公开(公告)号：US20120231271A1

公开(公告)日：2012-09-13

申请号：US13508783

申请日：2010-09-14

申请人： Anke Schuster ,  Rene Sowa ,  Martin Trommer ,  Udo Peper

发明人： Anke Schuster ,  Rene Sowa ,  Martin Trommer ,  Udo Peper

IPC分类号： B32B17/02 ,  C03B37/014

CPC分类号： C03B19/1492 ,  C03B37/01493 ,  Y10T428/22 ,  Y10T428/2918

摘要： In a known process for producing a quartz glass cylinder, a porous soot tube, which is sintered to form the quartz glass cylinder, is produced by depositing SiO2 particles on an outer cylindrical surface of a support, which rotates about the longitudinal axis thereof and has a layer of silicon carbide (SiC layer). In order on this basis to specify a support having a high resistance to fracture, which firstly can easily be removed and which secondly presents a low risk of contamination for the soot body, the invention proposes that the SiC layer is treated at a high temperature in an oxygen-containing atmosphere before the SiO2 particles are deposited, in such a manner that an SiO2 protective layer having a thickness of at least 0.1 μm is produced by oxidation.

摘要翻译： 在生产石英玻璃圆筒的已知方法中，烧结形成石英玻璃圆筒的多孔烟灰管是通过在支撑件的外圆柱形表面上沉积SiO 2颗粒来生产的，该支撑体的外圆柱形表面围绕其纵向轴线旋转， 一层碳化硅（SiC层）。 为了在此基础上指定具有高耐断裂性的载体，其首先可以容易地除去，其次呈现较低的烟灰体污染风险，本发明提出在高温下处理SiC层 在沉积SiO 2颗粒之前的含氧气氛以通过氧化产生具有至少0.1μm的厚度的SiO 2保护层的方式。

公开(公告)号：US20110244154A1

公开(公告)日：2011-10-06

申请号：US12998596

申请日：2009-10-29

申请人： Thomas Krause ,  Martin Trommer

发明人： Thomas Krause ,  Martin Trommer

IPC分类号： C03B37/014 ,  B32B17/02 ,  G02B6/036 ,  B32B1/08

CPC分类号： C03B37/01446 ,  C03B2201/12 ,  Y10T428/1317 ,  Y10T428/2964

摘要： In a known method for producing a dimensionally stable semi-finished product for use in producing fibers from synthetic quartz glass, an SiO2 soot layer is applied to the outer wall of a quartz glass inner cylinder and is subjected to a sintering treatment, wherein a sintering zone moves through the SiO2 soot layer from the outside to the inside. In order to achieve dimensionally accurate and low-deformation production as well as high cost efficiency based on said known method, it is proposed that the sintering treatment be interrupted before the sintering zone reaches the outer wall of the inner cylinder so that an intermediate layer made of synthetic quartz glass containing pores remains at the inner cylinder outer wall. The semi-finished product obtained in such a way is elongated into the optical component, wherein the intermediate layer sinters completely into transparent quartz glass.

摘要翻译： 在用于制造用于从合成石英玻璃生产纤维的尺寸稳定的半成品的已知方法中，将SiO 2烟灰层施加到石英玻璃内筒的外壁上，并进行烧结处理，其中烧结 区域从外部向内移动通过SiO 2烟灰层。 为了实现尺寸精确和低变形的生产以及基于所述已知方法的高成本效率，建议在烧结区到达内筒的外壁之前中断烧结处理，以使中间层 含有孔的合成石英玻璃保留在内筒外壁。 以这种方式获得的半成品细长到光学部件中，其中中间层完全烧结成透明的石英玻璃。

公开(公告)号：US07749930B2

公开(公告)日：2010-07-06

申请号：US11630405

申请日：2006-03-30

申请人： Juergen Weber ,  Tobias Pogge ,  Martin Trommer ,  Bodo Kuehn ,  Ulrich Kirst ,  Waltraud Werdecker

发明人： Juergen Weber ,  Tobias Pogge ,  Martin Trommer ,  Bodo Kuehn ,  Ulrich Kirst ,  Waltraud Werdecker

IPC分类号： C03C3/06 ,  C03C3/04 ,  C03C15/00 ,  C03B19/00 ,  C03B21/00 ,  C03B32/00 ,  C03B25/00

CPC分类号： C03C3/06 ,  C03B19/06 ,  C03B19/09 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/24 ,  C03B2201/32 ,  C03C15/00 ,  C03C19/00 ,  C03C23/0025 ,  C03C23/006 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/32 ,  C03C2201/50 ,  C03C2203/54 ,  C30B25/12 ,  C30B31/14 ,  C30B35/00 ,  Y02P40/57

摘要： An ideal quartz glass for a wafer jig for use in an environment having an etching effect is distinguished by both high purity and high resistance to dry etching. To indicate a quartz glass that substantially fulfills these requirements, it is suggested according to the invention that the quartz glass is doped with nitrogen at least in a near-surface area, has a mean content of metastable hydroxyl groups of less than 30 wt ppm and that its fictive temperature is below 1250° C. and its viscosity is at least 1013 dPa·s at a temperature of 1200° C. An economic method for producing such a quartz glass comprises the following method steps: melting an SiO2 raw material to obtain a quartz glass blank, the SiO2 raw material or the quartz glass blank being subjected to a dehydration measure, heating the SiO2 raw material or the quartz glass blank to a nitriding temperature in the range between 1050° C. and 1850° C. in an ammonia-containing atmosphere, a temperature treatment by means of which the quartz glass of the quartz glass blank is set to a fictive temperature of 1250° C. or less, and a surface treatment of the quartz glass blank with formation of the quartz glass jig.

摘要翻译： 用于具有蚀刻效果的环境中的晶片夹具的理想石英玻璃的特征在于高纯度和高耐干蚀刻性。 为了表明基本满足这些要求的石英玻璃，根据本发明提出，石英玻璃至少在近表面积中掺杂氮，其平均含量小于30重量ppm， 其虚拟温度低于1250℃，在1200℃的温度下其粘度至少为1013dPa·s。制备这种石英玻璃的经济方法包括以下方法步骤：将SiO 2原料熔化得到 将石英玻璃坯料，SiO 2原料或石英玻璃坯料进行脱水处理，将SiO2原料或石英玻璃坯料加热至1050℃〜1850℃的氮化温度， 含有氨的气氛，将石英玻璃坯料的石英玻璃设定为1250℃以下的假想温度的温度处理，以及格式化的石英玻璃坯料的表面处理 在石英玻璃夹具上。

公开(公告)号：US07955715B2

公开(公告)日：2011-06-07

申请号：US11642349

申请日：2006-12-20

申请人： Martin Trommer ,  Rainer Berg ,  Nigel Whippey ,  Helmut Leber ,  Joerg Becker

发明人： Martin Trommer ,  Rainer Berg ,  Nigel Whippey ,  Helmut Leber ,  Joerg Becker

IPC分类号： B32B15/04 ,  C03B37/00

CPC分类号： C03B5/1675 ,  C23C4/08 ,  C23C4/134 ,  Y10T428/12292 ,  Y10T428/12771 ,  Y10T428/1284

摘要： In a known method for coating a crucible for use at a high working temperature in a crucible drawing method for quartz glass, a base body wall of tungsten has applied thereto a protective layer containing a coating metal consisting of the group selected from iridium, rhenium, osmium and ruthenium. Starting therefrom, to provide a method for producing such a component exhibiting high corrosion resistance to the quartz glass melt at low material costs, it is suggested according to the invention that the protective layer should be produced from a layer material which contains tungsten and the coating metal, and in which the amount of the coating metal should be dimensioned such that it exceeds the limit amount of a coating metal-rich phase boundary of a solid mixture phase of tungsten and the coating metal, with the solid mixture phase being thermodynamically stable at the working temperature, by not more than 25 at. % (based on the total amount of tungsten and the coating metal in the layer material).

摘要翻译： 在用于石英玻璃的坩埚拉拔方法中用于涂覆在高工作温度下使用的坩埚的已知方法中，钨基体壁向其施加保护层，该保护层含有由选自铱，铼， 锇和钌。 从其开始，为了提供一种以低材料成本制造对石英玻璃熔体具有高耐腐蚀性的组分的方法，根据本发明，建议保护层应由含钨的层材料和涂层 金属，并且其中涂层金属的量的尺寸应使其超过钨和涂覆金属的固体混合物相的涂覆金属富集相边界的极限量，其中固体混合物相在热力学上稳定在 工作温度不超过25℃。 ％（基于钨层和层材料中涂层金属的总量）。

公开(公告)号：US20080075949A1

公开(公告)日：2008-03-27

申请号：US11661160

申请日：2005-08-23

申请人： Ulrich Kirst ,  Wolfgang Stang ,  Juergen Weber ,  Waltraud Werdecker ,  Martin Trommer ,  Joerg Becker

发明人： Ulrich Kirst ,  Wolfgang Stang ,  Juergen Weber ,  Waltraud Werdecker ,  Martin Trommer ,  Joerg Becker

IPC分类号： C03C17/02 ,  C03B19/02 ,  C03C17/25

CPC分类号： C03C17/25 ,  C03B19/066 ,  C03C17/02 ,  C03C2217/213 ,  Y10T428/26

摘要： The invention relates to methods for producing a coated component consisting of quartz glass, according to which the component surface is at least partially provided with a SiO2 glass composition that differs from the quartz glass of the base body. The aim of the invention is to provide a novel way of coating a quartz glass component with a SiO2 glass composition that can be produced in a cost-effective, reproducible manner, with any thickness, and can fulfil various functions according to the concrete embodiment thereof. To this end, an amorphous slip containing SiO2 particles is produced and applied to the surface of the base body, forming a slip layer which is dried and then vitrified, forming a SiO2 glass composition. The quartz glass components coated in this way can be advantageously used especially in the production of semiconductors.

摘要翻译： 本发明涉及生产由石英玻璃组成的涂层组分的方法，根据该方法，组分表面至少部分地具有不同于基体的石英玻璃的SiO 2玻璃组合物。 本发明的目的是提供一种用可以以任何厚度的成本有效，可再现的方式生产的SiO 2玻璃组合物涂覆石英玻璃组分的新方法，并且可以实现 根据具体实施例的各种功能。 为此，制备含有SiO 2颗粒的无定形滑移并施加到基体的表面，形成干燥然后玻璃化的滑移层，形成SiO 2 2 / SUB>玻璃组合物。 以这种方式涂覆的石英玻璃组分可以有利地用于半导体的生产。

公开(公告)号：US20070178329A1

公开(公告)日：2007-08-02

申请号：US11642349

申请日：2006-12-20

申请人： Martin Trommer ,  Rainer Berg ,  Nigel Whippey ,  Helmut Leber ,  Joerg Becker

发明人： Martin Trommer ,  Rainer Berg ,  Nigel Whippey ,  Helmut Leber ,  Joerg Becker

IPC分类号： B05D1/36 ,  C23C4/08 ,  F01D5/18

CPC分类号： C03B5/1675 ,  C23C4/08 ,  C23C4/134 ,  Y10T428/12292 ,  Y10T428/12771 ,  Y10T428/1284

摘要： In a known method for coating a crucible for use at a high working temperature in a crucible drawing method for quartz glass, a base body wall of tungsten has applied thereto a protective layer containing a coating metal consisting of the group selected from iridium, rhenium, osmium and ruthenium. Starting therefrom, to provide a method for producing such a component exhibiting high corrosion resistance to the quartz glass melt at low material costs, it is suggested according to the invention that the protective layer should be produced from a layer material which contains tungsten and the coating metal, and in which the amount of the coating metal should be dimensioned such that it exceeds the limit amount of a coating metal-rich phase boundary of a solid mixture phase of tungsten and the coating metal, with the solid mixture phase being thermodynamically stable at the working temperature, by not more than 25 at. % (based on the total amount of tungsten and the coating metal in the layer material).

摘要翻译： 在用于石英玻璃的坩埚拉拔方法中用于涂覆在高工作温度下使用的坩埚的已知方法中，钨基体壁向其施加保护层，该保护层含有由选自铱，铼， 锇和钌。 从其开始，为了提供一种以低材料成本制造对石英玻璃熔体具有高耐腐蚀性的组分的方法，根据本发明，建议保护层应由含钨的层材料和涂层 金属，并且其中涂层金属的量的尺寸应使其超过钨和涂覆金属的固体混合物相的涂覆金属富集相边界的极限量，其中固体混合物相在热力学上稳定在 工作温度不超过25℃。 ％（基于钨层和层材料中涂层金属的总量）。