日：2001-10-30

申请人： Hiroaki Sugimoto ,  Seiichiro Okuda ,  Takuya Kuroda

发明人： Hiroaki Sugimoto ,  Seiichiro Okuda ,  Takuya Kuroda

IPC分类号： G03D500

CPC分类号： H01L21/67051 ,  G03F7/3021 ,  H01L21/67028 ,  Y10S134/902

摘要： A removal liquid is supplied to a substrate on which a thin film formed is patterned by dry etching using a resist film as a mask, and cleaning is made with de-ionized water, thereby removing a reaction product generated on the surface of the substrate. After that, the processed substrate is heated, thereby completely drying the substrate from which the reaction product has been eliminated.

公开(公告)号：US07267130B2

公开(公告)日：2007-09-11

申请号：US10836283

申请日：2004-05-03

申请人： Seiichiro Okuda ,  Hiroaki Sugimoto ,  Takuya Kuroda ,  Masanobu Sato ,  Sadao Hirae ,  Shuichi Yasuda ,  Kenya Morinishi ,  Masayoshi Imai

发明人： Seiichiro Okuda ,  Hiroaki Sugimoto ,  Takuya Kuroda ,  Masanobu Sato ,  Sadao Hirae ,  Shuichi Yasuda ,  Kenya Morinishi ,  Masayoshi Imai

IPC分类号： B08B3/02

CPC分类号： H01L21/67046 ,  B08B1/04 ,  B08B3/02 ,  B08B2203/0288 ,  H01L21/67051 ,  Y10S134/902

摘要： The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, intermediate rinse liquid or deionized water. The reaction products which having been generated on the substrate in etching process is removed at high speeds with the flow of the mist, whereby the quality of the process is improved.

摘要翻译： 基板处理装置设置有气液混合喷嘴，用于通过混合液体和加压气体来产生处理液雾，以将处理液雾以高速排放到基板。 液体可以是去除液体，中间漂洗液体或去离子水。 在蚀刻过程中在基板上产生的反应产物随着雾的流动以高速度被去除，从而提高了工艺的质量。

公开(公告)号：US07236614B2

公开(公告)日：2007-06-26

申请号：US10085032

申请日：2002-03-01

申请人： Takuya Kuroda ,  Mihoko Takahashi ,  Miharu Sakuragi ,  Hiroyuki Iwao

发明人： Takuya Kuroda ,  Mihoko Takahashi ,  Miharu Sakuragi ,  Hiroyuki Iwao

IPC分类号： G06K9/00 ,  G06K9/46 ,  G06K9/66 ,  G06K9/62 ,  G06K9/54 ,  G06K9/60 ,  G06K19/00 ,  G05B19/00 ,  G05B23/00 ,  G06F7/0004 ,  G08B29/00 ,  G08C19/00 ,  H04B1/00 ,  H04B3/00 ,  H04Q1/00 ,  H04Q9/00 ,  G06Q40/00 ,  G06Q99/00 ,  H04K1/00 ,  H04L9/00

CPC分类号： G06K9/00288 ,  G06K9/00926 ,  G06Q20/3674 ,  G06Q20/383 ,  G06Q20/40 ,  Y10S707/99932 ,  Y10S707/99939

摘要： There are provided a living body collating device, a living body collating system and a living body collating method, which is equipped with optimization candidate data extracting means 35 for extracting optimization candidate data for data renewal from past record data of living body information achieved, optimization candidate data storage means 36 for storing the optimization candidate data extracted by the optimization candidate data extracting means 35, and renewal storage means 37 for storing, as new registration data, the data having higher priorities of the optimization candidate data stored in the optimization candidate data storage means 36 and registration data stored in registration data storage means.

摘要翻译： 提供了一种生物体整理装置，生物体整理系统和生物体整理方法，其具有优化候选数据提取装置35，用于从实现的生物体信息的过去记录数据中提取用于数据更新的优化候选数据，优化 候选数据存储装置36，用于存储由优化候选数据提取装置35提取的优化候选数据;以及更新存储装置37，用于将存储在优化候选数据中的优化候选数据的优先级较高的数据作为新的登记数据存储 存储装置36和存储在登记数据存储装置中的登记数据。

公开(公告)号：US06951221B2

公开(公告)日：2005-10-04

申请号：US09957652

申请日：2001-09-21

申请人： Seiichiro Okuda ,  Hiroaki Sugimoto ,  Takuya Kuroda ,  Masanobu Sato ,  Sadao Hirae ,  Shuichi Yasuda ,  Kenya Morinishi ,  Masayoshi Imai

发明人： Seiichiro Okuda ,  Hiroaki Sugimoto ,  Takuya Kuroda ,  Masanobu Sato ,  Sadao Hirae ,  Shuichi Yasuda ,  Kenya Morinishi ,  Masayoshi Imai

IPC分类号： B08B1/04 ,  B08B3/02 ,  H01L21/00

CPC分类号： H01L21/67046 ,  B08B1/04 ,  B08B3/02 ,  B08B2203/0288 ,  H01L21/67051 ,  Y10S134/902

摘要： The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, intermediate rinse liquid or deionized water. The reaction products which having been generated on the substrate in etching process is removed at high speeds with the flow of the mist, whereby the quality of the process is improved.

摘要翻译： 基板处理装置设置有气液混合喷嘴，用于通过混合液体和加压气体来产生处理液雾，以将处理液雾以高速排放到基板。 液体可以是去除液体，中间漂洗液体或去离子水。 在蚀刻过程中在基板上产生的反应产物随着雾的流动以高速度被去除，从而提高了工艺的质量。