公开(公告)号：US20230141911A1

公开(公告)日：2023-05-11

申请号：US17950116

申请日：2022-09-22

Applicant: Tokyo Electron Limited

Inventor： Dai KITAGAWA

IPC: H01J37/32

CPC classification number: H01J37/32899 ,  H01J37/32743 ,  H01J37/32715 ,  H01J37/32816 ,  H01J2237/20278 ,  H01J2237/20235 ,  H01J2237/186

Abstract: A substrate processing system is installable in a small installation area. The substrate processing system includes one or more process modules and a vacuum transfer module. At least one of the one or more process modules and the vacuum transfer module at least partially overlap with each other as viewed from above.

公开(公告)号：US20210375648A1

公开(公告)日：2021-12-02

申请号：US17444850

申请日：2021-08-11

Applicant: Tokyo Electron Limited

Inventor： Dai KITAGAWA

IPC: H01L21/67 ,  H01J37/32 ,  H01L21/683

Abstract: A heater power feeding mechanism is provided that divides a stage on which a substrate is placed into zones by using a plurality of heaters and can control a temperature of each of the zones. The heater power feeding mechanism includes a plurality of sets of heater terminals connected to any of the plurality of heaters by a segment unit when a set of the heater terminals is made one segment, a heater interconnection, and an interconnection structure configured to connect at least any of the plurality sets of the heater terminals with each other by using the heater interconnection by the segment unit.

公开(公告)号：US20210098224A1

公开(公告)日：2021-04-01

申请号：US17023939

申请日：2020-09-17

Applicant: Tokyo Electron Limited

Inventor： Dai KITAGAWA

IPC: H01J37/20 ,  B23Q3/15

Abstract: A disclosed substrate support includes a base and first and second supports. A refrigerant flow path is formed inside the base. The base has first to third regions. The first region has a circular upper surface. The second region surrounds the first region. The third region surrounds the second region. The upper surface of the first region, the upper surface of the second region, and the upper surface of the third region are flat and continuous. The first support is provided on the first region and is configured to support the substrate placed thereon. The second support is provided on the third region to surround the first support, is configured to support the edge ring placed thereon, and is separated from the first support.

公开(公告)号：US20170140957A1

公开(公告)日：2017-05-18

申请号：US15300342

申请日：2015-04-30

Applicant: Tokyo Electron Limited

Inventor： Dai KITAGAWA

IPC: H01L21/67 ,  H01J37/32 ,  H01L21/683

CPC classification number: H01L21/67103 ,  H01J37/32009 ,  H01J37/32431 ,  H01J37/32724 ,  H01J2237/334 ,  H01L21/67069 ,  H01L21/67248 ,  H01L21/6831

Abstract: A heater power feeding mechanism is provided that divides a stage on which a substrate is placed into zones by using a plurality of heaters and can control a temperature of each of the zones. The heater power feeding mechanism includes a plurality of sets of heater terminals connected to any of the plurality of heaters by a segment unit when a set of the heater terminals is made one segment, a heater interconnection, and an interconnection structure configured to connect at least any of the plurality sets of the heater terminals with each other by using the heater interconnection by the segment unit.

公开(公告)号：US20150311106A1

公开(公告)日：2015-10-29

申请号：US14690802

申请日：2015-04-20

Applicant: TOKYO ELECTRON LIMITED

Inventor： Katsuyuki KOIZUMI ,  Dai KITAGAWA ,  Tomoyuki TAKAHASHI

IPC: H01L21/683 ,  H01J37/32

CPC classification number: H01J37/32715 ,  H01J37/32697 ,  H01L21/6831

Abstract: Disclosed is an electrostatic chuck including a circular placing region configured to place a processing target object thereon. The placing region includes a bottom surface and a plurality of protrusions configured to protrude from the bottom surface. Further, the plurality of protrusions is formed at a plurality of positions set at a regular interval on each of a plurality of circles set concentrically and at a regular interval around a center of the placing region. Furthermore, among the plurality of positions, a plurality of positions set on each of any two adjacent circles is set not to be positioned on the same straight line extending from the center.

Abstract translation: 公开了一种静电卡盘，其包括被配置为在其上放置加工对象物体的圆形放置区域。 放置区域包括底表面和被配置为从底表面突出的多个突起。 此外，多个突起形成在围绕放置区域的中心的同心且以规则间隔设置的多个圆圈中的每一个上以规则间隔设置的多个位置。 此外，在多个位置中，设置在任何两个相邻圆圈中的每一个上的多个位置被设置为不位于从中心延伸的同一直线上。